JP2008032581A5 - - Google Patents
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- Publication number
- JP2008032581A5 JP2008032581A5 JP2006207342A JP2006207342A JP2008032581A5 JP 2008032581 A5 JP2008032581 A5 JP 2008032581A5 JP 2006207342 A JP2006207342 A JP 2006207342A JP 2006207342 A JP2006207342 A JP 2006207342A JP 2008032581 A5 JP2008032581 A5 JP 2008032581A5
- Authority
- JP
- Japan
- Prior art keywords
- inspection
- surface inspection
- filter process
- inspection apparatus
- digital
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007689 inspection Methods 0.000 claims 65
- 238000000034 method Methods 0.000 claims 32
- 238000006243 chemical reaction Methods 0.000 claims 9
- 238000001914 filtration Methods 0.000 claims 6
- 238000005286 illumination Methods 0.000 claims 6
- 230000007547 defect Effects 0.000 claims 5
- 239000002245 particle Substances 0.000 claims 5
- 238000001514 detection method Methods 0.000 claims 4
- 239000013078 crystal Substances 0.000 claims 2
- 230000001678 irradiating effect Effects 0.000 claims 2
- 238000005070 sampling Methods 0.000 claims 2
- 230000003746 surface roughness Effects 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006207342A JP5319876B2 (ja) | 2006-07-31 | 2006-07-31 | 表面検査装置及び表面検査方法 |
| US11/878,197 US7791721B2 (en) | 2006-07-31 | 2007-07-23 | Surface inspection with variable digital filtering |
| US12/783,318 US20100225907A1 (en) | 2006-07-31 | 2010-05-19 | Surface inspection with variable digital filtering |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006207342A JP5319876B2 (ja) | 2006-07-31 | 2006-07-31 | 表面検査装置及び表面検査方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008032581A JP2008032581A (ja) | 2008-02-14 |
| JP2008032581A5 true JP2008032581A5 (https=) | 2009-02-19 |
| JP5319876B2 JP5319876B2 (ja) | 2013-10-16 |
Family
ID=38987428
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006207342A Expired - Fee Related JP5319876B2 (ja) | 2006-07-31 | 2006-07-31 | 表面検査装置及び表面検査方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US7791721B2 (https=) |
| JP (1) | JP5319876B2 (https=) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8411922B2 (en) * | 2007-11-30 | 2013-04-02 | University Of Washington | Reducing noise in images acquired with a scanning beam device |
| JP5256003B2 (ja) * | 2008-11-26 | 2013-08-07 | 株式会社日立ハイテクノロジーズ | 光学式検査装置および光学式検査方法 |
| JP5213765B2 (ja) | 2009-03-06 | 2013-06-19 | 株式会社日立ハイテクノロジーズ | 表面検査装置及び表面検査方法 |
| JP5564807B2 (ja) * | 2009-03-12 | 2014-08-06 | 株式会社日立ハイテクノロジーズ | 欠陥検査装置及び欠陥検査方法 |
| JP2010236968A (ja) * | 2009-03-31 | 2010-10-21 | Hitachi High-Technologies Corp | 検査方法及び検査装置 |
| JP5295160B2 (ja) * | 2010-03-30 | 2013-09-18 | 株式会社日立ハイテクノロジーズ | 表面検査装置及び表面検査方法 |
| US9696265B2 (en) * | 2014-11-04 | 2017-07-04 | Exnodes Inc. | Computational wafer inspection filter design |
| FR3045156B1 (fr) * | 2015-12-11 | 2017-12-22 | Soitec Silicon On Insulator | Procede de detection de defauts et dispositif associe |
| CN106248688B (zh) * | 2016-08-30 | 2019-04-16 | 中国科学院嘉兴微电子仪器与设备工程中心 | 一种基于fpga的晶圆检测信号提取方法 |
| CN106226324B (zh) * | 2016-08-30 | 2019-04-16 | 中国科学院嘉兴微电子仪器与设备工程中心 | 一种基于fpga的晶圆检测信号提取装置及系统 |
| US10466176B2 (en) * | 2017-05-01 | 2019-11-05 | Bae Systems Information And Electronic Systems Integration Inc. | System and method for detecting contaminants on a circuit |
| US11067784B2 (en) | 2017-05-01 | 2021-07-20 | Bae Systems Information And Electronic Systems Integration Inc. | System and techniques for detecting fluorescing particles on a target |
| US20220011568A1 (en) * | 2020-07-10 | 2022-01-13 | Toshiba Tec Kabushiki Kaisha | Scanning light measuring apparatus |
| WO2025013238A1 (ja) * | 2023-07-12 | 2025-01-16 | 株式会社日立ハイテク | 欠陥検査装置及び欠陥検査方法 |
| CN118969684B (zh) * | 2024-10-15 | 2024-12-27 | 江苏永鼎股份有限公司 | 基于多维检测反馈的外延前晶圆表面处理动态优化系统 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63143830A (ja) | 1986-12-08 | 1988-06-16 | Hitachi Electronics Eng Co Ltd | ヘイズ欠陥検出方法 |
| CH685650A5 (de) * | 1991-07-20 | 1995-08-31 | Tencor Instruments | Einrichtung für Oberflächeninspektionen. |
| JPH05149893A (ja) * | 1991-10-23 | 1993-06-15 | Atene Computer Syst:Kk | 布地の欠陥検出装置 |
| JPH0682376A (ja) * | 1992-09-03 | 1994-03-22 | Toshiba Corp | 表面検査装置 |
| JP3647100B2 (ja) * | 1995-01-12 | 2005-05-11 | キヤノン株式会社 | 検査装置およびこれを用いた露光装置やデバイス生産方法 |
| JPH08272077A (ja) * | 1995-03-30 | 1996-10-18 | Canon Inc | 検査装置およびこれを用いた露光装置やデバイス生産方法 |
| EP0850397B1 (en) * | 1995-09-12 | 2002-04-24 | Corning Incorporated | Methods for detecting striae |
| US6529270B1 (en) * | 1999-03-31 | 2003-03-04 | Ade Optical Systems Corporation | Apparatus and method for detecting defects in the surface of a workpiece |
| KR20040032947A (ko) * | 2001-08-21 | 2004-04-17 | 웨이브프론트 싸이언씨스 인코포레이티드 | 데이터 세트를 고대역 필터링하는 방법 |
-
2006
- 2006-07-31 JP JP2006207342A patent/JP5319876B2/ja not_active Expired - Fee Related
-
2007
- 2007-07-23 US US11/878,197 patent/US7791721B2/en active Active
-
2010
- 2010-05-19 US US12/783,318 patent/US20100225907A1/en not_active Abandoned
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