US7856044B2
(en)
|
1999-05-10 |
2010-12-21 |
Cymer, Inc. |
Extendable electrode for gas discharge laser
|
US7897947B2
(en)
*
|
2007-07-13 |
2011-03-01 |
Cymer, Inc. |
Laser produced plasma EUV light source having a droplet stream produced using a modulated disturbance wave
|
US7928416B2
(en)
|
2006-12-22 |
2011-04-19 |
Cymer, Inc. |
Laser produced plasma EUV light source
|
US7916388B2
(en)
*
|
2007-12-20 |
2011-03-29 |
Cymer, Inc. |
Drive laser for EUV light source
|
US8653437B2
(en)
|
2010-10-04 |
2014-02-18 |
Cymer, Llc |
EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
|
US7671349B2
(en)
|
2003-04-08 |
2010-03-02 |
Cymer, Inc. |
Laser produced plasma EUV light source
|
US8654438B2
(en)
|
2010-06-24 |
2014-02-18 |
Cymer, Llc |
Master oscillator-power amplifier drive laser with pre-pulse for EUV light source
|
JP4512747B2
(ja)
*
|
2005-03-02 |
2010-07-28 |
独立行政法人産業技術総合研究所 |
レーザープラズマから輻射光を発生させる方法、該方法を用いたレーザープラズマ輻射光発生装置
|
US8158960B2
(en)
|
2007-07-13 |
2012-04-17 |
Cymer, Inc. |
Laser produced plasma EUV light source
|
US8513629B2
(en)
*
|
2011-05-13 |
2013-08-20 |
Cymer, Llc |
Droplet generator with actuator induced nozzle cleaning
|
WO2007121142A2
(en)
*
|
2006-04-12 |
2007-10-25 |
The Regents Of The University Of California |
Improved light source employing laser-produced plasma
|
US7696492B2
(en)
*
|
2006-12-13 |
2010-04-13 |
Asml Netherlands B.V. |
Radiation system and lithographic apparatus
|
US8901521B2
(en)
|
2007-08-23 |
2014-12-02 |
Asml Netherlands B.V. |
Module and method for producing extreme ultraviolet radiation
|
KR101495208B1
(ko)
*
|
2007-08-23 |
2015-02-25 |
에이에스엠엘 네델란즈 비.브이. |
극자외 방사선을 생성하는 방법 및 모듈
|
US7812329B2
(en)
|
2007-12-14 |
2010-10-12 |
Cymer, Inc. |
System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
|
US7655925B2
(en)
|
2007-08-31 |
2010-02-02 |
Cymer, Inc. |
Gas management system for a laser-produced-plasma EUV light source
|
JP5458243B2
(ja)
*
|
2007-10-25 |
2014-04-02 |
国立大学法人大阪大学 |
Euv光の放射方法、および前記euv光を用いた感応基板の露光方法
|
JP5280066B2
(ja)
*
|
2008-02-28 |
2013-09-04 |
ギガフォトン株式会社 |
極端紫外光源装置
|
US7872245B2
(en)
*
|
2008-03-17 |
2011-01-18 |
Cymer, Inc. |
Systems and methods for target material delivery in a laser produced plasma EUV light source
|
US20110122387A1
(en)
*
|
2008-05-13 |
2011-05-26 |
The Regents Of The University Of California |
System and method for light source employing laser-produced plasma
|
US8198612B2
(en)
*
|
2008-07-31 |
2012-06-12 |
Cymer, Inc. |
Systems and methods for heating an EUV collector mirror
|
US8519366B2
(en)
|
2008-08-06 |
2013-08-27 |
Cymer, Inc. |
Debris protection system having a magnetic field for an EUV light source
|
EP2159638B1
(en)
*
|
2008-08-26 |
2015-06-17 |
ASML Netherlands BV |
Radiation source and lithographic apparatus
|
JP5454881B2
(ja)
*
|
2008-08-29 |
2014-03-26 |
ギガフォトン株式会社 |
極端紫外光源装置及び極端紫外光の発生方法
|
US7641349B1
(en)
|
2008-09-22 |
2010-01-05 |
Cymer, Inc. |
Systems and methods for collector mirror temperature control using direct contact heat transfer
|
JP5368261B2
(ja)
*
|
2008-11-06 |
2013-12-18 |
ギガフォトン株式会社 |
極端紫外光源装置、極端紫外光源装置の制御方法
|
US8283643B2
(en)
*
|
2008-11-24 |
2012-10-09 |
Cymer, Inc. |
Systems and methods for drive laser beam delivery in an EUV light source
|
US8969838B2
(en)
*
|
2009-04-09 |
2015-03-03 |
Asml Netherlands B.V. |
Systems and methods for protecting an EUV light source chamber from high pressure source material leaks
|
WO2011100322A2
(en)
|
2010-02-09 |
2011-08-18 |
Energetiq Technology, Inc. |
Laser-driven light source
|
JP5687488B2
(ja)
|
2010-02-22 |
2015-03-18 |
ギガフォトン株式会社 |
極端紫外光生成装置
|
WO2011113591A2
(en)
|
2010-03-18 |
2011-09-22 |
Eth Zurich |
Optical collector for collecting extreme ultraviolet radiation, method for operating such an optical collector, and euv source with such a collector
|
WO2011116898A1
(en)
|
2010-03-25 |
2011-09-29 |
Eth Zurich |
Steering device for controlling the direction and/or velocity of droplets of a target material and extreme euv source with such a steering device
|
EP2550564B1
(en)
|
2010-03-25 |
2015-03-04 |
ETH Zurich |
A beam line for a source of extreme ultraviolet (euv) radiation
|
US8263953B2
(en)
|
2010-04-09 |
2012-09-11 |
Cymer, Inc. |
Systems and methods for target material delivery protection in a laser produced plasma EUV light source
|
US9066412B2
(en)
|
2010-04-15 |
2015-06-23 |
Asml Netherlands B.V. |
Systems and methods for cooling an optic
|
US8686381B2
(en)
*
|
2010-06-28 |
2014-04-01 |
Media Lario S.R.L. |
Source-collector module with GIC mirror and tin vapor LPP target system
|
US8462425B2
(en)
|
2010-10-18 |
2013-06-11 |
Cymer, Inc. |
Oscillator-amplifier drive laser with seed protection for an EUV light source
|
US8810902B2
(en)
|
2010-12-29 |
2014-08-19 |
Asml Netherlands B.V. |
Multi-pass optical apparatus
|
US8633459B2
(en)
|
2011-03-02 |
2014-01-21 |
Cymer, Llc |
Systems and methods for optics cleaning in an EUV light source
|
US8604452B2
(en)
|
2011-03-17 |
2013-12-10 |
Cymer, Llc |
Drive laser delivery systems for EUV light source
|
US9029813B2
(en)
*
|
2011-05-20 |
2015-05-12 |
Asml Netherlands B.V. |
Filter for material supply apparatus of an extreme ultraviolet light source
|
US9516730B2
(en)
|
2011-06-08 |
2016-12-06 |
Asml Netherlands B.V. |
Systems and methods for buffer gas flow stabilization in a laser produced plasma light source
|
KR101938707B1
(ko)
|
2011-09-02 |
2019-01-15 |
에이에스엠엘 네델란즈 비.브이. |
디바이스 제조용 리소그래피 장치에 대한 방법 및 방사선 소스
|
NL2009358A
(en)
|
2011-09-23 |
2013-03-26 |
Asml Netherlands Bv |
Radiation source.
|
JP6077822B2
(ja)
*
|
2012-02-10 |
2017-02-08 |
ギガフォトン株式会社 |
ターゲット供給装置、および、ターゲット供給方法
|
JP6154459B2
(ja)
|
2012-03-27 |
2017-06-28 |
エーエスエムエル ネザーランズ ビー.ブイ. |
リソグラフィ装置用の燃料システム、euv源、リソグラフィ装置及び燃料フィルタリング方法
|
US8681427B2
(en)
*
|
2012-05-31 |
2014-03-25 |
Cymer, Inc. |
System and method for separating a main pulse and a pre-pulse beam from a laser source
|
NL2011663A
(en)
*
|
2012-11-15 |
2014-05-19 |
Asml Netherlands Bv |
Radiation source and method for lithography.
|
JP6168797B2
(ja)
|
2013-03-08 |
2017-07-26 |
ギガフォトン株式会社 |
極端紫外光生成装置
|
US8872143B2
(en)
*
|
2013-03-14 |
2014-10-28 |
Asml Netherlands B.V. |
Target for laser produced plasma extreme ultraviolet light source
|
US8791440B1
(en)
|
2013-03-14 |
2014-07-29 |
Asml Netherlands B.V. |
Target for extreme ultraviolet light source
|
JP6283684B2
(ja)
|
2013-11-07 |
2018-02-21 |
ギガフォトン株式会社 |
極端紫外光生成装置及び極端紫外光生成装置の制御方法
|
US9301382B2
(en)
|
2013-12-02 |
2016-03-29 |
Asml Netherlands B.V. |
Apparatus for and method of source material delivery in a laser produced plasma EUV light source
|
US9338870B2
(en)
|
2013-12-30 |
2016-05-10 |
Asml Netherlands B.V. |
Extreme ultraviolet light source
|
US9232623B2
(en)
|
2014-01-22 |
2016-01-05 |
Asml Netherlands B.V. |
Extreme ultraviolet light source
|
US9835950B2
(en)
|
2014-01-27 |
2017-12-05 |
Asml Netherland B.V. |
Radiation source
|
US9271381B2
(en)
|
2014-02-10 |
2016-02-23 |
Asml Netherlands B.V. |
Methods and apparatus for laser produced plasma EUV light source
|
US9357625B2
(en)
|
2014-07-07 |
2016-05-31 |
Asml Netherlands B.V. |
Extreme ultraviolet light source
|
WO2016059674A1
(ja)
*
|
2014-10-14 |
2016-04-21 |
ギガフォトン株式会社 |
ターゲット材料、材料処理装置、材料処理方法、材料製造方法およびプログラム
|
JP6434984B2
(ja)
|
2014-10-24 |
2018-12-05 |
ギガフォトン株式会社 |
極端紫外光生成システム及び極端紫外光を生成する方法
|
US9538628B1
(en)
|
2015-06-11 |
2017-01-03 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Method for EUV power improvement with fuel droplet trajectory stabilization
|
US9451683B1
(en)
*
|
2015-07-14 |
2016-09-20 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Solution for EUV power increment at wafer level
|
US20170311429A1
(en)
|
2016-04-25 |
2017-10-26 |
Asml Netherlands B.V. |
Reducing the effect of plasma on an object in an extreme ultraviolet light source
|
JP6864096B2
(ja)
|
2016-12-19 |
2021-04-21 |
エーエスエムエル ネザーランズ ビー.ブイ. |
計測センサ、リソグラフィ装置および内でのデバイス製造方法
|
US10499485B2
(en)
|
2017-06-20 |
2019-12-03 |
Asml Netherlands B.V. |
Supply system for an extreme ultraviolet light source
|
US10585215B2
(en)
|
2017-06-29 |
2020-03-10 |
Cymer, Llc |
Reducing optical damage on an optical element
|
EP3525556A1
(en)
*
|
2018-02-09 |
2019-08-14 |
Excillum AB |
A method for protecting an x-ray source, and an x-ray source
|
US11906902B2
(en)
*
|
2021-08-06 |
2024-02-20 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Semiconductor processing tool and methods of operation
|