JP2010500776A - Ｅｕｖ光学器械 - Google Patents

Ｅｕｖ光学器械 Download PDF

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Publication number
JP2010500776A
JP2010500776A JP2009524601A JP2009524601A JP2010500776A JP 2010500776 A JP2010500776 A JP 2010500776A JP 2009524601 A JP2009524601 A JP 2009524601A JP 2009524601 A JP2009524601 A JP 2009524601A JP 2010500776 A JP2010500776 A JP 2010500776A
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JP
Japan
Prior art keywords
mirror
substrate
euv
coating
substrates
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Pending
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JP2009524601A
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English (en)
Japanese (ja)
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JP2010500776A5 (enExample
Inventor
イゴー ヴィー フォーメンコフ
ノーバート アール バウアリング
Original Assignee
サイマー インコーポレイテッド
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Publication of JP2010500776A publication Critical patent/JP2010500776A/ja
Publication of JP2010500776A5 publication Critical patent/JP2010500776A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/4998—Combined manufacture including applying or shaping of fluent material
    • Y10T29/49982—Coating

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Elements Other Than Lenses (AREA)
JP2009524601A 2006-08-16 2007-07-24 Ｅｕｖ光学器械 Pending JP2010500776A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/505,177 US7843632B2 (en) 2006-08-16 2006-08-16 EUV optics
PCT/US2007/016648 WO2008020965A2 (en) 2006-08-16 2007-07-24 Euv optics

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012234751A Division JP5667615B2 (ja) 2006-08-16 2012-10-24 Ｅｕｖ光学器械

Publications (2)

Publication Number Publication Date
JP2010500776A true JP2010500776A (ja) 2010-01-07
JP2010500776A5 JP2010500776A5 (enExample) 2010-09-09

Family

ID=39082516

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2009524601A Pending JP2010500776A (ja) 2006-08-16 2007-07-24 Ｅｕｖ光学器械
JP2012234751A Expired - Fee Related JP5667615B2 (ja) 2006-08-16 2012-10-24 Ｅｕｖ光学器械

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2012234751A Expired - Fee Related JP5667615B2 (ja) 2006-08-16 2012-10-24 Ｅｕｖ光学器械

Country Status (5)

Country Link
US (3) US7843632B2 (enExample)
JP (2) JP2010500776A (enExample)
KR (2) KR20130119012A (enExample)
TW (2) TWI367611B (enExample)
WO (1) WO2008020965A2 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011222958A (ja) * 2010-03-25 2011-11-04 Komatsu Ltd ミラーおよび極端紫外光生成装置
JP2017506356A (ja) * 2014-02-07 2017-03-02 エーエスエムエル ネザーランズ ビー．ブイ． ブリスタ耐性のある多層キャップを有するｅｕｖ光学素子

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