JP2006527305A - 電気接点用の接点表面および形成方法 - Google Patents
電気接点用の接点表面および形成方法 Download PDFInfo
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- JP2006527305A JP2006527305A JP2006516115A JP2006516115A JP2006527305A JP 2006527305 A JP2006527305 A JP 2006527305A JP 2006516115 A JP2006516115 A JP 2006516115A JP 2006516115 A JP2006516115 A JP 2006516115A JP 2006527305 A JP2006527305 A JP 2006527305A
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- Prior art keywords
- metal
- alloy
- layer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
- H01R13/03—Contact members characterised by the material, e.g. plating, or coating materials
- H01R13/035—Plated dielectric material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
- B32B15/018—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of a noble metal or a noble metal alloy
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C13/00—Alloys based on tin
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C5/00—Alloys based on noble metals
- C22C5/06—Alloys based on silver
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
- C25D15/02—Combined electrolytic and electrophoretic processes with charged materials
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12479—Porous [e.g., foamed, spongy, cracked, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Mechanical Engineering (AREA)
- Contacts (AREA)
- Electroplating Methods And Accessories (AREA)
- Manufacture Of Switches (AREA)
- Laminated Bodies (AREA)
Abstract
Description
Claims (14)
- 銅ベースの基板上に電気化学的方法により金属を析出させる,電気接点のための触媒表面を形成する方法であって,
前記金属が,前記金属から容易に溶かし出すことのできるスペースホルダ材料と共に前記基板上に析出され,
続いて,前記スペースホルダ材料が前記金属の層から溶かし出され,残った多孔質の金属泡に潤滑剤が含浸されることを特徴とする,電気接点のための接点触表面を形成する方法。 - 前記金属は,Cu,Cu合金,Sn,Sn合金,Ag,Ag合金,Au,およびAu合金からなる群より選択されることを特徴とする,請求項1に記載の方法。
- 付加的に,前記基板上に拡散バリア層が析出されることを特徴とする,請求項1または2に記載の方法。
- 付加的に,貴金属からなるフラッシュが,前記金属,特にCu合金上に析出されることを特徴とする,請求項1または2に記載の方法。
- 前記スペースホルダ材料は,プラスチック球,ポリエチレン,卑金属,硫黄,リン,硫黄合金,リン合金,サイザル,トウモロコシ澱粉などからなる群より選択される材料であることを特徴とする,請求項1から4のいずれか1項に記載の方法。
- 前記スペースホルダ材料は,ポリスチロール球またはラテックス球からなることを特徴とする,請求項5に記載の方法。
- 析出される前記金属の層の厚さは,0.5〜10μmの領域にあることを特徴とする,請求項1から6のいずれか1項に記載の方法。
- 前記金属泡の平均的な孔の大きさは,0.1〜5μmの領域にあることを特徴とする,請求項1から7のいずれか1項に記載の方法。
- 前記金属泡の孔の割合が,層の1〜25体積パーセントの領域にあることを特徴とする,請求項1から8のいずれか1項に記載の方法。
- 前記潤滑剤は,グラファイト,MoS2,ポリテトラフルオロエチレン(PTFE),オイルおよび脂肪からなる群より選択されることを特徴とする,請求項1から9のいずれか1項に記載の方法。
- 前記スペースホルダ材料の取出しは,熱処理および/または溶剤処理によって行われることを特徴とする,請求項1から10のいずれか1項に記載の方法。
- 銅ベースの基板と,その上に配置されている多孔質の金属層からなる,複合材料。
- 前記孔が潤滑剤を含んでいることを特徴とする,請求項12に記載の複合材料。
- 電気接点のための接触層としての,請求項12または13に記載の複合材料の使用。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2003126788 DE10326788B4 (de) | 2003-06-13 | 2003-06-13 | Kontaktoberflächen für elektrische Kontakte und Verfahren zur Herstellung |
PCT/EP2004/050881 WO2004111312A2 (de) | 2003-06-13 | 2004-05-21 | Kontaktoberflächen für elektrische kontakte und verfahren zur herstellung |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2006527305A true JP2006527305A (ja) | 2006-11-30 |
Family
ID=33546557
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006516115A Pending JP2006527305A (ja) | 2003-06-13 | 2004-05-21 | 電気接点用の接点表面および形成方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20060204741A1 (ja) |
EP (1) | EP1636402A2 (ja) |
JP (1) | JP2006527305A (ja) |
DE (1) | DE10326788B4 (ja) |
WO (1) | WO2004111312A2 (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009209453A (ja) * | 2008-02-05 | 2009-09-17 | Kyushu Nogeden:Kk | 錫めっき膜および該錫めっき膜を形成する錫めっき浴 |
JP2010530475A (ja) * | 2007-06-21 | 2010-09-09 | デンマークス テクニスク ユニヴェルジテイト−ディーティーユー | 金属成形プロセスにおける摩擦を低減するためのマイクロ多孔性層 |
JP2013129881A (ja) * | 2011-12-22 | 2013-07-04 | Jst Mfg Co Ltd | 部品 |
JP2013129882A (ja) * | 2011-12-22 | 2013-07-04 | Jst Mfg Co Ltd | 部品 |
JP2018145482A (ja) * | 2017-03-06 | 2018-09-20 | 帝国イオン株式会社 | 耐摩耗性皮膜及びその形成方法、並びに耐摩耗性部材 |
JP2019525421A (ja) * | 2016-08-08 | 2019-09-05 | ティーイー コネクティビティ ジャーマニー ゲゼルシャフト ミット ベシュレンクテル ハフツンクTE Connectivity Germany GmbH | 接触面の下に微細構造の空洞を有する電気コネクタのための電気コンタクト素子 |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4855032B2 (ja) * | 2005-09-29 | 2012-01-18 | Dowaメタルテック株式会社 | 複合めっき材およびその製造方法 |
US7604871B2 (en) | 2006-06-07 | 2009-10-20 | Honeywell International Inc. | Electrical components including abrasive powder coatings for inhibiting tin whisker growth |
JP2008106290A (ja) * | 2006-10-23 | 2008-05-08 | Ricoh Co Ltd | 電気接点部材 |
WO2009035444A1 (en) * | 2006-11-15 | 2009-03-19 | Massachusetts Institute Of Technology | Methods for tailoring the surface topography of a nanocrystalline or amorphous metal or alloy and articles formed by such methods |
EP2009146A1 (en) * | 2007-06-22 | 2008-12-31 | Danmarks Tekniske Universitet - DTU | A microporous coating or structure and a process for producing it |
FR2962856B1 (fr) | 2010-07-16 | 2012-08-17 | Amc Holding | Dispositif de connexion electrique a conductance amelioree |
DE102011088793A1 (de) * | 2011-12-16 | 2013-06-20 | Tyco Electronics Amp Gmbh | Elektrischer Steckverbinder mit mikrostrukturiertem Kontaktelement |
KR20130096045A (ko) * | 2012-02-21 | 2013-08-29 | 엘지전자 주식회사 | 다공성 금속 구조체 및 그 제조 방법 |
FR2996348B1 (fr) | 2012-10-03 | 2015-05-15 | Amc Holding | Poudre et pate pour ameliorer la conductance des connexions electriques |
FR2997788B1 (fr) | 2012-11-05 | 2016-01-22 | Amc Etec | Dispositif de sectionnement d'une ligne d'alimentation electrique a courant de haute intensite |
FR3008429A1 (fr) | 2013-07-12 | 2015-01-16 | Commissariat Energie Atomique | Procede de synthese d'une mousse metallique, mousse metallique, ses utilisations et dispositif comprenant une telle mousse metallique |
DE102014005941A1 (de) * | 2014-04-24 | 2015-11-12 | Te Connectivity Germany Gmbh | Verfahren zum Herstellen eines elektrischen Kontaktelements zur Vermeidung von Zinnwhiskerbildung, und Kontaktelement |
JP6514031B2 (ja) * | 2015-05-19 | 2019-05-15 | 日本圧着端子製造株式会社 | 圧着端子 |
KR102218853B1 (ko) * | 2018-06-29 | 2021-02-24 | 주식회사 엘지화학 | 복합재 |
WO2020081448A1 (en) * | 2018-10-15 | 2020-04-23 | Semtech Corporation | Semiconductor package for providing mechanical isolation of assembled diodes |
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US3676308A (en) * | 1969-06-19 | 1972-07-11 | Udylite Corp | Electrolytic codeposition of polyvinylidene and copolymer particles with copper |
CH623851A5 (ja) * | 1975-10-04 | 1981-06-30 | Akzo Nv | |
JPS5486041A (en) * | 1977-12-14 | 1979-07-09 | Daido Metal Co Ltd | Bearing material |
US4222828A (en) * | 1978-06-06 | 1980-09-16 | Akzo N.V. | Process for electro-codepositing inorganic particles and a metal on a surface |
JPS57110697A (en) * | 1980-12-26 | 1982-07-09 | Mazda Motor Corp | Formation of abrasion resistant layer on metal surface |
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US5667659A (en) * | 1996-04-04 | 1997-09-16 | Handy & Harman | Low friction solder electrodeposits |
US5967860A (en) * | 1997-05-23 | 1999-10-19 | General Motors Corporation | Electroplated Ag-Ni-C electrical contacts |
DE10246062A1 (de) * | 2002-10-02 | 2004-04-15 | Robert Bosch Gmbh | Elektrischer Kontakt |
-
2003
- 2003-06-13 DE DE2003126788 patent/DE10326788B4/de not_active Expired - Fee Related
-
2004
- 2004-05-21 EP EP04741622A patent/EP1636402A2/de not_active Withdrawn
- 2004-05-21 US US10/544,718 patent/US20060204741A1/en not_active Abandoned
- 2004-05-21 JP JP2006516115A patent/JP2006527305A/ja active Pending
- 2004-05-21 WO PCT/EP2004/050881 patent/WO2004111312A2/de active Application Filing
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010530475A (ja) * | 2007-06-21 | 2010-09-09 | デンマークス テクニスク ユニヴェルジテイト−ディーティーユー | 金属成形プロセスにおける摩擦を低減するためのマイクロ多孔性層 |
JP2009209453A (ja) * | 2008-02-05 | 2009-09-17 | Kyushu Nogeden:Kk | 錫めっき膜および該錫めっき膜を形成する錫めっき浴 |
JP2013129881A (ja) * | 2011-12-22 | 2013-07-04 | Jst Mfg Co Ltd | 部品 |
JP2013129882A (ja) * | 2011-12-22 | 2013-07-04 | Jst Mfg Co Ltd | 部品 |
JP2019525421A (ja) * | 2016-08-08 | 2019-09-05 | ティーイー コネクティビティ ジャーマニー ゲゼルシャフト ミット ベシュレンクテル ハフツンクTE Connectivity Germany GmbH | 接触面の下に微細構造の空洞を有する電気コネクタのための電気コンタクト素子 |
US11239593B2 (en) | 2016-08-08 | 2022-02-01 | Te Connectivity Germany Gmbh | Electrical contact element for an electrical connector having microstructured caverns under the contact surface |
JP2018145482A (ja) * | 2017-03-06 | 2018-09-20 | 帝国イオン株式会社 | 耐摩耗性皮膜及びその形成方法、並びに耐摩耗性部材 |
JP7082337B2 (ja) | 2017-03-06 | 2022-06-08 | 帝国イオン株式会社 | 耐摩耗性皮膜及びその形成方法、並びに耐摩耗性部材 |
Also Published As
Publication number | Publication date |
---|---|
DE10326788A1 (de) | 2005-02-10 |
US20060204741A1 (en) | 2006-09-14 |
WO2004111312A2 (de) | 2004-12-23 |
DE10326788B4 (de) | 2005-05-25 |
WO2004111312A3 (de) | 2005-06-16 |
EP1636402A2 (de) | 2006-03-22 |
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