JP2009075459A - 二軸性複屈折体の製造方法、二軸性複屈折体及び液晶プロジェクタ - Google Patents

二軸性複屈折体の製造方法、二軸性複屈折体及び液晶プロジェクタ Download PDF

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Publication number
JP2009075459A
JP2009075459A JP2007245921A JP2007245921A JP2009075459A JP 2009075459 A JP2009075459 A JP 2009075459A JP 2007245921 A JP2007245921 A JP 2007245921A JP 2007245921 A JP2007245921 A JP 2007245921A JP 2009075459 A JP2009075459 A JP 2009075459A
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JP
Japan
Prior art keywords
phase difference
liquid crystal
substrate
vapor deposition
refractive index
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2007245921A
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English (en)
Japanese (ja)
Other versions
JP2009075459A5 (enExample
Inventor
Kenichi Nakagawa
謙一 中川
Hiroki Takahashi
裕樹 高橋
Taro Hashizume
太朗 橋爪
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2007245921A priority Critical patent/JP2009075459A/ja
Priority to EP08832696.2A priority patent/EP2191307B1/en
Priority to PCT/JP2008/067360 priority patent/WO2009038218A1/en
Priority to KR1020107005966A priority patent/KR20100071995A/ko
Priority to US12/679,240 priority patent/US8605241B2/en
Priority to CN200880107754XA priority patent/CN101802663B/zh
Priority to TW097135924A priority patent/TWI443427B/zh
Publication of JP2009075459A publication Critical patent/JP2009075459A/ja
Publication of JP2009075459A5 publication Critical patent/JP2009075459A5/ja
Abandoned legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/225—Oblique incidence of vaporised material on substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/005—Projectors using an electronic spatial light modulator but not peculiar thereto
    • G03B21/006—Projectors using an electronic spatial light modulator but not peculiar thereto using LCD's
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/20—Lamp housings
    • G03B21/2073—Polarisers in the lamp house
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N9/00—Details of colour television systems
    • H04N9/12—Picture reproducers
    • H04N9/31—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM]
    • H04N9/3102—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM] using two-dimensional electronic spatial light modulators
    • H04N9/3105—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM] using two-dimensional electronic spatial light modulators for displaying all colours simultaneously, e.g. by using two or more electronic spatial light modulators
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N9/00—Details of colour television systems
    • H04N9/12—Picture reproducers
    • H04N9/31—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM]
    • H04N9/3141—Constructional details thereof
    • H04N9/315—Modulator illumination systems
    • H04N9/3167—Modulator illumination systems for polarizing the light beam
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2413/00—Indexing scheme related to G02F1/13363, i.e. to birefringent elements, e.g. for optical compensation, characterised by the number, position, orientation or value of the compensation plates
    • G02F2413/10—Indexing scheme related to G02F1/13363, i.e. to birefringent elements, e.g. for optical compensation, characterised by the number, position, orientation or value of the compensation plates with refractive index ellipsoid inclined, or tilted, relative to the LC-layer surface O plate
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2413/00—Indexing scheme related to G02F1/13363, i.e. to birefringent elements, e.g. for optical compensation, characterised by the number, position, orientation or value of the compensation plates
    • G02F2413/12—Biaxial compensators

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Signal Processing (AREA)
  • Multimedia (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Polarising Elements (AREA)
  • Liquid Crystal (AREA)
  • Projection Apparatus (AREA)
JP2007245921A 2007-09-21 2007-09-21 二軸性複屈折体の製造方法、二軸性複屈折体及び液晶プロジェクタ Abandoned JP2009075459A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2007245921A JP2009075459A (ja) 2007-09-21 2007-09-21 二軸性複屈折体の製造方法、二軸性複屈折体及び液晶プロジェクタ
EP08832696.2A EP2191307B1 (en) 2007-09-21 2008-09-18 Biaxial birefringent component, liquid crystal projector, and method for manufacturing biaxial birefringent component
PCT/JP2008/067360 WO2009038218A1 (en) 2007-09-21 2008-09-18 Biaxial birefringent component, liquid crystal projector, and method for manufacturing biaxial birefringent component
KR1020107005966A KR20100071995A (ko) 2007-09-21 2008-09-18 이축성 복굴절 컴포넌트, 액정 프로젝터, 및 이축성 복굴절 컴포넌트의 제조 방법
US12/679,240 US8605241B2 (en) 2007-09-21 2008-09-18 Biaxial birefringent component, liquid crystal projector, and method for manufacturing biaxial birefringent component
CN200880107754XA CN101802663B (zh) 2007-09-21 2008-09-18 双轴双折射元件及其制造方法、液晶投影机
TW097135924A TWI443427B (zh) 2007-09-21 2008-09-19 製造雙軸雙折射構件之方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007245921A JP2009075459A (ja) 2007-09-21 2007-09-21 二軸性複屈折体の製造方法、二軸性複屈折体及び液晶プロジェクタ

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010273726A Division JP5318079B2 (ja) 2010-12-08 2010-12-08 二軸性複屈折体の製造方法

Publications (2)

Publication Number Publication Date
JP2009075459A true JP2009075459A (ja) 2009-04-09
JP2009075459A5 JP2009075459A5 (enExample) 2010-04-08

Family

ID=40468025

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JP2007245921A Abandoned JP2009075459A (ja) 2007-09-21 2007-09-21 二軸性複屈折体の製造方法、二軸性複屈折体及び液晶プロジェクタ

Country Status (7)

Country Link
US (1) US8605241B2 (enExample)
EP (1) EP2191307B1 (enExample)
JP (1) JP2009075459A (enExample)
KR (1) KR20100071995A (enExample)
CN (1) CN101802663B (enExample)
TW (1) TWI443427B (enExample)
WO (1) WO2009038218A1 (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009161843A (ja) * 2008-01-10 2009-07-23 Fujinon Corp ワーク支持部材、光学素子、位相差素子及び偏光ビームスプリッタ
JP2011076030A (ja) * 2009-10-02 2011-04-14 Seiko Epson Corp 液晶装置、電子機器および投射型表示装置
JP2014170247A (ja) * 2014-06-23 2014-09-18 Seiko Epson Corp 液晶装置および電子機器
JP2017049594A (ja) * 2016-10-17 2017-03-09 デクセリアルズ株式会社 位相差素子及びその製造方法、液晶表示装置、並びに投射型画像表示装置
WO2019230559A1 (ja) * 2018-05-31 2019-12-05 デクセリアルズ株式会社 位相差補償素子、液晶表示装置および投射型画像表示装置
JPWO2022004712A1 (enExample) * 2020-06-30 2022-01-06
US11947221B2 (en) 2021-12-28 2024-04-02 Fujifilm Corporation Phase difference compensation element, liquid crystal display element, and liquid crystal projector

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI826607B (zh) 2018-12-07 2023-12-21 美商思娜公司 顯示系統、空間光調變器系統及顯示系統的形成方法
JP7491117B2 (ja) * 2020-07-23 2024-05-28 セイコーエプソン株式会社 液晶装置および電子機器

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Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009161843A (ja) * 2008-01-10 2009-07-23 Fujinon Corp ワーク支持部材、光学素子、位相差素子及び偏光ビームスプリッタ
JP2011076030A (ja) * 2009-10-02 2011-04-14 Seiko Epson Corp 液晶装置、電子機器および投射型表示装置
JP2014170247A (ja) * 2014-06-23 2014-09-18 Seiko Epson Corp 液晶装置および電子機器
JP2017049594A (ja) * 2016-10-17 2017-03-09 デクセリアルズ株式会社 位相差素子及びその製造方法、液晶表示装置、並びに投射型画像表示装置
JP7236225B2 (ja) 2018-05-31 2023-03-09 デクセリアルズ株式会社 位相差補償素子、液晶表示装置および投射型画像表示装置
JP2019211494A (ja) * 2018-05-31 2019-12-12 デクセリアルズ株式会社 位相差補償素子、液晶表示装置および投射型画像表示装置
US11281049B2 (en) 2018-05-31 2022-03-22 Dexerials Corporation Phase difference compensating element, liquid crystal display device, and projection-type image display device
WO2019230559A1 (ja) * 2018-05-31 2019-12-05 デクセリアルズ株式会社 位相差補償素子、液晶表示装置および投射型画像表示装置
JPWO2022004712A1 (enExample) * 2020-06-30 2022-01-06
WO2022004712A1 (ja) * 2020-06-30 2022-01-06 富士フイルム株式会社 位相差板、液晶プロジェクタ及びコントラスト調整方法
CN115997145A (zh) * 2020-06-30 2023-04-21 富士胶片株式会社 相位差片、液晶投影仪及对比度调整方法
US11899315B2 (en) 2020-06-30 2024-02-13 Fujifilm Corporation Phase difference plate, liquid crystal projector, and contrast adjustment method
US11947221B2 (en) 2021-12-28 2024-04-02 Fujifilm Corporation Phase difference compensation element, liquid crystal display element, and liquid crystal projector

Also Published As

Publication number Publication date
TW200921215A (en) 2009-05-16
CN101802663A (zh) 2010-08-11
WO2009038218A1 (en) 2009-03-26
US8605241B2 (en) 2013-12-10
EP2191307A1 (en) 2010-06-02
TWI443427B (zh) 2014-07-01
KR20100071995A (ko) 2010-06-29
CN101802663B (zh) 2013-01-23
EP2191307B1 (en) 2019-09-11
EP2191307A4 (en) 2012-11-21
US20100231835A1 (en) 2010-09-16

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