KR101083085B1 - 방전 공간에서 전기 방전을 통하여 플라스마를 발생시키기위한 방법 및 장치 - Google Patents

방전 공간에서 전기 방전을 통하여 플라스마를 발생시키기위한 방법 및 장치 Download PDF

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KR101083085B1
KR101083085B1 KR1020057016748A KR20057016748A KR101083085B1 KR 101083085 B1 KR101083085 B1 KR 101083085B1 KR 1020057016748 A KR1020057016748 A KR 1020057016748A KR 20057016748 A KR20057016748 A KR 20057016748A KR 101083085 B1 KR101083085 B1 KR 101083085B1
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Prior art keywords
sacrificial substrate
plasma
discharge
carrier material
electrodes
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Korean (ko)
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KR20050116137A (ko
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에릭 제라더스 데오도어 보쉬
제르엔 존커스
윌리 네프
귄더 핸스 데라
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코닌클리즈케 필립스 일렉트로닉스 엔.브이.
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • X-Ray Techniques (AREA)
  • Plasma Technology (AREA)
KR1020057016748A 2003-03-10 2004-03-05 방전 공간에서 전기 방전을 통하여 플라스마를 발생시키기위한 방법 및 장치 Expired - Lifetime KR101083085B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10310623A DE10310623B8 (de) 2003-03-10 2003-03-10 Verfahren und Vorrichtung zum Erzeugen eines Plasmas durch elektrische Entladung in einem Entladungsraum
DE10310623.5 2003-03-10
PCT/IB2004/000611 WO2004082340A1 (en) 2003-03-10 2004-03-05 Method and device for the generation of a plasma through electric discharge in a discharge space

Publications (2)

Publication Number Publication Date
KR20050116137A KR20050116137A (ko) 2005-12-09
KR101083085B1 true KR101083085B1 (ko) 2011-11-16

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KR1020057016748A Expired - Lifetime KR101083085B1 (ko) 2003-03-10 2004-03-05 방전 공간에서 전기 방전을 통하여 플라스마를 발생시키기위한 방법 및 장치

Country Status (6)

Country Link
US (1) US7518300B2 (https=)
EP (1) EP1604552B1 (https=)
JP (2) JP2006521670A (https=)
KR (1) KR101083085B1 (https=)
DE (1) DE10310623B8 (https=)
WO (1) WO2004082340A1 (https=)

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US6770895B2 (en) 2002-11-21 2004-08-03 Asml Holding N.V. Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
US6919573B2 (en) 2003-03-20 2005-07-19 Asml Holding N.V Method and apparatus for recycling gases used in a lithography tool
JP5503108B2 (ja) * 2004-11-29 2014-05-28 コーニンクレッカ フィリップス エヌ ヴェ 約１ｎｍから約３０ｎｍの波長範囲の放射線を発生させる方法および機器、ならびにリソグラフィー装置
DE102004058500A1 (de) * 2004-12-04 2006-06-08 Philips Intellectual Property & Standards Gmbh Verfahren und Vorrichtung zum Betreiben einer elektrischen Entladevorrichtung
EP2020165B1 (en) * 2006-05-16 2010-11-24 Philips Intellectual Property & Standards GmbH A method of increasing the conversion efficiency of an euv and/or soft x-ray lamp and a corresponding apparatus
US20080239262A1 (en) * 2007-03-29 2008-10-02 Asml Netherlands B.V. Radiation source for generating electromagnetic radiation and method for generating electromagnetic radiation
US8227771B2 (en) * 2007-07-23 2012-07-24 Asml Netherlands B.V. Debris prevention system and lithographic apparatus
US8493548B2 (en) * 2007-08-06 2013-07-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5479723B2 (ja) 2008-12-18 2014-04-23 株式会社Ｉｈｉ プラズマ光源とプラズマ光発生方法
KR101038232B1 (ko) * 2010-06-23 2011-05-31 (주) 라미나 회분식 및 연속식 반응수행이 가능한 반응장치
US8592788B1 (en) * 2013-02-25 2013-11-26 Plex Llc Lithium extreme ultraviolet source and operating method
US10580610B2 (en) * 2013-03-15 2020-03-03 General Electric Company Cold cathode switching device and converter
KR102711420B1 (ko) * 2021-09-10 2024-09-26 경희대학교 산학협력단 전자빔 기반 극자외선 광원 장치

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GB1557696A (en) 1976-09-29 1979-12-12 Inst Tekh Teplofiziki Akad Nau Electric discharge device

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US3654567A (en) * 1970-12-31 1972-04-04 Ibm Vapor discharge cell
JPS58188040A (ja) * 1982-04-28 1983-11-02 Toshiba Corp Ｘ線発生装置
JPS6188435A (ja) * 1984-10-05 1986-05-06 Hitachi Ltd Ｘ線発生装置
JPS6467988A (en) * 1987-09-09 1989-03-14 Hitachi Ltd Metallic vapor laser device
DD282561A5 (de) 1989-04-24 1990-09-12 Leipzig Chemieanlagen Verfahren zum effektiven betreiben eines plasmatrons
IT1246682B (it) * 1991-03-04 1994-11-24 Proel Tecnologie Spa Dispositivo a catodo cavo non riscaldato per la generazione dinamica di plasma
DE4117775A1 (de) * 1991-05-31 1992-12-03 Immelborn Hartmetallwerk Verfahren zum verdichten von profilkoerpern aus wolfram-kupfer-traenkwerkstoffen
US5243638A (en) * 1992-03-10 1993-09-07 Hui Wang Apparatus and method for generating a plasma x-ray source
DE4208764C2 (de) * 1992-03-19 1994-02-24 Kernforschungsz Karlsruhe Gasgefüllter Teilchenbeschleuniger
DE4444763C2 (de) * 1994-12-19 1996-11-21 Apvv Angewandte Plasma Vakuum Elektrode zur Materialverdampfung für die Beschichtung von Substraten
US6586757B2 (en) * 1997-05-12 2003-07-01 Cymer, Inc. Plasma focus light source with active and buffer gas control
DE19753696A1 (de) * 1997-12-03 1999-06-17 Fraunhofer Ges Forschung Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Röntgenstrahlung aus einer Gasentladung
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DE19962160C2 (de) * 1999-06-29 2003-11-13 Fraunhofer Ges Forschung Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung
JP3587745B2 (ja) 1999-09-08 2004-11-10 株式会社ニチレイ 甲殻類の剥ぎ残し殻の検出排除方法及び装置
TW503669B (en) * 2000-07-04 2002-09-21 Lambda Physik Ag Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it
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JP2002248344A (ja) * 2001-02-26 2002-09-03 Nikon Corp 極端紫外光発生装置並びにそれを用いた露光装置及び半導体製造方法
DE10139677A1 (de) * 2001-04-06 2002-10-17 Fraunhofer Ges Forschung Verfahren und Vorrichtung zum Erzeugen von extrem ultravioletter Strahlung und weicher Röntgenstrahlung
US6998785B1 (en) * 2001-07-13 2006-02-14 University Of Central Florida Research Foundation, Inc. Liquid-jet/liquid droplet initiated plasma discharge for generating useful plasma radiation
JP4540267B2 (ja) * 2001-07-30 2010-09-08 Ｈｏｙａ株式会社 Ｅｕｖ光露光用反射型マスクブランクおよびｅｕｖ光露光用反射型マスク
DE10151080C1 (de) * 2001-10-10 2002-12-05 Xtreme Tech Gmbh Einrichtung und Verfahren zum Erzeugen von extrem ultravioletter (EUV-)Strahlung auf Basis einer Gasentladung

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Publication number Priority date Publication date Assignee Title
US3891813A (en) 1973-05-04 1975-06-24 Westinghouse Electric Corp EHV circuit breaker utilizing gallium cathode ignitrons for synchronous closing
GB1557696A (en) 1976-09-29 1979-12-12 Inst Tekh Teplofiziki Akad Nau Electric discharge device

Also Published As

Publication number Publication date
EP1604552A1 (en) 2005-12-14
US7518300B2 (en) 2009-04-14
WO2004082340A1 (en) 2004-09-23
EP1604552B1 (en) 2013-12-25
DE10310623B8 (de) 2005-12-01
KR20050116137A (ko) 2005-12-09
JP5882580B2 (ja) 2016-03-09
JP2006521670A (ja) 2006-09-21
JP2011100741A (ja) 2011-05-19
US20070001571A1 (en) 2007-01-04
DE10310623A1 (de) 2004-09-30
DE10310623B4 (de) 2005-08-04

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