JP2005532668A - プラズマｒｆ源測定用マルチレート処理 - Google Patents

プラズマｒｆ源測定用マルチレート処理 Download PDF

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Publication number
JP2005532668A
JP2005532668A JP2004521427A JP2004521427A JP2005532668A JP 2005532668 A JP2005532668 A JP 2005532668A JP 2004521427 A JP2004521427 A JP 2004521427A JP 2004521427 A JP2004521427 A JP 2004521427A JP 2005532668 A JP2005532668 A JP 2005532668A
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Japan
Prior art keywords
signal
digital
generator
frequency
power
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Pending
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JP2004521427A
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English (en)
Japanese (ja)
Inventor
コウモウ，デービッド，ジェー．
カーク，マイケル，エル．
Original Assignee
イーエヌアイ テクノロジー， インコーポレイテッド
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Publication of JP2005532668A publication Critical patent/JP2005532668A/ja
Pending legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H17/00—Networks using digital techniques
    • H03H17/02—Frequency selective networks
    • H03H17/06—Non-recursive filters
    • H03H17/0621—Non-recursive filters with input-sampling frequency and output-delivery frequency which differ, e.g. extrapolation; Anti-aliasing
    • H03H17/0635—Non-recursive filters with input-sampling frequency and output-delivery frequency which differ, e.g. extrapolation; Anti-aliasing characterized by the ratio between the input-sampling and output-delivery frequencies
    • H03H17/0671—Cascaded integrator-comb [CIC] filters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Mathematical Physics (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
JP2004521427A 2002-07-10 2003-04-14 プラズマｒｆ源測定用マルチレート処理 Pending JP2005532668A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/192,196 US6707255B2 (en) 2002-07-10 2002-07-10 Multirate processing for metrology of plasma RF source
PCT/US2003/011266 WO2004008502A2 (en) 2002-07-10 2003-04-14 Multirate processing for metrology of plasma rf source

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010111764A Division JP5631628B2 (ja) 2002-07-10 2010-05-14 プラズマｒｆ源測定用マルチレート処理

Publications (1)

Publication Number Publication Date
JP2005532668A true JP2005532668A (ja) 2005-10-27

Family

ID=30114293

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2004521427A Pending JP2005532668A (ja) 2002-07-10 2003-04-14 プラズマｒｆ源測定用マルチレート処理
JP2010111764A Expired - Lifetime JP5631628B2 (ja) 2002-07-10 2010-05-14 プラズマｒｆ源測定用マルチレート処理

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2010111764A Expired - Lifetime JP5631628B2 (ja) 2002-07-10 2010-05-14 プラズマｒｆ源測定用マルチレート処理

Country Status (7)

Country Link
US (1) US6707255B2 (enExample)
EP (1) EP1520288B1 (enExample)
JP (2) JP2005532668A (enExample)
KR (1) KR100738990B1 (enExample)
CN (1) CN100339943C (enExample)
AU (1) AU2003224937A1 (enExample)
WO (1) WO2004008502A2 (enExample)

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JP2013084606A (ja) * 2007-03-14 2013-05-09 Mks Instruments Inc 多点電圧電流プローブシステム
JP2019503136A (ja) * 2015-12-18 2019-01-31 オリンパス株式会社 改善されたスライディングｄｆｔを使用する正確かつ効率的なスペクトル推定のための方法および装置
KR20210024172A (ko) 2018-09-13 2021-03-04 가부시키가이샤 히다치 고쿠사이 덴키 고주파 전원 장치 및 기판 처리 장치

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CN100543481C (zh) * 2005-01-11 2009-09-23 亿诺维新工程股份有限公司 检测传递到负载的rf功率以及该负载的复数阻抗的方法
US7602127B2 (en) * 2005-04-18 2009-10-13 Mks Instruments, Inc. Phase and frequency control of a radio frequency generator from an external source
US8102954B2 (en) * 2005-04-26 2012-01-24 Mks Instruments, Inc. Frequency interference detection and correction
US7477711B2 (en) * 2005-05-19 2009-01-13 Mks Instruments, Inc. Synchronous undersampling for high-frequency voltage and current measurements
US7780814B2 (en) * 2005-07-08 2010-08-24 Applied Materials, Inc. Wafer pre-clean reactor cable termination for selective suppression/reflection of source and bias frequency cross products
US7196650B1 (en) 2006-01-27 2007-03-27 Analog Devices, Inc. Signal converter systems and methods with enhanced signal-to-noise ratios
US7788309B2 (en) * 2006-04-04 2010-08-31 Analog Devices, Inc. Interleaved comb and integrator filter structures
US7408495B2 (en) * 2006-05-15 2008-08-05 Guzik Technical Enterprises Digital equalization of multiple interleaved analog-to-digital converters
DE102007056468A1 (de) * 2007-11-22 2009-06-04 Hüttinger Elektronik Gmbh + Co. Kg Messsignalverarbeitungseinrichtung und Verfahren zur Verarbeitung von zumindest zwei Messsignalen
US7822565B2 (en) * 2007-12-31 2010-10-26 Advanced Energy Industries, Inc. System, method, and apparatus for monitoring characteristics of RF power
US7839223B2 (en) * 2008-03-23 2010-11-23 Advanced Energy Industries, Inc. Method and apparatus for advanced frequency tuning
US8213885B2 (en) * 2008-04-11 2012-07-03 Nautel Limited Impedance measurement in an active radio frequency transmitter
US7970562B2 (en) * 2008-05-07 2011-06-28 Advanced Energy Industries, Inc. System, method, and apparatus for monitoring power
US8040068B2 (en) 2009-02-05 2011-10-18 Mks Instruments, Inc. Radio frequency power control system
CN102469675A (zh) * 2010-11-05 2012-05-23 北京北方微电子基地设备工艺研究中心有限责任公司 功率匹配装置和半导体设备
CN102981156A (zh) * 2011-09-06 2013-03-20 中国科学院声学研究所 一种超声成像后处理方法及装置
KR102009541B1 (ko) * 2012-02-23 2019-08-09 도쿄엘렉트론가부시키가이샤 플라즈마 처리 장치, 및 고주파 발생기
WO2014016357A2 (en) * 2012-07-25 2014-01-30 Impedans Ltd Analysing rf signals from a plasma system
CN104871430B (zh) 2012-12-18 2018-01-12 通快许廷格两合公司 用于产生高频功率的方法和具有用于给负载供送功率的功率转换器的功率供送系统
DE202013012714U1 (de) 2012-12-18 2018-10-15 TRUMPF Hüttinger GmbH + Co. KG Leistungsversorgungssystem mit einem Leistungswandler
US10821542B2 (en) * 2013-03-15 2020-11-03 Mks Instruments, Inc. Pulse synchronization by monitoring power in another frequency band
CN103731148B (zh) * 2013-12-31 2017-04-26 上海英威腾工业技术有限公司 一种电流采样处理装置及电机驱动器
US9336997B2 (en) * 2014-03-17 2016-05-10 Applied Materials, Inc. RF multi-feed structure to improve plasma uniformity
DE102015212242A1 (de) * 2015-06-30 2017-01-05 TRUMPF Hüttinger GmbH + Co. KG Verfahren zum Abtasten eines mit einem Plasmaprozess in Beziehung stehenden Signalgemischs
US9947514B2 (en) * 2015-09-01 2018-04-17 Mks Instruments, Inc. Plasma RF bias cancellation system
US10044338B2 (en) * 2015-10-15 2018-08-07 Lam Research Corporation Mutually induced filters
US9748076B1 (en) 2016-04-20 2017-08-29 Advanced Energy Industries, Inc. Apparatus for frequency tuning in a RF generator
KR101930440B1 (ko) * 2017-01-04 2018-12-18 주식회사 메디플 플라즈마 생성을 위한 전력 공급 장치
US10546724B2 (en) 2017-05-10 2020-01-28 Mks Instruments, Inc. Pulsed, bidirectional radio frequency source/load
US11042140B2 (en) 2018-06-26 2021-06-22 Mks Instruments, Inc. Adaptive control for a power generator
US10623013B1 (en) * 2018-10-29 2020-04-14 Texas Instruments Incorporated Systems with pairs of voltage level shifter switches to couple voltage level shifters to anti-aliasing filters
US11158488B2 (en) 2019-06-26 2021-10-26 Mks Instruments, Inc. High speed synchronization of plasma source/bias power delivery
US12394604B2 (en) 2020-09-11 2025-08-19 Applied Materials, Inc. Plasma source with floating electrodes
US11776793B2 (en) 2020-11-13 2023-10-03 Applied Materials, Inc. Plasma source with ceramic electrode plate

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JPS63155848A (ja) * 1986-12-19 1988-06-29 Nec Corp 信号電力検出回路
JPH0280563A (ja) * 1988-09-14 1990-03-20 Hitachi Ltd プラズマ処理方法及び処理装置
JPH0450668A (ja) * 1990-06-12 1992-02-19 Hioki Ee Corp 高調波電力計
JPH118095A (ja) * 1997-03-19 1999-01-12 Scient Syst Res Ltd プラズマに供給されるｒｆ電流を感知する装置及びこのような装置に使用する波形サンプリング回路
JPH1183907A (ja) * 1997-09-03 1999-03-26 Mitsubishi Electric Corp 高周波電流の測定方法
JP2000031073A (ja) * 1998-02-26 2000-01-28 Canon Inc プラズマ処理装置及びプラズマ処理方法
US6020794A (en) * 1998-02-09 2000-02-01 Eni Technologies, Inc. Ratiometric autotuning algorithm for RF plasma generator
JP2001515668A (ja) * 1996-11-14 2001-09-18 サイエンティフィック―アトランタ，インコーポレイテッド ブロック位相推定のための装置および方法
JP2002340944A (ja) * 2001-03-20 2002-11-27 Eni Technology Inc プローブ解析システムのブロードバンド設計

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KR100525961B1 (ko) * 1996-11-04 2005-12-21 어플라이드 머티어리얼스, 인코포레이티드 플라즈마시스에서발생하는고주파를필터링하는플라즈마처리장치및방법
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JPS63155848A (ja) * 1986-12-19 1988-06-29 Nec Corp 信号電力検出回路
JPH0280563A (ja) * 1988-09-14 1990-03-20 Hitachi Ltd プラズマ処理方法及び処理装置
JPH0450668A (ja) * 1990-06-12 1992-02-19 Hioki Ee Corp 高調波電力計
JP2001515668A (ja) * 1996-11-14 2001-09-18 サイエンティフィック―アトランタ，インコーポレイテッド ブロック位相推定のための装置および方法
JPH118095A (ja) * 1997-03-19 1999-01-12 Scient Syst Res Ltd プラズマに供給されるｒｆ電流を感知する装置及びこのような装置に使用する波形サンプリング回路
JPH1183907A (ja) * 1997-09-03 1999-03-26 Mitsubishi Electric Corp 高周波電流の測定方法
US6020794A (en) * 1998-02-09 2000-02-01 Eni Technologies, Inc. Ratiometric autotuning algorithm for RF plasma generator
JP2000031073A (ja) * 1998-02-26 2000-01-28 Canon Inc プラズマ処理装置及びプラズマ処理方法
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013084606A (ja) * 2007-03-14 2013-05-09 Mks Instruments Inc 多点電圧電流プローブシステム
JP2019503136A (ja) * 2015-12-18 2019-01-31 オリンパス株式会社 改善されたスライディングｄｆｔを使用する正確かつ効率的なスペクトル推定のための方法および装置
US10566955B2 (en) 2015-12-18 2020-02-18 Olympus Corporation Method and apparatus for accurate and efficient spectrum estimation using improved sliding DFT
KR20210024172A (ko) 2018-09-13 2021-03-04 가부시키가이샤 히다치 고쿠사이 덴키 고주파 전원 장치 및 기판 처리 장치
US11901159B2 (en) 2018-09-13 2024-02-13 Hitachi Kokusai Electric Inc. RF generator device and substrate processing apparatus

Also Published As

Publication number Publication date
WO2004008502A2 (en) 2004-01-22
KR100738990B1 (ko) 2007-07-13
CN1647237A (zh) 2005-07-27
AU2003224937A8 (en) 2004-02-02
JP5631628B2 (ja) 2014-11-26
AU2003224937A1 (en) 2004-02-02
CN100339943C (zh) 2007-09-26
WO2004008502A3 (en) 2004-09-10
EP1520288B1 (en) 2018-10-17
JP2010212252A (ja) 2010-09-24
US20040007984A1 (en) 2004-01-15
EP1520288A2 (en) 2005-04-06
KR20050039751A (ko) 2005-04-29
US6707255B2 (en) 2004-03-16

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