JP2008525309A5 - - Google Patents

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Publication number
JP2008525309A5
JP2008525309A5 JP2007549589A JP2007549589A JP2008525309A5 JP 2008525309 A5 JP2008525309 A5 JP 2008525309A5 JP 2007549589 A JP2007549589 A JP 2007549589A JP 2007549589 A JP2007549589 A JP 2007549589A JP 2008525309 A5 JP2008525309 A5 JP 2008525309A5
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JP
Japan
Prior art keywords
preform
ppm
concentration
less
silica
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2007549589A
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English (en)
Japanese (ja)
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JP2008525309A (ja
JP5202959B2 (ja
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Publication date
Priority claimed from US11/148,764 external-priority patent/US7506522B2/en
Application filed filed Critical
Publication of JP2008525309A publication Critical patent/JP2008525309A/ja
Publication of JP2008525309A5 publication Critical patent/JP2008525309A5/ja
Application granted granted Critical
Publication of JP5202959B2 publication Critical patent/JP5202959B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2007549589A 2004-12-29 2005-12-28 高屈折率均一性溶融シリカガラスおよびその製造方法 Expired - Fee Related JP5202959B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US64073204P 2004-12-29 2004-12-29
US60/640,732 2004-12-29
US11/148,764 2005-06-08
US11/148,764 US7506522B2 (en) 2004-12-29 2005-06-08 High refractive index homogeneity fused silica glass and method of making same
PCT/US2005/047257 WO2006071936A2 (en) 2004-12-29 2005-12-28 High refractive index homogeneity fused silica glass and method of making same

Publications (3)

Publication Number Publication Date
JP2008525309A JP2008525309A (ja) 2008-07-17
JP2008525309A5 true JP2008525309A5 (https=) 2008-12-11
JP5202959B2 JP5202959B2 (ja) 2013-06-05

Family

ID=36367617

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007549589A Expired - Fee Related JP5202959B2 (ja) 2004-12-29 2005-12-28 高屈折率均一性溶融シリカガラスおよびその製造方法

Country Status (5)

Country Link
US (1) US7506522B2 (https=)
JP (1) JP5202959B2 (https=)
DE (1) DE112005003308B4 (https=)
TW (1) TWI308557B (https=)
WO (1) WO2006071936A2 (https=)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004009557B3 (de) * 2004-02-25 2005-04-21 Autoflug Gmbh Land-, Luft- oder Seefahrzeug mit einem Transportraum zur Aufnahme von Gütern und/oder von der Personenbeförderung dienenden, am Fahrzeug gehalterten Sitzen
US7506521B2 (en) * 2004-12-29 2009-03-24 Corning Incorporated High transmission synthetic silica glass and method of making same
JP5091128B2 (ja) * 2005-06-21 2012-12-05 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ用の投影レンズおよびそのための端部素子
US20070049482A1 (en) * 2005-08-11 2007-03-01 Shin-Etsu Chemical Co., Ltd. Synthetic quartz glass substrate for excimer lasers and making method
US20070059533A1 (en) * 2005-09-12 2007-03-15 Burdette Steven R Thermal reflow of glass and fused silica body
US20070105703A1 (en) * 2005-11-07 2007-05-10 Bookbinder Dana C Deuteroxyle-doped silica glass, optical member and lithographic system comprising same and method of making same
US7635658B2 (en) * 2005-11-07 2009-12-22 Corning Inc Deuteroxyl-doped silica glass, optical member and lithographic system comprising same and method of making same
WO2007086617A1 (en) * 2006-01-30 2007-08-02 Asahi Glass Co., Ltd. Synthetic quartz glass with fast axes of birefringence distributed in concentric-circle tangent directions and process for producing the same
US7964522B2 (en) * 2006-08-31 2011-06-21 Corning Incorporated F-doped silica glass and process of making same
JP5365826B2 (ja) * 2007-02-01 2013-12-11 ウシオ電機株式会社 放電ランプ
US20080268201A1 (en) * 2007-04-27 2008-10-30 Richard Michael Fiacco Low OH glass for infrared applications
EP2158170A2 (en) * 2007-05-09 2010-03-03 Corning Incorporated Glasses having low oh, od levels
US8062986B2 (en) * 2007-07-27 2011-11-22 Corning Incorporated Fused silica having low OH, OD levels and method of making
KR100989125B1 (ko) * 2008-07-16 2010-10-20 삼성모바일디스플레이주식회사 원장기판 절단 장치 및 이에 의하여 절단된 유기발광표시장치
US8328417B2 (en) 2009-08-20 2012-12-11 Corning Incorporated Photoelastic method for absolute determination of zero CTE crossover in low expansion silica-titania glass samples
US8596094B2 (en) * 2009-10-21 2013-12-03 Corning Incorporated Synthetic silica glass with uniform fictive temperature
JP5476982B2 (ja) * 2009-12-25 2014-04-23 信越化学工業株式会社 チタニアドープ石英ガラスの選定方法
KR101273801B1 (ko) 2011-10-17 2013-06-11 에쓰이에이치에프코리아 (주) 구부림 손실 강화 광섬유
DE102011119374A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
DE102011119341A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas nach der Sootmethode
DE102011119339A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas
DE102011119373A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
JP5935765B2 (ja) * 2012-07-10 2016-06-15 信越化学工業株式会社 ナノインプリントモールド用合成石英ガラス、その製造方法、及びナノインプリント用モールド
JP6241276B2 (ja) * 2013-01-22 2017-12-06 信越化学工業株式会社 Ｅｕｖリソグラフィ用部材の製造方法
DE102013101328B3 (de) * 2013-02-11 2014-02-13 Heraeus Quarzglas Gmbh & Co. Kg Rohling aus TiO2-SiO2-Glas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie sowie Verfahren für dessen Herstellung
RU2527359C1 (ru) * 2013-04-09 2014-08-27 ФГБОУ ВПО "Уральский государственный горный университет" Способ контроля оптической однородности расплава стекла
US9382151B2 (en) 2014-01-31 2016-07-05 Corning Incorporated Low expansion silica-titania articles with a Tzc gradient by compositional variation
TW201802046A (zh) * 2016-03-24 2018-01-16 康寧公司 用於形成高純度、低粗糙度、低翹曲的二氧化矽玻璃的雷射燒結系統和方法
US10893577B2 (en) * 2016-09-19 2021-01-12 Corning Incorporated Millimeter wave heating of soot preform
EP3516435B1 (en) * 2016-09-21 2022-04-27 Corning Incorporated Optical fibers having a varying clad index and methods of forming same
DE102016012003A1 (de) 2016-10-06 2018-04-12 Karlsruher Institut für Technologie Zusammensetzung und Verfahren zur Herstellung eines Formkörpers aus hochreinem, transparentem Quarzglas mittels additiver Fertigung
CN115181502B (zh) 2016-12-21 2023-09-22 康宁股份有限公司 烧结系统和烧结制品
JP2020012933A (ja) * 2018-07-17 2020-01-23 住友電気工業株式会社 光ファイバ
DE102019115928B4 (de) * 2019-06-12 2023-07-27 J-Fiber Gmbh Quarzfaser mit Wasserstoff-Barriereschicht und Verfahren zu deren Herstellung

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0791084B2 (ja) * 1988-09-14 1995-10-04 信越化学工業株式会社 耐紫外線用合成石英ガラスおよびその製造方法
EP0401845B2 (en) * 1989-06-09 2001-04-11 Heraeus Quarzglas GmbH & Co. KG Optical members and blanks of synthetic silica glass and method for their production
US5325230A (en) 1989-06-09 1994-06-28 Shin-Etsu Quartz Products Co., Ltd. Optical members and blanks of synthetic silica glass and method for their production
JPH0627014B2 (ja) * 1989-06-19 1994-04-13 信越石英株式会社 紫外線レーザ用合成シリカガラス光学体及びその製造方法
US5116400A (en) * 1990-09-20 1992-05-26 Corning Incorporated Apparatus for forming a porous glass preform
US5211732A (en) 1990-09-20 1993-05-18 Corning Incorporated Method for forming a porous glass preform
US5410428A (en) * 1990-10-30 1995-04-25 Shin-Etsu Quartz Products Co. Ltd. Optical member made of high-purity and transparent synthetic silica glass and method for production thereof or blank thereof
JPH04367536A (ja) 1991-06-11 1992-12-18 Fujikura Ltd 希土類添加石英の製造方法
JPH06234545A (ja) * 1993-02-10 1994-08-23 Sumitomo Metal Ind Ltd 光透過用合成石英ガラス
US5616159A (en) * 1995-04-14 1997-04-01 Corning Incorporated Method of forming high purity fused silica having high resistance to optical damage
JP3521681B2 (ja) 1996-08-13 2004-04-19 住友電気工業株式会社 光ファイバ母材の製造方法
JP3403317B2 (ja) 1997-05-20 2003-05-06 信越石英株式会社 高出力真空紫外線用合成シリカガラス光学材料およびその製造方法
DE69816758T2 (de) * 1997-05-20 2004-06-03 Heraeus Quarzglas Gmbh & Co. Kg Synthetisches quarzglas zur verwendung in uv-strahlung und verfahren zu seiner herstellung
US6376401B1 (en) 1998-09-07 2002-04-23 Tosoh Corporation Ultraviolet ray-transparent optical glass material and method of producing same
US6499317B1 (en) 1998-10-28 2002-12-31 Asahi Glass Company, Limited Synthetic quartz glass and method for production thereof
JP4240709B2 (ja) * 1998-12-25 2009-03-18 旭硝子株式会社 合成石英ガラスおよびその製造方法
JP4531904B2 (ja) 1999-01-21 2010-08-25 東ソー株式会社 紫外線用光学材料およびその製造方法
JP3730448B2 (ja) * 1999-07-22 2006-01-05 信越化学工業株式会社 多孔質ガラス母材の製造方法と製造装置
DE60019029T2 (de) 1999-07-02 2006-02-16 Shin-Etsu Chemical Co., Ltd. Verfahren und Vorrichtung zum herstellen einer Vorform aus Glas für optische Fasern mittels des Aussenabscheidungsverfahrens
JP3069562B1 (ja) * 1999-10-19 2000-07-24 信越石英株式会社 エキシマレ―ザ及びエキシマランプ用のシリカガラス光学材料及びその製造方法
JP3865039B2 (ja) 2000-08-18 2007-01-10 信越化学工業株式会社 合成石英ガラスの製造方法および合成石英ガラス並びに合成石英ガラス基板
WO2003027033A1 (en) * 2001-09-27 2003-04-03 Corning Incorporated Improved methods and furnaces for fused silica production
JP4054983B2 (ja) * 2001-12-11 2008-03-05 信越化学工業株式会社 合成石英ガラス部材
JP4114039B2 (ja) * 2001-12-11 2008-07-09 信越石英株式会社 合成石英ガラス部材
JP4323319B2 (ja) * 2001-12-21 2009-09-02 コーニング インコーポレイテッド アルミニウムを含有する溶融シリカ

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