JP2010245509A - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP2010245509A JP2010245509A JP2010035597A JP2010035597A JP2010245509A JP 2010245509 A JP2010245509 A JP 2010245509A JP 2010035597 A JP2010035597 A JP 2010035597A JP 2010035597 A JP2010035597 A JP 2010035597A JP 2010245509 A JP2010245509 A JP 2010245509A
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Abstract
【解決手段】 半導体装置は、第2配線基板10の第1配線基板側の面から突出する第2貫通電極40を備えるため、第1配線基板110の第1接続パッド164上に形成される半田バンプ174の高さを低くしても、第2配線基板10と第1配線基板110との接続が取れる。
【選択図】 図1
Description
前記第1基板の第1面側に形成され、半導体素子を実装する第1実装パッドと、
前記第1基板の第1面側に形成され、前記第1実装パッドの外周に配置されている第1接続パッドと、
前記第1基板の内部に設けられ、第1面側と第2面側とを接続する第1貫通電極と、
前記第1基板の上部に設けられ、半導体素子が実装される側の第1面と、その反対側に位置する第2面とを有する第2基板と、
前記第2基板の第1面側に形成され、半導体素子を実装する第2実装パッドと、
前記第2基板の内部に設けられて第1面側と第2面側とを接続し、第2面から端部が突き出る第2貫通電極と、
前記第1接続パッド上に設けられ、前記第2貫通電極の端部と前記第1接続パッドとを電気的に接続する導電性部材と、
を備えることを技術的特徴とする。
図1は実施例の半導体装置の断面図である。半導体装置は、CPU等のロジックICチップ180を実装する第1配線基板110上に、複数のメモリー等のICチップ80を実装する第2配線基板10を重ねた所謂パッケージオンパッケージ型の半導体装置である。第1配線基板110は、第1コア基材150と、第1コア基材の内部に形成されていて表裏を導通する第1貫通電極140と、第1コア基材150の第1面上に形成されている第1配線層157とを有している。第1配線層157は、ICチップ180を実装するための第1実装パッド65群と、その第1実装パッド65群の周囲に形成されている第1接続パッド164群とを有している(図1、図8参照)。第1配線基板110の第1接続パッド164上には半田バンプ174が形成されており、この半田バンプ174を介して第1基板110上に第2基板10が実装されている。より詳しくは、第2基板10の下面から突出する第2貫通電極40の先端部と第1基板110の第1接続パッド164とが半田バンプ174により接続されている。
この第1配線基板110において、平面視略中央部には、ICチップ接続用の半田バンプ170が配置されている。図8は、第1配線基板110の平面図である。ICチップ接続用の半田バンプ170の外周に、上述した第2貫通電極接続用の半田バンプ174が配置されている。電極接続用の半田バンプ174は、第1接続パッド164上に形成されている。また、第1配線基板110も、第1コア基材150の下面から突出する第1貫通電極140を有している。第1貫通電極140の先端部には、他のプリント配線板等への実装用の半田バンプ176が設けられている。さらに、第1配線基板110の最表面とICチップ180との間にはアンダーフィル184が充填されている。
図2は図1に示す鎖線Cの楕円内の拡大図である。第2配線基板10は、第2コア基材としてシリコン基板(シリコンウエハ)50を有している。シリコン基板50の表面側には表面絶縁層22が形成されている。第2貫通電極40は、シリコン基板50に形成された孔部50a内に設けられている。孔部50aを形成するシリコン基板50の壁面上には、表面絶縁層22、シード層24が順次形成されている。そして、シード層24の内側に電解めっき層26が形成されている。この電解めっき層26により第2貫通電極40が構成されている。第2貫通電極40の端部は、第2コア基材の下面(第2面)から第1配線基板側に向けて突き出ている。
第2配線基板10の第2配線層57は、複数の無機絶縁層56、54、52を有している。さらに、第2配線層57は、最外層の無機絶縁層56を貫通するランド部64と、最外層の無機絶縁層56の内部に形成されている配線66と、最外層の無機絶縁層の内部に形成されていてICチップ80を実装するための第2実装パッド65と、無機絶縁層54、52に形成されたビア導体46とを有している。なお、第1配線基板においては、第1実装パッド群の周囲に、同じく最外層の無機絶縁層の内部に形成された第1接続パッド群を有している。
また、絶縁層57上にはさらにソルダーレジスト層68が形成されている。ソルダーレジスト層6内には、第2実装パッド65の一部を露出させる開口68aが形成されている。この開口68a内に半田バンプ70が形成され、該半田バンプ70を介してICチップ80のパッド82に接続されている。第2配線基板10の最表面とICチップ80との間にはアンダーフィル84が充填されている。
また、半田量を少なくすることで、第1配線基板と第2配線基板との間の接続抵抗を小さくすることが可能となる。さらに、半田量を少なくすることで、第1配線基板上に第2配線基板を実装する際には、リフローによって基板がうける熱量が少なくなる。
加えて、第2貫通電極40に半田バンプ174を接続させるため、第2貫通電極40の底面のみならず側面にも半田バンプが接合することで接合面積を広くすることができ、第2貫通電極40と半田バンプ174との密着性を向上させることができる。更に、図2中に示すシリコンウエハ50からの第2貫通電極40の突き出し量t3を調整することで、第2貫通電極40がポスト状に第2基板10と第1基板110との間に介在し、両者の応力差を緩和することができる。
(1)図3(A)に示すように、シリコンウエハ50に、所定パターンのレジストマスク20を形成した後、図3(B)に示すように、ドライエッチング(反応性イオンエッチング)や、アルカリ溶液を用いたウェットエッチングにより開口部50aを形成する。ここでは、ドライエッチングを用いるが、例えばUVレーザーを用いて開口部を形成することもできる。
図4(D)に示すように、Si3N4層54上にCVD(化学気相成長)法によって第2SiO2層56を形成する。
図5(A)に示すように、第2SiO2層56上にレジストマスク(図示せず)を形成し、ランド部、配線、実装パッドが形成される所定の箇所に第2SiO2層56を貫通する開口をRIEにより形成する。なお、RIEの際には、Si3N4層54がエッチングストッパーの役割を果たす。
図5(B)に示すように、第2SiO2層56の開口を含む表面にシード層60を、例えばスパッタリングにより形成する。本実施例では、シード層60は、下から順にTaN、Ta、Cuのスパッタリング膜により構成されるが、これに限定されるものではない。
図5(C)に示すように、シード層60を給電層として電解銅めっきを行い電解銅めっき層62を形成する(図5(C))。電解銅めっきは、従来公知の方法により行えばよい。
図7(B)に示すように、半田バンプ70を介してICチップ80の電極82を接続し、ICチップを実装する。
続いて、図7(C)に示すように、第2配線基板10とICチップ80との間にアンダーフィル84を充填する。
その後、第1配線基板110の接続パッド上に形成された半田バンプ174を介して第2配線基板10を第1配線基板110上に実装する(図1参照)。
実施例では、配線層をダマシン法で形成したが、これをセミアディティブ法で形成してもよい。この場合、絶縁層を樹脂より形成される。
実施例では、コア基材をシリコンより形成したが、これをAlN、SiC等のセラミックスや、ガラス、樹脂等より形成してもよい。なおこの場合の樹脂としては、熱膨張係数が2.5〜10ppmであるものが好ましい。
実施例では、貫通電極を電解銅めっきにより形成したが、これを図9に示すように半田めっきにより形成してもよい。この場合、第1配線基板と第2配線基板との間の応力緩和を効果的に実施することが可能となる。
26 銅めっき層
28 半田
40 貫通電極
50 シリコンウエハ
65 第2実装パッド
66 配線
110 第1基板
140 貫通電極
164 第1実装パッド
170 半田バンプ
174 半田バンプ
Claims (8)
- 半導体素子が実装される側の第1面と、その反対側に位置する第2面とを有する第1基板と、
前記第1基板の第1面側に形成され、半導体素子を実装する第1実装パッドと、
前記第1基板の第1面側に形成され、前記第1実装パッドの外周に配置されている第1接続パッドと、
前記第1基板の内部に設けられ、第1面側と第2面側とを接続する第1貫通電極と、
前記第1基板の上部に設けられ、半導体素子が実装される側の第1面と、その反対側に位置する第2面とを有する第2基板と、
前記第2基板の第1面側に形成され、半導体素子を実装する第2実装パッドと、
前記第2基板の内部に設けられて第1面側と第2面側とを接続し、第2面から端部が突き出る第2貫通電極と、
前記第1接続パッド上に設けられ、前記第2貫通電極の端部と前記第1接続パッドとを電気的に接続する導電性部材と、
を備える半導体装置。 - 前記第1基板及び前記第2基板は、熱膨張係数が2.5〜10ppmである材料からなる請求項1の半導体装置。
- 前記第1基板及び前記第2基板はシリコンからなる請求項1の半導体装置。
- 前記導電性部材は半田バンプである請求項1の半導体装置。
- 前記第1電極の一端部は、前記第1基板の第2面から突き出る請求項1の半導体装置。
- 前記第1貫通電極及び前記第2貫通電極はめっきからなる請求項1の半導体装置。
- 前記第2貫通電極の端面は略同一平面上に位置する請求項1の半導体装置。
- 前記半導体素子は封止樹脂により封止されている請求項1の半導体装置。
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