KR101435410B1 - 열 안정성 양이온 광경화성 조성물 - Google Patents

열 안정성 양이온 광경화성 조성물 Download PDF

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Publication number
KR101435410B1
KR101435410B1 KR1020097010573A KR20097010573A KR101435410B1 KR 101435410 B1 KR101435410 B1 KR 101435410B1 KR 1020097010573 A KR1020097010573 A KR 1020097010573A KR 20097010573 A KR20097010573 A KR 20097010573A KR 101435410 B1 KR101435410 B1 KR 101435410B1
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KR
South Korea
Prior art keywords
composition
phenyl
sterically hindered
stabilizer
coating
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Expired - Fee Related
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KR1020097010573A
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English (en)
Korean (ko)
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KR20090082251A (ko
Inventor
카르슈텐 린커
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시바 홀딩 인크
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/02—Halogenated hydrocarbons
    • C08K5/03—Halogenated hydrocarbons aromatic, e.g. C6H5-CH2-Cl
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/05—Alcohols; Metal alcoholates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Polymerisation Methods In General (AREA)
  • Dental Preparations (AREA)
  • Epoxy Resins (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
KR1020097010573A 2006-10-24 2007-10-15 열 안정성 양이온 광경화성 조성물 Expired - Fee Related KR101435410B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06122783 2006-10-24
EP06122783.1 2006-10-24
PCT/EP2007/060924 WO2008049743A1 (en) 2006-10-24 2007-10-15 Thermally stable cationic photocurable compositions

Publications (2)

Publication Number Publication Date
KR20090082251A KR20090082251A (ko) 2009-07-29
KR101435410B1 true KR101435410B1 (ko) 2014-08-29

Family

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Family Applications (1)

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KR1020097010573A Expired - Fee Related KR101435410B1 (ko) 2006-10-24 2007-10-15 열 안정성 양이온 광경화성 조성물

Country Status (7)

Country Link
US (1) US8084522B2 (enExample)
EP (1) EP2076563B1 (enExample)
JP (2) JP5523101B2 (enExample)
KR (1) KR101435410B1 (enExample)
CN (1) CN101558110B (enExample)
ES (1) ES2603838T3 (enExample)
WO (1) WO2008049743A1 (enExample)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5473921B2 (ja) 2007-10-10 2014-04-16 ビーエーエスエフ ソシエタス・ヨーロピア スルホニウム塩開始剤
JP5498832B2 (ja) * 2009-03-25 2014-05-21 電気化学工業株式会社 エネルギー線硬化性樹脂組成物とそれを用いた接着剤及び硬化体
KR101833078B1 (ko) * 2009-12-17 2018-02-27 디에스엠 아이피 어셋츠 비.브이. 적층식 제작을 위한 발광 다이오드 경화성 액체 수지 조성물
US20110300367A1 (en) * 2010-06-07 2011-12-08 Ching-Kee Chien Optical Fiber With Photoacid Coating
WO2012039051A1 (ja) * 2010-09-24 2012-03-29 電気化学工業株式会社 エネルギー線硬化性樹脂組成物とそれを用いた接着剤及び硬化体
JP5832740B2 (ja) 2010-11-30 2015-12-16 株式会社ダイセル 硬化性エポキシ樹脂組成物
EP2514800B2 (de) * 2011-04-21 2018-03-07 Merck Patent GmbH Verbindungen und flüssigkristallines Medium
KR102091871B1 (ko) 2012-07-26 2020-03-20 덴카 주식회사 수지 조성물
KR102385321B1 (ko) 2014-01-23 2022-04-11 덴카 주식회사 수지 조성물
US10604659B2 (en) 2015-06-08 2020-03-31 Dsm Ip Assets B.V. Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication
KR102663364B1 (ko) 2015-10-01 2024-05-08 스트래터시스,인코포레이티드 적층식 제조용 액체 하이브리드 uv/가시광 복사선-경화성 수지 조성물
KR101941649B1 (ko) 2017-11-24 2019-01-23 주식회사 엘지화학 편광판 및 이를 포함하는 화상 표시 장치
JP7488102B2 (ja) * 2019-05-17 2024-05-21 住友化学株式会社 塩、クエンチャー、レジスト組成物及びレジストパターンの製造方法
JP7537913B2 (ja) * 2019-06-04 2024-08-21 住友化学株式会社 塩、クエンチャー、レジスト組成物及びレジストパターンの製造方法
JP7689013B2 (ja) * 2020-05-15 2025-06-05 住友化学株式会社 カルボン酸塩、クエンチャー、レジスト組成物及びレジストパターンの製造方法
WO2025140899A1 (en) * 2023-12-28 2025-07-03 Merck Patent Gmbh Methods for stabilizing a photoactive generator

Citations (4)

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JP2004051656A (ja) 2002-07-16 2004-02-19 Konica Minolta Holdings Inc 画像形成方法、印刷物及び記録装置
US20050165141A1 (en) * 2004-01-27 2005-07-28 Jean-Pierre Wolf Thermally stable cationic photocurable compositions
JP2006008740A (ja) 2004-06-22 2006-01-12 Nitto Denko Corp 紫外線硬化型樹脂組成物
US20060223903A1 (en) * 2005-04-04 2006-10-05 Jie Cao Radiation-curable desiccant-filled adhesive/sealant

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JP2699188B2 (ja) * 1988-03-15 1998-01-19 三新化学工業株式会社 カチオン重合性組成物、重合触媒および重合方法
JPH0735917A (ja) * 1993-07-23 1995-02-07 Toray Ind Inc カラーフィルタの製造方法
DE19627469A1 (de) * 1995-07-12 1997-01-16 Sanyo Chemical Ind Ltd Epoxidharzvernetzungsmittel und Ein-Komponenten-Epoxidharzzusammensetzung
TW460509B (en) * 1996-07-12 2001-10-21 Ciba Sc Holding Ag Curing process for cationically photocurable formulations
DE69824961T2 (de) * 1997-07-28 2005-07-28 Kaneka Corp. Härtbare zusammensetzung
US5973020A (en) * 1998-01-06 1999-10-26 Rhodia Inc. Photoinitiator composition including hindered amine stabilizer
DE19927949A1 (de) * 1999-06-18 2000-12-21 Delo Industrieklebstoffe Gmbh Kationisch härtende Masse, ihre Verwendung sowie Verfahren zur Herstellung gehärteter Polymermassen
SG98433A1 (en) * 1999-12-21 2003-09-19 Ciba Sc Holding Ag Iodonium salts as latent acid donors
BR0205767B1 (pt) * 2001-07-19 2013-10-15 Sais de sulfônio, composições curáveis por radiação, formulações líquidas, e, método para a preparação dos sais de sulfônio
GB0204467D0 (en) 2002-02-26 2002-04-10 Coates Brothers Plc Novel fused ring compounds, and their use as cationic photoinitiators
EP1731544A4 (en) * 2004-03-30 2008-06-18 Kaneka Corp CURABLE COMPOSITION
JP4331644B2 (ja) * 2004-05-10 2009-09-16 日東電工株式会社 紫外線硬化型樹脂組成物
JP4421938B2 (ja) * 2004-05-10 2010-02-24 日東電工株式会社 紫外線硬化型樹脂組成物
JP2006124636A (ja) * 2004-06-28 2006-05-18 Konica Minolta Medical & Graphic Inc 活性光線硬化型組成物、活性光線硬化型インクジェットインク、該活性光線硬化型インクジェットインクを用いた画像形成方法及びインクジェット記録装置
EP2028228B1 (en) * 2004-10-25 2018-12-12 IGM Group B.V. Functionalized nanoparticles
JP4644050B2 (ja) * 2005-02-04 2011-03-02 積水化学工業株式会社 光デバイスの製造方法及び光デバイス
JP2006257257A (ja) * 2005-03-17 2006-09-28 Sumitomo Chemical Co Ltd 硬化性樹脂組成物および該組成物を用いて形成される保護膜
KR101191370B1 (ko) * 2005-04-04 2012-10-15 헨켈 아게 운트 코. 카게아아 방사선 경화성 건조제-충전 접착제/밀봉제

Patent Citations (4)

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Publication number Priority date Publication date Assignee Title
JP2004051656A (ja) 2002-07-16 2004-02-19 Konica Minolta Holdings Inc 画像形成方法、印刷物及び記録装置
US20050165141A1 (en) * 2004-01-27 2005-07-28 Jean-Pierre Wolf Thermally stable cationic photocurable compositions
JP2006008740A (ja) 2004-06-22 2006-01-12 Nitto Denko Corp 紫外線硬化型樹脂組成物
US20060223903A1 (en) * 2005-04-04 2006-10-05 Jie Cao Radiation-curable desiccant-filled adhesive/sealant

Also Published As

Publication number Publication date
CN101558110A (zh) 2009-10-14
EP2076563A1 (en) 2009-07-08
CN101558110B (zh) 2012-06-13
WO2008049743A1 (en) 2008-05-02
US20100304284A1 (en) 2010-12-02
JP5523101B2 (ja) 2014-06-18
EP2076563B1 (en) 2016-08-17
KR20090082251A (ko) 2009-07-29
US8084522B2 (en) 2011-12-27
JP2010507696A (ja) 2010-03-11
ES2603838T3 (es) 2017-03-01
JP2013241622A (ja) 2013-12-05

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