JP5431675B2 - プレパルスによるレーザ生成プラズマｅｕｖ光源 - Google Patents

プレパルスによるレーザ生成プラズマｅｕｖ光源 Download PDF

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Publication number
JP5431675B2
JP5431675B2 JP2007557224A JP2007557224A JP5431675B2 JP 5431675 B2 JP5431675 B2 JP 5431675B2 JP 2007557224 A JP2007557224 A JP 2007557224A JP 2007557224 A JP2007557224 A JP 2007557224A JP 5431675 B2 JP5431675 B2 JP 5431675B2
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raw material
droplets
droplet
pulse
irradiated
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JP2008532293A (ja
JP2008532293A5 (enExample
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アレクサンダー エヌ ビカノフ
オリー コーディキン
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サイマー インコーポレイテッド
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Priority claimed from US11/067,124 external-priority patent/US7405416B2/en
Priority claimed from US11/174,443 external-priority patent/US7372056B2/en
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0088—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam for preconditioning the plasma generating material

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2007557224A 2005-02-25 2006-02-24 プレパルスによるレーザ生成プラズマｅｕｖ光源 Expired - Fee Related JP5431675B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US11/067,124 US7405416B2 (en) 2005-02-25 2005-02-25 Method and apparatus for EUV plasma source target delivery
US11/067,124 2005-02-25
US11/174,443 US7372056B2 (en) 2005-06-29 2005-06-29 LPP EUV plasma source material target delivery system
US11/174,443 2005-06-29
US11/358,988 US20060255298A1 (en) 2005-02-25 2006-02-21 Laser produced plasma EUV light source with pre-pulse
US11/358,988 2006-02-21
PCT/US2006/006947 WO2006091948A2 (en) 2005-02-25 2006-02-24 Laser produced plasma euv light source with pre-pulse

Publications (3)

Publication Number Publication Date
JP2008532293A JP2008532293A (ja) 2008-08-14
JP2008532293A5 JP2008532293A5 (enExample) 2009-04-09
JP5431675B2 true JP5431675B2 (ja) 2014-03-05

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JP2007557224A Expired - Fee Related JP5431675B2 (ja) 2005-02-25 2006-02-24 プレパルスによるレーザ生成プラズマｅｕｖ光源

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US (1) US20060255298A1 (enExample)
JP (1) JP5431675B2 (enExample)
WO (1) WO2006091948A2 (enExample)

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WO2011113591A2 (en) 2010-03-18 2011-09-22 Eth Zurich Optical collector for collecting extreme ultraviolet radiation, method for operating such an optical collector, and euv source with such a collector
WO2011116898A1 (en) 2010-03-25 2011-09-29 Eth Zurich Steering device for controlling the direction and/or velocity of droplets of a target material and extreme euv source with such a steering device
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JP6077822B2 (ja) * 2012-02-10 2017-02-08 ギガフォトン株式会社 ターゲット供給装置、および、ターゲット供給方法
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US8681427B2 (en) * 2012-05-31 2014-03-25 Cymer, Inc. System and method for separating a main pulse and a pre-pulse beam from a laser source
US10095119B2 (en) * 2012-11-15 2018-10-09 Asml Netherlands B.V. Radiation source and method for lithography
JP6168797B2 (ja) 2013-03-08 2017-07-26 ギガフォトン株式会社 極端紫外光生成装置
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JP6283684B2 (ja) 2013-11-07 2018-02-21 ギガフォトン株式会社 極端紫外光生成装置及び極端紫外光生成装置の制御方法
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WO2016063409A1 (ja) * 2014-10-24 2016-04-28 ギガフォトン株式会社 極端紫外光生成システム及び極端紫外光を生成する方法
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JP6864096B2 (ja) 2016-12-19 2021-04-21 エーエスエムエル ネザーランズ ビー．ブイ． 計測センサ、リソグラフィ装置および内でのデバイス製造方法
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Publication number Publication date
JP2008532293A (ja) 2008-08-14
WO2006091948A3 (en) 2008-01-24
WO2006091948A2 (en) 2006-08-31
US20060255298A1 (en) 2006-11-16

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