JP2008537182A5 - - Google Patents

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Publication number
JP2008537182A5
JP2008537182A5 JP2008507660A JP2008507660A JP2008537182A5 JP 2008537182 A5 JP2008537182 A5 JP 2008537182A5 JP 2008507660 A JP2008507660 A JP 2008507660A JP 2008507660 A JP2008507660 A JP 2008507660A JP 2008537182 A5 JP2008537182 A5 JP 2008537182A5
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JP
Japan
Prior art keywords
composition
group
component
cleaning
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008507660A
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English (en)
Japanese (ja)
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JP4677030B2 (ja
JP2008537182A (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/US2006/009389 external-priority patent/WO2006112994A1/en
Publication of JP2008537182A publication Critical patent/JP2008537182A/ja
Publication of JP2008537182A5 publication Critical patent/JP2008537182A5/ja
Application granted granted Critical
Publication of JP4677030B2 publication Critical patent/JP4677030B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2008507660A 2005-04-19 2006-03-16 電気化学的腐食を阻害する非水性フォトレジスト剥離剤 Expired - Fee Related JP4677030B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US67292305P 2005-04-19 2005-04-19
PCT/US2006/009389 WO2006112994A1 (en) 2005-04-19 2006-03-16 Non-aqueous photoresist stripper that inhibits galvanic corrosion

Publications (3)

Publication Number Publication Date
JP2008537182A JP2008537182A (ja) 2008-09-11
JP2008537182A5 true JP2008537182A5 (https=) 2009-04-30
JP4677030B2 JP4677030B2 (ja) 2011-04-27

Family

ID=36754183

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008507660A Expired - Fee Related JP4677030B2 (ja) 2005-04-19 2006-03-16 電気化学的腐食を阻害する非水性フォトレジスト剥離剤

Country Status (20)

Country Link
US (1) US20080280235A1 (https=)
EP (1) EP1877870B1 (https=)
JP (1) JP4677030B2 (https=)
KR (1) KR101088568B1 (https=)
CN (1) CN101164016B (https=)
AT (1) ATE498859T1 (https=)
BR (1) BRPI0610852A2 (https=)
CA (1) CA2605236A1 (https=)
DE (1) DE602006020125D1 (https=)
DK (1) DK1877870T3 (https=)
ES (1) ES2361271T3 (https=)
IL (1) IL186565A0 (https=)
MY (1) MY145299A (https=)
NO (1) NO20075935L (https=)
PL (1) PL1877870T3 (https=)
PT (1) PT1877870E (https=)
SG (1) SG161273A1 (https=)
TW (1) TW200700549A (https=)
WO (1) WO2006112994A1 (https=)
ZA (1) ZA200706296B (https=)

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US8518865B2 (en) 2009-08-31 2013-08-27 Air Products And Chemicals, Inc. Water-rich stripping and cleaning formulation and method for using same
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CN103389627A (zh) * 2012-05-11 2013-11-13 安集微电子科技(上海)有限公司 一种光刻胶清洗液
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US11149235B2 (en) 2018-07-20 2021-10-19 Entegris, Inc. Cleaning composition with corrosion inhibitor
CN109557774A (zh) * 2019-01-22 2019-04-02 上海华虹宏力半导体制造有限公司 光刻胶去除方法及铝制程工艺方法
CN110967946A (zh) * 2019-12-04 2020-04-07 苏州博洋化学股份有限公司 一种高效碱性光刻胶剥离液
TW202437031A (zh) 2023-03-13 2024-09-16 台灣芯電應用科技股份有限公司 剝離劑組成物以及清洗方法
EP4440252A1 (en) * 2023-03-31 2024-10-02 Atotech Deutschland GmbH & Co. KG Method for removing an organic resin from a surface of a substrate

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