JP2008103658A5 - - Google Patents
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- Publication number
- JP2008103658A5 JP2008103658A5 JP2007044999A JP2007044999A JP2008103658A5 JP 2008103658 A5 JP2008103658 A5 JP 2008103658A5 JP 2007044999 A JP2007044999 A JP 2007044999A JP 2007044999 A JP2007044999 A JP 2007044999A JP 2008103658 A5 JP2008103658 A5 JP 2008103658A5
- Authority
- JP
- Japan
- Prior art keywords
- etching
- reaction
- pattern
- manufacturing
- photoresist pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000005530 etching Methods 0.000 claims 14
- 239000006227 byproduct Substances 0.000 claims 10
- 239000010408 film Substances 0.000 claims 9
- 239000000758 substrate Substances 0.000 claims 9
- 229920002120 photoresistant polymer Polymers 0.000 claims 8
- 238000004519 manufacturing process Methods 0.000 claims 7
- 239000010409 thin film Substances 0.000 claims 7
- 239000003795 chemical substances by application Substances 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 2
- 229910052782 aluminium Inorganic materials 0.000 claims 2
- 239000000460 chlorine Substances 0.000 claims 2
- 238000001312 dry etching Methods 0.000 claims 2
- 229910052750 molybdenum Inorganic materials 0.000 claims 2
- 239000011733 molybdenum Substances 0.000 claims 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 1
- 229910052801 chlorine Inorganic materials 0.000 claims 1
- 230000001681 protective effect Effects 0.000 claims 1
- 238000005507 spraying Methods 0.000 claims 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020060101428A KR20080035150A (ko) | 2006-10-18 | 2006-10-18 | 박막 트랜지스터 기판의 제조 방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008103658A JP2008103658A (ja) | 2008-05-01 |
| JP2008103658A5 true JP2008103658A5 (enExample) | 2010-04-08 |
Family
ID=38941885
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007044999A Withdrawn JP2008103658A (ja) | 2006-10-18 | 2007-02-26 | 薄膜トランジスタ基板の製造方法 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20080093334A1 (enExample) |
| EP (1) | EP1914802A2 (enExample) |
| JP (1) | JP2008103658A (enExample) |
| KR (1) | KR20080035150A (enExample) |
| CN (1) | CN101165882A (enExample) |
| TW (1) | TW200820446A (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8202360B2 (en) | 2008-09-02 | 2012-06-19 | National Institute Of Advanced Industrial Science And Technology | Method of producing amorphous aluminum silicate, amorphous aluminum silicate obtained with said method, and adsorbent using the same |
| KR101682078B1 (ko) | 2010-07-30 | 2016-12-05 | 삼성디스플레이 주식회사 | 박막 트랜지스터 표시판의 제조 방법 |
| JP5836846B2 (ja) * | 2011-03-11 | 2015-12-24 | 株式会社半導体エネルギー研究所 | 液晶表示装置の作製方法 |
| KR102030797B1 (ko) * | 2012-03-30 | 2019-11-11 | 삼성디스플레이 주식회사 | 박막 트랜지스터 표시판 제조 방법 |
| CN107895713B (zh) * | 2017-11-30 | 2020-05-05 | 深圳市华星光电半导体显示技术有限公司 | Tft基板制作方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3191745B2 (ja) * | 1997-04-23 | 2001-07-23 | 日本電気株式会社 | 薄膜トランジスタ素子及びその製造方法 |
| US7479205B2 (en) * | 2000-09-22 | 2009-01-20 | Dainippon Screen Mfg. Co., Ltd. | Substrate processing apparatus |
| US8148895B2 (en) * | 2004-10-01 | 2012-04-03 | Semiconductor Energy Laboratory Co., Ltd. | Display device and manufacturing method of the same |
| KR100614323B1 (ko) * | 2004-12-30 | 2006-08-21 | 엘지.필립스 엘시디 주식회사 | 액정표시장치 및 그 제조방법 |
-
2006
- 2006-10-18 KR KR1020060101428A patent/KR20080035150A/ko not_active Withdrawn
-
2007
- 2007-02-26 JP JP2007044999A patent/JP2008103658A/ja not_active Withdrawn
- 2007-08-16 EP EP07016072A patent/EP1914802A2/en not_active Withdrawn
- 2007-08-22 TW TW096131096A patent/TW200820446A/zh unknown
- 2007-10-17 US US11/874,098 patent/US20080093334A1/en not_active Abandoned
- 2007-10-18 CN CNA2007101671041A patent/CN101165882A/zh active Pending
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