JP2010212252A5 - - Google Patents

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Publication number
JP2010212252A5
JP2010212252A5 JP2010111764A JP2010111764A JP2010212252A5 JP 2010212252 A5 JP2010212252 A5 JP 2010212252A5 JP 2010111764 A JP2010111764 A JP 2010111764A JP 2010111764 A JP2010111764 A JP 2010111764A JP 2010212252 A5 JP2010212252 A5 JP 2010212252A5
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JP
Japan
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signal
digital
generator
analog
power
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JP2010111764A
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Japanese (ja)
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JP5631628B2 (ja
JP2010212252A (ja
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Priority claimed from US10/192,196 external-priority patent/US6707255B2/en
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Publication of JP2010212252A5 publication Critical patent/JP2010212252A5/ja
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Publication of JP5631628B2 publication Critical patent/JP5631628B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2010111764A 2002-07-10 2010-05-14 プラズマｒｆ源測定用マルチレート処理 Expired - Lifetime JP5631628B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/192,196 2002-07-10
US10/192,196 US6707255B2 (en) 2002-07-10 2002-07-10 Multirate processing for metrology of plasma RF source

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2004521427A Division JP2005532668A (ja) 2002-07-10 2003-04-14 プラズマｒｆ源測定用マルチレート処理

Publications (3)

Publication Number Publication Date
JP2010212252A JP2010212252A (ja) 2010-09-24
JP2010212252A5 true JP2010212252A5 (enExample) 2012-05-17
JP5631628B2 JP5631628B2 (ja) 2014-11-26

Family

ID=30114293

Family Applications (2)

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JP2004521427A Pending JP2005532668A (ja) 2002-07-10 2003-04-14 プラズマｒｆ源測定用マルチレート処理
JP2010111764A Expired - Lifetime JP5631628B2 (ja) 2002-07-10 2010-05-14 プラズマｒｆ源測定用マルチレート処理

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JP2004521427A Pending JP2005532668A (ja) 2002-07-10 2003-04-14 プラズマｒｆ源測定用マルチレート処理

Country Status (7)

Country Link
US (1) US6707255B2 (enExample)
EP (1) EP1520288B1 (enExample)
JP (2) JP2005532668A (enExample)
KR (1) KR100738990B1 (enExample)
CN (1) CN100339943C (enExample)
AU (1) AU2003224937A1 (enExample)
WO (1) WO2004008502A2 (enExample)

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WO2014016357A2 (en) * 2012-07-25 2014-01-30 Impedans Ltd Analysing rf signals from a plasma system
CN104871430B (zh) 2012-12-18 2018-01-12 通快许廷格两合公司 用于产生高频功率的方法和具有用于给负载供送功率的功率转换器的功率供送系统
DE202013012714U1 (de) 2012-12-18 2018-10-15 TRUMPF Hüttinger GmbH + Co. KG Leistungsversorgungssystem mit einem Leistungswandler
US10821542B2 (en) * 2013-03-15 2020-11-03 Mks Instruments, Inc. Pulse synchronization by monitoring power in another frequency band
CN103731148B (zh) * 2013-12-31 2017-04-26 上海英威腾工业技术有限公司 一种电流采样处理装置及电机驱动器
US9336997B2 (en) * 2014-03-17 2016-05-10 Applied Materials, Inc. RF multi-feed structure to improve plasma uniformity
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US9947514B2 (en) * 2015-09-01 2018-04-17 Mks Instruments, Inc. Plasma RF bias cancellation system
US10044338B2 (en) * 2015-10-15 2018-08-07 Lam Research Corporation Mutually induced filters
WO2017105497A1 (en) 2015-12-18 2017-06-22 Olympus Corporation Method and apparatus for accurate and efficient spectrum estimation using improved sliding dft
US9748076B1 (en) 2016-04-20 2017-08-29 Advanced Energy Industries, Inc. Apparatus for frequency tuning in a RF generator
KR101930440B1 (ko) * 2017-01-04 2018-12-18 주식회사 메디플 플라즈마 생성을 위한 전력 공급 장치
US10546724B2 (en) 2017-05-10 2020-01-28 Mks Instruments, Inc. Pulsed, bidirectional radio frequency source/load
US11042140B2 (en) 2018-06-26 2021-06-22 Mks Instruments, Inc. Adaptive control for a power generator
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