JP2009295580A5 - - Google Patents

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Publication number
JP2009295580A5
JP2009295580A5 JP2009121573A JP2009121573A JP2009295580A5 JP 2009295580 A5 JP2009295580 A5 JP 2009295580A5 JP 2009121573 A JP2009121573 A JP 2009121573A JP 2009121573 A JP2009121573 A JP 2009121573A JP 2009295580 A5 JP2009295580 A5 JP 2009295580A5
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JP
Japan
Prior art keywords
electrodes
outer periphery
gas distribution
members
conductive members
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JP2009121573A
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English (en)
Japanese (ja)
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JP2009295580A (ja
JP5713542B2 (ja
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Priority claimed from US12/123,954 external-priority patent/US8372238B2/en
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Publication of JP2009295580A publication Critical patent/JP2009295580A/ja
Publication of JP2009295580A5 publication Critical patent/JP2009295580A5/ja
Application granted granted Critical
Publication of JP5713542B2 publication Critical patent/JP5713542B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2009121573A 2008-05-20 2009-05-20 源ガスから発生したプラズマで製品を処理する装置 Expired - Fee Related JP5713542B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/123,954 US8372238B2 (en) 2008-05-20 2008-05-20 Multiple-electrode plasma processing systems with confined process chambers and interior-bussed electrical connections with the electrodes
US12/123,954 2008-05-20

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2015045390A Division JP6078571B2 (ja) 2008-05-20 2015-03-09 製品を処理する装置

Publications (3)

Publication Number Publication Date
JP2009295580A JP2009295580A (ja) 2009-12-17
JP2009295580A5 true JP2009295580A5 (enExample) 2012-07-05
JP5713542B2 JP5713542B2 (ja) 2015-05-07

Family

ID=41341204

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2009121573A Expired - Fee Related JP5713542B2 (ja) 2008-05-20 2009-05-20 源ガスから発生したプラズマで製品を処理する装置
JP2015045390A Expired - Fee Related JP6078571B2 (ja) 2008-05-20 2015-03-09 製品を処理する装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2015045390A Expired - Fee Related JP6078571B2 (ja) 2008-05-20 2015-03-09 製品を処理する装置

Country Status (6)

Country Link
US (2) US8372238B2 (enExample)
JP (2) JP5713542B2 (enExample)
KR (2) KR101645191B1 (enExample)
CN (2) CN103474327B (enExample)
SG (2) SG157301A1 (enExample)
TW (1) TWI519212B (enExample)

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CN110223904A (zh) * 2019-07-19 2019-09-10 江苏鲁汶仪器有限公司 一种具有法拉第屏蔽装置的等离子体处理系统
US20230011958A1 (en) * 2019-12-04 2023-01-12 Jiangsu Favored Nanotechnology Co., Ltd. Coating equipment
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CN111517117A (zh) * 2020-04-16 2020-08-11 昆山辉跃通信设备有限公司 一种等离子体设备用滑动装置

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