JP5319876B2 - 表面検査装置及び表面検査方法 - Google Patents

表面検査装置及び表面検査方法 Download PDF

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Publication number
JP5319876B2
JP5319876B2 JP2006207342A JP2006207342A JP5319876B2 JP 5319876 B2 JP5319876 B2 JP 5319876B2 JP 2006207342 A JP2006207342 A JP 2006207342A JP 2006207342 A JP2006207342 A JP 2006207342A JP 5319876 B2 JP5319876 B2 JP 5319876B2
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Japan
Prior art keywords
inspection
inspection object
frequency
filter process
signal
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Expired - Fee Related
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JP2006207342A
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English (en)
Japanese (ja)
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JP2008032581A5 (https=
JP2008032581A (ja
Inventor
和夫 ▲高▼橋
孝広 神宮
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Priority to JP2006207342A priority Critical patent/JP5319876B2/ja
Priority to US11/878,197 priority patent/US7791721B2/en
Publication of JP2008032581A publication Critical patent/JP2008032581A/ja
Publication of JP2008032581A5 publication Critical patent/JP2008032581A5/ja
Priority to US12/783,318 priority patent/US20100225907A1/en
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges

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  • Chemical & Material Sciences (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Engineering & Computer Science (AREA)
  • Signal Processing (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP2006207342A 2006-07-31 2006-07-31 表面検査装置及び表面検査方法 Expired - Fee Related JP5319876B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2006207342A JP5319876B2 (ja) 2006-07-31 2006-07-31 表面検査装置及び表面検査方法
US11/878,197 US7791721B2 (en) 2006-07-31 2007-07-23 Surface inspection with variable digital filtering
US12/783,318 US20100225907A1 (en) 2006-07-31 2010-05-19 Surface inspection with variable digital filtering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006207342A JP5319876B2 (ja) 2006-07-31 2006-07-31 表面検査装置及び表面検査方法

Publications (3)

Publication Number Publication Date
JP2008032581A JP2008032581A (ja) 2008-02-14
JP2008032581A5 JP2008032581A5 (https=) 2009-02-19
JP5319876B2 true JP5319876B2 (ja) 2013-10-16

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Family Applications (1)

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JP2006207342A Expired - Fee Related JP5319876B2 (ja) 2006-07-31 2006-07-31 表面検査装置及び表面検査方法

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US (2) US7791721B2 (https=)
JP (1) JP5319876B2 (https=)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8411922B2 (en) * 2007-11-30 2013-04-02 University Of Washington Reducing noise in images acquired with a scanning beam device
JP5256003B2 (ja) * 2008-11-26 2013-08-07 株式会社日立ハイテクノロジーズ 光学式検査装置および光学式検査方法
JP5213765B2 (ja) 2009-03-06 2013-06-19 株式会社日立ハイテクノロジーズ 表面検査装置及び表面検査方法
JP5564807B2 (ja) * 2009-03-12 2014-08-06 株式会社日立ハイテクノロジーズ 欠陥検査装置及び欠陥検査方法
JP2010236968A (ja) * 2009-03-31 2010-10-21 Hitachi High-Technologies Corp 検査方法及び検査装置
JP5295160B2 (ja) * 2010-03-30 2013-09-18 株式会社日立ハイテクノロジーズ 表面検査装置及び表面検査方法
US9696265B2 (en) * 2014-11-04 2017-07-04 Exnodes Inc. Computational wafer inspection filter design
FR3045156B1 (fr) * 2015-12-11 2017-12-22 Soitec Silicon On Insulator Procede de detection de defauts et dispositif associe
CN106248688B (zh) * 2016-08-30 2019-04-16 中国科学院嘉兴微电子仪器与设备工程中心 一种基于fpga的晶圆检测信号提取方法
CN106226324B (zh) * 2016-08-30 2019-04-16 中国科学院嘉兴微电子仪器与设备工程中心 一种基于fpga的晶圆检测信号提取装置及系统
US10466176B2 (en) * 2017-05-01 2019-11-05 Bae Systems Information And Electronic Systems Integration Inc. System and method for detecting contaminants on a circuit
US11067784B2 (en) 2017-05-01 2021-07-20 Bae Systems Information And Electronic Systems Integration Inc. System and techniques for detecting fluorescing particles on a target
US20220011568A1 (en) * 2020-07-10 2022-01-13 Toshiba Tec Kabushiki Kaisha Scanning light measuring apparatus
WO2025013238A1 (ja) * 2023-07-12 2025-01-16 株式会社日立ハイテク 欠陥検査装置及び欠陥検査方法
CN118969684B (zh) * 2024-10-15 2024-12-27 江苏永鼎股份有限公司 基于多维检测反馈的外延前晶圆表面处理动态优化系统

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63143830A (ja) 1986-12-08 1988-06-16 Hitachi Electronics Eng Co Ltd ヘイズ欠陥検出方法
CH685650A5 (de) * 1991-07-20 1995-08-31 Tencor Instruments Einrichtung für Oberflächeninspektionen.
JPH05149893A (ja) * 1991-10-23 1993-06-15 Atene Computer Syst:Kk 布地の欠陥検出装置
JPH0682376A (ja) * 1992-09-03 1994-03-22 Toshiba Corp 表面検査装置
JP3647100B2 (ja) * 1995-01-12 2005-05-11 キヤノン株式会社 検査装置およびこれを用いた露光装置やデバイス生産方法
JPH08272077A (ja) * 1995-03-30 1996-10-18 Canon Inc 検査装置およびこれを用いた露光装置やデバイス生産方法
EP0850397B1 (en) * 1995-09-12 2002-04-24 Corning Incorporated Methods for detecting striae
US6529270B1 (en) * 1999-03-31 2003-03-04 Ade Optical Systems Corporation Apparatus and method for detecting defects in the surface of a workpiece
KR20040032947A (ko) * 2001-08-21 2004-04-17 웨이브프론트 싸이언씨스 인코포레이티드 데이터 세트를 고대역 필터링하는 방법

Also Published As

Publication number Publication date
JP2008032581A (ja) 2008-02-14
US20080027665A1 (en) 2008-01-31
US20100225907A1 (en) 2010-09-09
US7791721B2 (en) 2010-09-07

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