JP2008174782A - 成形用冶工具用硬質皮膜被覆部材および成形用冶工具 - Google Patents
成形用冶工具用硬質皮膜被覆部材および成形用冶工具 Download PDFInfo
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Abstract
【解決手段】Crを含有する鉄基合金基材表面に、Cr1-x Mx (Ba Cb N1-a-b )からなる皮膜層A(膜厚1〜10μm)が形成され、その上にTi1-X-Y CrX AlY LZ (BB CA N1-A-B )からなる皮膜層B(膜厚2〜10μm)が形成されていることを特徴とする成形用冶工具用硬質皮膜被覆部材等。 但し、0≦x≦0.7、0≦a≦0.2、0≦b≦0.5、M:W,V,Mo,Nb,Ti,Alの1種以上、0≦1−X−Y≦0.5、0<X≦0.5、0.4≦Y≦0.7、0≦Z≦0.15、0≦A≦0.5、0≦B≦0.2、L:Si,Yの1種以上である。x、a、b、X、Y、Z、A、B:いずれも原子比である。
【選択図】図1
Description
皮膜層A:
Cr1-x Mx (Ba Cb N1-a-b )からなる皮膜層であって下記の式(1A)〜(3A)を満たす皮膜層。
0≦x≦0.7 --------------------- 式(1A)
0≦a≦0.2 --------------------- 式(2A)
0≦b≦0.5 --------------------- 式(3A)
但し、上記Cr1-x Mx (Ba Cb N1-a-b )において、MはW,V,Mo,Nb,Ti,Alの1種以上であり、上記式(1A)〜(3A)において、xはMの原子比、aはBの原子比、bはCの原子比を示すものである。
皮膜層B:
Ti1-X-Y CrX AlY LZ (BB CA N1-A-B )からなる皮膜層であって下記の式(1B)〜(6B)を満たす皮膜層。
0≦1−X−Y≦0.5 --------------------- 式(1B)
0<X≦0.5 ------------------------- 式(2B)
0.4≦Y≦0.7 --------------------- 式(3B)
0≦Z≦0.15 ----------------------- 式(4B)
0≦A≦0.5 ------------------------- 式(5B)
0≦B≦0.2 ------------------------- 式(6B)
但し、上記Ti1-X-Y CrX AlY LZ (BB CA N1-A-B )において、LはSi,Yの1種以上であり、上記式(1B)〜(6B)において、XはCrの原子比、YはAlの原子比、ZはLの原子比、AはCの原子比、BはBの原子比を示すものである。
0≦1−X−Y≦0.5 --------------------- 式(1C)
0<X≦0.5 ------------------------- 式(2C)
0.5≦Y≦0.6 --------------------- 式(3C)
0.01≦Z≦0.05 ------------------- 式(4C)
Cr1-x Mx (Ba Cb N1-a-b )からなる皮膜層であって下記の式(1A)〜(3A)を満たす皮膜層。
0≦x≦0.7 --------------------- 式(1A)
0≦a≦0.2 --------------------- 式(2A)
0≦b≦0.5 --------------------- 式(3A)
但し、上記Cr1-x Mx (Ba Cb N1-a-b )において、MはW,V,Mo,Nb,Ti,Alの1種以上であり、上記式(1A)〜(3A)において、xはMの原子比、aはBの原子比、bはCの原子比を示すものである。
Ti1-X-Y CrX AlY LZ (BB CA N1-A-B )からなる皮膜層であって下記の式(1B)〜(6B)を満たす皮膜層。
0≦1−X−Y≦0.5 --------------------- 式(1B)
0<X≦0.5 ------------------------- 式(2B)
0.4≦Y≦0.7 --------------------- 式(3B)
0≦Z≦0.15 ----------------------- 式(4B)
0≦A≦0.5 ------------------------- 式(5B)
0≦B≦0.2 ------------------------- 式(6B)
但し、上記Ti1-X-Y CrX AlY LZ (BB CA N1-A-B )において、LはSi,Yの1種以上であり、上記式(1B)〜(6B)において、XはCrの原子比、YはAlの原子比、ZはLの原子比、AはCの原子比、BはBの原子比を示すものである。
複数のアーク蒸発源を有する成膜装置(図1)を用いて表1〜2に示す組成の皮膜を作製した。このとき、基材としては、皮膜の組成、硬度、結晶構造の調査用の皮膜形成の場合には鏡面研磨した超硬合金基板を使用し、高温下での摺動試験用の皮膜形成の場合には SKD11基板(硬度HRC 60)を使用した。いずれの皮膜の形成の場合にも、基板を成膜装置のチャンバー内に導入し、チャンバー内を真空引き(1×10-3Pa以下に排気)した後、基材を約400℃まで加熱し、この後、Arイオンイオンを用いてスパッタクリーニングを実施した。この後、アーク蒸発源による成膜の場合は、φ100mm のターゲットを用い、アーク電流150Aとし、全圧力4PaのN2雰囲気あるいはN2+CH4の混合ガス中にて成膜を実施した。
・装置:ベーンオンディスク型摺動試験装置
・ベーン:SKD 61鋼(HRC 50)
・ディスク:SKD 11鋼(HRC 60)に皮膜形成したもの
・摺動速度:0.2m/秒
・荷重:500N
・摺動距離:2000m
・試験温度:500℃
複数のアーク蒸発源を有する成膜装置(図1)を用いて表3に示す組成の皮膜を作製した。このとき、基材としては、皮膜の組成、硬度、結晶構造の調査用の皮膜形成の場合、鏡面研磨した超硬合金基板を使用し、皮膜の密着性の調査用の皮膜形成の場合、 SKD11基板(硬度HRC 60)を用いた。いずれの皮膜の形成の場合にも、基板を成膜装置のチャンバー内に導入し、チャンバー内を真空引き(1×10-3Pa以下に排気)した後、基材を約400℃まで加熱し、この後、Arイオンイオンを用いてスパッタクリーニングを実施した。この後、アーク蒸発源による成膜の場合は、φ100mm のターゲットを用い、アーク電流150Aとし、全圧力4PaのN2雰囲気あるいはN2+CH4の混合ガス中にて成膜を実施した。
・圧子:ダイヤモンド(先端半径200μmR)
・スクラッチ速度:10mm/分
・荷重増加速度:100N/分
・スクラッチ距離:20mm(0〜200N)
複数のアーク蒸発源を有する成膜装置(図1)を用いて表4に示す組成の皮膜を作製した。このとき、基材としては、皮膜の組成、硬度、結晶構造の調査用の皮膜形成の場合、鏡面研磨した超硬合金基板を使用し、高温下での摺動試験用の皮膜形成の場合、表6に示す各種金属材料を使用した。いずれの皮膜の形成の場合にも、基板を成膜装置のチャンバー内に導入し、チャンバー内を真空引き(1×10-3Pa以下に排気)した後、基材を約400℃まで加熱し、この後、Arイオンイオンを用いてスパッタクリーニングを実施した。この後、アーク蒸発源による成膜の場合は、φ100mm のターゲットを用い、アーク電流150Aとし、全圧力4PaのN2雰囲気あるいはN2+CH4の混合ガス中にて成膜を実施した。
・温度:550℃
・時間:1〜12時間
・雰囲気:窒素―5%Ar
・圧力:100Pa
・プラズマ源:直流DCプラズマ(1500V)
・温度:950℃
・時間:1〜12時間
・雰囲気:Ar―5%メタン
・圧力:100Pa
・プラズマ源:直流DCプラズマ(1500V)
Claims (7)
- Crを含有する鉄基合金基材表面に、下記の皮膜層Aが膜厚1〜10μmで形成され、その上に下記の皮膜層Bが膜厚2〜10μmで形成されていることを特徴とする成形用冶工具用硬質皮膜被覆部材。
皮膜層A:
Cr1-x Mx (Ba Cb N1-a-b )からなる皮膜層であって下記の式(1A)〜(3A)を満たす皮膜層。
0≦x≦0.7 --------------------- 式(1A)
0≦a≦0.2 --------------------- 式(2A)
0≦b≦0.5 --------------------- 式(3A)
但し、上記Cr1-x Mx (Ba Cb N1-a-b )において、MはW,V,Mo,Nb,Ti,Alの1種以上であり、上記式(1A)〜(3A)において、xはMの原子比、aはBの原子比、bはCの原子比を示すものである。
皮膜層B:
Ti1-X-Y CrX AlY LZ (BB CA N1-A-B )からなる皮膜層であって下記の式(1B)〜(6B)を満たす皮膜層。
0≦1−X−Y≦0.5 --------------------- 式(1B)
0<X≦0.5 ------------------------- 式(2B)
0.4≦Y≦0.7 --------------------- 式(3B)
0≦Z≦0.15 ----------------------- 式(4B)
0≦A≦0.5 ------------------------- 式(5B)
0≦B≦0.2 ------------------------- 式(6B)
但し、上記Ti1-X-Y CrX AlY LZ (BB CA N1-A-B )において、LはSi,Yの1種以上であり、上記式(1B)〜(6B)において、XはCrの原子比、YはAlの原子比、ZはLの原子比、AはCの原子比、BはBの原子比を示すものである。 - 前記皮膜層AがCrNからなり、前記皮膜層BがTi1-X-Y CrX AlY LZ Nからなる皮膜層であって下記の式(1C)〜(4C)を満たす皮膜層である請求項1記載の成形用冶工具用硬質皮膜被覆部材。
0≦1−X−Y≦0.5 --------------------- 式(1C)
0<X≦0.5 ------------------------- 式(2C)
0.5≦Y≦0.6 --------------------- 式(3C)
0.01≦Z≦0.05 ------------------- 式(4C) - 前記皮膜層AがCrNからなり、前記皮膜層BがTi1-X-Y CrX AlY SiZ Nからなる皮膜層であって下記の式(1C)〜(4C)を満たす皮膜層である請求項2記載の成形用冶工具用硬質皮膜被覆部材。
0≦1−X−Y≦0.5 --------------------- 式(1C)
0<X≦0.5 ------------------------- 式(2C)
0.5≦Y≦0.6 --------------------- 式(3C)
0.01≦Z≦0.05 ------------------- 式(4C) - 前記皮膜層Aと皮膜層Bの界面に、前記皮膜層Aと同一または異なる一般式で示される皮膜層Cと前記皮膜層Bと同一または異なる一般式で示される皮膜層Dとからなる積層膜が積層周期300nm以下の範囲で、積層膜合計厚み0.1μm以上で形成されている請求項1〜3のいずれかに記載の成形用冶工具用硬質皮膜被覆部材。
- 前記鉄基合金基材がCrを含有する析出炭化物を有し、ロックウエル硬度がHRC50以上の鉄基合金基材である請求項4記載の成形用冶工具用硬質皮膜被覆部材。
- 前記鉄基合金基材の表面に窒化、浸炭あるいは窒化浸炭による拡散層が形成されている請求項5記載の成形用冶工具用硬質皮膜被覆部材。
- 請求項〜6のいずれかに記載の成形用冶工具用硬質皮膜被覆部材を有してなる成形用冶工具。
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JP2007008323A JP4668214B2 (ja) | 2007-01-17 | 2007-01-17 | 成形用金型 |
CN2007101927895A CN101224648B (zh) | 2007-01-17 | 2007-11-20 | 成形用工具用硬质皮膜被覆构件和成形用工具 |
US11/968,453 US8043728B2 (en) | 2007-01-17 | 2008-01-02 | Hard coating film for forming tool and forming tool |
AT08000227T ATE467696T1 (de) | 2007-01-17 | 2008-01-08 | Hartbeschichtung für ein formgebungswerkzeug und formgebungswerkzeug |
ES08000227T ES2343601T3 (es) | 2007-01-17 | 2008-01-08 | Pelicula dura de revestimiento para herramienta de moldeo y herramienta de moldeo. |
DE602008001162T DE602008001162D1 (de) | 2007-01-17 | 2008-01-08 | Hartbeschichtung für ein Formgebungswerkzeug und Formgebungswerkzeug |
EP08000227A EP1947209B1 (en) | 2007-01-17 | 2008-01-08 | Hard coating film for forming tool and forming tool |
PL08000227T PL1947209T3 (pl) | 2007-01-17 | 2008-01-08 | Twarda powlekająca warstewka do narzędzia do kształtowania i narzędzie do kształtowania |
KR1020080004680A KR101000241B1 (ko) | 2007-01-17 | 2008-01-16 | 성형용 치공구용 경질 피막 피복 부재 및 성형용 치공구 |
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WO2012173236A1 (ja) * | 2011-06-17 | 2012-12-20 | 株式会社神戸製鋼所 | 硬質皮膜被覆部材 |
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JP6347566B1 (ja) * | 2017-10-13 | 2018-06-27 | 鋼鈑工業株式会社 | 硬質皮膜、この硬質皮膜が被覆された被覆材、表面処理方法及びアーク放電式イオンプレーティング用ターゲット材 |
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EP1947209A1 (en) | 2008-07-23 |
EP1947209B1 (en) | 2010-05-12 |
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PL1947209T3 (pl) | 2010-10-29 |
CN101224648A (zh) | 2008-07-23 |
ATE467696T1 (de) | 2010-05-15 |
KR101000241B1 (ko) | 2010-12-10 |
US8043728B2 (en) | 2011-10-25 |
CN101224648B (zh) | 2013-02-20 |
ES2343601T3 (es) | 2010-08-04 |
DE602008001162D1 (de) | 2010-06-24 |
JP4668214B2 (ja) | 2011-04-13 |
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