JP2010210706A - 偏光素子 - Google Patents
偏光素子 Download PDFInfo
- Publication number
- JP2010210706A JP2010210706A JP2009054118A JP2009054118A JP2010210706A JP 2010210706 A JP2010210706 A JP 2010210706A JP 2009054118 A JP2009054118 A JP 2009054118A JP 2009054118 A JP2009054118 A JP 2009054118A JP 2010210706 A JP2010210706 A JP 2010210706A
- Authority
- JP
- Japan
- Prior art keywords
- thin
- thin wire
- wire
- polarizing element
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000463 material Substances 0.000 claims abstract description 83
- 239000000758 substrate Substances 0.000 claims abstract description 82
- 230000001681 protective effect Effects 0.000 claims description 84
- 230000007423 decrease Effects 0.000 claims description 23
- 239000011358 absorbing material Substances 0.000 claims description 10
- 238000001579 optical reflectometry Methods 0.000 claims description 8
- 229910052782 aluminium Inorganic materials 0.000 claims description 6
- 229910052732 germanium Inorganic materials 0.000 claims description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 5
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 5
- 239000011810 insulating material Substances 0.000 claims description 5
- 239000011800 void material Substances 0.000 claims description 5
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 229910052802 copper Inorganic materials 0.000 claims description 2
- 239000010949 copper Substances 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- 239000004332 silver Substances 0.000 claims description 2
- 229910052714 tellurium Inorganic materials 0.000 claims description 2
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 230000003287 optical effect Effects 0.000 abstract description 13
- 239000010410 layer Substances 0.000 description 79
- 239000004973 liquid crystal related substance Substances 0.000 description 24
- 238000004544 sputter deposition Methods 0.000 description 21
- 239000007789 gas Substances 0.000 description 19
- 238000000034 method Methods 0.000 description 19
- 239000002245 particle Substances 0.000 description 19
- 238000005755 formation reaction Methods 0.000 description 14
- 230000031700 light absorption Effects 0.000 description 14
- 230000015572 biosynthetic process Effects 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 11
- 230000010287 polarization Effects 0.000 description 11
- 239000002994 raw material Substances 0.000 description 10
- 239000007769 metal material Substances 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 229910001111 Fine metal Inorganic materials 0.000 description 7
- 238000005229 chemical vapour deposition Methods 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 230000008569 process Effects 0.000 description 7
- 239000011521 glass Substances 0.000 description 6
- 230000006866 deterioration Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 229910052752 metalloid Inorganic materials 0.000 description 5
- 150000002738 metalloids Chemical class 0.000 description 5
- 239000010453 quartz Substances 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 3
- 230000002238 attenuated effect Effects 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 3
- 229910052753 mercury Inorganic materials 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 229910001507 metal halide Inorganic materials 0.000 description 2
- 150000005309 metal halides Chemical class 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- 238000002834 transmittance Methods 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- NCMAYWHYXSWFGB-UHFFFAOYSA-N [Si].[N+][O-] Chemical compound [Si].[N+][O-] NCMAYWHYXSWFGB-UHFFFAOYSA-N 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000036632 reaction speed Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
- G02B5/3041—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid comprising multiple thin layers, e.g. multilayer stacks
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/283—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising used for beam splitting or combining
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Polarising Elements (AREA)
- Liquid Crystal (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009054118A JP2010210706A (ja) | 2009-03-06 | 2009-03-06 | 偏光素子 |
| US12/711,566 US8205992B2 (en) | 2009-03-06 | 2010-02-24 | Polarization element and projection display device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009054118A JP2010210706A (ja) | 2009-03-06 | 2009-03-06 | 偏光素子 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010210706A true JP2010210706A (ja) | 2010-09-24 |
| JP2010210706A5 JP2010210706A5 (https=) | 2012-04-12 |
Family
ID=42677974
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009054118A Withdrawn JP2010210706A (ja) | 2009-03-06 | 2009-03-06 | 偏光素子 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US8205992B2 (https=) |
| JP (1) | JP2010210706A (https=) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012098469A (ja) * | 2010-11-01 | 2012-05-24 | Seiko Epson Corp | 偏光素子とその製造方法、プロジェクター、液晶装置、電子機器 |
| US8363319B2 (en) | 2010-01-08 | 2013-01-29 | Seiko Epson Corporation | Polarizing element, method of manufacturing polarizing element, and electronic apparatus |
| US8369013B2 (en) | 2010-01-08 | 2013-02-05 | Seiko Epson Corporation | Polarizing element, method of manufacturing polarizing element, and electronic apparatus |
| JP2013104992A (ja) * | 2011-11-14 | 2013-05-30 | Seiko Epson Corp | 偏光素子、偏光素子の製造方法、プロジェクター、液晶装置、および電子機器 |
| JP2015528581A (ja) * | 2012-08-10 | 2015-09-28 | テマセク ポリテクニックTemasek Polytechnic | 光回折格子 |
| JP2019536073A (ja) * | 2016-11-22 | 2019-12-12 | モックステック・インコーポレーテッド | ワイヤグリッド偏光子ヒートシンク |
| WO2021200515A1 (ja) * | 2020-04-03 | 2021-10-07 | マクセル株式会社 | 情報表示装置 |
| JP2023063519A (ja) * | 2018-04-25 | 2023-05-09 | デクセリアルズ株式会社 | 偏光板及び偏光板の製造方法 |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012002971A (ja) * | 2010-06-16 | 2012-01-05 | Seiko Epson Corp | 偏光素子及びその製造方法、液晶装置、電子機器 |
| CN111929760B (zh) * | 2013-07-11 | 2023-03-24 | 迪睿合株式会社 | 偏光板、和偏光板的制造方法、束结构的制造方法 |
| EP3120172A4 (en) * | 2014-06-25 | 2017-11-22 | Moxtek, Inc. | Wire grid polarizer with dual absorptive regions |
| US10571614B2 (en) * | 2016-08-16 | 2020-02-25 | Moxek, Inc. | Wire grid polarizer heat sink having specified reflective layer, absorptive layer, and heat-dissipation layer |
| US10444410B2 (en) | 2016-08-16 | 2019-10-15 | Moxtek, Inc. | Overcoat wire grid polarizer having conformal coat layer with oxidation barrier and moisture barrier |
| US10408983B2 (en) | 2016-08-16 | 2019-09-10 | Moxtek, Inc. | Durable, high performance wire grid polarizer having permeable junction between top protection layer |
| CN109581568B (zh) * | 2017-09-28 | 2022-05-24 | 迪睿合株式会社 | 偏振光板及具备该偏振光板的光学设备 |
| JP2019109375A (ja) * | 2017-12-19 | 2019-07-04 | セイコーエプソン株式会社 | 偏光素子、偏光素子の製造方法 |
| US20240036241A1 (en) * | 2020-12-28 | 2024-02-01 | Dexerials Corporation | Wire grid polarizing element, method for manufacturing wire grid polarizing element, projection display device, and vehicle |
| WO2023120736A1 (ja) * | 2021-12-24 | 2023-06-29 | デクセリアルズ株式会社 | ワイヤグリッド偏光素子、ワイヤグリッド偏光素子の製造方法、投影表示装置及び車両 |
Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63132203A (ja) * | 1986-11-25 | 1988-06-04 | Toyota Motor Corp | 複屈折板 |
| JP2000047033A (ja) * | 1998-05-29 | 2000-02-18 | Toyota Central Res & Dev Lab Inc | 複屈折板 |
| JP2005037900A (ja) * | 2003-06-25 | 2005-02-10 | Sharp Corp | 偏光光学素子、およびそれを用いた表示装置 |
| JP2006003447A (ja) * | 2004-06-15 | 2006-01-05 | Sony Corp | 偏光分離素子及びその製造方法 |
| JP2006126338A (ja) * | 2004-10-27 | 2006-05-18 | Nippon Sheet Glass Co Ltd | 偏光子およびその製造方法 |
| JP2006227361A (ja) * | 2005-02-18 | 2006-08-31 | Seiko Epson Corp | 偏光変換光学素子、照明装置及びプロジェクタ |
| JP2006323119A (ja) * | 2005-05-19 | 2006-11-30 | Kawazoe Frontier Technology Kk | 固体偏光素子及びその製造方法、並びに、それを用いた液晶表示装置、液晶表示パネル及び光アイソレータ |
| JP2007033558A (ja) * | 2005-07-22 | 2007-02-08 | Nippon Zeon Co Ltd | グリッド偏光子及びその製法 |
| JP2007178763A (ja) * | 2005-12-28 | 2007-07-12 | Seiko Epson Corp | 光学素子の製造方法、液晶装置、及び投射型表示装置 |
| WO2008084856A1 (ja) * | 2007-01-12 | 2008-07-17 | Toray Industries, Inc. | 偏光板およびこれを用いた液晶表示装置 |
| JP2008249914A (ja) * | 2007-03-30 | 2008-10-16 | Nippon Sheet Glass Co Ltd | 透過型偏光素子、及びそれを用いた複合偏光板 |
| JP2008299178A (ja) * | 2007-06-01 | 2008-12-11 | Seiko Epson Corp | 偏光素子、偏光素子の製造方法、液晶装置、及び投射型表示装置 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6829090B2 (en) * | 2001-10-01 | 2004-12-07 | Sony Corporation | Prism, projection device and optical component |
| US6714350B2 (en) * | 2001-10-15 | 2004-03-30 | Eastman Kodak Company | Double sided wire grid polarizer |
| US6785050B2 (en) * | 2002-05-09 | 2004-08-31 | Moxtek, Inc. | Corrosion resistant wire-grid polarizer and method of fabrication |
| US6665119B1 (en) * | 2002-10-15 | 2003-12-16 | Eastman Kodak Company | Wire grid polarizer |
| US7630133B2 (en) * | 2004-12-06 | 2009-12-08 | Moxtek, Inc. | Inorganic, dielectric, grid polarizer and non-zero order diffraction grating |
| JP4935209B2 (ja) | 2005-10-27 | 2012-05-23 | ソニー株式会社 | 偏光素子及びその製造方法 |
| US20070217008A1 (en) * | 2006-03-17 | 2007-09-20 | Wang Jian J | Polarizer films and methods of making the same |
| US20070296921A1 (en) * | 2006-06-26 | 2007-12-27 | Bin Wang | Projection display with a cube wire-grid polarizing beam splitter |
| US7957062B2 (en) * | 2007-02-06 | 2011-06-07 | Sony Corporation | Polarizing element and liquid crystal projector |
| KR20080092784A (ko) * | 2007-04-13 | 2008-10-16 | 삼성전자주식회사 | 나노 와이어 그리드 편광자 및 이를 채용한 액정디스플레이 장치 |
-
2009
- 2009-03-06 JP JP2009054118A patent/JP2010210706A/ja not_active Withdrawn
-
2010
- 2010-02-24 US US12/711,566 patent/US8205992B2/en not_active Expired - Fee Related
Patent Citations (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63132203A (ja) * | 1986-11-25 | 1988-06-04 | Toyota Motor Corp | 複屈折板 |
| JP2000047033A (ja) * | 1998-05-29 | 2000-02-18 | Toyota Central Res & Dev Lab Inc | 複屈折板 |
| JP2005037900A (ja) * | 2003-06-25 | 2005-02-10 | Sharp Corp | 偏光光学素子、およびそれを用いた表示装置 |
| JP2006003447A (ja) * | 2004-06-15 | 2006-01-05 | Sony Corp | 偏光分離素子及びその製造方法 |
| JP2006126338A (ja) * | 2004-10-27 | 2006-05-18 | Nippon Sheet Glass Co Ltd | 偏光子およびその製造方法 |
| JP2006227361A (ja) * | 2005-02-18 | 2006-08-31 | Seiko Epson Corp | 偏光変換光学素子、照明装置及びプロジェクタ |
| JP2006323119A (ja) * | 2005-05-19 | 2006-11-30 | Kawazoe Frontier Technology Kk | 固体偏光素子及びその製造方法、並びに、それを用いた液晶表示装置、液晶表示パネル及び光アイソレータ |
| JP2007033558A (ja) * | 2005-07-22 | 2007-02-08 | Nippon Zeon Co Ltd | グリッド偏光子及びその製法 |
| JP2007178763A (ja) * | 2005-12-28 | 2007-07-12 | Seiko Epson Corp | 光学素子の製造方法、液晶装置、及び投射型表示装置 |
| WO2008084856A1 (ja) * | 2007-01-12 | 2008-07-17 | Toray Industries, Inc. | 偏光板およびこれを用いた液晶表示装置 |
| JP2008249914A (ja) * | 2007-03-30 | 2008-10-16 | Nippon Sheet Glass Co Ltd | 透過型偏光素子、及びそれを用いた複合偏光板 |
| JP2008299178A (ja) * | 2007-06-01 | 2008-12-11 | Seiko Epson Corp | 偏光素子、偏光素子の製造方法、液晶装置、及び投射型表示装置 |
Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8363319B2 (en) | 2010-01-08 | 2013-01-29 | Seiko Epson Corporation | Polarizing element, method of manufacturing polarizing element, and electronic apparatus |
| US8369013B2 (en) | 2010-01-08 | 2013-02-05 | Seiko Epson Corporation | Polarizing element, method of manufacturing polarizing element, and electronic apparatus |
| JP2012098469A (ja) * | 2010-11-01 | 2012-05-24 | Seiko Epson Corp | 偏光素子とその製造方法、プロジェクター、液晶装置、電子機器 |
| JP2013104992A (ja) * | 2011-11-14 | 2013-05-30 | Seiko Epson Corp | 偏光素子、偏光素子の製造方法、プロジェクター、液晶装置、および電子機器 |
| US9164307B2 (en) | 2011-11-14 | 2015-10-20 | Seiko Epson Corporation | Polarizer, polarizer producing process, projector, liquid crystal device, and electronic device |
| JP2015528581A (ja) * | 2012-08-10 | 2015-09-28 | テマセク ポリテクニックTemasek Polytechnic | 光回折格子 |
| JP2019536073A (ja) * | 2016-11-22 | 2019-12-12 | モックステック・インコーポレーテッド | ワイヤグリッド偏光子ヒートシンク |
| JP2023063519A (ja) * | 2018-04-25 | 2023-05-09 | デクセリアルズ株式会社 | 偏光板及び偏光板の製造方法 |
| JP7372494B2 (ja) | 2018-04-25 | 2023-10-31 | デクセリアルズ株式会社 | 偏光板及び偏光板の製造方法 |
| WO2021200515A1 (ja) * | 2020-04-03 | 2021-10-07 | マクセル株式会社 | 情報表示装置 |
| JP2021162801A (ja) * | 2020-04-03 | 2021-10-11 | マクセル株式会社 | 情報表示装置 |
| JP7561512B2 (ja) | 2020-04-03 | 2024-10-04 | マクセル株式会社 | 情報表示装置 |
| US12546925B2 (en) | 2020-04-03 | 2026-02-10 | Maxell, Ltd. | Information display device |
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| US20100225886A1 (en) | 2010-09-09 |
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