JP2008543070A5 - - Google Patents

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Publication number
JP2008543070A5
JP2008543070A5 JP2008514024A JP2008514024A JP2008543070A5 JP 2008543070 A5 JP2008543070 A5 JP 2008543070A5 JP 2008514024 A JP2008514024 A JP 2008514024A JP 2008514024 A JP2008514024 A JP 2008514024A JP 2008543070 A5 JP2008543070 A5 JP 2008543070A5
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JP
Japan
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unit
component
imaging device
optical
substrate
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JP2008514024A
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English (en)
Japanese (ja)
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JP2008543070A (ja
JP5237091B2 (ja
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Priority claimed from PCT/EP2006/005263 external-priority patent/WO2006128713A2/en
Publication of JP2008543070A publication Critical patent/JP2008543070A/ja
Publication of JP2008543070A5 publication Critical patent/JP2008543070A5/ja
Application granted granted Critical
Publication of JP5237091B2 publication Critical patent/JP5237091B2/ja
Expired - Fee Related legal-status Critical Current
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JP2008514024A 2005-06-02 2006-06-02 光学結像装置 Expired - Fee Related JP5237091B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US68684905P 2005-06-02 2005-06-02
US60/686,849 2005-06-02
US71497505P 2005-09-08 2005-09-08
US60/714,975 2005-09-08
PCT/EP2006/005263 WO2006128713A2 (en) 2005-06-02 2006-06-02 Optical imaging arrangement

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2012222394A Division JP5816152B2 (ja) 2005-06-02 2012-10-04 光学結像装置

Publications (3)

Publication Number Publication Date
JP2008543070A JP2008543070A (ja) 2008-11-27
JP2008543070A5 true JP2008543070A5 (enExample) 2009-07-16
JP5237091B2 JP5237091B2 (ja) 2013-07-17

Family

ID=36952670

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2008514024A Expired - Fee Related JP5237091B2 (ja) 2005-06-02 2006-06-02 光学結像装置
JP2012222394A Expired - Fee Related JP5816152B2 (ja) 2005-06-02 2012-10-04 光学結像装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2012222394A Expired - Fee Related JP5816152B2 (ja) 2005-06-02 2012-10-04 光学結像装置

Country Status (6)

Country Link
US (2) US7817248B2 (enExample)
EP (2) EP2357529A3 (enExample)
JP (2) JP5237091B2 (enExample)
KR (2) KR20130014602A (enExample)
CN (2) CN101248392B (enExample)
WO (1) WO2006128713A2 (enExample)

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WO2009039883A1 (en) * 2007-09-26 2009-04-02 Carl Zeiss Smt Ag Optical imaging device with thermal stabilization
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DE102008004762A1 (de) 2008-01-16 2009-07-30 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie mit einer Messeinrichtung
NL1036579A1 (nl) * 2008-02-19 2009-08-20 Asml Netherlands Bv Lithographic apparatus and methods.
DE102008026077B4 (de) * 2008-05-30 2017-11-09 Integrated Dynamics Engineering Gmbh Lithographiesystem
DE102008030664A1 (de) 2008-07-01 2010-01-21 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit Bestimmung von Abbildungsfehlern
DE102009013720A1 (de) * 2009-03-20 2010-09-23 Carl Zeiss Smt Ag Verfahren zur Ausrichtung von Referenzkomponenten von Projektionsobjektiven, Projektionsobjektiv für die Halbleiterlithographie und Hilfselement
CN102648402B (zh) 2009-09-30 2015-11-25 卡尔蔡司Smt有限责任公司 光学系统、特别是微光刻投射曝光设备中的光学系统
DE102009043501A1 (de) 2009-09-30 2011-03-31 Carl Zeiss Smt Gmbh Optisches System, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
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US20120127445A1 (en) * 2010-11-18 2012-05-24 Akimitsu Ebihara Isolation system for an optical element of an exposure apparatus
JP5886952B2 (ja) * 2011-07-01 2016-03-16 カール・ツァイス・エスエムティー・ゲーエムベーハー 個々に能動的に支持されたコンポーネントを有する光学結像装置
JP6121524B2 (ja) * 2012-05-31 2017-04-26 カール・ツァイス・エスエムティー・ゲーエムベーハー 複数の計測支持ユニットを有する光学結像装置
JP6066592B2 (ja) * 2012-06-12 2017-01-25 キヤノン株式会社 露光装置及びデバイス製造方法
CN105593761B (zh) 2013-09-30 2018-03-20 卡尔蔡司Smt有限责任公司 具有简化制造的光学成像布置
WO2015169329A1 (de) * 2014-05-05 2015-11-12 Carl Zeiss Industrielle Messtechnik Gmbh Koordinatenmessgeraet zum bestimmen von geometrischen eigenschaften eines messobjekts
WO2015173363A1 (de) * 2014-05-14 2015-11-19 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit feldnahem manipulator
DE102014212104A1 (de) * 2014-06-24 2015-12-24 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und verfahren zur relativen positionierung einer multiaperturoptik mit mehreren optischen kanälen relativ zu einem bildsensor
DE102015211286A1 (de) 2015-06-18 2016-12-22 Carl Zeiss Smt Gmbh Abbildungssystem und verfahren
WO2017092815A1 (en) * 2015-12-03 2017-06-08 Carl Zeiss Smt Gmbh Optical imaging arrangement with actively adjustable metrology support units
JP2019523437A (ja) * 2016-07-22 2019-08-22 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及びリソグラフィ投影装置
US10048599B2 (en) * 2016-12-30 2018-08-14 Mapper Lithography Ip B.V. Adjustment assembly and substrate exposure system comprising such an adjustment assembly
WO2018122003A1 (en) 2016-12-30 2018-07-05 Mapper Lithography Ip B.V. Adjustment assembly and substrate exposure system comprising such an adjustment assembly
US10348306B2 (en) * 2017-03-09 2019-07-09 University Of Utah Research Foundation Resistive random access memory based multiplexers and field programmable gate arrays
CN109945777A (zh) * 2017-12-21 2019-06-28 北京矩阵空间科技有限公司 一种三维自动成像系统
DE102020206249A1 (de) * 2020-05-18 2021-11-18 Carl Zeiss Smt Gmbh Verfahren zur Instandhaltung einer Projektionsbelichtungsanlage, Servicemodul und Anordnung für die Halbleiterlithographie

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