CN101558110B - 热稳定的可阳离子光固化组合物 - Google Patents

热稳定的可阳离子光固化组合物 Download PDF

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Publication number
CN101558110B
CN101558110B CN2007800384851A CN200780038485A CN101558110B CN 101558110 B CN101558110 B CN 101558110B CN 2007800384851 A CN2007800384851 A CN 2007800384851A CN 200780038485 A CN200780038485 A CN 200780038485A CN 101558110 B CN101558110 B CN 101558110B
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CN
China
Prior art keywords
phenyl
coatings
composition
stabilizer
composition according
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CN2007800384851A
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English (en)
Chinese (zh)
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CN101558110A (zh
Inventor
K·林克
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
BASF SE
IGM Group BV
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Ciba SC Holding AG
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/02—Halogenated hydrocarbons
    • C08K5/03—Halogenated hydrocarbons aromatic, e.g. C6H5-CH2-Cl
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/05—Alcohols; Metal alcoholates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Polymerisation Methods In General (AREA)
  • Dental Preparations (AREA)
  • Epoxy Resins (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Paints Or Removers (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CN2007800384851A 2006-10-24 2007-10-15 热稳定的可阳离子光固化组合物 Active CN101558110B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP06122783 2006-10-24
EP06122783.1 2006-10-24
PCT/EP2007/060924 WO2008049743A1 (en) 2006-10-24 2007-10-15 Thermally stable cationic photocurable compositions

Publications (2)

Publication Number Publication Date
CN101558110A CN101558110A (zh) 2009-10-14
CN101558110B true CN101558110B (zh) 2012-06-13

Family

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Family Applications (1)

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CN2007800384851A Active CN101558110B (zh) 2006-10-24 2007-10-15 热稳定的可阳离子光固化组合物

Country Status (7)

Country Link
US (1) US8084522B2 (enExample)
EP (1) EP2076563B1 (enExample)
JP (2) JP5523101B2 (enExample)
KR (1) KR101435410B1 (enExample)
CN (1) CN101558110B (enExample)
ES (1) ES2603838T3 (enExample)
WO (1) WO2008049743A1 (enExample)

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WO2009047151A1 (en) 2007-10-10 2009-04-16 Basf Se Sulphonium salt initiators
JP5498832B2 (ja) * 2009-03-25 2014-05-21 電気化学工業株式会社 エネルギー線硬化性樹脂組成物とそれを用いた接着剤及び硬化体
WO2011075555A1 (en) * 2009-12-17 2011-06-23 Dsm Ip Assets, B.V. Led curable liquid resin compositions for additive fabrication
US20110300367A1 (en) * 2010-06-07 2011-12-08 Ching-Kee Chien Optical Fiber With Photoacid Coating
CN103119080B (zh) * 2010-09-24 2015-07-29 电气化学工业株式会社 能量射线固化性树脂组合物与使用该组合物的粘合剂及固化体
JP5832740B2 (ja) * 2010-11-30 2015-12-16 株式会社ダイセル 硬化性エポキシ樹脂組成物
EP2514800B2 (de) 2011-04-21 2018-03-07 Merck Patent GmbH Verbindungen und flüssigkristallines Medium
JPWO2014017524A1 (ja) 2012-07-26 2016-07-11 デンカ株式会社 樹脂組成物
KR20160111377A (ko) 2014-01-23 2016-09-26 덴카 주식회사 수지 조성물
US10604659B2 (en) 2015-06-08 2020-03-31 Dsm Ip Assets B.V. Liquid, hybrid UV/VIS radiation curable resin compositions for additive fabrication
KR102663364B1 (ko) 2015-10-01 2024-05-08 스트래터시스,인코포레이티드 적층식 제조용 액체 하이브리드 uv/가시광 복사선-경화성 수지 조성물
KR101941649B1 (ko) 2017-11-24 2019-01-23 주식회사 엘지화학 편광판 및 이를 포함하는 화상 표시 장치
JP7488102B2 (ja) * 2019-05-17 2024-05-21 住友化学株式会社 塩、クエンチャー、レジスト組成物及びレジストパターンの製造方法
JP7537913B2 (ja) * 2019-06-04 2024-08-21 住友化学株式会社 塩、クエンチャー、レジスト組成物及びレジストパターンの製造方法
JP7689013B2 (ja) * 2020-05-15 2025-06-05 住友化学株式会社 カルボン酸塩、クエンチャー、レジスト組成物及びレジストパターンの製造方法
WO2025140899A1 (en) * 2023-12-28 2025-07-03 Merck Patent Gmbh Methods for stabilizing a photoactive generator

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Publication number Priority date Publication date Assignee Title
DE3641014A1 (de) 1986-12-19 1988-06-16 Wolfen Filmfab Veb Fotopolymerisierbares material
JP2699188B2 (ja) * 1988-03-15 1998-01-19 三新化学工業株式会社 カチオン重合性組成物、重合触媒および重合方法
JPH0735917A (ja) * 1993-07-23 1995-02-07 Toray Ind Inc カラーフィルタの製造方法
DE19627469A1 (de) 1995-07-12 1997-01-16 Sanyo Chemical Ind Ltd Epoxidharzvernetzungsmittel und Ein-Komponenten-Epoxidharzzusammensetzung
TW460509B (en) 1996-07-12 2001-10-21 Ciba Sc Holding Ag Curing process for cationically photocurable formulations
EP1000980B1 (en) 1997-07-28 2004-07-07 Kaneka Corporation Curable composition
US5973020A (en) 1998-01-06 1999-10-26 Rhodia Inc. Photoinitiator composition including hindered amine stabilizer
DE19927949A1 (de) * 1999-06-18 2000-12-21 Delo Industrieklebstoffe Gmbh Kationisch härtende Masse, ihre Verwendung sowie Verfahren zur Herstellung gehärteter Polymermassen
SG98433A1 (en) 1999-12-21 2003-09-19 Ciba Sc Holding Ag Iodonium salts as latent acid donors
ATE438638T1 (de) 2001-07-19 2009-08-15 Lamberti Spa Sulfoniumsalze als photoinitiatoren für strahlungshärtbare systeme
GB0204467D0 (en) 2002-02-26 2002-04-10 Coates Brothers Plc Novel fused ring compounds, and their use as cationic photoinitiators
JP2004051656A (ja) * 2002-07-16 2004-02-19 Konica Minolta Holdings Inc 画像形成方法、印刷物及び記録装置
WO2005070989A2 (en) 2004-01-27 2005-08-04 Ciba Specialty Chemicals Holding Inc. Thermally stable cationic photocurable compositions
US20090192265A1 (en) 2004-03-30 2009-07-30 Nobuhiro Hasegawa Curable composition
JP4421938B2 (ja) * 2004-05-10 2010-02-24 日東電工株式会社 紫外線硬化型樹脂組成物
JP4331644B2 (ja) * 2004-05-10 2009-09-16 日東電工株式会社 紫外線硬化型樹脂組成物
JP2006008740A (ja) * 2004-06-22 2006-01-12 Nitto Denko Corp 紫外線硬化型樹脂組成物
JP2006124636A (ja) * 2004-06-28 2006-05-18 Konica Minolta Medical & Graphic Inc 活性光線硬化型組成物、活性光線硬化型インクジェットインク、該活性光線硬化型インクジェットインクを用いた画像形成方法及びインクジェット記録装置
WO2006045713A1 (en) * 2004-10-25 2006-05-04 Ciba Specialty Chemicals Holding Inc. Functionalized nanoparticles
JP4644050B2 (ja) * 2005-02-04 2011-03-02 積水化学工業株式会社 光デバイスの製造方法及び光デバイス
JP2006257257A (ja) * 2005-03-17 2006-09-28 Sumitomo Chemical Co Ltd 硬化性樹脂組成物および該組成物を用いて形成される保護膜
JP2008534771A (ja) * 2005-04-04 2008-08-28 ナショナル スターチ アンド ケミカル インベストメント ホールディング コーポレイション 放射線硬化性の乾燥剤を充填した接着剤／密閉剤
US7687119B2 (en) * 2005-04-04 2010-03-30 Henkel Ag & Co. Kgaa Radiation-curable desiccant-filled adhesive/sealant

Also Published As

Publication number Publication date
JP2010507696A (ja) 2010-03-11
EP2076563A1 (en) 2009-07-08
WO2008049743A1 (en) 2008-05-02
EP2076563B1 (en) 2016-08-17
ES2603838T3 (es) 2017-03-01
KR101435410B1 (ko) 2014-08-29
JP5523101B2 (ja) 2014-06-18
CN101558110A (zh) 2009-10-14
KR20090082251A (ko) 2009-07-29
US8084522B2 (en) 2011-12-27
JP2013241622A (ja) 2013-12-05
US20100304284A1 (en) 2010-12-02

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
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GR01 Patent grant
CP01 Change in the name or title of a patent holder
CP01 Change in the name or title of a patent holder

Address after: Basel, Switzerland

Patentee after: BASF Ag AG

Address before: Basel, Switzerland

Patentee before: BASF Special Chemicals Holding Co.,Ltd.

TR01 Transfer of patent right
TR01 Transfer of patent right

Effective date of registration: 20180309

Address after: Wahl Holland

Patentee after: IGM Group B.V.

Address before: Rhine, Ludwigshafen, Germany

Patentee before: BASF SE

Effective date of registration: 20180309

Address after: Rhine, Ludwigshafen, Germany

Patentee after: BASF SE

Address before: Basel, Switzerland

Patentee before: BASF Ag AG

Effective date of registration: 20180309

Address after: Basel, Switzerland

Patentee after: BASF Special Chemicals Holding Co.,Ltd.

Address before: Basel, Switzerland

Patentee before: CIBA HOLDING Inc.