JP2008524443A - 分配装置及び該装置の使用方法 - Google Patents
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- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
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Abstract
Description
取り外し可能な頂壁部材によって上端を限られ、底壁部材によって下端を限られて、その中に内部容積を画定する円筒形の閉鎖容器であって、
上記底壁部材が、主床面から下向きに底壁部材の中に延在する槽状の空腔を含む主床面を有し、該槽状の空腔が、その下端を副床面によって限られ、該槽状の空腔の少なくとも一部が底壁部材の中央に配置され、該槽状の空腔の少なくとも一部が底壁部材の中央以外に配置された閉鎖容器と、
頂壁部材の中央に配置された部分を介して容器の上端外部から、概ね垂直下向きに容器の内部容積の中へ、底壁部材の中央に配置された槽状の空腔の部分の下端まで延在し、槽状の空腔の副床面に干渉しない近傍にその下端が配置された温度センサと、
容器の上端外部から、頂壁部材の中央以外に配置された部分を介して、概ね垂直下向きに容器の内部容積の中へ、底壁部材の中央以外に配置された槽状の空腔の部分の下端まで延在し、槽状の空腔の副床面に干渉しない近傍にその下端が配置された液体試薬レベルセンサとを備え、
上記温度センサが、容器内の液体試薬の温度を判定するために槽状の空腔の中に作動的に配置され、上記液体試薬レベルセンサが、容器内の液体試薬のレベルを判定するために槽状の空腔の中に作動的に配置され、上記温度センサと液体試薬レベルセンサとが、槽状の空腔の中で互いに干渉しない近傍に配置され、上記温度センサと液体試薬レベルセンサとが、槽状の空腔の中で液体試薬によって流体連通された気相試薬分配装置に関する。
キャリヤーガス供給入口開口部を有する、頂壁部材の中央以外に配置された部分と、
キャリヤーガスを容器の内部容積の中へ送るために、キャリヤーガス供給入口開口部から上向きに、頂壁部材から外向きに延在するキャリヤーガス供給管であって、その中を通るキャリヤーガスの流れを制御するためのキャリヤーガス流れ制御弁をその中に含むキャリヤーガス供給管と、
気相試薬出口開口部を有する、頂壁部材の中央以外に配置された部分と、
気相試薬出口開口部から上向きに、容器の内部容積からの気相試薬の除去のために頂壁部材から外向きに延在する気相試薬放出管であって、その中を通る気相試薬の流れを制御するための気相試薬流れ制御弁をその中に含む気相試薬放出管とをさらに備える、上述の気相試薬分配装置に関する。
化学蒸着室及び原子層堆積室から選択される成膜室と、
装置を成膜室へ連結する気相試薬放出管と、
成膜室の中に収容され、気相試薬放出管を受けるように配置される加熱可能サセプタと、
成膜室に連結された排出物放出管とをさらに備える上述の気相試薬分配装置にさらに関する。
(a)上述のような気相試薬分配装置を用意するステップと、
(b)環境温度で液体又は固体である試薬を、前記気相試薬分配装置に加えるステップと、
(c)前記気相試薬分配装置内の試薬を、試薬を気化させて気相試薬をもたらすのに十分である温度まで加熱するステップと、
(d)キャリヤーガスを前記気相試薬分配装置の中へ供給するステップと、
(e)気相試薬及びキャリヤーガスを、気相試薬放出管を介して前記気相試薬分配装置から除去するステップと、
(f)気相試薬及びキャリヤーガスを前記成膜室へ供給するステップとを含む。
(g)気相試薬を、成膜室内で、加熱可能サセプタ上の基板に接触させるステップと、
(h)残ったすべての排出物を、成膜室に連結された排出物放出管を介して排出するステップとを含む、気相試薬を成膜室へ送る上述の方法にさらに関する。
環境温度で固体:テトラキスジメチルアミノハフニウム(Tetrakis Dimethyl Amino Hafnium)(TDMAH)は約29℃で融解する。適切な送出温度は、約40〜100℃になる。キャリヤーガスは、ヘリウム、窒素、又はアルゴンなどの任意の不活性ガスであってよい。ガスの圧力は、数torrから数psiの間であってよい。
環境温度で液体:テトラキスジエチルアミノハフニウム(Tetrakis Diethyl Amino Hafnium)(TDEAH)は液体であるにもかかわらず低い気化圧力を有する。適切な送出温度は、約80〜120℃の間になる。キャリヤーガスは、ヘリウム、窒素、又はアルゴンなどの任意の不活性ガスであってよい。ガスの圧力は、数torrから数psiの間であってよい。
Claims (20)
- 気相試薬分配装置であって、
取り外し可能な頂壁部材によって上端を限られ、底壁部材によって下端を限られて、内部容積を中に画定した円筒形の閉鎖容器において、
前記底壁部材が主床面から下向きに前記底壁部材の中に延在する槽状の空腔を含む前記主床面を有し、前記槽状の空腔が、その下端を副床面によって限られ、前記槽状の空腔の少なくとも一部が、前記底壁部材の中央に配置され、前記槽状の空腔の少なくとも一部が、前記底壁部材の中央以外に配置された閉鎖容器と、
前記頂壁部材の中央に配置された部分を介して前記容器の上端外部から、概ね垂直下向きに前記容器の前記内部容積の中へ、前記底壁部材の中央に配置された前記槽状の空腔の部分の下端まで延在し、前記槽状の空腔の前記副床面に干渉しない近傍に下端が配置された温度センサと、
前記容器の上端外部から、前記頂壁部材の中央以外に配置された部分を介して、概ね垂直下向きに前記容器の前記内部容積の中へ、前記底壁部材の中央以外に配置された槽状の空腔の部分の下端まで延在し、前記槽状の空腔の前記副床面に干渉しない近傍に下端が配置された液体試薬レベルセンサとを備え、
前記温度センサが、前記容器内の液体試薬の温度を判定するために前記槽状の空腔の中に作動的に配置され、前記液体試薬レベルセンサが、前記容器内の液体試薬のレベルを判定するために前記槽状の空腔の中に作動的に配置され、前記温度センサと前記液体試薬レベルセンサとが、前記槽状の空腔の中で互いに干渉しない近傍に配置され、前記温度センサと前記液体試薬レベルセンサとが、前記槽状の空腔の中で液体試薬によって流体連通した気相試薬分配装置。 - キャリヤーガス供給入口開口部を有する、前記頂壁部材の中央以外に配置された部分と、
キャリヤーガスを前記容器の前記内部容積の中へ送るために、前記キャリヤーガス供給入口開口部から上向きに、前記頂壁部材から外向きに延在するキャリヤーガス供給管であって、中を通るキャリヤーガスの流れを制御するためのキャリヤーガス流れ制御弁を中に含むキャリヤーガス供給管と、
気相試薬出口開口部を有する、前記頂壁部材の中央以外に配置された部分と、
前記気相試薬出口開口部から上向きに、前記容器の前記内部容積からの気相試薬の除去のために前記頂壁部材から外向きに延在する気相試薬放出管であって、中を通る前記気相試薬の流れを制御するための気相試薬流れ制御弁を中に含む気相試薬放出管とをさらに備える請求項1に記載の気相試薬分配装置。 - 気相送出堆積システムに気相試薬によって流体連通する前記気相試薬放出管をさらに備え、前記堆積システムが化学蒸着システム及び原子層堆積システムから選択される請求項1に記載の気相試薬分配装置。
- 前記槽状の空腔が、前記底壁部材の面積のうちの少ない部分を含む請求項1に記載の気相試薬分配装置。
- 前記槽状の空腔が、前記底床部材の表面積の20%より少ない面積を占める請求項1に記載の気相試薬分配装置。
- 前記槽状の空腔が、底床部材面の平面図では亜鈴形を有する請求項1に記載の気相試薬分配装置。
- 前記槽状の空腔が、互いに流体連通した2つの横方向に離間した穴を備え、前記穴の一方が中に配設された前記温度センサの下端を有し、前記穴の他方が中に配設された前記液体試薬レベルセンサの下端を有する請求項1に記載の気相試薬分配装置。
- 液体試薬が前記閉鎖容器に収容されているとき、液体試薬の少なくとも95%を使用できるように、前記液体試薬レベルセンサの下端が、前記槽状の空腔の前記副床面に十分近接している請求項1に記載の気相試薬分配装置。
- 前記液体試薬レベルセンサが、超音波センサ、光学センサ、及びフロート式センサからなる群から選択され、前記温度センサが、サーモウエル及び熱電対を備える請求項1に記載の気相試薬分配装置。
- 前記気相試薬が、ルテニウム、ハフニウム、タンタル、モリブデン、プラチナ、金、チタン、鉛、パラジウム、ジルコニウム、ビスマス、ストロンチウム、バリウム、カルシウム、アンチモン、及びタリウムからなる群から選択される金属のための前駆体を含む請求項1に記載の気相試薬分配装置。
- 液体試薬レベルセンサ用の穴が、温度センサ用の穴と連結通路によって連結され、それによって、亜鈴形の形状の前記槽状の空腔を画定する請求項7に記載の気相試薬分配装置。
- 前記槽状の空腔が、少なくとも部分的に傾斜した壁面によって画定される請求項1に記載の気相試薬分配装置。
- 前記キャリヤーガス供給管に連結されたキャリヤーガス源をさらに備える請求項2に記載の気相試薬分配装置。
- 前記キャリヤーガス源が、高圧ガスシリンダ、深冷空気分離設備及び圧力変動空気分離装置からなる群から選択される請求項13に記載の気相試薬分配装置。
- 気相試薬が、前記気相試薬放出管を介して、加熱可能サセプタ上の基板と接触するように成膜室へ流れ、残ったすべての排出物が排出物放出管を介して排出されるように、
化学蒸着室及び原子層堆積室から選択される成膜室と、
前記装置を前記成膜室へ連結する前記気相試薬放出管と、
前記成膜室の中に収容され、前記気相試薬放出管を受けるように配置される前記加熱可能サセプタと、
前記成膜室に連結された前記排出物放出管とをさらに備える請求項2に記載の気相試薬分配装置。 - 気相試薬を成膜室へ送る方法であって、
(a)請求項2に従った気相試薬分配装置を用意するステップと、
(b)環境温度で液体又は固体である試薬を、前記気相試薬分配装置に加えるステップと、
(c)前記気相試薬分配装置内の前記試薬を、前記試薬を気化させて気相試薬をもたらすのに十分である温度まで加熱するステップと、
(d)キャリヤーガスを前記気相試薬分配装置の中へ供給するステップと、
(e)前記気相試薬及びキャリヤーガスを、気相試薬放出管を介して前記気相試薬分配装置から除去するステップと、
(f)前記気相試薬及びキャリヤーガスを前記成膜室へ供給するステップとを含む方法。 - (g)前記気相試薬を、前記成膜室内で加熱可能サセプタ上の基板に接触させるステップと、
(h)残ったすべての排出物を、前記成膜室に連結された排出物放出管を介して排出するステップとをさらに含む、請求項16に記載の方法。 - 前記成膜室が、化学蒸着室及び原子層堆積室から選択される請求項16に記載の方法。
- 前記基板が、金属、金属シリサイド、半導体、絶縁体、及びバリア材料からなる群から選択される材料からなる請求項17に記載の方法。
- 前記基板がパターン付きウエハである請求項17に記載の方法。
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Also Published As
Publication number | Publication date |
---|---|
EP1839253A2 (en) | 2007-10-03 |
TWI408250B (zh) | 2013-09-11 |
SG161287A1 (en) | 2010-05-27 |
KR20070097038A (ko) | 2007-10-02 |
TW200624596A (en) | 2006-07-16 |
IL183971A0 (en) | 2007-10-31 |
CN101124605B (zh) | 2011-09-14 |
WO2006065627A3 (en) | 2006-10-26 |
KR20130018958A (ko) | 2013-02-25 |
WO2006065627A2 (en) | 2006-06-22 |
CN101124605A (zh) | 2008-02-13 |
US20060133955A1 (en) | 2006-06-22 |
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