JP2008525535A5 - - Google Patents
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- JP2008525535A5 JP2008525535A5 JP2007546722A JP2007546722A JP2008525535A5 JP 2008525535 A5 JP2008525535 A5 JP 2008525535A5 JP 2007546722 A JP2007546722 A JP 2007546722A JP 2007546722 A JP2007546722 A JP 2007546722A JP 2008525535 A5 JP2008525535 A5 JP 2008525535A5
- Authority
- JP
- Japan
- Prior art keywords
- sol
- gel
- superporous
- integral
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000000034 method Methods 0.000 claims 14
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical group F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims 10
- 239000012703 sol-gel precursor Substances 0.000 claims 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims 5
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims 4
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims 3
- 229910052782 aluminium Inorganic materials 0.000 claims 3
- 229910052732 germanium Inorganic materials 0.000 claims 3
- 229910052735 hafnium Inorganic materials 0.000 claims 3
- 229910052710 silicon Inorganic materials 0.000 claims 3
- 239000000243 solution Substances 0.000 claims 3
- 125000001424 substituent group Chemical group 0.000 claims 3
- -1 substituted Chemical class 0.000 claims 3
- 229910052719 titanium Inorganic materials 0.000 claims 3
- 239000010936 titanium Substances 0.000 claims 3
- 229910052720 vanadium Inorganic materials 0.000 claims 3
- 229910052726 zirconium Inorganic materials 0.000 claims 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 2
- 150000004703 alkoxides Chemical group 0.000 claims 2
- 125000003545 alkoxy group Chemical group 0.000 claims 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 2
- 125000003118 aryl group Chemical group 0.000 claims 2
- 238000001354 calcination Methods 0.000 claims 2
- 239000004202 carbamide Substances 0.000 claims 2
- 235000013877 carbamide Nutrition 0.000 claims 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 2
- 239000003795 chemical substances by application Substances 0.000 claims 2
- 125000000753 cycloalkyl group Chemical group 0.000 claims 2
- 238000001035 drying Methods 0.000 claims 2
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims 2
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims 2
- 150000004820 halides Chemical class 0.000 claims 2
- 229910052736 halogen Inorganic materials 0.000 claims 2
- 150000002367 halogens Chemical class 0.000 claims 2
- 125000001072 heteroaryl group Chemical group 0.000 claims 2
- 125000000592 heterocycloalkyl group Chemical group 0.000 claims 2
- 229910052739 hydrogen Inorganic materials 0.000 claims 2
- 239000001257 hydrogen Substances 0.000 claims 2
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 2
- 239000011159 matrix material Substances 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 2
- 239000011148 porous material Substances 0.000 claims 2
- 229910000077 silane Inorganic materials 0.000 claims 2
- 239000010703 silicon Substances 0.000 claims 2
- 239000002904 solvent Substances 0.000 claims 2
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 claims 2
- 239000007864 aqueous solution Substances 0.000 claims 1
- 239000011230 binding agent Substances 0.000 claims 1
- 238000009835 boiling Methods 0.000 claims 1
- 239000003054 catalyst Substances 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 150000004673 fluoride salts Chemical class 0.000 claims 1
- 150000002222 fluorine compounds Chemical class 0.000 claims 1
- BCQKCDCVNZQJKN-UHFFFAOYSA-N fluorogermane Chemical compound [GeH3]F BCQKCDCVNZQJKN-UHFFFAOYSA-N 0.000 claims 1
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 claims 1
- 238000007710 freezing Methods 0.000 claims 1
- 230000008014 freezing Effects 0.000 claims 1
- 229910052733 gallium Inorganic materials 0.000 claims 1
- 229910021480 group 4 element Inorganic materials 0.000 claims 1
- 229910021478 group 5 element Inorganic materials 0.000 claims 1
- 229920001477 hydrophilic polymer Polymers 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 150000002736 metal compounds Chemical class 0.000 claims 1
- 150000002737 metalloid compounds Chemical class 0.000 claims 1
- 229910052758 niobium Inorganic materials 0.000 claims 1
- 239000004094 surface-active agent Substances 0.000 claims 1
- 229910052718 tin Inorganic materials 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/018,168 | 2004-12-20 | ||
| US11/018,168 US7439272B2 (en) | 2004-12-20 | 2004-12-20 | Ultraporous sol gel monoliths |
| PCT/US2005/043429 WO2006068797A1 (en) | 2004-12-20 | 2005-12-01 | Ultraporous sol gel monoliths |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008525535A JP2008525535A (ja) | 2008-07-17 |
| JP2008525535A5 true JP2008525535A5 (cg-RX-API-DMAC7.html) | 2009-01-22 |
| JP5288804B2 JP5288804B2 (ja) | 2013-09-11 |
Family
ID=36177825
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007546722A Expired - Fee Related JP5288804B2 (ja) | 2004-12-20 | 2005-12-01 | 超多孔性のゾルゲル一体物 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US7439272B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP1827679A1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP5288804B2 (cg-RX-API-DMAC7.html) |
| AU (1) | AU2005319513B2 (cg-RX-API-DMAC7.html) |
| CA (1) | CA2590779C (cg-RX-API-DMAC7.html) |
| TW (1) | TWI315997B (cg-RX-API-DMAC7.html) |
| WO (1) | WO2006068797A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (88)
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| JP2001026664A (ja) * | 1999-05-13 | 2001-01-30 | Matsushita Electric Ind Co Ltd | 多孔体の製造方法 |
| AU2001238109A1 (en) * | 2000-02-09 | 2001-08-20 | University Of South Florida | Sol-gel monolithic column with optical window and method of making |
| US7052532B1 (en) * | 2000-03-09 | 2006-05-30 | 3M Innovative Properties Company | High temperature nanofilter, system and method |
| EP1134189A1 (de) | 2000-03-16 | 2001-09-19 | Degussa AG | Formkörper amorpher, poröser (Metall-)Silikate |
| US6346140B2 (en) * | 2000-03-31 | 2002-02-12 | Kabushiki Kaisha Toyota Chuo Kenkyusho | Porous solid for gas adsorption separation and gas adsorption separation process employing it |
| US6620368B1 (en) * | 2000-07-13 | 2003-09-16 | Simax Technologies, Inc. | Sol-gel process for production of oxide-based glass and ceramic articles |
| DE10034076C1 (de) * | 2000-07-13 | 2002-01-24 | Merck Patent Gmbh | Anschlußsystem für Kunststoffsäulen |
| US6528167B2 (en) * | 2001-01-31 | 2003-03-04 | Waters Investments Limited | Porous hybrid particles with organic groups removed from the surface |
| WO2003014450A1 (en) * | 2001-08-09 | 2003-02-20 | Waters Investments Limited | Porous inorganic/organic hybrid monolith materials for chromatographic separations and process for their preparation |
| US7026362B2 (en) * | 2001-10-09 | 2006-04-11 | Simax Technologies, Inc. | Sol-gel process utilizing reduced mixing temperatures |
| US7125912B2 (en) * | 2001-10-09 | 2006-10-24 | Simax Technologies, Inc. | Doped sol-gel materials and method of manufacture utilizing reduced mixing temperatures |
| US7235142B2 (en) * | 2002-01-04 | 2007-06-26 | University Of Dayton | Non-toxic corrosion-protection rinses and seals based on cobalt |
| US7000885B2 (en) * | 2002-02-01 | 2006-02-21 | Simax Technologies, Inc. | Apparatus and method for forming a sol-gel monolith utilizing multiple casting |
| US6645378B1 (en) * | 2002-03-05 | 2003-11-11 | Dionex Corporation | Polar silanes and their use on silica supports |
| US20030230524A1 (en) * | 2002-06-18 | 2003-12-18 | Naohiro Soga | Chromatographic chip and method of fabrication thereof |
| JP4362752B2 (ja) * | 2002-09-13 | 2009-11-11 | 直弘 曽我 | 一体型多孔質材料の製造方法 |
-
2004
- 2004-12-20 US US11/018,168 patent/US7439272B2/en active Active
-
2005
- 2005-12-01 JP JP2007546722A patent/JP5288804B2/ja not_active Expired - Fee Related
- 2005-12-01 WO PCT/US2005/043429 patent/WO2006068797A1/en not_active Ceased
- 2005-12-01 CA CA2590779A patent/CA2590779C/en not_active Expired - Fee Related
- 2005-12-01 EP EP05852613A patent/EP1827679A1/en not_active Withdrawn
- 2005-12-01 AU AU2005319513A patent/AU2005319513B2/en not_active Ceased
- 2005-12-12 TW TW094143805A patent/TWI315997B/zh not_active IP Right Cessation
-
2008
- 2008-09-11 US US12/209,061 patent/US7595350B2/en not_active Expired - Lifetime
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