TWI443427B - 製造雙軸雙折射構件之方法 - Google Patents
製造雙軸雙折射構件之方法 Download PDFInfo
- Publication number
- TWI443427B TWI443427B TW097135924A TW97135924A TWI443427B TW I443427 B TWI443427 B TW I443427B TW 097135924 A TW097135924 A TW 097135924A TW 97135924 A TW97135924 A TW 97135924A TW I443427 B TWI443427 B TW I443427B
- Authority
- TW
- Taiwan
- Prior art keywords
- liquid crystal
- substrate
- light
- birefringent member
- refractive index
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 238000000034 method Methods 0.000 title claims description 6
- 239000000758 substrate Substances 0.000 claims description 100
- 238000000151 deposition Methods 0.000 claims description 43
- 230000008021 deposition Effects 0.000 claims description 37
- 229910010272 inorganic material Inorganic materials 0.000 claims description 22
- 239000011147 inorganic material Substances 0.000 claims description 22
- 239000000463 material Substances 0.000 claims description 18
- 238000007740 vapor deposition Methods 0.000 claims description 16
- 238000001704 evaporation Methods 0.000 claims description 14
- 230000008020 evaporation Effects 0.000 claims description 13
- 239000004973 liquid crystal related substance Substances 0.000 description 137
- 239000010408 film Substances 0.000 description 30
- 239000010410 layer Substances 0.000 description 21
- 230000003287 optical effect Effects 0.000 description 20
- 239000010409 thin film Substances 0.000 description 6
- 239000011521 glass Substances 0.000 description 5
- 239000006200 vaporizer Substances 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000005137 deposition process Methods 0.000 description 4
- 239000004904 UV filter Substances 0.000 description 3
- 210000002858 crystal cell Anatomy 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910052594 sapphire Inorganic materials 0.000 description 2
- 239000010980 sapphire Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 239000004985 Discotic Liquid Crystal Substance Substances 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- BEJRNLMOMBGWFU-UHFFFAOYSA-N bismuth boron Chemical compound [B].[Bi] BEJRNLMOMBGWFU-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/225—Oblique incidence of vaporised material on substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/005—Projectors using an electronic spatial light modulator but not peculiar thereto
- G03B21/006—Projectors using an electronic spatial light modulator but not peculiar thereto using LCD's
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B21/00—Projectors or projection-type viewers; Accessories therefor
- G03B21/14—Details
- G03B21/20—Lamp housings
- G03B21/2073—Polarisers in the lamp house
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N9/00—Details of colour television systems
- H04N9/12—Picture reproducers
- H04N9/31—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM]
- H04N9/3102—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM] using two-dimensional electronic spatial light modulators
- H04N9/3105—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM] using two-dimensional electronic spatial light modulators for displaying all colours simultaneously, e.g. by using two or more electronic spatial light modulators
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N9/00—Details of colour television systems
- H04N9/12—Picture reproducers
- H04N9/31—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM]
- H04N9/3141—Constructional details thereof
- H04N9/315—Modulator illumination systems
- H04N9/3167—Modulator illumination systems for polarizing the light beam
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2413/00—Indexing scheme related to G02F1/13363, i.e. to birefringent elements, e.g. for optical compensation, characterised by the number, position, orientation or value of the compensation plates
- G02F2413/10—Indexing scheme related to G02F1/13363, i.e. to birefringent elements, e.g. for optical compensation, characterised by the number, position, orientation or value of the compensation plates with refractive index ellipsoid inclined, or tilted, relative to the LC-layer surface O plate
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2413/00—Indexing scheme related to G02F1/13363, i.e. to birefringent elements, e.g. for optical compensation, characterised by the number, position, orientation or value of the compensation plates
- G02F2413/12—Biaxial compensators
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Signal Processing (AREA)
- Multimedia (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Polarising Elements (AREA)
- Liquid Crystal (AREA)
- Projection Apparatus (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007245921A JP2009075459A (ja) | 2007-09-21 | 2007-09-21 | 二軸性複屈折体の製造方法、二軸性複屈折体及び液晶プロジェクタ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200921215A TW200921215A (en) | 2009-05-16 |
| TWI443427B true TWI443427B (zh) | 2014-07-01 |
Family
ID=40468025
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW097135924A TWI443427B (zh) | 2007-09-21 | 2008-09-19 | 製造雙軸雙折射構件之方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8605241B2 (enExample) |
| EP (1) | EP2191307B1 (enExample) |
| JP (1) | JP2009075459A (enExample) |
| KR (1) | KR20100071995A (enExample) |
| CN (1) | CN101802663B (enExample) |
| TW (1) | TWI443427B (enExample) |
| WO (1) | WO2009038218A1 (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009161843A (ja) * | 2008-01-10 | 2009-07-23 | Fujinon Corp | ワーク支持部材、光学素子、位相差素子及び偏光ビームスプリッタ |
| JP5568937B2 (ja) * | 2009-10-02 | 2014-08-13 | セイコーエプソン株式会社 | 液晶装置、電子機器および投射型表示装置 |
| JP5924376B2 (ja) * | 2014-06-23 | 2016-05-25 | セイコーエプソン株式会社 | 液晶装置および電子機器 |
| JP2017049594A (ja) * | 2016-10-17 | 2017-03-09 | デクセリアルズ株式会社 | 位相差素子及びその製造方法、液晶表示装置、並びに投射型画像表示装置 |
| JP7236225B2 (ja) * | 2018-05-31 | 2023-03-09 | デクセリアルズ株式会社 | 位相差補償素子、液晶表示装置および投射型画像表示装置 |
| TWI826607B (zh) | 2018-12-07 | 2023-12-21 | 美商思娜公司 | 顯示系統、空間光調變器系統及顯示系統的形成方法 |
| JP7477609B2 (ja) * | 2020-06-30 | 2024-05-01 | 富士フイルム株式会社 | 位相差板、液晶プロジェクタ及びコントラスト調整方法 |
| JP7491117B2 (ja) * | 2020-07-23 | 2024-05-28 | セイコーエプソン株式会社 | 液晶装置および電子機器 |
| JP2023098288A (ja) | 2021-12-28 | 2023-07-10 | 富士フイルム株式会社 | 位相差補償素子、液晶表示素子及び液晶プロジェクタ |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4529741A (en) | 1984-10-26 | 1985-07-16 | Dow Corning Corporation | Nonslumping foamable polyorganosiloxane compositions containing silica and fibers |
| US5196953A (en) | 1991-11-01 | 1993-03-23 | Rockwell International Corporation | Compensator for liquid crystal display, having two types of layers with different refractive indices alternating |
| JPH05132768A (ja) | 1991-11-13 | 1993-05-28 | Ricoh Co Ltd | 複屈折板およびその製造方法 |
| US5638197A (en) * | 1994-04-04 | 1997-06-10 | Rockwell International Corp. | Inorganic thin film compensator for improved gray scale performance in twisted nematic liquid crystal displays and method of making |
| US5504603A (en) * | 1994-04-04 | 1996-04-02 | Rockwell International Corporation | Optical compensator for improved gray scale performance in liquid crystal display |
| US5619352A (en) * | 1994-04-04 | 1997-04-08 | Rockwell International Corporation | LCD splay/twist compensator having varying tilt and /or azimuthal angles for improved gray scale performance |
| US5557434A (en) * | 1994-09-30 | 1996-09-17 | Rockwell International | Optical compensator including an o-plate for super-twist nematic liquid crystal display |
| JPH09296265A (ja) | 1996-05-08 | 1997-11-18 | Matsushita Electric Ind Co Ltd | 斜め蒸着膜の製造方法 |
| JPH10330940A (ja) | 1997-06-04 | 1998-12-15 | Oki Electric Ind Co Ltd | 多層金属配線の蒸着装置 |
| JPH11263861A (ja) | 1997-11-28 | 1999-09-28 | Sumitomo Chem Co Ltd | 位相差フィルムの製造方法 |
| JP4009044B2 (ja) | 1999-10-08 | 2007-11-14 | リコー光学株式会社 | 薄膜複屈折素子及びその製造方法及び製造装置 |
| JP2002014345A (ja) | 2000-06-28 | 2002-01-18 | Sony Corp | 投射型液晶表示装置 |
| JP2002031782A (ja) | 2000-07-18 | 2002-01-31 | Seiko Epson Corp | プロジェクタ |
| JP2002131750A (ja) | 2000-10-27 | 2002-05-09 | Matsushita Electric Ind Co Ltd | 投写型表示装置 |
| KR100852224B1 (ko) | 2000-12-28 | 2008-08-13 | 하야시 텔렘프 가부시끼가이샤 | 위상차 필름 및 그 제조 방법 |
| US6824838B2 (en) * | 2002-03-11 | 2004-11-30 | Fuji Photo Film Co., Ltd. | Retarders and circular polarizers |
| US7554635B2 (en) * | 2002-07-19 | 2009-06-30 | Fujifilm Corporation | Liquid crystal projector, liquid crystal device and substrate for liquid crystal device |
| JP2004102200A (ja) | 2002-07-19 | 2004-04-02 | Fuji Photo Film Co Ltd | 液晶プロジェクタ |
| AU2003290555A1 (en) * | 2002-10-30 | 2004-06-07 | Colorlink, Inc. | Oblique plate compensators for projection display systems |
| KR20070097438A (ko) | 2004-12-15 | 2007-10-04 | 후지필름 가부시키가이샤 | 위상차 보상기, 광 변조 시스템, 액정 디스플레이, 및 액정프로젝터 |
| JP2006171328A (ja) | 2004-12-15 | 2006-06-29 | Fuji Photo Film Co Ltd | 位相差補償素子、光変調システム、液晶表示装置及び液晶プロジェクタ |
| JP2006292784A (ja) | 2005-04-05 | 2006-10-26 | Matsushita Electric Ind Co Ltd | 斜め蒸着膜素子 |
| JP2007017485A (ja) | 2005-07-05 | 2007-01-25 | Fujifilm Holdings Corp | 液晶表示装置及び液晶プロジェクタ |
| JP2007086406A (ja) | 2005-09-22 | 2007-04-05 | Fujifilm Corp | 液晶表示装置及び光学異方性体並びにその製造方法 |
| JP2008242411A (ja) | 2006-09-27 | 2008-10-09 | Seiko Epson Corp | 蒸着装置及び蒸着方法並びに液晶装置の製造方法 |
| JP5098375B2 (ja) | 2007-03-12 | 2012-12-12 | セイコーエプソン株式会社 | 液晶装置の製造方法 |
-
2007
- 2007-09-21 JP JP2007245921A patent/JP2009075459A/ja not_active Abandoned
-
2008
- 2008-09-18 KR KR1020107005966A patent/KR20100071995A/ko not_active Withdrawn
- 2008-09-18 US US12/679,240 patent/US8605241B2/en active Active
- 2008-09-18 CN CN200880107754XA patent/CN101802663B/zh active Active
- 2008-09-18 EP EP08832696.2A patent/EP2191307B1/en active Active
- 2008-09-18 WO PCT/JP2008/067360 patent/WO2009038218A1/en not_active Ceased
- 2008-09-19 TW TW097135924A patent/TWI443427B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| TW200921215A (en) | 2009-05-16 |
| JP2009075459A (ja) | 2009-04-09 |
| CN101802663A (zh) | 2010-08-11 |
| WO2009038218A1 (en) | 2009-03-26 |
| US8605241B2 (en) | 2013-12-10 |
| EP2191307A1 (en) | 2010-06-02 |
| KR20100071995A (ko) | 2010-06-29 |
| CN101802663B (zh) | 2013-01-23 |
| EP2191307B1 (en) | 2019-09-11 |
| EP2191307A4 (en) | 2012-11-21 |
| US20100231835A1 (en) | 2010-09-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |