JP2010507696A5 - - Google Patents
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- Publication number
- JP2010507696A5 JP2010507696A5 JP2009533784A JP2009533784A JP2010507696A5 JP 2010507696 A5 JP2010507696 A5 JP 2010507696A5 JP 2009533784 A JP2009533784 A JP 2009533784A JP 2009533784 A JP2009533784 A JP 2009533784A JP 2010507696 A5 JP2010507696 A5 JP 2010507696A5
- Authority
- JP
- Japan
- Prior art keywords
- composition
- phenyl
- stabilizer
- sterically hindered
- alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000203 mixture Substances 0.000 claims 21
- 239000003381 stabilizer Substances 0.000 claims 14
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 8
- 239000002516 radical scavenger Substances 0.000 claims 6
- 125000000217 alkyl group Chemical group 0.000 claims 5
- 239000011248 coating agent Substances 0.000 claims 5
- 238000000576 coating method Methods 0.000 claims 5
- 125000001624 naphthyl group Chemical group 0.000 claims 5
- 150000003839 salts Chemical class 0.000 claims 5
- ODUCDPQEXGNKDN-UHFFFAOYSA-N nitroxyl Chemical compound O=N ODUCDPQEXGNKDN-UHFFFAOYSA-N 0.000 claims 4
- -1 nitroxyl compound Chemical class 0.000 claims 4
- 239000002530 phenolic antioxidant Substances 0.000 claims 4
- 125000003545 alkoxy group Chemical group 0.000 claims 2
- 150000001450 anions Chemical class 0.000 claims 2
- 229910052799 carbon Inorganic materials 0.000 claims 2
- 125000002091 cationic group Chemical group 0.000 claims 2
- 150000001875 compounds Chemical class 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- 229910052760 oxygen Inorganic materials 0.000 claims 2
- 229910052717 sulfur Inorganic materials 0.000 claims 2
- 125000006700 (C1-C6) alkylthio group Chemical group 0.000 claims 1
- 125000006552 (C3-C8) cycloalkyl group Chemical group 0.000 claims 1
- CSGAUKGQUCHWDP-UHFFFAOYSA-N 1-hydroxy-2,2,6,6-tetramethylpiperidin-4-ol Chemical compound CC1(C)CC(O)CC(C)(C)N1O CSGAUKGQUCHWDP-UHFFFAOYSA-N 0.000 claims 1
- WPMYUUITDBHVQZ-UHFFFAOYSA-N 3-(3,5-ditert-butyl-4-hydroxyphenyl)propanoic acid Chemical compound CC(C)(C)C1=CC(CCC(O)=O)=CC(C(C)(C)C)=C1O WPMYUUITDBHVQZ-UHFFFAOYSA-N 0.000 claims 1
- 229910017008 AsF 6 Inorganic materials 0.000 claims 1
- 229910015892 BF 4 Inorganic materials 0.000 claims 1
- 125000003860 C1-C20 alkoxy group Chemical group 0.000 claims 1
- 125000003358 C2-C20 alkenyl group Chemical group 0.000 claims 1
- 229910020366 ClO 4 Inorganic materials 0.000 claims 1
- 229910021115 PF 6 Inorganic materials 0.000 claims 1
- 229910018286 SbF 6 Inorganic materials 0.000 claims 1
- 229910021536 Zeolite Inorganic materials 0.000 claims 1
- 239000000853 adhesive Substances 0.000 claims 1
- 230000001070 adhesive effect Effects 0.000 claims 1
- SXPLGYBFGPYAHS-UHFFFAOYSA-N bis(1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl) decanedioate Chemical group C1C(C)(C)N(O)C(C)(C)CC1OC(=O)CCCCCCCCC(=O)OC1CC(C)(C)N(O)C(C)(C)C1 SXPLGYBFGPYAHS-UHFFFAOYSA-N 0.000 claims 1
- 238000004132 cross linking Methods 0.000 claims 1
- 125000004122 cyclic group Chemical group 0.000 claims 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 claims 1
- 150000002148 esters Chemical class 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 150000002367 halogens Chemical class 0.000 claims 1
- 239000006115 industrial coating Substances 0.000 claims 1
- 239000003999 initiator Substances 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000016 photochemical curing Methods 0.000 claims 1
- 238000006116 polymerization reaction Methods 0.000 claims 1
- 239000000843 powder Substances 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 150000005846 sugar alcohols Polymers 0.000 claims 1
- 150000003573 thiols Chemical class 0.000 claims 1
- GKASDNZWUGIAMG-UHFFFAOYSA-N triethyl orthoformate Chemical compound CCOC(OCC)OCC GKASDNZWUGIAMG-UHFFFAOYSA-N 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
- 239000010457 zeolite Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP06122783 | 2006-10-24 | ||
| EP06122783.1 | 2006-10-24 | ||
| PCT/EP2007/060924 WO2008049743A1 (en) | 2006-10-24 | 2007-10-15 | Thermally stable cationic photocurable compositions |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013169104A Division JP2013241622A (ja) | 2006-10-24 | 2013-08-16 | 熱安定性のカチオン光硬化性組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010507696A JP2010507696A (ja) | 2010-03-11 |
| JP2010507696A5 true JP2010507696A5 (enExample) | 2010-12-02 |
| JP5523101B2 JP5523101B2 (ja) | 2014-06-18 |
Family
ID=37846122
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009533784A Active JP5523101B2 (ja) | 2006-10-24 | 2007-10-15 | 熱安定性のカチオン光硬化性組成物 |
| JP2013169104A Withdrawn JP2013241622A (ja) | 2006-10-24 | 2013-08-16 | 熱安定性のカチオン光硬化性組成物 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2013169104A Withdrawn JP2013241622A (ja) | 2006-10-24 | 2013-08-16 | 熱安定性のカチオン光硬化性組成物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8084522B2 (enExample) |
| EP (1) | EP2076563B1 (enExample) |
| JP (2) | JP5523101B2 (enExample) |
| KR (1) | KR101435410B1 (enExample) |
| CN (1) | CN101558110B (enExample) |
| ES (1) | ES2603838T3 (enExample) |
| WO (1) | WO2008049743A1 (enExample) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009047151A1 (en) | 2007-10-10 | 2009-04-16 | Basf Se | Sulphonium salt initiators |
| JP5498832B2 (ja) * | 2009-03-25 | 2014-05-21 | 電気化学工業株式会社 | エネルギー線硬化性樹脂組成物とそれを用いた接着剤及び硬化体 |
| WO2011075555A1 (en) * | 2009-12-17 | 2011-06-23 | Dsm Ip Assets, B.V. | Led curable liquid resin compositions for additive fabrication |
| US20110300367A1 (en) * | 2010-06-07 | 2011-12-08 | Ching-Kee Chien | Optical Fiber With Photoacid Coating |
| CN103119080B (zh) * | 2010-09-24 | 2015-07-29 | 电气化学工业株式会社 | 能量射线固化性树脂组合物与使用该组合物的粘合剂及固化体 |
| JP5832740B2 (ja) * | 2010-11-30 | 2015-12-16 | 株式会社ダイセル | 硬化性エポキシ樹脂組成物 |
| EP2514800B2 (de) | 2011-04-21 | 2018-03-07 | Merck Patent GmbH | Verbindungen und flüssigkristallines Medium |
| JPWO2014017524A1 (ja) | 2012-07-26 | 2016-07-11 | デンカ株式会社 | 樹脂組成物 |
| KR20160111377A (ko) | 2014-01-23 | 2016-09-26 | 덴카 주식회사 | 수지 조성물 |
| US10604659B2 (en) | 2015-06-08 | 2020-03-31 | Dsm Ip Assets B.V. | Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication |
| KR102663364B1 (ko) | 2015-10-01 | 2024-05-08 | 스트래터시스,인코포레이티드 | 적층식 제조용 액체 하이브리드 uv/가시광 복사선-경화성 수지 조성물 |
| KR101941649B1 (ko) | 2017-11-24 | 2019-01-23 | 주식회사 엘지화학 | 편광판 및 이를 포함하는 화상 표시 장치 |
| JP7488102B2 (ja) * | 2019-05-17 | 2024-05-21 | 住友化学株式会社 | 塩、クエンチャー、レジスト組成物及びレジストパターンの製造方法 |
| JP7537913B2 (ja) * | 2019-06-04 | 2024-08-21 | 住友化学株式会社 | 塩、クエンチャー、レジスト組成物及びレジストパターンの製造方法 |
| JP7689013B2 (ja) * | 2020-05-15 | 2025-06-05 | 住友化学株式会社 | カルボン酸塩、クエンチャー、レジスト組成物及びレジストパターンの製造方法 |
| WO2025140899A1 (en) * | 2023-12-28 | 2025-07-03 | Merck Patent Gmbh | Methods for stabilizing a photoactive generator |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3641014A1 (de) | 1986-12-19 | 1988-06-16 | Wolfen Filmfab Veb | Fotopolymerisierbares material |
| JP2699188B2 (ja) * | 1988-03-15 | 1998-01-19 | 三新化学工業株式会社 | カチオン重合性組成物、重合触媒および重合方法 |
| JPH0735917A (ja) * | 1993-07-23 | 1995-02-07 | Toray Ind Inc | カラーフィルタの製造方法 |
| DE19627469A1 (de) | 1995-07-12 | 1997-01-16 | Sanyo Chemical Ind Ltd | Epoxidharzvernetzungsmittel und Ein-Komponenten-Epoxidharzzusammensetzung |
| TW460509B (en) | 1996-07-12 | 2001-10-21 | Ciba Sc Holding Ag | Curing process for cationically photocurable formulations |
| EP1000980B1 (en) | 1997-07-28 | 2004-07-07 | Kaneka Corporation | Curable composition |
| US5973020A (en) | 1998-01-06 | 1999-10-26 | Rhodia Inc. | Photoinitiator composition including hindered amine stabilizer |
| DE19927949A1 (de) * | 1999-06-18 | 2000-12-21 | Delo Industrieklebstoffe Gmbh | Kationisch härtende Masse, ihre Verwendung sowie Verfahren zur Herstellung gehärteter Polymermassen |
| SG98433A1 (en) | 1999-12-21 | 2003-09-19 | Ciba Sc Holding Ag | Iodonium salts as latent acid donors |
| ATE438638T1 (de) | 2001-07-19 | 2009-08-15 | Lamberti Spa | Sulfoniumsalze als photoinitiatoren für strahlungshärtbare systeme |
| GB0204467D0 (en) | 2002-02-26 | 2002-04-10 | Coates Brothers Plc | Novel fused ring compounds, and their use as cationic photoinitiators |
| JP2004051656A (ja) * | 2002-07-16 | 2004-02-19 | Konica Minolta Holdings Inc | 画像形成方法、印刷物及び記録装置 |
| WO2005070989A2 (en) | 2004-01-27 | 2005-08-04 | Ciba Specialty Chemicals Holding Inc. | Thermally stable cationic photocurable compositions |
| US20090192265A1 (en) | 2004-03-30 | 2009-07-30 | Nobuhiro Hasegawa | Curable composition |
| JP4421938B2 (ja) * | 2004-05-10 | 2010-02-24 | 日東電工株式会社 | 紫外線硬化型樹脂組成物 |
| JP4331644B2 (ja) * | 2004-05-10 | 2009-09-16 | 日東電工株式会社 | 紫外線硬化型樹脂組成物 |
| JP2006008740A (ja) * | 2004-06-22 | 2006-01-12 | Nitto Denko Corp | 紫外線硬化型樹脂組成物 |
| JP2006124636A (ja) * | 2004-06-28 | 2006-05-18 | Konica Minolta Medical & Graphic Inc | 活性光線硬化型組成物、活性光線硬化型インクジェットインク、該活性光線硬化型インクジェットインクを用いた画像形成方法及びインクジェット記録装置 |
| WO2006045713A1 (en) * | 2004-10-25 | 2006-05-04 | Ciba Specialty Chemicals Holding Inc. | Functionalized nanoparticles |
| JP4644050B2 (ja) * | 2005-02-04 | 2011-03-02 | 積水化学工業株式会社 | 光デバイスの製造方法及び光デバイス |
| JP2006257257A (ja) * | 2005-03-17 | 2006-09-28 | Sumitomo Chemical Co Ltd | 硬化性樹脂組成物および該組成物を用いて形成される保護膜 |
| JP2008534771A (ja) * | 2005-04-04 | 2008-08-28 | ナショナル スターチ アンド ケミカル インベストメント ホールディング コーポレイション | 放射線硬化性の乾燥剤を充填した接着剤／密閉剤 |
| US7687119B2 (en) * | 2005-04-04 | 2010-03-30 | Henkel Ag & Co. Kgaa | Radiation-curable desiccant-filled adhesive/sealant |
-
2007
- 2007-10-15 CN CN2007800384851A patent/CN101558110B/zh active Active
- 2007-10-15 ES ES07821291.7T patent/ES2603838T3/es active Active
- 2007-10-15 US US12/445,756 patent/US8084522B2/en active Active
- 2007-10-15 EP EP07821291.7A patent/EP2076563B1/en active Active
- 2007-10-15 WO PCT/EP2007/060924 patent/WO2008049743A1/en not_active Ceased
- 2007-10-15 JP JP2009533784A patent/JP5523101B2/ja active Active
- 2007-10-15 KR KR1020097010573A patent/KR101435410B1/ko not_active Expired - Fee Related
-
2013
- 2013-08-16 JP JP2013169104A patent/JP2013241622A/ja not_active Withdrawn
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