TWI367611B - Euv light source mirror and method for fabricating the same, euv light source mirror assembly and method for fabricating and aligning a light source collector mirror - Google Patents
Euv light source mirror and method for fabricating the same, euv light source mirror assembly and method for fabricating and aligning a light source collector mirrorInfo
- Publication number
- TWI367611B TWI367611B TW096127084A TW96127084A TWI367611B TW I367611 B TWI367611 B TW I367611B TW 096127084 A TW096127084 A TW 096127084A TW 96127084 A TW96127084 A TW 96127084A TW I367611 B TWI367611 B TW I367611B
- Authority
- TW
- Taiwan
- Prior art keywords
- light source
- fabricating
- mirror
- euv light
- aligning
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0891—Ultraviolet [UV] mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/4998—Combined manufacture including applying or shaping of fluent material
- Y10T29/49982—Coating
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Optical Elements Other Than Lenses (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/505,177 US7843632B2 (en) | 2006-08-16 | 2006-08-16 | EUV optics |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200820526A TW200820526A (en) | 2008-05-01 |
TWI367611B true TWI367611B (en) | 2012-07-01 |
Family
ID=39082516
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096127084A TWI367611B (en) | 2006-08-16 | 2007-07-25 | Euv light source mirror and method for fabricating the same, euv light source mirror assembly and method for fabricating and aligning a light source collector mirror |
TW100131687A TWI489155B (zh) | 2006-08-16 | 2007-07-25 | 極遠紫外光光學部件 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW100131687A TWI489155B (zh) | 2006-08-16 | 2007-07-25 | 極遠紫外光光學部件 |
Country Status (5)
Country | Link |
---|---|
US (3) | US7843632B2 (zh) |
JP (2) | JP2010500776A (zh) |
KR (2) | KR20090040434A (zh) |
TW (2) | TWI367611B (zh) |
WO (1) | WO2008020965A2 (zh) |
Families Citing this family (73)
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2007
- 2007-07-24 KR KR1020097002879A patent/KR20090040434A/ko not_active Application Discontinuation
- 2007-07-24 JP JP2009524601A patent/JP2010500776A/ja active Pending
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US8598549B2 (en) | 2013-12-03 |
KR20090040434A (ko) | 2009-04-24 |
WO2008020965A3 (en) | 2008-10-16 |
US20080043321A1 (en) | 2008-02-21 |
TWI489155B (zh) | 2015-06-21 |
US7843632B2 (en) | 2010-11-30 |
WO2008020965A2 (en) | 2008-02-21 |
JP2010500776A (ja) | 2010-01-07 |
US8907310B2 (en) | 2014-12-09 |
JP2013016872A (ja) | 2013-01-24 |
KR20130119012A (ko) | 2013-10-30 |
TW201213892A (en) | 2012-04-01 |
US20110075253A1 (en) | 2011-03-31 |
JP5667615B2 (ja) | 2015-02-12 |
US20140176926A1 (en) | 2014-06-26 |
TW200820526A (en) | 2008-05-01 |
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