JP2008165984A5 - - Google Patents

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Publication number
JP2008165984A5
JP2008165984A5 JP2006350554A JP2006350554A JP2008165984A5 JP 2008165984 A5 JP2008165984 A5 JP 2008165984A5 JP 2006350554 A JP2006350554 A JP 2006350554A JP 2006350554 A JP2006350554 A JP 2006350554A JP 2008165984 A5 JP2008165984 A5 JP 2008165984A5
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JP
Japan
Prior art keywords
haze
refractive index
less
conductive film
resistance value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006350554A
Other languages
English (en)
Japanese (ja)
Other versions
JP5060781B2 (ja
JP2008165984A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2006350554A external-priority patent/JP5060781B2/ja
Priority to JP2006350554A priority Critical patent/JP5060781B2/ja
Priority to KR1020097014896A priority patent/KR101105641B1/ko
Priority to PCT/JP2007/061473 priority patent/WO2008078422A1/ja
Priority to US12/520,660 priority patent/US20100025638A1/en
Priority to EP07744816.5A priority patent/EP2099037B1/en
Priority to CN200780048125XA priority patent/CN101632138B/zh
Priority to TW096120476A priority patent/TW200827418A/zh
Publication of JP2008165984A publication Critical patent/JP2008165984A/ja
Publication of JP2008165984A5 publication Critical patent/JP2008165984A5/ja
Publication of JP5060781B2 publication Critical patent/JP5060781B2/ja
Application granted granted Critical
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2006350554A 2006-12-26 2006-12-26 透明導電膜形成用組成物、透明導電膜及びディスプレイ Expired - Fee Related JP5060781B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2006350554A JP5060781B2 (ja) 2006-12-26 2006-12-26 透明導電膜形成用組成物、透明導電膜及びディスプレイ
EP07744816.5A EP2099037B1 (en) 2006-12-26 2007-06-06 Composition for formation of transparent conductive film, transparent conductive film, and display
PCT/JP2007/061473 WO2008078422A1 (ja) 2006-12-26 2007-06-06 透明導電膜形成用組成物、透明導電膜及びディスプレイ
US12/520,660 US20100025638A1 (en) 2006-12-26 2007-06-06 Composition for forming transparent electroconductive film, transparent electroconductive film, and display
KR1020097014896A KR101105641B1 (ko) 2006-12-26 2007-06-06 투명 도전막 형성용 조성물, 투명 도전막 및 디스플레이
CN200780048125XA CN101632138B (zh) 2006-12-26 2007-06-06 透明导电膜形成用组合物、透明导电膜和显示器
TW096120476A TW200827418A (en) 2006-12-26 2007-06-07 Composition for forming transparent conductive film, transparent conductive film and display

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006350554A JP5060781B2 (ja) 2006-12-26 2006-12-26 透明導電膜形成用組成物、透明導電膜及びディスプレイ

Publications (3)

Publication Number Publication Date
JP2008165984A JP2008165984A (ja) 2008-07-17
JP2008165984A5 true JP2008165984A5 (enExample) 2009-11-05
JP5060781B2 JP5060781B2 (ja) 2012-10-31

Family

ID=39562217

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006350554A Expired - Fee Related JP5060781B2 (ja) 2006-12-26 2006-12-26 透明導電膜形成用組成物、透明導電膜及びディスプレイ

Country Status (7)

Country Link
US (1) US20100025638A1 (enExample)
EP (1) EP2099037B1 (enExample)
JP (1) JP5060781B2 (enExample)
KR (1) KR101105641B1 (enExample)
CN (1) CN101632138B (enExample)
TW (1) TW200827418A (enExample)
WO (1) WO2008078422A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5077950B2 (ja) * 2008-03-19 2012-11-21 大日本塗料株式会社 分散液、透明導電膜形成用組成物、透明導電膜及びディスプレイ
JP5443878B2 (ja) * 2009-07-27 2014-03-19 パナソニック株式会社 透明導電膜付き基材
JP5443881B2 (ja) * 2009-07-28 2014-03-19 パナソニック株式会社 透明導電膜付き基材
EP2610220A4 (en) * 2010-08-27 2015-08-12 Nissan Chemical Ind Ltd DISPERSION IN A HYDROPHOBIC ORGANIC SOLVENT WITH SURFACE-MODIFIED COLLOIDAL PARTICLES FROM WATER-FREE ZINCANTONONATE, COATING COMPOSITION THEREFOR AND COATED ELEMENT
US9447492B2 (en) * 2011-06-03 2016-09-20 Graham J. Hubbard Conductive anti-reflective films
KR101688173B1 (ko) * 2011-12-26 2016-12-21 코오롱인더스트리 주식회사 플라스틱 기판
JP5326058B2 (ja) * 2012-01-11 2013-10-30 三菱マテリアル株式会社 赤外線カット材、赤外線カット材の分散液、赤外線カット膜形成用組成物、および赤外線カット膜
US10059622B2 (en) 2012-05-07 2018-08-28 Guardian Glass, LLC Anti-reflection glass with tin oxide nanoparticles
JP5949395B2 (ja) * 2012-09-27 2016-07-06 三菱マテリアル株式会社 Ｉｔｏ粉末の製造方法
US10168626B2 (en) 2016-06-17 2019-01-01 Taiwan Semiconductor Manufacturing Company, Ltd. Apparatus and a method of forming a particle shield

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW250618B (enExample) * 1993-01-27 1995-07-01 Mitsui Toatsu Chemicals
JPH06278244A (ja) * 1993-01-29 1994-10-04 Mitsui Toatsu Chem Inc 積層体
US5569412A (en) * 1994-08-18 1996-10-29 E. I. Du Pont De Nemours And Company Tin oxide based conductive powders and coatings
JPH09115334A (ja) * 1995-10-23 1997-05-02 Mitsubishi Materiais Corp 透明導電膜および膜形成用組成物
JPH09124363A (ja) * 1995-10-31 1997-05-13 Mitsubishi Materials Corp Ｉｔｏ焼結体の製造方法
US6013983A (en) * 1995-12-28 2000-01-11 Dai Nippon Printing Co., Ltd. Transparent colored conductive film
JPH11170442A (ja) * 1997-12-17 1999-06-29 Tomoegawa Paper Co Ltd 透明性赤外線カットオフフィルム
JPH11181335A (ja) 1997-12-18 1999-07-06 Dainippon Toryo Co Ltd 光硬化性導電膜形成用組成物
JP2000106044A (ja) * 1998-09-30 2000-04-11 Nitto Denko Corp 透明導電性フィルムの表面抵抗低下方法
JP2001210156A (ja) * 1999-11-17 2001-08-03 Toyo Gosei Kogyo Kk 透明導電性酸化スズ膜形成用塗布溶液及び透明導電性酸化スズ膜の製造方法並びに透明導電性酸化スズ膜
US6949284B2 (en) * 2001-01-15 2005-09-27 Dai Nippon Printing Co., Ltd. Coating composition, it's coating layer, antireflection coating, antireflection film, image display and intermediate product
JP4815707B2 (ja) 2001-07-04 2011-11-16 Ｊｓｒ株式会社 光硬化性組成物、その硬化物及び積層体
JP4033646B2 (ja) * 2001-07-18 2008-01-16 触媒化成工業株式会社 導電性金属酸化物粒子、導電性金属酸化物粒子の製造方法、透明導電性被膜付基材および表示装置
JP4242132B2 (ja) * 2002-09-25 2009-03-18 株式会社クリスタルシステム 透明帯電防止板およびその製造方法
CN1487030A (zh) * 2002-09-30 2004-04-07 江门市江磁电工企业有限公司 一种用于电致发光线的透明水性导电涂料及制造方法
CN1289400C (zh) * 2004-07-13 2006-12-13 武汉大学 掺锑氢氧化锡纳米微粉的制备方法
JP4433300B2 (ja) 2005-01-05 2010-03-17 日本化薬株式会社 感光性樹脂組成物及びその硬化皮膜を有するフィルム
JP5044099B2 (ja) * 2005-02-23 2012-10-10 パナソニック株式会社 反射防止フィルム及びその製造方法
KR101000436B1 (ko) * 2006-06-09 2010-12-13 미쓰비시마테리알덴시카세이가부시키가이샤 투명 도전막 형성용 조성물, 투명 도전막 및 디스플레이

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