JP2009152423A5 - - Google Patents

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Publication number
JP2009152423A5
JP2009152423A5 JP2007329505A JP2007329505A JP2009152423A5 JP 2009152423 A5 JP2009152423 A5 JP 2009152423A5 JP 2007329505 A JP2007329505 A JP 2007329505A JP 2007329505 A JP2007329505 A JP 2007329505A JP 2009152423 A5 JP2009152423 A5 JP 2009152423A5
Authority
JP
Japan
Prior art keywords
resin layer
sealing resin
metal post
semiconductor device
semiconductor substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007329505A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009152423A (ja
JP5075611B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2007329505A priority Critical patent/JP5075611B2/ja
Priority claimed from JP2007329505A external-priority patent/JP5075611B2/ja
Priority to US12/339,218 priority patent/US7928583B2/en
Publication of JP2009152423A publication Critical patent/JP2009152423A/ja
Publication of JP2009152423A5 publication Critical patent/JP2009152423A5/ja
Application granted granted Critical
Publication of JP5075611B2 publication Critical patent/JP5075611B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2007329505A 2007-12-21 2007-12-21 半導体装置 Expired - Fee Related JP5075611B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2007329505A JP5075611B2 (ja) 2007-12-21 2007-12-21 半導体装置
US12/339,218 US7928583B2 (en) 2007-12-21 2008-12-19 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007329505A JP5075611B2 (ja) 2007-12-21 2007-12-21 半導体装置

Publications (3)

Publication Number Publication Date
JP2009152423A JP2009152423A (ja) 2009-07-09
JP2009152423A5 true JP2009152423A5 (enExample) 2010-12-09
JP5075611B2 JP5075611B2 (ja) 2012-11-21

Family

ID=40787634

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007329505A Expired - Fee Related JP5075611B2 (ja) 2007-12-21 2007-12-21 半導体装置

Country Status (2)

Country Link
US (1) US7928583B2 (enExample)
JP (1) JP5075611B2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9524945B2 (en) 2010-05-18 2016-12-20 Taiwan Semiconductor Manufacturing Company, Ltd. Cu pillar bump with L-shaped non-metal sidewall protection structure
US8198133B2 (en) * 2009-07-13 2012-06-12 International Business Machines Corporation Structures and methods to improve lead-free C4 interconnect reliability
CN102484078B (zh) * 2009-09-01 2015-06-24 先进封装技术私人有限公司 封装结构
JP5226639B2 (ja) * 2009-10-09 2013-07-03 株式会社テラミクロス 半導体装置およびその製造方法
JP2010268010A (ja) * 2010-08-31 2010-11-25 Sony Chemical & Information Device Corp 電子部品、並びに、接合体及びその製造方法
JP5966330B2 (ja) * 2011-11-24 2016-08-10 ローム株式会社 半導体チップおよび半導体パッケージ
US9627290B2 (en) * 2011-12-07 2017-04-18 Taiwan Semiconductor Manufacturing Company, Ltd. Bump structure design for stress reduction
US9159686B2 (en) 2012-01-24 2015-10-13 Taiwan Semiconductor Manufacturing Company, Ltd. Crack stopper on under-bump metallization layer
JP6182309B2 (ja) * 2012-11-28 2017-08-16 新光電気工業株式会社 配線基板、半導体装置及び配線基板の製造方法
JP7157783B2 (ja) * 2020-09-07 2022-10-20 富士電機株式会社 半導体モジュールの製造方法及び半導体モジュール

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3496569B2 (ja) * 1999-04-23 2004-02-16 カシオ計算機株式会社 半導体装置及びその製造方法並びにその実装構造
JP3450238B2 (ja) * 1999-11-04 2003-09-22 Necエレクトロニクス株式会社 半導体装置及びその製造方法
JP2001339012A (ja) * 2000-05-30 2001-12-07 Nec Kyushu Ltd 半導体装置およびその製造方法
JP3998564B2 (ja) 2002-11-13 2007-10-31 株式会社巴川製紙所 半導体封止用硬化性接着剤組成物および接着シート
JP4360873B2 (ja) * 2003-09-18 2009-11-11 ミナミ株式会社 ウエハレベルcspの製造方法
US7294929B2 (en) * 2003-12-30 2007-11-13 Texas Instruments Incorporated Solder ball pad structure
TWI295498B (en) * 2005-09-30 2008-04-01 Siliconware Precision Industries Co Ltd Semiconductor element with conductive bumps and fabrication method thereof

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