JP5032328B2 - 水性コロイドシリカ分散液からの直接的疎水性シリカの製造法 - Google Patents

水性コロイドシリカ分散液からの直接的疎水性シリカの製造法 Download PDF

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Publication number
JP5032328B2
JP5032328B2 JP2007538024A JP2007538024A JP5032328B2 JP 5032328 B2 JP5032328 B2 JP 5032328B2 JP 2007538024 A JP2007538024 A JP 2007538024A JP 2007538024 A JP2007538024 A JP 2007538024A JP 5032328 B2 JP5032328 B2 JP 5032328B2
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Japan
Prior art keywords
silica particles
dispersion
silylamine
treating agent
silica
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Expired - Lifetime
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JP2007538024A
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Japanese (ja)
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JP2008516889A (ja
JP2008516889A5 (enExample
Inventor
イー． アダムス，カーティス
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Cabot Corp
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Cabot Corp
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Publication of JP2008516889A5 publication Critical patent/JP2008516889A5/ja
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28—Compounds of silicon
    • C09C1/30—Silicic acid
    • C09C1/3081—Treatment with organo-silicon compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00—Developers
    • G03G9/08—Developers with toner particles
    • G03G9/097—Plasticisers; Charge controlling agents
    • G03G9/09708—Inorganic compounds
    • G03G9/09716—Inorganic compounds treated with organic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G9/00—Developers
    • G03G9/08—Developers with toner particles
    • G03G9/097—Plasticisers; Charge controlling agents
    • G03G9/09708—Inorganic compounds
    • G03G9/09725—Silicon-oxides; Silicates
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area

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  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Organic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Glanulating (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Developing Agents For Electrophotography (AREA)
JP2007538024A 2004-10-20 2005-10-20 水性コロイドシリカ分散液からの直接的疎水性シリカの製造法 Expired - Lifetime JP5032328B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US62058904P 2004-10-20 2004-10-20
US60/620,589 2004-10-20
PCT/US2005/037728 WO2006045012A2 (en) 2004-10-20 2005-10-20 Method of preparing hydrophobic silica directly from an aqueous colloidal silica dispersion

Publications (3)

Publication Number Publication Date
JP2008516889A JP2008516889A (ja) 2008-05-22
JP2008516889A5 JP2008516889A5 (enExample) 2008-12-11
JP5032328B2 true JP5032328B2 (ja) 2012-09-26

Family

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Family Applications (1)

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JP2007538024A Expired - Lifetime JP5032328B2 (ja) 2004-10-20 2005-10-20 水性コロイドシリカ分散液からの直接的疎水性シリカの製造法

Country Status (4)

Country Link
US (1) US7811540B2 (enExample)
EP (1) EP1807347B1 (enExample)
JP (1) JP5032328B2 (enExample)
WO (1) WO2006045012A2 (enExample)

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US7828889B2 (en) * 2003-12-18 2010-11-09 The Clorox Company Treatments and kits for creating transparent renewable surface protective coatings
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US7186440B2 (en) * 2005-07-04 2007-03-06 Nissan Chemical Industries, Ltd. Process for producing hydrophobic silica powder
ATE509891T1 (de) * 2005-12-20 2011-06-15 Evonik Degussa Gmbh Pyrogen hergestelltes siliciumdioxid
US20080070146A1 (en) 2006-09-15 2008-03-20 Cabot Corporation Hydrophobic-treated metal oxide
US8435474B2 (en) * 2006-09-15 2013-05-07 Cabot Corporation Surface-treated metal oxide particles
US8455165B2 (en) * 2006-09-15 2013-06-04 Cabot Corporation Cyclic-treated metal oxide
US8202502B2 (en) 2006-09-15 2012-06-19 Cabot Corporation Method of preparing hydrophobic silica
JP5194563B2 (ja) * 2007-05-28 2013-05-08 信越化学工業株式会社 耐擦傷性コーティング組成物、及び被覆物品
EP2025381A1 (de) * 2007-07-30 2009-02-18 Nanoresins AG Verfahren zum Entfernen basischer oder saurer Verbindungen aus einer lösungsmittelhaltigen Metalloxiddispersion insbesondere Kieselsäure
JP4431605B2 (ja) * 2007-08-09 2010-03-17 シャープ株式会社 トナーの製造方法、トナー、二成分現像剤、現像装置および画像形成装置
US20100330488A1 (en) * 2007-09-29 2010-12-30 Zeon Corporation Positively-chargeable toner for developing electrostatic images
EP2145929B1 (de) 2008-07-18 2020-06-24 Evonik Operations GmbH Verfahren zur Herstellung redispergierbarer, oberflächenmodifizierter Siliciumdioxidpartikel
WO2010038538A1 (ja) * 2008-10-01 2010-04-08 日本アエロジル株式会社 疎水性シリカ微粒子及び電子写真用トナー組成物
TWI488746B (zh) * 2009-02-13 2015-06-21 Toyo Aluminium Kk 層積體及容器
JP5249903B2 (ja) * 2009-10-22 2013-07-31 味の素株式会社 樹脂組成物
US20110244382A1 (en) * 2010-04-06 2011-10-06 Christopher Alyson M Hydrophobic silica particles and method of producing same
JP5250003B2 (ja) * 2010-09-13 2013-07-31 株式会社日立製作所 樹脂材料及びこれを用いた高電圧機器
JP5811620B2 (ja) 2010-12-13 2015-11-11 富士ゼロックス株式会社 シリカ粒子の製造方法
EP2732002B1 (en) 2011-07-11 2015-07-08 Cabot Corporation Oil emulsification and polycyclic aromatic hydrocarbon adsorption using fine particles as dispersants
JP2013092748A (ja) 2011-10-26 2013-05-16 Cabot Corp 複合体粒子を含むトナー添加剤
US9581922B2 (en) 2012-03-26 2017-02-28 Cabot Corporation Treated fumed silica
US20140120339A1 (en) 2012-10-31 2014-05-01 Cabot Corporation Porous carbon monoliths templated by pickering emulsions
JP6195524B2 (ja) * 2014-01-28 2017-09-13 日揮触媒化成株式会社 疎水性シリカ粉末およびその製造方法
CN106414329B (zh) * 2014-07-24 2020-03-03 电化株式会社 硅石微粉末及其用途
JP6507655B2 (ja) * 2015-01-14 2019-05-08 リコーイメージング株式会社 多孔質膜用塗工液及びその製造方法
BR112018006362A2 (pt) 2015-09-29 2018-10-09 Cabot Specialty Fluids, Inc. fluido de poço com base em óleo de baixo teor de sólidos com emulsão estabilizada por partículas.
CN106185964B (zh) * 2016-07-20 2018-03-06 福建远翔新材料股份有限公司 一种超级绝热材料用二氧化硅的制备方法
CN109906411B (zh) 2016-11-04 2022-12-27 卡博特公司 含结晶聚酯和有机硅的纳米复合物
CA3048374A1 (en) * 2017-01-24 2018-08-02 Smarterials Technology Gmbh Damage-resistant gloves with breach-indicator function
JP6968632B2 (ja) * 2017-09-07 2021-11-17 扶桑化学工業株式会社 疎水性シリカ粉末
US11987501B2 (en) 2018-01-25 2024-05-21 Cabot Corporation Aqueous hydrophobic silica dispersions
JP7155046B2 (ja) 2019-03-06 2022-10-18 扶桑化学工業株式会社 疎水性シリカ粉末及びトナー樹脂粒子
KR102780988B1 (ko) * 2020-02-04 2025-03-17 캐보트 코포레이션 액체-기반 적층 제조를 위한 조성물
US20220162452A1 (en) * 2020-11-22 2022-05-26 Melior Innovations, Inc. Functionalized Silicon Oxycarbide Additives And Pigments, And Methods Of Make The Materials
JP2025522646A (ja) 2022-05-27 2025-07-16 キャボット コーポレイション 断熱用エアロゲル組成物

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Also Published As

Publication number Publication date
EP1807347B1 (en) 2014-01-22
JP2008516889A (ja) 2008-05-22
WO2006045012A2 (en) 2006-04-27
EP1807347A4 (en) 2012-02-22
US20060171872A1 (en) 2006-08-03
US7811540B2 (en) 2010-10-12
WO2006045012A3 (en) 2006-10-26
EP1807347A2 (en) 2007-07-18

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