JP2008507127A5 - - Google Patents
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- Publication number
- JP2008507127A5 JP2008507127A5 JP2007520958A JP2007520958A JP2008507127A5 JP 2008507127 A5 JP2008507127 A5 JP 2008507127A5 JP 2007520958 A JP2007520958 A JP 2007520958A JP 2007520958 A JP2007520958 A JP 2007520958A JP 2008507127 A5 JP2008507127 A5 JP 2008507127A5
- Authority
- JP
- Japan
- Prior art keywords
- region
- channel region
- nanostructure
- source
- drain
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
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- 239000002086 nanomaterial Substances 0.000 claims 13
- 239000003054 catalyst Substances 0.000 claims 6
- 239000002070 nanowire Substances 0.000 claims 6
- 239000012212 insulator Substances 0.000 claims 5
- 239000002184 metal Substances 0.000 claims 4
- 238000000034 method Methods 0.000 claims 4
- 239000002071 nanotube Substances 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 3
- 230000003197 catalytic effect Effects 0.000 claims 2
- 238000000151 deposition Methods 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 230000007704 transition Effects 0.000 claims 2
- 238000005530 etching Methods 0.000 claims 1
- 230000000977 initiatory effect Effects 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB0415891.1A GB0415891D0 (en) | 2004-07-16 | 2004-07-16 | Nanoscale fet |
| PCT/IB2005/052313 WO2006008703A2 (en) | 2004-07-16 | 2005-07-12 | Nanoscale fet |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008507127A JP2008507127A (ja) | 2008-03-06 |
| JP2008507127A5 true JP2008507127A5 (enExample) | 2008-08-28 |
Family
ID=32893646
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007520958A Withdrawn JP2008507127A (ja) | 2004-07-16 | 2005-07-12 | ナノスケールfet |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7838368B2 (enExample) |
| EP (1) | EP1771888B1 (enExample) |
| JP (1) | JP2008507127A (enExample) |
| CN (1) | CN100521237C (enExample) |
| AT (1) | ATE524831T1 (enExample) |
| GB (1) | GB0415891D0 (enExample) |
| WO (1) | WO2006008703A2 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7858918B2 (en) * | 2007-02-05 | 2010-12-28 | Ludwig Lester F | Molecular transistor circuits compatible with carbon nanotube sensors and transducers |
| US7838809B2 (en) | 2007-02-17 | 2010-11-23 | Ludwig Lester F | Nanoelectronic differential amplifiers and related circuits having carbon nanotubes, graphene nanoribbons, or other related materials |
| US8389387B2 (en) * | 2009-01-06 | 2013-03-05 | Brookhaven Science Associates, Llc | Segmented nanowires displaying locally controllable properties |
| US8890115B2 (en) * | 2009-01-06 | 2014-11-18 | Brookhaven Science Associates, Llc | Stable and metastable nanowires displaying locally controllable properties |
| CN104137228A (zh) * | 2011-12-23 | 2014-11-05 | 英特尔公司 | 具有环绕式接触部的纳米线结构 |
| EP2741337B1 (en) * | 2012-12-07 | 2018-04-11 | IMEC vzw | Semiconductor heterostructure field effect transistor and method for making thereof |
| WO2014179340A2 (en) * | 2013-04-29 | 2014-11-06 | The University Of North Carolina At Chapel Hill | Methods and systems for chemically encoding high-resolution shapes in silicon nanowires |
| US9741811B2 (en) | 2014-12-15 | 2017-08-22 | Samsung Electronics Co., Ltd. | Integrated circuit devices including source/drain extension regions and methods of forming the same |
| CN105990413B (zh) * | 2015-02-06 | 2020-11-17 | 联华电子股份有限公司 | 具有纳米线结构的半导体结构与制造方法 |
| CN105789442B (zh) * | 2016-05-23 | 2018-12-18 | 京东方科技集团股份有限公司 | 一种薄膜晶体管、其制作方法及相应装置 |
| US11004985B2 (en) * | 2016-05-30 | 2021-05-11 | Samsung Electronics Co., Ltd. | Semiconductor device having multi-thickness nanowire |
| CN119545838B (zh) * | 2024-11-26 | 2025-09-16 | 北京智芯微电子科技有限公司 | 环栅场效应晶体管及其制备方法、芯片和电子设备 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4112358B2 (ja) | 2000-07-04 | 2008-07-02 | インフィネオン テクノロジーズ アクチエンゲゼルシャフト | 電界効果トランジスタ |
| GB2382718B (en) | 2000-07-18 | 2004-03-24 | Lg Electronics Inc | Field effect transistor using horizontally grown carbon nanotubes |
| JP3859199B2 (ja) * | 2000-07-18 | 2006-12-20 | エルジー エレクトロニクス インコーポレイティド | カーボンナノチューブの水平成長方法及びこれを利用した電界効果トランジスタ |
| KR101008294B1 (ko) * | 2001-03-30 | 2011-01-13 | 더 리전트 오브 더 유니버시티 오브 캘리포니아 | 나노구조체 및 나노와이어의 제조 방법 및 그로부터 제조되는 디바이스 |
| AU2003215840A1 (en) * | 2002-03-28 | 2003-10-13 | Koninklijke Philips Electronics N.V. | Nanowire and electronic device |
| US7115916B2 (en) * | 2002-09-26 | 2006-10-03 | International Business Machines Corporation | System and method for molecular optical emission |
| CN100459181C (zh) * | 2002-11-05 | 2009-02-04 | 皇家飞利浦电子股份有限公司 | 纳米结构、具有这种纳米结构的电子器件和纳米结构的制造方法 |
| US7180107B2 (en) * | 2004-05-25 | 2007-02-20 | International Business Machines Corporation | Method of fabricating a tunneling nanotube field effect transistor |
-
2004
- 2004-07-16 GB GBGB0415891.1A patent/GB0415891D0/en not_active Ceased
-
2005
- 2005-07-12 CN CNB2005800239721A patent/CN100521237C/zh not_active Expired - Fee Related
- 2005-07-12 AT AT05759916T patent/ATE524831T1/de not_active IP Right Cessation
- 2005-07-12 US US11/632,738 patent/US7838368B2/en active Active
- 2005-07-12 EP EP05759916A patent/EP1771888B1/en not_active Expired - Lifetime
- 2005-07-12 JP JP2007520958A patent/JP2008507127A/ja not_active Withdrawn
- 2005-07-12 WO PCT/IB2005/052313 patent/WO2006008703A2/en not_active Ceased
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