JP2006521670A - 放電空間内の電気放電を介するプラズマの発生のための方法及び装置 - Google Patents

放電空間内の電気放電を介するプラズマの発生のための方法及び装置 Download PDF

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Publication number
JP2006521670A
JP2006521670A JP2006506293A JP2006506293A JP2006521670A JP 2006521670 A JP2006521670 A JP 2006521670A JP 2006506293 A JP2006506293 A JP 2006506293A JP 2006506293 A JP2006506293 A JP 2006506293A JP 2006521670 A JP2006521670 A JP 2006521670A
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Prior art keywords
sacrificial substrate
discharge
carrier material
electrodes
plasma
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JP2006506293A
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Japanese (ja)
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JP2006521670A5 (https=
Inventor
エリク へラルダス テオドール ボシュ
イェロン ヨンケルス
ウィッリ ネッフ
ギュンター ハンス デッラ
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Koninklijke Philips NV
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Koninklijke Philips Electronics NV
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Publication of JP2006521670A publication Critical patent/JP2006521670A/ja
Publication of JP2006521670A5 publication Critical patent/JP2006521670A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/48—Generating plasma using an arc

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • X-Ray Techniques (AREA)
  • Plasma Technology (AREA)
JP2006506293A 2003-03-10 2004-03-05 放電空間内の電気放電を介するプラズマの発生のための方法及び装置 Pending JP2006521670A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10310623A DE10310623B8 (de) 2003-03-10 2003-03-10 Verfahren und Vorrichtung zum Erzeugen eines Plasmas durch elektrische Entladung in einem Entladungsraum
PCT/IB2004/000611 WO2004082340A1 (en) 2003-03-10 2004-03-05 Method and device for the generation of a plasma through electric discharge in a discharge space

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010289649A Division JP5882580B2 (ja) 2003-03-10 2010-12-27 放電空間内の電気放電を介するプラズマ発生のための方法、装置、及びその使用

Publications (2)

Publication Number Publication Date
JP2006521670A true JP2006521670A (ja) 2006-09-21
JP2006521670A5 JP2006521670A5 (https=) 2007-04-19

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JP2006506293A Pending JP2006521670A (ja) 2003-03-10 2004-03-05 放電空間内の電気放電を介するプラズマの発生のための方法及び装置
JP2010289649A Expired - Lifetime JP5882580B2 (ja) 2003-03-10 2010-12-27 放電空間内の電気放電を介するプラズマ発生のための方法、装置、及びその使用

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JP2010289649A Expired - Lifetime JP5882580B2 (ja) 2003-03-10 2010-12-27 放電空間内の電気放電を介するプラズマ発生のための方法、装置、及びその使用

Country Status (6)

Country Link
US (1) US7518300B2 (https=)
EP (1) EP1604552B1 (https=)
JP (2) JP2006521670A (https=)
KR (1) KR101083085B1 (https=)
DE (1) DE10310623B8 (https=)
WO (1) WO2004082340A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024536746A (ja) * 2021-09-10 2024-10-08 慶熙大學校産學協力團 電子ビームベースの極紫外線光源装置

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* Cited by examiner, † Cited by third party
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US6770895B2 (en) 2002-11-21 2004-08-03 Asml Holding N.V. Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
US6919573B2 (en) 2003-03-20 2005-07-19 Asml Holding N.V Method and apparatus for recycling gases used in a lithography tool
JP5503108B2 (ja) * 2004-11-29 2014-05-28 コーニンクレッカ フィリップス エヌ ヴェ 約１ｎｍから約３０ｎｍの波長範囲の放射線を発生させる方法および機器、ならびにリソグラフィー装置
DE102004058500A1 (de) * 2004-12-04 2006-06-08 Philips Intellectual Property & Standards Gmbh Verfahren und Vorrichtung zum Betreiben einer elektrischen Entladevorrichtung
EP2020165B1 (en) * 2006-05-16 2010-11-24 Philips Intellectual Property & Standards GmbH A method of increasing the conversion efficiency of an euv and/or soft x-ray lamp and a corresponding apparatus
US20080239262A1 (en) * 2007-03-29 2008-10-02 Asml Netherlands B.V. Radiation source for generating electromagnetic radiation and method for generating electromagnetic radiation
US8227771B2 (en) * 2007-07-23 2012-07-24 Asml Netherlands B.V. Debris prevention system and lithographic apparatus
US8493548B2 (en) * 2007-08-06 2013-07-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5479723B2 (ja) 2008-12-18 2014-04-23 株式会社Ｉｈｉ プラズマ光源とプラズマ光発生方法
KR101038232B1 (ko) * 2010-06-23 2011-05-31 (주) 라미나 회분식 및 연속식 반응수행이 가능한 반응장치
US8592788B1 (en) * 2013-02-25 2013-11-26 Plex Llc Lithium extreme ultraviolet source and operating method
US10580610B2 (en) * 2013-03-15 2020-03-03 General Electric Company Cold cathode switching device and converter

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JPS542555B1 (https=) * 1970-12-31 1979-02-08
JPS58188040A (ja) * 1982-04-28 1983-11-02 Toshiba Corp Ｘ線発生装置
JPS6188435A (ja) * 1984-10-05 1986-05-06 Hitachi Ltd Ｘ線発生装置
JPS6467988A (en) * 1987-09-09 1989-03-14 Hitachi Ltd Metallic vapor laser device
US5243638A (en) * 1992-03-10 1993-09-07 Hui Wang Apparatus and method for generating a plasma x-ray source
JP2000133408A (ja) * 1998-10-30 2000-05-12 Toshiba Corp レーザ誘導放電発生装置および同放電発生方法
JP2002248344A (ja) * 2001-02-26 2002-09-03 Nikon Corp 極端紫外光発生装置並びにそれを用いた露光装置及び半導体製造方法
WO2002082872A1 (de) * 2001-04-06 2002-10-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und vorrichtung zum erzeugen von extrem ultravioletter strahlung und weicher röntgenstrahlung
JP2003045779A (ja) * 2001-07-30 2003-02-14 Hoya Corp Ｅｕｖ光露光用反射型マスクおよびｅｕｖ光露光用反射型マスクブランク

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IT1246682B (it) * 1991-03-04 1994-11-24 Proel Tecnologie Spa Dispositivo a catodo cavo non riscaldato per la generazione dinamica di plasma
DE4117775A1 (de) * 1991-05-31 1992-12-03 Immelborn Hartmetallwerk Verfahren zum verdichten von profilkoerpern aus wolfram-kupfer-traenkwerkstoffen
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DE19753696A1 (de) * 1997-12-03 1999-06-17 Fraunhofer Ges Forschung Vorrichtung und Verfahren zur Erzeugung von Extrem-Ultraviolettstrahlung und weicher Röntgenstrahlung aus einer Gasentladung
DE19825555A1 (de) * 1998-06-08 1999-12-09 Plasma Scorpion Schneiden Und Lichtbogen-Plasmagenerator
DE19962160C2 (de) * 1999-06-29 2003-11-13 Fraunhofer Ges Forschung Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung
JP3587745B2 (ja) 1999-09-08 2004-11-10 株式会社ニチレイ 甲殻類の剥ぎ残し殻の検出排除方法及び装置
TW503669B (en) * 2000-07-04 2002-09-21 Lambda Physik Ag Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it
GB0021815D0 (en) * 2000-09-06 2000-10-18 Lofting Marcus J Plasma enhanced gas reactor
US6998785B1 (en) * 2001-07-13 2006-02-14 University Of Central Florida Research Foundation, Inc. Liquid-jet/liquid droplet initiated plasma discharge for generating useful plasma radiation
DE10151080C1 (de) * 2001-10-10 2002-12-05 Xtreme Tech Gmbh Einrichtung und Verfahren zum Erzeugen von extrem ultravioletter (EUV-)Strahlung auf Basis einer Gasentladung

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS542555B1 (https=) * 1970-12-31 1979-02-08
JPS58188040A (ja) * 1982-04-28 1983-11-02 Toshiba Corp Ｘ線発生装置
JPS6188435A (ja) * 1984-10-05 1986-05-06 Hitachi Ltd Ｘ線発生装置
JPS6467988A (en) * 1987-09-09 1989-03-14 Hitachi Ltd Metallic vapor laser device
US5243638A (en) * 1992-03-10 1993-09-07 Hui Wang Apparatus and method for generating a plasma x-ray source
JP2000133408A (ja) * 1998-10-30 2000-05-12 Toshiba Corp レーザ誘導放電発生装置および同放電発生方法
JP2002248344A (ja) * 2001-02-26 2002-09-03 Nikon Corp 極端紫外光発生装置並びにそれを用いた露光装置及び半導体製造方法
WO2002082872A1 (de) * 2001-04-06 2002-10-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und vorrichtung zum erzeugen von extrem ultravioletter strahlung und weicher röntgenstrahlung
JP2004530269A (ja) * 2001-04-06 2004-09-30 フラウンホーファー−ゲゼルシャフト　ツル　フェルデルング　デル　アンゲヴァンテン　フォルシュング　エー　ファウ 超紫外線及び軟ｘ線の発生方法及び装置
JP2003045779A (ja) * 2001-07-30 2003-02-14 Hoya Corp Ｅｕｖ光露光用反射型マスクおよびｅｕｖ光露光用反射型マスクブランク

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024536746A (ja) * 2021-09-10 2024-10-08 慶熙大學校産學協力團 電子ビームベースの極紫外線光源装置

Also Published As

Publication number Publication date
EP1604552A1 (en) 2005-12-14
US7518300B2 (en) 2009-04-14
WO2004082340A1 (en) 2004-09-23
EP1604552B1 (en) 2013-12-25
DE10310623B8 (de) 2005-12-01
KR20050116137A (ko) 2005-12-09
JP5882580B2 (ja) 2016-03-09
JP2011100741A (ja) 2011-05-19
US20070001571A1 (en) 2007-01-04
DE10310623A1 (de) 2004-09-30
KR101083085B1 (ko) 2011-11-16
DE10310623B4 (de) 2005-08-04

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