JP2006190997A5 - - Google Patents

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Publication number
JP2006190997A5
JP2006190997A5 JP2005350685A JP2005350685A JP2006190997A5 JP 2006190997 A5 JP2006190997 A5 JP 2006190997A5 JP 2005350685 A JP2005350685 A JP 2005350685A JP 2005350685 A JP2005350685 A JP 2005350685A JP 2006190997 A5 JP2006190997 A5 JP 2006190997A5
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Japan
Prior art keywords
liquid
exposure
substrate
measurement
exposure apparatus
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JP2005350685A
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English (en)
Japanese (ja)
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JP2006190997A (ja
JP4752473B2 (ja
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Priority claimed from JP2005350685A external-priority patent/JP4752473B2/ja
Priority to JP2005350685A priority Critical patent/JP4752473B2/ja
Priority to PCT/JP2005/022634 priority patent/WO2006062188A1/ja
Priority to EP05814747A priority patent/EP1821338A4/en
Priority to KR1020077001616A priority patent/KR101281951B1/ko
Priority to US11/660,921 priority patent/US8035799B2/en
Priority to CN2005800355949A priority patent/CN101044593B/zh
Publication of JP2006190997A publication Critical patent/JP2006190997A/ja
Publication of JP2006190997A5 publication Critical patent/JP2006190997A5/ja
Publication of JP4752473B2 publication Critical patent/JP4752473B2/ja
Application granted granted Critical
Priority to US13/137,692 priority patent/US8913224B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2005350685A 2004-12-09 2005-12-05 露光装置、露光方法及びデバイス製造方法 Expired - Fee Related JP4752473B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2005350685A JP4752473B2 (ja) 2004-12-09 2005-12-05 露光装置、露光方法及びデバイス製造方法
US11/660,921 US8035799B2 (en) 2004-12-09 2005-12-09 Exposure apparatus, exposure method, and device producing method
EP05814747A EP1821338A4 (en) 2004-12-09 2005-12-09 EXPOSURE DEVICE, EXPOSURE METHOD AND MANUFACTURING METHOD FOR THE DEVICE
KR1020077001616A KR101281951B1 (ko) 2004-12-09 2005-12-09 노광 장치, 노광 방법 및 디바이스 제조 방법
PCT/JP2005/022634 WO2006062188A1 (ja) 2004-12-09 2005-12-09 露光装置、露光方法及びデバイス製造方法
CN2005800355949A CN101044593B (zh) 2004-12-09 2005-12-09 曝光装置、曝光方法及组件制造方法
US13/137,692 US8913224B2 (en) 2004-12-09 2011-09-02 Exposure apparatus, exposure method, and device producing method

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2004356535 2004-12-09
JP2004356535 2004-12-09
JP2005350685A JP4752473B2 (ja) 2004-12-09 2005-12-05 露光装置、露光方法及びデバイス製造方法

Publications (3)

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JP2006190997A JP2006190997A (ja) 2006-07-20
JP2006190997A5 true JP2006190997A5 (cg-RX-API-DMAC7.html) 2009-01-22
JP4752473B2 JP4752473B2 (ja) 2011-08-17

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JP2005350685A Expired - Fee Related JP4752473B2 (ja) 2004-12-09 2005-12-05 露光装置、露光方法及びデバイス製造方法

Country Status (6)

Country Link
US (2) US8035799B2 (cg-RX-API-DMAC7.html)
EP (1) EP1821338A4 (cg-RX-API-DMAC7.html)
JP (1) JP4752473B2 (cg-RX-API-DMAC7.html)
KR (1) KR101281951B1 (cg-RX-API-DMAC7.html)
CN (1) CN101044593B (cg-RX-API-DMAC7.html)
WO (1) WO2006062188A1 (cg-RX-API-DMAC7.html)

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Cited By (4)

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Publication number Priority date Publication date Assignee Title
US7733459B2 (en) 2003-08-29 2010-06-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8953144B2 (en) 2003-08-29 2015-02-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9025127B2 (en) 2003-08-29 2015-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9581914B2 (en) 2003-08-29 2017-02-28 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method

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