JP2007517401A - 圧縮及び/又は加圧発泡体、気泡、及び/又は液体を用いて半導体ウェーハを洗浄するための方法及び装置 - Google Patents
圧縮及び/又は加圧発泡体、気泡、及び/又は液体を用いて半導体ウェーハを洗浄するための方法及び装置 Download PDFInfo
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/003—Cleaning involving contact with foam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S134/00—Cleaning and liquid contact with solids
- Y10S134/902—Semiconductor wafer
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
- Weting (AREA)
Abstract
Description
装置は、支持体、発泡体マニホルド、型、及びアクチュエータを収容する容器を更に含むこともでき、圧密発泡体が崩壊することにより生じる液体が半導体ウェーハの表面から除去されるチャネルを含むこともできる。
以下の好ましい実施形態の図及び詳細な説明は、これら及び本発明の他の目的並びに利点を更に明らかに示すことになる。
Claims (20)
- 半導体ウェーハを処理するための装置であって、前記装置が、
前記半導体ウェーハを支持するように構成された支持体と、
前記半導体ウェーハが前記支持体に支持されている間に、前記半導体ウェーハの表面に発泡体を導入するように構成された発泡体マニホルドと、
前記半導体ウェーハの表面上に配置された前記発泡体に圧力を加えて圧密発泡体を生成する型と、
前記圧密発泡体が前記半導体ウェーハの表面に接触している間に、前記型と前記半導体ウェーハとの間に相対的運動を起こし、望ましくない粒子を前記半導体ウェーハの表面から除去するアクチュエータと、
を含むことを特徴とする装置。 - 前記型が、前記発泡体上に配置されたプラテンを含み、前記プラテンの面積が、少なくとも前記半導体ウェーハの面積を有し、前記半導体ウェーハの全表面を覆う前記発泡体に前記圧力が加えられるようにすることを特徴とする請求項1に記載の装置。
- 前記型が、前記半導体ウェーハの全表面よりも小さい圧力構造体を含み、前記圧力が、前記半導体ウェーハの表面を覆う局所域の前記発泡体に加えられるようにすることを特徴とする請求項1に記載の装置。
- 前記アクチュエータが、前記型と前記半導体ウェーハの表面との間の距離が変化するように前記型又は前記半導体ウェーハを垂直方向に周期変動し、又は前記型又は前記半導体ウェーハを複数の非平行方向に横方向で周期変動し、或いは前記型又は前記半導体ウェーハを回転するように構成されることを特徴とする請求項1に記載の装置。
- 前記装置が、前記半導体ウェーハと前記支持体との間に圧密発泡体の追加の層を設けるように構成されることを特徴とする請求項1に記載の装置。
- 前記圧密発泡体の崩壊により得られる液体が、前記半導体ウェーハの表面から除去されるチャネルを更に含むことを特徴とする請求項1に記載の装置。
- 前記発泡体が液体及び気泡を含み、前記液体が、前記半導体ウェーハに化学処理を行う化学物質を含むことを特徴とする請求項1に記載の装置。
- 前記液体が、前記半導体ウェーハ又は前記半導体ウェーハ上に配置された層をエッチングするように構成されることを特徴とする請求項7に記載の装置。
- 前記液体が、前記半導体ウェーハを洗浄するのに好適な洗浄剤を含むことを特徴とする請求項7に記載の装置。
- 前記発泡体が、反応ガスを含む気泡を含むことを特徴とする請求項1に記載の装置。
- 前記発泡体を前記半導体ウェーハに導入し、前記半導体ウェーハが前記圧密発泡体に暴露された後に脱イオン水(DIW)を前記半導体ウェーハに付加し、前記半導体ウェーハが前記圧密発泡体に暴露された後に化学処理剤及びDIWを前記半導体ウェーハに付加し、前記半導体ウェーハが前記圧密発泡体に暴露された後に不活性ガスを前記半導体ウェーハに付加し、前記発泡体を生成した後に前記発泡体を前記発泡体マニホルドに供給し、及び/又は前記発泡体を前記発泡体マニホルドに分配するように構成されたマニホルドを更に含むことを特徴とする請求項1に記載の装置。
- 半導体ウェーハを処理する方法であって、前記方法が、
前記半導体ウェーハを支持する段階と、
前記半導体ウェーハを支持しながら、前記半導体ウェーハの第1の表面上に発泡体を供給する段階と、
型を用いて前記半導体ウェーハ上に配置された前記発泡体に圧力を加えて、圧密発泡体を生成する段階と、
前記圧密発泡体が前記半導体ウェーハと接触している間に、前記型と前記半導体ウェーハとの間に相対的動きを生じさせる段階と、
を含む方法。 - 前記半導体ウェーハの第1の表面全体を覆う前記発泡体に圧力を加える段階を更に含む請求項12に記載の方法。
- 前記半導体ウェーハを覆う局所領域の前記発泡体のみに圧力を加える段階を更に含む請求項12に記載の方法。
- 前記型又は前記半導体ウェーハを周期変動させて、前記型と前記半導体ウェーハの表面との間の距離又は前記型と前記半導体ウェーハの表面との間の重なり量を変化させる段階を更に含む請求項12に記載の方法。
- 前記半導体ウェーハの第2の表面上に圧密発泡体の追加の層を設ける段階を更に含む請求項12に記載の方法。
- 前記発泡体の液体を用いて前記半導体ウェーハを化学的に処理する段階を更に含む請求項12に記載の方法。
- 前記発泡体の気泡が反応ガスを含む、発泡体を生成する段階を更に含む請求項12に記載の方法。
- 前記半導体ウェーハが前記圧密発泡体に暴露された後に前記半導体ウェーハを乾燥させる段階を更に含む請求項12に記載の方法。
- 前記半導体ウェーハが前記圧密発泡体に暴露された後に脱イオン水(DIW)を前記半導体ウェーハに付加する段階、前記半導体ウェーハが前記圧密発泡体に暴露された後にDIW及び化学処理剤を前記半導体ウェーハに付加する段階、及び/又は前記半導体ウェーハが前記圧密発泡体に暴露された後に不活性ガスを前記半導体ウェーハに付加する段階を更に含む請求項12に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US10/746,114 US7568490B2 (en) | 2003-12-23 | 2003-12-23 | Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids |
PCT/US2004/042831 WO2005064647A1 (en) | 2003-12-23 | 2004-12-17 | Method and apparatus for cleaning semiconductor wafers using compressed and/or pressurized foams, bubbles, and/or liquids |
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JP2007517401A true JP2007517401A (ja) | 2007-06-28 |
JP4511555B2 JP4511555B2 (ja) | 2010-07-28 |
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US (4) | US7568490B2 (ja) |
EP (1) | EP1704584A1 (ja) |
JP (1) | JP4511555B2 (ja) |
KR (1) | KR101122377B1 (ja) |
CN (2) | CN100421210C (ja) |
MY (2) | MY140370A (ja) |
TW (1) | TWI397103B (ja) |
WO (1) | WO2005064647A1 (ja) |
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JP2012094702A (ja) * | 2010-10-27 | 2012-05-17 | Fujifilm Corp | 多剤型半導体基板用洗浄剤、それを用いた洗浄方法及び半導体素子の製造方法 |
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JPH06177101A (ja) * | 1992-12-03 | 1994-06-24 | Mitsubishi Materials Corp | 改良されたシリコンウェーハ洗浄液 |
US20020094684A1 (en) * | 2000-11-27 | 2002-07-18 | Hirasaki George J. | Foam cleaning process in semiconductor manufacturing |
JP2004349675A (ja) * | 2003-04-30 | 2004-12-09 | Nippei Toyama Corp | 鏡面仕上げ装置 |
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JP2008545272A (ja) * | 2005-06-30 | 2008-12-11 | ラム リサーチ コーポレーション | 半導体ウエハからの物質除去方法並びに除去装置 |
US8691027B2 (en) | 2005-06-30 | 2014-04-08 | Lam Research Corporation | Method for removing material from semiconductor wafer and apparatus for performing the same |
JP2012094702A (ja) * | 2010-10-27 | 2012-05-17 | Fujifilm Corp | 多剤型半導体基板用洗浄剤、それを用いた洗浄方法及び半導体素子の製造方法 |
US8551928B2 (en) | 2010-10-27 | 2013-10-08 | Fujifilm Corporation | Multi-agent type cleaning kit for semiconductor substrates, cleaning method using the same and method of producing semiconductor element |
Also Published As
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KR101122377B1 (ko) | 2012-03-27 |
EP1704584A1 (en) | 2006-09-27 |
US7568490B2 (en) | 2009-08-04 |
MY144394A (en) | 2011-09-15 |
US20090078282A1 (en) | 2009-03-26 |
CN1898776B (zh) | 2011-04-20 |
US7441299B2 (en) | 2008-10-28 |
JP4511555B2 (ja) | 2010-07-28 |
KR20060110335A (ko) | 2006-10-24 |
US8535451B2 (en) | 2013-09-17 |
TW200527487A (en) | 2005-08-16 |
US20050133060A1 (en) | 2005-06-23 |
US7625452B2 (en) | 2009-12-01 |
MY140370A (en) | 2009-12-31 |
TWI397103B (zh) | 2013-05-21 |
US20090000044A1 (en) | 2009-01-01 |
CN1898775A (zh) | 2007-01-17 |
CN100421210C (zh) | 2008-09-24 |
CN1898776A (zh) | 2007-01-17 |
US20050133061A1 (en) | 2005-06-23 |
WO2005064647A1 (en) | 2005-07-14 |
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