JP2008532293A5 - - Google Patents

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Publication number
JP2008532293A5
JP2008532293A5 JP2007557224A JP2007557224A JP2008532293A5 JP 2008532293 A5 JP2008532293 A5 JP 2008532293A5 JP 2007557224 A JP2007557224 A JP 2007557224A JP 2007557224 A JP2007557224 A JP 2007557224A JP 2008532293 A5 JP2008532293 A5 JP 2008532293A5
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JP
Japan
Prior art keywords
raw material
irradiated
euv light
droplet
droplets
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2007557224A
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English (en)
Japanese (ja)
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JP2008532293A (ja
JP5431675B2 (ja
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Priority claimed from US11/067,124 external-priority patent/US7405416B2/en
Priority claimed from US11/174,443 external-priority patent/US7372056B2/en
Priority claimed from US11/358,988 external-priority patent/US20060255298A1/en
Application filed filed Critical
Publication of JP2008532293A publication Critical patent/JP2008532293A/ja
Publication of JP2008532293A5 publication Critical patent/JP2008532293A5/ja
Application granted granted Critical
Publication of JP5431675B2 publication Critical patent/JP5431675B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2007557224A 2005-02-25 2006-02-24 プレパルスによるレーザ生成プラズマｅｕｖ光源 Expired - Fee Related JP5431675B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US11/067,124 US7405416B2 (en) 2005-02-25 2005-02-25 Method and apparatus for EUV plasma source target delivery
US11/067,124 2005-02-25
US11/174,443 US7372056B2 (en) 2005-06-29 2005-06-29 LPP EUV plasma source material target delivery system
US11/174,443 2005-06-29
US11/358,988 US20060255298A1 (en) 2005-02-25 2006-02-21 Laser produced plasma EUV light source with pre-pulse
US11/358,988 2006-02-21
PCT/US2006/006947 WO2006091948A2 (en) 2005-02-25 2006-02-24 Laser produced plasma euv light source with pre-pulse

Publications (3)

Publication Number Publication Date
JP2008532293A JP2008532293A (ja) 2008-08-14
JP2008532293A5 true JP2008532293A5 (enExample) 2009-04-09
JP5431675B2 JP5431675B2 (ja) 2014-03-05

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ID=36928120

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007557224A Expired - Fee Related JP5431675B2 (ja) 2005-02-25 2006-02-24 プレパルスによるレーザ生成プラズマｅｕｖ光源

Country Status (3)

Country Link
US (1) US20060255298A1 (enExample)
JP (1) JP5431675B2 (enExample)
WO (1) WO2006091948A2 (enExample)

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US8283643B2 (en) * 2008-11-24 2012-10-09 Cymer, Inc. Systems and methods for drive laser beam delivery in an EUV light source
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WO2011113591A2 (en) 2010-03-18 2011-09-22 Eth Zurich Optical collector for collecting extreme ultraviolet radiation, method for operating such an optical collector, and euv source with such a collector
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US8686381B2 (en) * 2010-06-28 2014-04-01 Media Lario S.R.L. Source-collector module with GIC mirror and tin vapor LPP target system
US8462425B2 (en) 2010-10-18 2013-06-11 Cymer, Inc. Oscillator-amplifier drive laser with seed protection for an EUV light source
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JP6864096B2 (ja) 2016-12-19 2021-04-21 エーエスエムエル ネザーランズ ビー．ブイ． 計測センサ、リソグラフィ装置および内でのデバイス製造方法
US10499485B2 (en) 2017-06-20 2019-12-03 Asml Netherlands B.V. Supply system for an extreme ultraviolet light source
US10585215B2 (en) 2017-06-29 2020-03-10 Cymer, Llc Reducing optical damage on an optical element
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US11587781B2 (en) 2021-05-24 2023-02-21 Hamamatsu Photonics K.K. Laser-driven light source with electrodeless ignition
US11906902B2 (en) * 2021-08-06 2024-02-20 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor processing tool and methods of operation
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US12144072B2 (en) 2022-03-29 2024-11-12 Hamamatsu Photonics K.K. All-optical laser-driven light source with electrodeless ignition
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