JP2008532293A5 - - Google Patents

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Publication number
JP2008532293A5
JP2008532293A5 JP2007557224A JP2007557224A JP2008532293A5 JP 2008532293 A5 JP2008532293 A5 JP 2008532293A5 JP 2007557224 A JP2007557224 A JP 2007557224A JP 2007557224 A JP2007557224 A JP 2007557224A JP 2008532293 A5 JP2008532293 A5 JP 2008532293A5
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JP
Japan
Prior art keywords
raw material
irradiated
euv light
droplet
droplets
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JP2007557224A
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English (en)
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JP5431675B2 (ja
JP2008532293A (ja
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Priority claimed from US11/067,124 external-priority patent/US7405416B2/en
Priority claimed from US11/174,443 external-priority patent/US7372056B2/en
Priority claimed from US11/358,988 external-priority patent/US20060255298A1/en
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Publication of JP2008532293A publication Critical patent/JP2008532293A/ja
Publication of JP2008532293A5 publication Critical patent/JP2008532293A5/ja
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Publication of JP5431675B2 publication Critical patent/JP5431675B2/ja
Expired - Fee Related legal-status Critical Current
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Claims (10)

  1. EUV光を発生させる方法において、
    原材料を供給する段階と、
    複数の原材料液滴を発生させ、液滴をターゲットボリューム内のランダムな位置に供給する段階と、
    ターゲットボリューム内の複数の原材料液滴に第1の光パルスを同時に照射して照射原材料を生成する段階と、
    その後で、前記照射原材料を第2の光パルスに露出してEUV光を発生させる段階と、を含む方法。
  2. 前記照射原材料が蒸発原材料を含むことを特徴とする請求項1に記載の方法。
  3. 前記照射原材料が弱いプラズマを含むことを特徴とする請求項1に記載の方法。
  4. 前記露出段階がプラズマを発生させることを特徴とする請求項1に記載の方法。
  5. CO2レーザを用いて前記第2の光パルスを発生させ、前記第2の光パルスがある焦点サイズを有する焦点に集束され、前記方法が更に、
    前記照射段階の後に予め設定された時間を待機して、前記露出段階の開始前に前記照射原材料が少なくとも前記焦点サイズにまで膨張することができるようにする段階を含む、ことを特徴とする請求項1に記載の方法。
  6. 複数の原材料液滴をターゲットボリューム内のランダムな位置に供給する液滴発生器と、
    前記ターゲットボリューム内の複数の原材料液滴に第1のパルスを同時に照射して照射原材料を生成するための第1の光パルス源と、
    前記照射原材料を第2の光パルスに露出してEUV光を発生させる第2の光パルス源と、
    を含むことを特徴とするEUV光源。
  7. 前記液滴発生器が非変調液滴発生器を含むことを特徴とする請求項6に記載のEUV光源。
  8. 前記複数の原材料液滴内の各液滴が、5μmから100μmの範囲の直径を有することを特徴とする請求項6に記載のEUV光源。
  9. 前記複数の原材料液滴内の各液滴が、5μmから15μmの範囲の直径を有することを特徴とする請求項6に記載のEUV光源。
  10. EUV光を発生させる方法において、
    原材料を供給する段階と、
    少なくとも1つの液滴直径を有する原材料液滴を発生させる段階と、
    前記少なくとも1つの原材料液滴に第1の光パルスを照射して照射原材料を生成する段階と、
    前記照射原材料を前記液滴直径よりも大きい直径を有する焦点サイズを有する焦点に集束させた第2の光パルスに露出して、EUV光を発生させる段階と
    を含み、
    前記照射段階と前記露出段階との間に予め設定された時間期間が経過するのを許容して、前記露出段階の開始前に前記照射原材料が少なくとも前記焦点サイズにまで膨張することができるようにする、
    ことを特徴とする方法。
JP2007557224A 2005-02-25 2006-02-24 プレパルスによるレーザ生成プラズマeuv光源 Expired - Fee Related JP5431675B2 (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US11/067,124 US7405416B2 (en) 2005-02-25 2005-02-25 Method and apparatus for EUV plasma source target delivery
US11/067,124 2005-02-25
US11/174,443 US7372056B2 (en) 2005-06-29 2005-06-29 LPP EUV plasma source material target delivery system
US11/174,443 2005-06-29
US11/358,988 2006-02-21
US11/358,988 US20060255298A1 (en) 2005-02-25 2006-02-21 Laser produced plasma EUV light source with pre-pulse
PCT/US2006/006947 WO2006091948A2 (en) 2005-02-25 2006-02-24 Laser produced plasma euv light source with pre-pulse

Publications (3)

Publication Number Publication Date
JP2008532293A JP2008532293A (ja) 2008-08-14
JP2008532293A5 true JP2008532293A5 (ja) 2009-04-09
JP5431675B2 JP5431675B2 (ja) 2014-03-05

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ID=36928120

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007557224A Expired - Fee Related JP5431675B2 (ja) 2005-02-25 2006-02-24 プレパルスによるレーザ生成プラズマeuv光源

Country Status (3)

Country Link
US (1) US20060255298A1 (ja)
JP (1) JP5431675B2 (ja)
WO (1) WO2006091948A2 (ja)

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