CN101248392B - 光学成像装置 - Google Patents

光学成像装置 Download PDF

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Publication number
CN101248392B
CN101248392B CN2006800265792A CN200680026579A CN101248392B CN 101248392 B CN101248392 B CN 101248392B CN 2006800265792 A CN2006800265792 A CN 2006800265792A CN 200680026579 A CN200680026579 A CN 200680026579A CN 101248392 B CN101248392 B CN 101248392B
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CN
China
Prior art keywords
optical
imaging device
unit
substrate
component
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CN2006800265792A
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English (en)
Chinese (zh)
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CN101248392A (zh
Inventor
Y-B·P·克万
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Carl Zeiss SMT GmbH
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Carl Zeiss SMT GmbH
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Publication of CN101248392A publication Critical patent/CN101248392A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground

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  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
CN2006800265792A 2005-06-02 2006-06-02 光学成像装置 Active CN101248392B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US68684905P 2005-06-02 2005-06-02
US60/686,849 2005-06-02
US71497505P 2005-09-08 2005-09-08
US60/714,975 2005-09-08
PCT/EP2006/005263 WO2006128713A2 (en) 2005-06-02 2006-06-02 Optical imaging arrangement

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201210424595.4A Division CN102929104B (zh) 2005-06-02 2006-06-02 光学成像装置

Publications (2)

Publication Number Publication Date
CN101248392A CN101248392A (zh) 2008-08-20
CN101248392B true CN101248392B (zh) 2012-12-19

Family

ID=36952670

Family Applications (2)

Application Number Title Priority Date Filing Date
CN201210424595.4A Active CN102929104B (zh) 2005-06-02 2006-06-02 光学成像装置
CN2006800265792A Active CN101248392B (zh) 2005-06-02 2006-06-02 光学成像装置

Family Applications Before (1)

Application Number Title Priority Date Filing Date
CN201210424595.4A Active CN102929104B (zh) 2005-06-02 2006-06-02 光学成像装置

Country Status (6)

Country Link
US (2) US7817248B2 (enExample)
EP (2) EP1886191A2 (enExample)
JP (2) JP5237091B2 (enExample)
KR (2) KR20130014602A (enExample)
CN (2) CN102929104B (enExample)
WO (1) WO2006128713A2 (enExample)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008110212A1 (en) * 2007-03-15 2008-09-18 Carl Zeiss Smt Ag Optical imaging arrangement
US7903866B2 (en) 2007-03-29 2011-03-08 Asml Netherlands B.V. Measurement system, lithographic apparatus and method for measuring a position dependent signal of a movable object
WO2009039883A1 (en) * 2007-09-26 2009-04-02 Carl Zeiss Smt Ag Optical imaging device with thermal stabilization
US8792079B2 (en) * 2007-12-28 2014-07-29 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method having encoders to measure displacement between optical member and measurement mount and between measurement mount and movable body
DE102008004762A1 (de) 2008-01-16 2009-07-30 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie mit einer Messeinrichtung
NL1036579A1 (nl) * 2008-02-19 2009-08-20 Asml Netherlands Bv Lithographic apparatus and methods.
DE102008026077B4 (de) * 2008-05-30 2017-11-09 Integrated Dynamics Engineering Gmbh Lithographiesystem
DE102008030664A1 (de) 2008-07-01 2010-01-21 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit Bestimmung von Abbildungsfehlern
DE102009013720A1 (de) * 2009-03-20 2010-09-23 Carl Zeiss Smt Ag Verfahren zur Ausrichtung von Referenzkomponenten von Projektionsobjektiven, Projektionsobjektiv für die Halbleiterlithographie und Hilfselement
DE102009043501A1 (de) 2009-09-30 2011-03-31 Carl Zeiss Smt Gmbh Optisches System, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
DE102009054860A1 (de) 2009-12-17 2011-06-22 Carl Zeiss SMT GmbH, 73447 Optisches System, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
KR101328870B1 (ko) * 2009-09-30 2013-11-13 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 노광 장치의 광학 시스템
US20120127445A1 (en) * 2010-11-18 2012-05-24 Akimitsu Ebihara Isolation system for an optical element of an exposure apparatus
JP5886952B2 (ja) * 2011-07-01 2016-03-16 カール・ツァイス・エスエムティー・ゲーエムベーハー 個々に能動的に支持されたコンポーネントを有する光学結像装置
CN104380201B (zh) * 2012-05-31 2016-11-23 卡尔蔡司Smt有限责任公司 具有多个度量支撑单元的光学成像设备
JP6066592B2 (ja) 2012-06-12 2017-01-25 キヤノン株式会社 露光装置及びデバイス製造方法
JP6360177B2 (ja) 2013-09-30 2018-07-18 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学結像装置モジュール及びその構成要素の支持方法
DE112014006641A5 (de) * 2014-05-05 2017-01-26 Carl Zeiss Industrielle Messtechnik Gmbh Koordinatenmessgerät zum Bestimmen von geometrischen Eigenschaften eines Messobjekts
JP6730197B2 (ja) * 2014-05-14 2020-07-29 カール・ツァイス・エスエムティー・ゲーエムベーハー ニアフィールドマニピュレータを有する投影露光装置
DE102014212104A1 (de) * 2014-06-24 2015-12-24 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und verfahren zur relativen positionierung einer multiaperturoptik mit mehreren optischen kanälen relativ zu einem bildsensor
DE102015211286A1 (de) 2015-06-18 2016-12-22 Carl Zeiss Smt Gmbh Abbildungssystem und verfahren
CN108292099B (zh) * 2015-12-03 2021-07-06 卡尔蔡司Smt有限责任公司 具有主动可调整的度量支撑单元的光学成像布置
EP3488293A1 (en) * 2016-07-22 2019-05-29 ASML Netherlands B.V. Lithographic apparatus, lithographic projection apparatus and device manufacturing method
US10048599B2 (en) * 2016-12-30 2018-08-14 Mapper Lithography Ip B.V. Adjustment assembly and substrate exposure system comprising such an adjustment assembly
CN110325919B (zh) 2016-12-30 2022-02-11 Asml荷兰有限公司 调整组件和包括该调整组件的衬底曝光系统
US10348306B2 (en) * 2017-03-09 2019-07-09 University Of Utah Research Foundation Resistive random access memory based multiplexers and field programmable gate arrays
CN109945777A (zh) * 2017-12-21 2019-06-28 北京矩阵空间科技有限公司 一种三维自动成像系统
DE102020206249A1 (de) * 2020-05-18 2021-11-18 Carl Zeiss Smt Gmbh Verfahren zur Instandhaltung einer Projektionsbelichtungsanlage, Servicemodul und Anordnung für die Halbleiterlithographie

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4758091A (en) * 1986-11-20 1988-07-19 Ateo Corporation Pattern generator part holder
US4790642A (en) * 1986-12-01 1988-12-13 Gca Corporation/Tropel Division Integrated metrology for microlithographic objective reducing lens
JPH01122119A (ja) * 1987-11-05 1989-05-15 Canon Inc 露光装置
NL9100407A (nl) * 1991-03-07 1992-10-01 Philips Nv Optisch lithografische inrichting met een krachtgecompenseerd machinegestel.
NL9100410A (nl) * 1991-03-07 1992-10-01 Asm Lithography Bv Afbeeldingsapparaat voorzien van een focusfout- en/of scheefstandsdetectie-inrichting.
JP3226704B2 (ja) * 1994-03-15 2001-11-05 キヤノン株式会社 露光装置
US6031598A (en) * 1998-09-25 2000-02-29 Euv Llc Extreme ultraviolet lithography machine
JP2000286189A (ja) * 1999-03-31 2000-10-13 Nikon Corp 露光装置および露光方法ならびにデバイス製造方法
JP2001160535A (ja) * 1999-09-20 2001-06-12 Nikon Corp 露光装置、及び該装置を用いるデバイス製造方法
US6344083B1 (en) * 2000-02-14 2002-02-05 Memc Electronic Materials, Inc. Process for producing a silicon melt
US7289212B2 (en) * 2000-08-24 2007-10-30 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufacturing thereby
EP1182509B1 (en) 2000-08-24 2009-04-08 ASML Netherlands B.V. Lithographic apparatus, calibration method thereof and device manufacturing method
US20020080339A1 (en) * 2000-12-25 2002-06-27 Nikon Corporation Stage apparatus, vibration control method and exposure apparatus
US6881963B2 (en) * 2002-11-08 2005-04-19 Canon Kabushiki Kaisha Vibration control of an object
JP4298305B2 (ja) * 2003-01-20 2009-07-15 キヤノン株式会社 露光装置及び半導体デバイスの製造方法
JP2004246060A (ja) * 2003-02-13 2004-09-02 Canon Inc 反射型投影光学系の調整方法
JP4307140B2 (ja) * 2003-04-25 2009-08-05 キヤノン株式会社 光学素子位置決め装置、それを用いた露光装置、デバイスの製造方法
JP2004281654A (ja) * 2003-03-14 2004-10-07 Canon Inc 駆動機構及びそれを用いた露光装置、デバイスの製造方法
EP1469348B1 (en) * 2003-04-14 2012-01-18 ASML Netherlands B.V. Projection system and method of use thereof
KR101211451B1 (ko) * 2003-07-09 2012-12-12 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
KR20060026883A (ko) * 2003-07-09 2006-03-24 가부시키가이샤 니콘 결합장치, 노광장치 및 디바이스 제조방법
JP4649136B2 (ja) * 2003-07-31 2011-03-09 キヤノン株式会社 アクチュエータ、露光装置及びデバイス製造方法
JP4366152B2 (ja) * 2003-09-09 2009-11-18 キヤノン株式会社 露光装置
WO2005028601A1 (ja) 2003-09-17 2005-03-31 Fuji Oil Company, Limited 油脂の乾式分別方法
JP2005236258A (ja) * 2003-09-18 2005-09-02 Canon Inc 光学装置およびデバイス製造方法
US7589911B2 (en) * 2003-09-18 2009-09-15 Canon Kabushiki Kaisha Technique for positioning optical system element

Also Published As

Publication number Publication date
US20080212083A1 (en) 2008-09-04
JP5816152B2 (ja) 2015-11-18
JP5237091B2 (ja) 2013-07-17
EP2357529A3 (en) 2015-09-02
KR20080019047A (ko) 2008-02-29
JP2013051424A (ja) 2013-03-14
WO2006128713A3 (en) 2007-05-31
WO2006128713A2 (en) 2006-12-07
EP1886191A2 (en) 2008-02-13
JP2008543070A (ja) 2008-11-27
US20110001949A1 (en) 2011-01-06
US8416392B2 (en) 2013-04-09
CN102929104A (zh) 2013-02-13
US7817248B2 (en) 2010-10-19
CN101248392A (zh) 2008-08-20
KR101346957B1 (ko) 2014-01-02
EP2357529A2 (en) 2011-08-17
CN102929104B (zh) 2016-08-03
KR20130014602A (ko) 2013-02-07

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