JP2008310332A - 液晶表示素子用フォトマスクおよびこれを用いたカラーフィルタの製造方法 - Google Patents

液晶表示素子用フォトマスクおよびこれを用いたカラーフィルタの製造方法 Download PDF

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Publication number
JP2008310332A
JP2008310332A JP2008155662A JP2008155662A JP2008310332A JP 2008310332 A JP2008310332 A JP 2008310332A JP 2008155662 A JP2008155662 A JP 2008155662A JP 2008155662 A JP2008155662 A JP 2008155662A JP 2008310332 A JP2008310332 A JP 2008310332A
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JP
Japan
Prior art keywords
light
color filter
photomask
transmittance
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2008155662A
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English (en)
Japanese (ja)
Inventor
Keon-Woo Lee
健雨 李
Sung-Hyun Kim
星▲ヒュン▼ 金
Keishu Sai
景洙 崔
Hee-Kwan Park
喜▲クワン▼ 朴
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
LG Chem Ltd
Original Assignee
LG Chem Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by LG Chem Ltd filed Critical LG Chem Ltd
Publication of JP2008310332A publication Critical patent/JP2008310332A/ja
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2008155662A 2007-06-14 2008-06-13 液晶表示素子用フォトマスクおよびこれを用いたカラーフィルタの製造方法 Pending JP2008310332A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020070058530A KR20080110148A (ko) 2007-06-14 2007-06-14 액정표시소자용 포토마스크 및 이를 이용한 컬러필터의제조방법

Publications (1)

Publication Number Publication Date
JP2008310332A true JP2008310332A (ja) 2008-12-25

Family

ID=40188336

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008155662A Pending JP2008310332A (ja) 2007-06-14 2008-06-13 液晶表示素子用フォトマスクおよびこれを用いたカラーフィルタの製造方法

Country Status (4)

Country Link
JP (1) JP2008310332A (ko)
KR (1) KR20080110148A (ko)
CN (1) CN101324750A (ko)
TW (1) TW200910000A (ko)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010199331A (ja) * 2009-02-25 2010-09-09 Sharp Corp カラーフィルタおよびその製造方法、固体撮像素子の製造方法、電子情報機器
US8833952B2 (en) 2011-09-23 2014-09-16 Samsung Display Co., Ltd. Display apparatus including recessed color filters
US20160195762A1 (en) * 2013-03-06 2016-07-07 Boe Technology Group Co., Ltd. Mask for forming color filter layer, method for fabricating color filter substrate, and color filter substrate
US11519863B2 (en) 2012-02-21 2022-12-06 Leica Biosystems Nussloch Gmbh Apparatus for checking the coverslipping quality of samples for microscopic examination

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101064756B1 (ko) * 2009-06-19 2011-09-15 엘지이노텍 주식회사 칼라필터 용 포토마스크 및 이의 사용방법
JP5800303B2 (ja) * 2010-07-26 2015-10-28 エルジー・ケム・リミテッド 立体映像表示装置に用いる光学フィルタの製造装置
JP5905272B2 (ja) * 2011-01-27 2016-04-20 住友化学株式会社 光学異方性層の製造方法
TWI440965B (zh) * 2011-09-05 2014-06-11 Au Optronics Corp 光罩、平面顯示面板之導線的製作方法以及平面顯示面板之導線結構
CN202383394U (zh) 2011-11-22 2012-08-15 北京京东方光电科技有限公司 一种阵列基板
CN102830587A (zh) * 2012-09-11 2012-12-19 京东方科技集团股份有限公司 一种掩模板、彩色滤光片、液晶显示设备及制作方法
CN103050379B (zh) * 2012-12-10 2015-03-04 华映视讯（吴江）有限公司 窄间距线路的形成方法
CN103869604B (zh) * 2012-12-10 2017-03-29 中芯国际集成电路制造(上海)有限公司 光罩及其设计方法
US9857687B2 (en) 2013-02-28 2018-01-02 Tokai Shinei Electronics Inidustry Co., Ltd Method of manufacturing substrate and substrate and mask film
JP6361162B2 (ja) * 2013-04-23 2018-07-25 Ａｇｃ株式会社 両面低反射膜付ガラス基板の製造方法
JP6482977B2 (ja) * 2014-11-10 2019-03-13 住友化学株式会社 フレキシブルデバイス用積層フィルム、光学部材、表示部材、前面板、及びフレキシブルデバイス用積層フィルムの製造方法
CN105974728A (zh) * 2016-06-29 2016-09-28 武汉华星光电技术有限公司 光罩及彩膜基板的制作方法
CN106444274A (zh) * 2016-09-05 2017-02-22 深圳市国华光电科技有限公司 一种掩模板、采用其制备下基板的方法和该方法的应用
CN108594512B (zh) * 2018-04-12 2020-11-24 深圳市华星光电技术有限公司 彩膜基板的制作方法
CN112511760B (zh) * 2019-08-26 2022-07-26 北京地平线机器人技术研发有限公司 调整摄像装置的入射光强度的方法和装置、介质和设备
CN110703489A (zh) * 2019-10-17 2020-01-17 深圳市华星光电技术有限公司 掩膜版和显示面板及其制备方法

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0749411A (ja) * 1993-08-06 1995-02-21 Dainippon Printing Co Ltd 階調マスク
JP2003004933A (ja) * 2001-06-21 2003-01-08 Dainippon Printing Co Ltd カラーフィルタの作製方法およびカラーフィルタ
JP2003090998A (ja) * 2001-07-13 2003-03-28 Seiko Epson Corp カラーフィルタ基板及び電気光学装置、カラーフィルタ基板の製造方法及び電気光学装置の製造方法並びに電子機器
JP2003121829A (ja) * 2001-07-13 2003-04-23 Seiko Epson Corp カラーフィルタ基板及び電気光学装置、カラーフィルタ基板の製造方法及び電気光学装置の製造方法並びに電子機器
JP2005091855A (ja) * 2003-09-18 2005-04-07 Dainippon Printing Co Ltd 階調マスクの製造方法
JP2006133785A (ja) * 2004-11-08 2006-05-25 Lg Micron Ltd ハーフトーンマスク及びその製造方法並びにこれにより製造された平板ディスプレイ
JP2007133098A (ja) * 2005-11-09 2007-05-31 Ulvac Seimaku Kk グレートーンマスク及びその製造方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0749411A (ja) * 1993-08-06 1995-02-21 Dainippon Printing Co Ltd 階調マスク
JP2003004933A (ja) * 2001-06-21 2003-01-08 Dainippon Printing Co Ltd カラーフィルタの作製方法およびカラーフィルタ
JP2003090998A (ja) * 2001-07-13 2003-03-28 Seiko Epson Corp カラーフィルタ基板及び電気光学装置、カラーフィルタ基板の製造方法及び電気光学装置の製造方法並びに電子機器
JP2003121829A (ja) * 2001-07-13 2003-04-23 Seiko Epson Corp カラーフィルタ基板及び電気光学装置、カラーフィルタ基板の製造方法及び電気光学装置の製造方法並びに電子機器
JP2005091855A (ja) * 2003-09-18 2005-04-07 Dainippon Printing Co Ltd 階調マスクの製造方法
JP2006133785A (ja) * 2004-11-08 2006-05-25 Lg Micron Ltd ハーフトーンマスク及びその製造方法並びにこれにより製造された平板ディスプレイ
JP2007133098A (ja) * 2005-11-09 2007-05-31 Ulvac Seimaku Kk グレートーンマスク及びその製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010199331A (ja) * 2009-02-25 2010-09-09 Sharp Corp カラーフィルタおよびその製造方法、固体撮像素子の製造方法、電子情報機器
US8833952B2 (en) 2011-09-23 2014-09-16 Samsung Display Co., Ltd. Display apparatus including recessed color filters
US11519863B2 (en) 2012-02-21 2022-12-06 Leica Biosystems Nussloch Gmbh Apparatus for checking the coverslipping quality of samples for microscopic examination
US20160195762A1 (en) * 2013-03-06 2016-07-07 Boe Technology Group Co., Ltd. Mask for forming color filter layer, method for fabricating color filter substrate, and color filter substrate
US9891463B2 (en) * 2013-03-06 2018-02-13 Boe Technology Group Co., Ltd. Mask for forming color filter layer, method for fabricating color filter substrate, and color filter substrate

Also Published As

Publication number Publication date
CN101324750A (zh) 2008-12-17
TW200910000A (en) 2009-03-01
KR20080110148A (ko) 2008-12-18

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