ATE524831T1 - Nanoskaliger inp fet - Google Patents

Nanoskaliger inp fet

Info

Publication number
ATE524831T1
ATE524831T1 AT05759916T AT05759916T ATE524831T1 AT E524831 T1 ATE524831 T1 AT E524831T1 AT 05759916 T AT05759916 T AT 05759916T AT 05759916 T AT05759916 T AT 05759916T AT E524831 T1 ATE524831 T1 AT E524831T1
Authority
AT
Austria
Prior art keywords
source
channel region
nanoscale
drain
region
Prior art date
Application number
AT05759916T
Other languages
German (de)
English (en)
Inventor
Radu Surdeanu
Prabhat Agarwal
Abraham Rudolf Balkenende
Erik Bakkers
Original Assignee
Nxp Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nxp Bv filed Critical Nxp Bv
Application granted granted Critical
Publication of ATE524831T1 publication Critical patent/ATE524831T1/de

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/30Devices controlled by electric currents or voltages
    • H10D48/32Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H10D48/36Unipolar devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/117Shapes of semiconductor bodies
    • H10D62/118Nanostructure semiconductor bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/117Shapes of semiconductor bodies
    • H10D62/118Nanostructure semiconductor bodies
    • H10D62/119Nanowire, nanosheet or nanotube semiconductor bodies
    • H10D62/121Nanowire, nanosheet or nanotube semiconductor bodies oriented parallel to substrates
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/85Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00Semiconductor device manufacturing: process
    • Y10S438/962Quantum dots and lines
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/70Nanostructure
    • Y10S977/762Nanowire or quantum wire, i.e. axially elongated structure having two dimensions of 100 nm or less
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/70Nanostructure
    • Y10S977/813Of specified inorganic semiconductor composition, e.g. periodic table group IV-VI compositions
    • Y10S977/815Group III-V based compounds, e.g. AlaGabIncNxPyAsz
    • Y10S977/818III-P based compounds, e.g. AlxGayIn2P
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00Nanotechnology
    • Y10S977/902Specified use of nanostructure
    • Y10S977/932Specified use of nanostructure for electronic or optoelectronic application
    • Y10S977/936Specified use of nanostructure for electronic or optoelectronic application in a transistor or 3-terminal device
    • Y10S977/938Field effect transistors, FETS, with nanowire- or nanotube-channel region

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Thin Film Transistor (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
  • Element Separation (AREA)
AT05759916T 2004-07-16 2005-07-12 Nanoskaliger inp fet ATE524831T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB0415891.1A GB0415891D0 (en) 2004-07-16 2004-07-16 Nanoscale fet
PCT/IB2005/052313 WO2006008703A2 (en) 2004-07-16 2005-07-12 Nanoscale fet

Publications (1)

Publication Number Publication Date
ATE524831T1 true ATE524831T1 (de) 2011-09-15

Family

ID=32893646

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05759916T ATE524831T1 (de) 2004-07-16 2005-07-12 Nanoskaliger inp fet

Country Status (7)

Country Link
US (1) US7838368B2 (enExample)
EP (1) EP1771888B1 (enExample)
JP (1) JP2008507127A (enExample)
CN (1) CN100521237C (enExample)
AT (1) ATE524831T1 (enExample)
GB (1) GB0415891D0 (enExample)
WO (1) WO2006008703A2 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7858918B2 (en) * 2007-02-05 2010-12-28 Ludwig Lester F Molecular transistor circuits compatible with carbon nanotube sensors and transducers
US7838809B2 (en) 2007-02-17 2010-11-23 Ludwig Lester F Nanoelectronic differential amplifiers and related circuits having carbon nanotubes, graphene nanoribbons, or other related materials
US8389387B2 (en) * 2009-01-06 2013-03-05 Brookhaven Science Associates, Llc Segmented nanowires displaying locally controllable properties
US8890115B2 (en) * 2009-01-06 2014-11-18 Brookhaven Science Associates, Llc Stable and metastable nanowires displaying locally controllable properties
CN104137228A (zh) * 2011-12-23 2014-11-05 英特尔公司 具有环绕式接触部的纳米线结构
EP2741337B1 (en) * 2012-12-07 2018-04-11 IMEC vzw Semiconductor heterostructure field effect transistor and method for making thereof
WO2014179340A2 (en) * 2013-04-29 2014-11-06 The University Of North Carolina At Chapel Hill Methods and systems for chemically encoding high-resolution shapes in silicon nanowires
US9741811B2 (en) 2014-12-15 2017-08-22 Samsung Electronics Co., Ltd. Integrated circuit devices including source/drain extension regions and methods of forming the same
CN105990413B (zh) * 2015-02-06 2020-11-17 联华电子股份有限公司 具有纳米线结构的半导体结构与制造方法
CN105789442B (zh) * 2016-05-23 2018-12-18 京东方科技集团股份有限公司 一种薄膜晶体管、其制作方法及相应装置
US11004985B2 (en) * 2016-05-30 2021-05-11 Samsung Electronics Co., Ltd. Semiconductor device having multi-thickness nanowire
CN119545838B (zh) * 2024-11-26 2025-09-16 北京智芯微电子科技有限公司 环栅场效应晶体管及其制备方法、芯片和电子设备

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4112358B2 (ja) 2000-07-04 2008-07-02 インフィネオン テクノロジーズ アクチエンゲゼルシャフト 電界効果トランジスタ
GB2382718B (en) 2000-07-18 2004-03-24 Lg Electronics Inc Field effect transistor using horizontally grown carbon nanotubes
JP3859199B2 (ja) * 2000-07-18 2006-12-20 エルジー エレクトロニクス インコーポレイティド カーボンナノチューブの水平成長方法及びこれを利用した電界効果トランジスタ
KR101008294B1 (ko) * 2001-03-30 2011-01-13 더 리전트 오브 더 유니버시티 오브 캘리포니아 나노구조체 및 나노와이어의 제조 방법 및 그로부터 제조되는 디바이스
AU2003215840A1 (en) * 2002-03-28 2003-10-13 Koninklijke Philips Electronics N.V. Nanowire and electronic device
US7115916B2 (en) * 2002-09-26 2006-10-03 International Business Machines Corporation System and method for molecular optical emission
CN100459181C (zh) * 2002-11-05 2009-02-04 皇家飞利浦电子股份有限公司 纳米结构、具有这种纳米结构的电子器件和纳米结构的制造方法
US7180107B2 (en) * 2004-05-25 2007-02-20 International Business Machines Corporation Method of fabricating a tunneling nanotube field effect transistor

Also Published As

Publication number Publication date
EP1771888A2 (en) 2007-04-11
US7838368B2 (en) 2010-11-23
EP1771888B1 (en) 2011-09-14
WO2006008703A2 (en) 2006-01-26
JP2008507127A (ja) 2008-03-06
US20070262397A1 (en) 2007-11-15
WO2006008703A3 (en) 2006-06-22
CN1985378A (zh) 2007-06-20
GB0415891D0 (en) 2004-08-18
CN100521237C (zh) 2009-07-29

Similar Documents

Publication Publication Date Title
ATE524831T1 (de) Nanoskaliger inp fet
DE602006013456D1 (de) Transistor mit verbessertem spitzenprofil und herstellungsverfahren dafür
TW200504359A (en) Single-electron transistor, field-effect transistor, sensor, method for producing sensor, and sensing method
ATE529894T1 (de) Nanodraht-tunneltransistor
TW200633212A (en) Semiconductor device including field-effect transistor
Yadav et al. Impactful study of dual work function, underlap and hetero gate dielectric on TFET with different drain doping profile for high frequency performance estimation and optimization
EP2367205A3 (en) Vertical junction field effect transistors and methods of producing the same
WO2009018395A3 (en) Self-aligned t-gate carbon nanotube field effect transistor devices and method for forming the same
TW200501420A (en) Double-gate transistor with enhanced carrier mobility
TW200644240A (en) Self-aligned process for nanotube/nanowire FETs
WO2003081687A3 (en) Self-aligned nanotube field effect transistor and method of fabricating same
WO2005053032A3 (en) Trench insulated gate field effect transistor
TW200711001A (en) Semiconductor device having a round-shaped nano-wire transistor channel and method of manufacturing same
DE602006017834D1 (de) Fet-transistornetzwerk auf basis von halbleitenden nanoröhrchen oder nanodrähten und entsprechende e
WO2009055173A3 (en) Floating body field-effect transistors, and methods of forming floating body field-effect transistors
EP1411554A4 (en) FIELD EFFECT TRANSISTOR COMPRISING A CHANNEL CONSISTING OF CARBON NANOTUBES
GB2522826A (en) Expitaxial film on nanoscale structure
EP1555688A3 (en) A multi-sided-channel finfet transistor and manufacturing method
Garg et al. Improving the scalability of SOI-based tunnel FETs using ground plane in buried oxide
GB2453495A (en) A transistor having a strained channel region including a performance enhancing material composition
SE0800764L (sv) Insulated gate field effect transistor in series with a junction field effect transistor
WO2005093841A3 (en) Trench insulated gate field effect transistor
EP1284496A4 (en) JUNCTION FIELD EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING SAME
WO2002078090A3 (en) Field-effect transistor structure and method of manufacture
WO2005053033A3 (en) Trench insulated gate field-effect transistor

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties