JP2006521670A5 - - Google Patents

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Publication number
JP2006521670A5
JP2006521670A5 JP2006506293A JP2006506293A JP2006521670A5 JP 2006521670 A5 JP2006521670 A5 JP 2006521670A5 JP 2006506293 A JP2006506293 A JP 2006506293A JP 2006506293 A JP2006506293 A JP 2006506293A JP 2006521670 A5 JP2006521670 A5 JP 2006521670A5
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JP
Japan
Prior art keywords
sacrificial substrate
carrier material
electrodes
plasma
discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006506293A
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English (en)
Japanese (ja)
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JP2006521670A (ja
Filing date
Publication date
Priority claimed from DE10310623A external-priority patent/DE10310623B8/de
Application filed filed Critical
Publication of JP2006521670A publication Critical patent/JP2006521670A/ja
Publication of JP2006521670A5 publication Critical patent/JP2006521670A5/ja
Pending legal-status Critical Current

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JP2006506293A 2003-03-10 2004-03-05 放電空間内の電気放電を介するプラズマの発生のための方法及び装置 Pending JP2006521670A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10310623A DE10310623B8 (de) 2003-03-10 2003-03-10 Verfahren und Vorrichtung zum Erzeugen eines Plasmas durch elektrische Entladung in einem Entladungsraum
PCT/IB2004/000611 WO2004082340A1 (en) 2003-03-10 2004-03-05 Method and device for the generation of a plasma through electric discharge in a discharge space

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010289649A Division JP5882580B2 (ja) 2003-03-10 2010-12-27 放電空間内の電気放電を介するプラズマ発生のための方法、装置、及びその使用

Publications (2)

Publication Number Publication Date
JP2006521670A JP2006521670A (ja) 2006-09-21
JP2006521670A5 true JP2006521670A5 (https=) 2007-04-19

Family

ID=32920732

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2006506293A Pending JP2006521670A (ja) 2003-03-10 2004-03-05 放電空間内の電気放電を介するプラズマの発生のための方法及び装置
JP2010289649A Expired - Lifetime JP5882580B2 (ja) 2003-03-10 2010-12-27 放電空間内の電気放電を介するプラズマ発生のための方法、装置、及びその使用

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2010289649A Expired - Lifetime JP5882580B2 (ja) 2003-03-10 2010-12-27 放電空間内の電気放電を介するプラズマ発生のための方法、装置、及びその使用

Country Status (6)

Country Link
US (1) US7518300B2 (https=)
EP (1) EP1604552B1 (https=)
JP (2) JP2006521670A (https=)
KR (1) KR101083085B1 (https=)
DE (1) DE10310623B8 (https=)
WO (1) WO2004082340A1 (https=)

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US6770895B2 (en) 2002-11-21 2004-08-03 Asml Holding N.V. Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
US6919573B2 (en) 2003-03-20 2005-07-19 Asml Holding N.V Method and apparatus for recycling gases used in a lithography tool
JP5503108B2 (ja) * 2004-11-29 2014-05-28 コーニンクレッカ フィリップス エヌ ヴェ 約１ｎｍから約３０ｎｍの波長範囲の放射線を発生させる方法および機器、ならびにリソグラフィー装置
DE102004058500A1 (de) * 2004-12-04 2006-06-08 Philips Intellectual Property & Standards Gmbh Verfahren und Vorrichtung zum Betreiben einer elektrischen Entladevorrichtung
EP2020165B1 (en) * 2006-05-16 2010-11-24 Philips Intellectual Property & Standards GmbH A method of increasing the conversion efficiency of an euv and/or soft x-ray lamp and a corresponding apparatus
US20080239262A1 (en) * 2007-03-29 2008-10-02 Asml Netherlands B.V. Radiation source for generating electromagnetic radiation and method for generating electromagnetic radiation
US8227771B2 (en) * 2007-07-23 2012-07-24 Asml Netherlands B.V. Debris prevention system and lithographic apparatus
US8493548B2 (en) * 2007-08-06 2013-07-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5479723B2 (ja) 2008-12-18 2014-04-23 株式会社Ｉｈｉ プラズマ光源とプラズマ光発生方法
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KR102711420B1 (ko) * 2021-09-10 2024-09-26 경희대학교 산학협력단 전자빔 기반 극자외선 광원 장치

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