JP2006312235A - 薄い耐摩耗性被膜 - Google Patents
薄い耐摩耗性被膜 Download PDFInfo
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- 239000011248 coating agent Substances 0.000 title claims abstract description 21
- 238000000576 coating method Methods 0.000 title claims abstract description 21
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 33
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 32
- 238000005520 cutting process Methods 0.000 claims abstract description 23
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 14
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 11
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 9
- 229910052715 tantalum Inorganic materials 0.000 claims abstract description 9
- 239000000463 material Substances 0.000 claims abstract description 8
- 229910052720 vanadium Inorganic materials 0.000 claims abstract description 8
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 7
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 7
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 7
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 7
- 239000007787 solid Substances 0.000 claims abstract description 7
- 229910052796 boron Inorganic materials 0.000 claims abstract description 6
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 6
- 150000001875 compounds Chemical class 0.000 claims abstract description 5
- 239000000203 mixture Substances 0.000 claims description 13
- 238000002441 X-ray diffraction Methods 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 12
- 239000000126 substance Substances 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims 2
- 230000001747 exhibiting effect Effects 0.000 claims 1
- 230000037303 wrinkles Effects 0.000 claims 1
- 239000002184 metal Substances 0.000 abstract description 8
- 229910052751 metal Inorganic materials 0.000 abstract description 8
- 238000003801 milling Methods 0.000 abstract description 7
- 238000005553 drilling Methods 0.000 abstract description 2
- 229910000831 Steel Inorganic materials 0.000 abstract 1
- 239000010959 steel Substances 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 43
- 238000000151 deposition Methods 0.000 description 22
- 230000008021 deposition Effects 0.000 description 21
- 239000002356 single layer Substances 0.000 description 14
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 11
- 230000008020 evaporation Effects 0.000 description 7
- 238000001704 evaporation Methods 0.000 description 7
- 238000005240 physical vapour deposition Methods 0.000 description 7
- 238000005275 alloying Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000011780 sodium chloride Substances 0.000 description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- 229910007744 Zr—N Inorganic materials 0.000 description 4
- 238000003754 machining Methods 0.000 description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 150000004767 nitrides Chemical class 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910000997 High-speed steel Inorganic materials 0.000 description 2
- 229910020018 Nb Zr Inorganic materials 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 239000013338 boron nitride-based material Substances 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 150000001247 metal acetylides Chemical class 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910000760 Hardened steel Inorganic materials 0.000 description 1
- 229910009043 WC-Co Inorganic materials 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000010406 cathode material Substances 0.000 description 1
- 239000011195 cermet Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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Abstract
【解決手段】被膜は、少なくとも1層がh−(Me1、Me2)X相を含んで成る1層以上の耐熱性化合物からなり、Me1がV、Cr、Nb及びTaの元素の1種以上であり、Me2がTi、Zr、Hf、Al及びSiの元素の1種以上であり且つXがN、C、O及びBの元素の1種以上である。前記h−Me1Me2X相の比率R=(Xのat%)/(Me1のat%+Me2のat%)が、0.5〜1.0好ましくは0.75〜1.0の間にあり、且つXが30at%未満のO+Bを含む。本発明は、切屑の厚みが薄くて加工物が硬い金属切削用途に有益であり、例えば中実エンドミル、インサートフライスカッタを使用する倣いフライス加工または硬質鋼の穿孔加工である。
【選択図】図1
Description
θ−2θ及び/または猶予入射形状寸法におけるX線回折(XRD)によって検出された結晶質六方晶相h−(Me1、Me2)Xの存在は、次の特徴の1以上を示し、すなわち、
約35°の2θでCuΚα照射を使用したh−NbNの場合、h−(Me1、Me2)X(100)ピーク、
約39°の2θでCuΚα照射を使用したh−NbNの場合、h−(Me1、Me2)X(101)ピーク、
約48°の2θでCuΚα照射を使用したh−NbNの場合、h−(Me1、Me2)X(102)ピーク、
約62°の2θでCuΚα照射を使用したh−NbNの場合、h−(Me1、Me2)X(110)ピーク、
約62°の2θでCuΚα照射を使用したh−NbNの場合、h−(Me1、Me2)X(103)ピーク、
約72°の2θでCuΚα照射を使用したh−NbNの場合、h−(Me1、Me2)X(112)ピーク、
約75°の2θでCuΚα照射を使用したh−NbNの場合、h−(Me1、Me2)X(201)ピーク、
約83°の2θでCuΚα照射を使用したh−NbNの場合、h−(Me1、Me2)X(202)ピーク、
h−(Me1、Me2)Xの組織は、好ましくは非NiAsタイプである。
θ−2θ形状寸法においてCuΚα照射を使用したh−(Me1、Me2)X(100)ピーク、及びh−(Me1、Me2)X(110)+(103)ピークの領域の比率Kとして定義されるテクスチャが、0〜0.5好ましくは0.0〜0.25である。
小さな粒と不均一応力に起因し、θ−2θ形状寸法においてCuΚα照射を使用するFWHM(全幅で最大の半分)の値は、次の:
h−(Me1、Me2)X(110)+(103)ピークは、0.5〜3.0°の2θであり、及び/または
h−(Me1、Me2)X(100)ピークは、0.4〜2.5°の2θである。
Xは、N及び/またはCの残部を有し30at%未満のO及び/またはBから成る。
93.5wt%のWC、6wt%のCo、0.5wt%の(Ta、Nb)Cの化学組成を有する磨かれた超硬合金基材が使用された。WCの粒径は約1μmであり、且つ硬さは1630HV10であった。
変種 Nb/Zr 硬さ ヤング率 検出相 FWHM FWHM 残留歪 テクスチャ
(at%) (GPa) (GPa) h-(100) h-(110) (%) 因子K
°2θ +h-(103)
°2θ
A 100/0 h-NbN, 0.7 1.2 0.12
a=2.98,
c=5.49
B 97/3 47 595 h-NbN, 0.8 1.5 -1.6 0.12
a=3.00,
c=5.49
c-(Nb,Zr)N
a=4.44
C 95/5 43 578 h-NbN, 0.8 1.5 0.11
a=2.98,
c=5.53
c-(Nb,Zr)N
a=4.44
D 93/7 38 493 h-NbN, 0.8 1.6 -1.7 0.19
a=3.00,
c=5.49
c-(Nb,Zr)N
a=4.45
E 86/14 38 493 h-NbN, 0.8 2.2 0.52
a=3.00,
c=5.49
c-(Nb,Zr)N
a=4.443
F 75/25 33 474 c-(Nb,Zr)N,
a=4.47
G 57/43 33 473 c-(Nb,Zr)N,
a=4.50
H 43/57 33 497 c-(Nb,Zr)N, -0.9
a=4.53
I 33/67 33 491 c-(Nb,Zr)N,
a=4.55
J 29/71 33 515 c-(Nb,Zr)N, -0.6
a=4.55
90wt%のWC−10wt%のCo(WC粒径:0.8μm)の組成を有するMM12−12012−B90P−M05タイプの超硬合金交換可能エンドミルが、実施例1(実施例2の同一名の変種は同一組成を有する実施例1の変種名を言及する)と同一条件を用いて被覆された。3回回転の固定物を使用した。エンドミルは、種々の組成を得るために種々のレベルに配置された。堆積期間は、フランク面に3.0μmを得るために、例えば1から140分まで調整した。基準として、同じ形状と基材のTiN被覆エンドミルが用いられ、ここではTiNと呼ぶ。この変種のフランク面の層厚みは、1.4ミクロンであった。
材料:DINX100CrMoV51、59HRC
n=4050回転/分
ap=ac=0.9mm
Vf=900mm/分
hm=0.015mm
切削30分後、最大フランク摩耗Vbmaxは、二つの異なる位置で測定され(頂部と頂部から1mmで)、表2を参照。
変種 Vbmax[mm] Vbmax[mm]
頂部 頂部から1mm
C 0.20 0.12
E 0.47 0.28
I 0.68 0.24
TiN 0.82 0.18
RDHW10T3M0T−MD06インサートを用いる倣いフライス加工試験は、実施例1(変種A、C及びE)におけるように同じ被覆がされた。工具寿命は、輝きが作り出され材料が平らでない表面になったと定義されたような摩耗したときに測定された。工具寿命は表3に示される。
材料:DINX155CrMoV121
乾式機械加工
Vc=250m/分
fz=0.2mm/歯
ap=1mm,ac=2mm
変種 工具寿命 工具寿命
刃1(mm) 刃2(mm)
A 5.2 4.5
C 4.3 5.4
E 2.5 2.8
TiN 3.1 2.5
この試験において、変種A(単相のh−NbN)及びCのような高量のh−(Nb、Zr)Nを有する変種は、最も長い工具寿命を有する。
Claims (7)
- 基材、及び1層以上の耐熱性化合物から成る被膜を含む切削工具インサート、中実エンドミルまたはドリルであって、
少なくとも1層が、Me1aMe21−aXbの化学組成で記載されるh−(Me1、Me2)Xの結晶質六方相を含み、Me1がV、Cr、Nb及びTaの元素の1種以上であり、Me2がTi、Zr、Hf、Al及びSiの元素の1種以上であり、且つa>0.5であり且つXがN、C、O及びBの元素の1種以上であり、前記Me1aMe21−aXbの相の比率R=(Xのat%)/(Me1のat%+Me2のat%)が0.5〜1.0好ましくは0.75〜1.0の間であり、且つ
Xが、30at%未満のO+Bを含み、
結晶質六方晶相h−(Me1、Me2)からのθ−2θ及び/または猶予入射形状寸法におけるX線回折(XRD)のパターンが、次のピーク、
h−(Me1、Me2)X(100)ピーク、
h−(Me1、Me2)X(101)ピーク、
h−(Me1、Me2)X(102)ピーク、
h−(Me1、Me2)X(110)ピーク、
h−(Me1、Me2)X(103)ピーク、
h−(Me1、Me2)X(112)ピーク、
h−(Me1、Me2)X(201)ピーク、
h−(Me1、Me2)X(202)ピーク、
の1以上を示すことを特徴とする基材、及び1層以上の耐熱性化合物から成る被膜を含む切削工具インサート、中実エンドミルまたはドリル。 - h−(Me1、Me2)X(110)+(103)ピーク(=A(h−(Me1、Me2)X110+103))及びc−(Me1、Me2)X(200)ピーク(=A(c−(Me1、Me2)X200)の領域間の比率L、換言すれば前記層からのθ−2θ形状寸法におけるX線回折パターンのL=A(h−(Me1、Me2)X110+103)/A(c−MeX200)が、0.1好ましくは0,2より大きく、及び/または
h−(Me1、Me2)X(110)+(103)ピークのバックグランド対するピークの比率が、2好ましくは4より大きいことを特徴とする請求項1記載の切削工具。 - 前記Me1が元素V、CrまたはNbの一つ以上であり、且つ前記Me2が元素Ti、Zr、AlまたはSiの一つ以上であることを特徴とする請求項1記載の切削工具。
- 前記層からのθ−2θ寸法形状のけるX線回折パターンのh−(Me1、Me2)X(100)ピーク及びh−(Me1、Me2)X(110)+(103)ピークの領域間の比率Κとして定義されるテクスチャが、0〜0.5好ましくは0.0〜0.25の間にあることを特徴とする請求項1記載の切削工具。
- 前記被膜からのθ−2θ形状寸法におけるX線回折パターンのh−(Me1、Me2)X(110)ピークのFWHM(全幅で最大の半分)の値は、0.5〜3.0°2θであり、且つh−(Me1、Me2)X(110)ピークは0.4〜0.25°2θであることを特徴とする請求項1記載の切削工具。
- 前記h−(Me1、Me2)Xの組織が非NiAsタイプであることを特徴とする請求項1記載の切削工具。
- 基材及び被膜を含む切削工具インサート、中実エンドミルまたはドリルを製造する方法であって、
前記被膜が、少なくとも1層がMe1aMe21−aXbの組成で記載されるh−(Me1、Me2)X相を含んで成る1層以上の耐熱性化合物からなり、Me1がV、Cr、Nb及びTaの元素の1種以上であり、Me2がTi、Zr、Hf、Al及びSiの元素の1種以上であり、且つa>0.5であり且つXがN、C、O及びBの元素の1種以上であり、前記Me1aMe21−aXbの相の比率R=(Xのat%)/(Me1のat%+Me2のat%)が0.5〜1.0好ましくは0.75〜1.0の間であることを特徴とする基材及び被膜を含む切削工具インサート、中実エンドミルまたはドリルを製造する方法。
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EP (1) | EP1722009B1 (ja) |
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US8507108B2 (en) | 2013-08-13 |
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CN100525968C (zh) | 2009-08-12 |
DE602006002920D1 (de) | 2008-11-13 |
EP1722009A1 (en) | 2006-11-15 |
US20070178330A1 (en) | 2007-08-02 |
SE529223C2 (sv) | 2007-06-05 |
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ATE409758T1 (de) | 2008-10-15 |
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