JP2008516889A5 - - Google Patents
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- Publication number
- JP2008516889A5 JP2008516889A5 JP2007538024A JP2007538024A JP2008516889A5 JP 2008516889 A5 JP2008516889 A5 JP 2008516889A5 JP 2007538024 A JP2007538024 A JP 2007538024A JP 2007538024 A JP2007538024 A JP 2007538024A JP 2008516889 A5 JP2008516889 A5 JP 2008516889A5
- Authority
- JP
- Japan
- Prior art keywords
- silylamine
- silica particles
- treating agent
- alkyl
- dispersion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 13
- 125000000217 alkyl group Chemical group 0.000 claims 8
- 239000003795 chemical substances by application Substances 0.000 claims 7
- 238000004519 manufacturing process Methods 0.000 claims 7
- 238000000034 method Methods 0.000 claims 7
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 claims 7
- 229910052739 hydrogen Inorganic materials 0.000 claims 6
- 239000001257 hydrogen Substances 0.000 claims 6
- 239000006185 dispersion Substances 0.000 claims 5
- 150000002431 hydrogen Chemical group 0.000 claims 5
- 125000003118 aryl group Chemical group 0.000 claims 4
- 230000002209 hydrophobic effect Effects 0.000 claims 4
- 239000002245 particle Substances 0.000 claims 3
- 239000011541 reaction mixture Substances 0.000 claims 3
- 125000002252 acyl group Chemical group 0.000 claims 2
- 125000003545 alkoxy group Chemical group 0.000 claims 2
- 125000004104 aryloxy group Chemical group 0.000 claims 2
- 239000008119 colloidal silica Substances 0.000 claims 2
- 229910052736 halogen Inorganic materials 0.000 claims 2
- 150000002367 halogens Chemical class 0.000 claims 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical group C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 2
- ITRFWRDOAWGZFV-UHFFFAOYSA-N 3-[[[dimethyl(3,3,3-trifluoropropyl)silyl]amino]-dimethylsilyl]-1,1,1-trifluoropropane Chemical group FC(F)(F)CC[Si](C)(C)N[Si](C)(C)CCC(F)(F)F ITRFWRDOAWGZFV-UHFFFAOYSA-N 0.000 claims 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 1
- 125000003342 alkenyl group Chemical group 0.000 claims 1
- 238000001035 drying Methods 0.000 claims 1
- 229910021485 fumed silica Inorganic materials 0.000 claims 1
- 125000001188 haloalkyl group Chemical group 0.000 claims 1
- 239000003960 organic solvent Substances 0.000 claims 1
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims 1
- 229920002554 vinyl polymer Polymers 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US62058904P | 2004-10-20 | 2004-10-20 | |
| US60/620,589 | 2004-10-20 | ||
| PCT/US2005/037728 WO2006045012A2 (en) | 2004-10-20 | 2005-10-20 | Method of preparing hydrophobic silica directly from an aqueous colloidal silica dispersion |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008516889A JP2008516889A (ja) | 2008-05-22 |
| JP2008516889A5 true JP2008516889A5 (enExample) | 2008-12-11 |
| JP5032328B2 JP5032328B2 (ja) | 2012-09-26 |
Family
ID=36203696
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007538024A Expired - Lifetime JP5032328B2 (ja) | 2004-10-20 | 2005-10-20 | 水性コロイドシリカ分散液からの直接的疎水性シリカの製造法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7811540B2 (enExample) |
| EP (1) | EP1807347B1 (enExample) |
| JP (1) | JP5032328B2 (enExample) |
| WO (1) | WO2006045012A2 (enExample) |
Families Citing this family (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ATE342319T1 (de) | 2003-04-24 | 2006-11-15 | Goldschmidt Gmbh | Verfahren zur herstellung von ablösbaren schmutz- und wasserabweisenden flächigen beschichtungen |
| US7828889B2 (en) * | 2003-12-18 | 2010-11-09 | The Clorox Company | Treatments and kits for creating transparent renewable surface protective coatings |
| US8034173B2 (en) | 2003-12-18 | 2011-10-11 | Evonik Degussa Gmbh | Processing compositions and method of forming the same |
| US8974590B2 (en) * | 2003-12-18 | 2015-03-10 | The Armor All/Stp Products Company | Treatments and kits for creating renewable surface protective coatings |
| KR101302646B1 (ko) * | 2005-07-04 | 2013-09-03 | 닛산 가가쿠 고교 가부시키 가이샤 | 소수성 실리카 분말의 제조방법 |
| EP1801073B1 (de) * | 2005-12-20 | 2011-05-18 | Evonik Degussa GmbH | Pyrogen hergestelltes Siliciumdioxid |
| US8435474B2 (en) * | 2006-09-15 | 2013-05-07 | Cabot Corporation | Surface-treated metal oxide particles |
| US8202502B2 (en) | 2006-09-15 | 2012-06-19 | Cabot Corporation | Method of preparing hydrophobic silica |
| US8455165B2 (en) * | 2006-09-15 | 2013-06-04 | Cabot Corporation | Cyclic-treated metal oxide |
| US20080070146A1 (en) * | 2006-09-15 | 2008-03-20 | Cabot Corporation | Hydrophobic-treated metal oxide |
| JP5194563B2 (ja) * | 2007-05-28 | 2013-05-08 | 信越化学工業株式会社 | 耐擦傷性コーティング組成物、及び被覆物品 |
| EP2025381A1 (de) * | 2007-07-30 | 2009-02-18 | Nanoresins AG | Verfahren zum Entfernen basischer oder saurer Verbindungen aus einer lösungsmittelhaltigen Metalloxiddispersion insbesondere Kieselsäure |
| JP4431605B2 (ja) | 2007-08-09 | 2010-03-17 | シャープ株式会社 | トナーの製造方法、トナー、二成分現像剤、現像装置および画像形成装置 |
| CN101809507B (zh) * | 2007-09-29 | 2012-10-10 | 日本瑞翁株式会社 | 静电图像显影用带正电性调色剂 |
| EP2145929B1 (de) * | 2008-07-18 | 2020-06-24 | Evonik Operations GmbH | Verfahren zur Herstellung redispergierbarer, oberflächenmodifizierter Siliciumdioxidpartikel |
| US20110177446A1 (en) * | 2008-10-01 | 2011-07-21 | Nippon Aerosil Co., Ltd. | Hydrophobic silica microparticles and composition for electrophotographic toner |
| TWI488746B (zh) * | 2009-02-13 | 2015-06-21 | Toyo Aluminium Kk | 層積體及容器 |
| JP5249903B2 (ja) * | 2009-10-22 | 2013-07-31 | 味の素株式会社 | 樹脂組成物 |
| US20110244382A1 (en) | 2010-04-06 | 2011-10-06 | Christopher Alyson M | Hydrophobic silica particles and method of producing same |
| JP5250003B2 (ja) * | 2010-09-13 | 2013-07-31 | 株式会社日立製作所 | 樹脂材料及びこれを用いた高電圧機器 |
| JP5811620B2 (ja) * | 2010-12-13 | 2015-11-11 | 富士ゼロックス株式会社 | シリカ粒子の製造方法 |
| CA2841345C (en) | 2011-07-11 | 2016-03-22 | Cabot Corporation | Oil emulsification and polycyclic aromatic hydrocarbon adsorption using fine particles as dispersants |
| JP2013092748A (ja) | 2011-10-26 | 2013-05-16 | Cabot Corp | 複合体粒子を含むトナー添加剤 |
| WO2013148241A1 (en) | 2012-03-26 | 2013-10-03 | Cabot Corporation | Treated fumed silica |
| US20140120339A1 (en) | 2012-10-31 | 2014-05-01 | Cabot Corporation | Porous carbon monoliths templated by pickering emulsions |
| JP6195524B2 (ja) * | 2014-01-28 | 2017-09-13 | 日揮触媒化成株式会社 | 疎水性シリカ粉末およびその製造方法 |
| WO2016013673A1 (ja) * | 2014-07-24 | 2016-01-28 | 電気化学工業株式会社 | シリカ微粉末及びその用途 |
| JP6507655B2 (ja) * | 2015-01-14 | 2019-05-08 | リコーイメージング株式会社 | 多孔質膜用塗工液及びその製造方法 |
| WO2017058492A1 (en) | 2015-09-29 | 2017-04-06 | Cabot Specialty Fluids, Inc. | Low solids oil based well fluid with particle-stabilized emulsion |
| CN108314053B (zh) * | 2016-07-20 | 2020-01-03 | 福建远翔新材料股份有限公司 | 一种疏水改性超级绝热材料用二氧化硅的制备方法 |
| US11091631B2 (en) | 2016-11-04 | 2021-08-17 | Cabot Corporation | Nanocomposites containing crystalline polyester and organosilica |
| ES2994255T3 (en) * | 2017-01-24 | 2025-01-21 | Smarterials Tech Gmbh | Damage-resistant gloves with breach-indicator function |
| JP6968632B2 (ja) * | 2017-09-07 | 2021-11-17 | 扶桑化学工業株式会社 | 疎水性シリカ粉末 |
| CN111655802B (zh) * | 2018-01-25 | 2023-02-21 | 卡博特公司 | 含水的疏水性二氧化硅分散体 |
| JP7155046B2 (ja) * | 2019-03-06 | 2022-10-18 | 扶桑化学工業株式会社 | 疎水性シリカ粉末及びトナー樹脂粒子 |
| KR102780988B1 (ko) * | 2020-02-04 | 2025-03-17 | 캐보트 코포레이션 | 액체-기반 적층 제조를 위한 조성물 |
| WO2022109346A1 (en) * | 2020-11-22 | 2022-05-27 | Melior Innovations, Inc. | Functionalized silicon oxycarbide additives and pigments, and methods of make the materials |
| CA3253844A1 (en) | 2022-05-27 | 2023-11-30 | Cabot Corp | Aerogel composition for thermal insulation |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2786042A (en) | 1951-11-23 | 1957-03-19 | Du Pont | Process for preparing sols of colloidal particles of reacted amorphous silica and products thereof |
| US3015645A (en) | 1954-10-06 | 1962-01-02 | Dow Corning | Silica powders |
| GB1110331A (en) | 1964-05-06 | 1968-04-18 | Degussa | Process for the production of hydrophobic silica |
| DE1963439A1 (de) | 1969-12-18 | 1971-06-24 | Dynamit Nobel Ag | Verfahren zur Herstellung poroeser Kieselsaeure |
| US3810843A (en) | 1971-05-28 | 1974-05-14 | Gen Electric | Silicone-silica compositions |
| US4208316A (en) | 1978-06-29 | 1980-06-17 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler | Hydrophobic precipitated silicic acid and compositions containing same |
| US4344800A (en) * | 1980-06-03 | 1982-08-17 | Dow Corning Corporation | Method for producing hydrophobic reinforcing silica fillers and fillers obtained thereby |
| JPS5778549A (en) | 1980-11-04 | 1982-05-17 | Canon Inc | Developer for electrophotography |
| FR2613708B1 (fr) * | 1987-04-13 | 1990-10-12 | Rhone Poulenc Chimie | Silice de precipitation hydrophobe, son procede de preparation et son application au renforcement des elastomeres silicones |
| US5226930A (en) * | 1988-06-03 | 1993-07-13 | Monsanto Japan, Ltd. | Method for preventing agglomeration of colloidal silica and silicon wafer polishing composition using the same |
| JP2646150B2 (ja) | 1990-08-27 | 1997-08-25 | 出光興産 株式会社 | 撥水性シリカゾルおよびその製造方法 |
| JP3318997B2 (ja) * | 1993-02-03 | 2002-08-26 | 三菱マテリアル株式会社 | 疎水性シリカ粉体、その製法および電子写真用現像剤 |
| DE19500674A1 (de) | 1995-01-12 | 1996-07-18 | Degussa | Oberflächenmodifizierte pyrogen hergestellte Mischoxide, Verfahren zu ihrer Herstellung und Verwendung |
| US5989768A (en) | 1997-03-06 | 1999-11-23 | Cabot Corporation | Charge-modified metal oxides with cyclic silazane and electrostatographic systems incorporating same |
| US5908660A (en) * | 1997-09-03 | 1999-06-01 | Dow Corning Corporation | Method of preparing hydrophobic precipitated silica |
| DE19756831A1 (de) * | 1997-12-19 | 1999-07-01 | Wacker Chemie Gmbh | Siliciumdioxid, das an seiner Oberfläche teil- oder vollständig silylierte Polykieselsäureketten trägt |
| US5919298A (en) * | 1998-01-12 | 1999-07-06 | Dow Corning Corporation | Method for preparing hydrophobic fumed silica |
| US6051672A (en) * | 1998-08-24 | 2000-04-18 | Dow Corning Corporation | Method for making hydrophobic non-aggregated colloidal silica |
| DE19857912A1 (de) | 1998-12-16 | 2000-07-06 | Degussa | Toner und/oder Toner-Mischungen |
| US6174926B1 (en) | 1999-01-13 | 2001-01-16 | Cabot Corporation | Method of preparing organically modified silica |
| WO2001012731A1 (en) * | 1999-08-19 | 2001-02-22 | Ppg Industries Ohio, Inc. | Hydrophobic particulate inorganic oxides and polymeric compositions containing same |
| JP4076681B2 (ja) | 1999-08-24 | 2008-04-16 | 富士ゼロックス株式会社 | 静電潜像現像用トナーの製造方法 |
| JP4046921B2 (ja) * | 2000-02-24 | 2008-02-13 | 触媒化成工業株式会社 | シリカ系微粒子、該微粒子分散液の製造方法、および被膜付基材 |
| US6203960B1 (en) | 2000-08-22 | 2001-03-20 | Xerox Corporation | Toner compositions |
| JP4390994B2 (ja) | 2000-09-27 | 2009-12-24 | 富士ゼロックス株式会社 | 静電荷像現像用トナー、それを用いた画像形成方法及び画像形成装置 |
| US6861115B2 (en) | 2001-05-18 | 2005-03-01 | Cabot Corporation | Ink jet recording medium comprising amine-treated silica |
| AU2003265192A1 (en) * | 2002-10-14 | 2004-05-04 | Akzo Nobel N.V. | Aqueous silica dispersion |
| JP2004168559A (ja) * | 2002-11-15 | 2004-06-17 | Nippon Aerosil Co Ltd | 高分散高疎水性シリカ粉末とその製造方法 |
-
2005
- 2005-10-20 US US11/254,440 patent/US7811540B2/en active Active
- 2005-10-20 EP EP05813927.0A patent/EP1807347B1/en not_active Expired - Lifetime
- 2005-10-20 JP JP2007538024A patent/JP5032328B2/ja not_active Expired - Lifetime
- 2005-10-20 WO PCT/US2005/037728 patent/WO2006045012A2/en not_active Ceased
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