JP2006128614A - 多波長半導体レーザー素子 - Google Patents
多波長半導体レーザー素子 Download PDFInfo
- Publication number
- JP2006128614A JP2006128614A JP2005174742A JP2005174742A JP2006128614A JP 2006128614 A JP2006128614 A JP 2006128614A JP 2005174742 A JP2005174742 A JP 2005174742A JP 2005174742 A JP2005174742 A JP 2005174742A JP 2006128614 A JP2006128614 A JP 2006128614A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor laser
- ridge
- ridge portion
- laser device
- cladding layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08086—Multiple-wavelength emission
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08086—Multiple-wavelength emission
- H01S3/0809—Two-wavelenghth emission
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Abstract
【解決手段】本発明による半導体レーザー素子は、第1領域と第2領域とに分けられた上面を有する基板と、上記基板の第1領域上に順次に形成された第1導電型クラッド層、活性層及び第1リッジ部を有する第2導電型クラッド層を具備する高出力波長のLD部と、上記基板の第2領域上に順次に形成された第1導電型クラッド層、活性層及び第2リッジ部を有する第2導電型クラッド層を具備する低出力波長のLD部とを含み、上記第1及び第2リッジ部は対向する両端面間に延長され、上記第1リッジ部は2個以上の折曲部を有する折られた形態であり、上記第2リッジ部は直線型である。
【選択図】図2
Description
12 n型クラッド層
13 活性層
14 p型下部クラッド層
15 エッチング停止層
40、41 ミラー部
130a、130b、131a、131b リッジ部
Claims (10)
- 第1領域と第2領域とに分けられた上面を有する基板と、
上記基板の第1領域上に順次に形成された第1導電型クラッド層、活性層及び第1リッジ部を有する第2導電型クラッド層を具備する高出力波長のLD部と、
上記基板の第2領域上に順次に形成された第1導電型クラッド層、活性層及び第2リッジ部を有する第2導電型クラッド層を具備する低出力波長のLD部とを含み、
上記第1リッジ部及び第2リッジ部は対向する両端面間に延長され、上記第1リッジ部は2個以上の折曲部を有する折られた形態であり、上記第2リッジ部は直線型である多波長半導体レーザー素子。 - 上記第1リッジ部が上記折曲部において折られた角度は20°ないし160°である請求項1に記載の多波長半導体レーザー素子。
- 上記折曲部の両側中少なくとも一つは曲線形態である請求項1に記載の多波長半導体レーザー素子。
- 上記第1リッジ部が上記折曲部により重畳した部分を有する請求項1に記載の多波長半導体レーザー素子。
- 上記重畳した部分の間隔は10μm以上である請求項4に記載の多波長半導体レーザー素子。
- 上記折曲部の外側に位置した上記第1導電型クラッド層、活性層及び第2導電型クラッド層部分には溝形態のミラー部が形成されている請求項1に記載の多波長半導体レーザー素子。
- 上記ミラー部に隣接した部位の第1リッジ部の底幅は他部位の第1リッジ部の底幅より小さい請求項6に記載の多波長半導体レーザー素子。
- 上記ミラー部の端面には誘電体膜が形成されている請求項6に記載の多波長半導体レーザー素子。
- 上記高出力波長のLD部の上記第2導電型クラッド層は、上記第1リッジ部下方に形成された第2導電型下部クラッド層と、上記第1リッジ部に形成された第2導電型上部クラッド層とを含み、上記高出力波長のLD部は、上記第2導電型下部クラッド層と上記第2導電型上部クラッド層との間にエッチング停止層をさらに含む請求項1に記載の多波長半導体レーザー素子。
- 上記エッチング停止層は上記 第1リッジ部の直下方部分にのみ形成されている請求項9に記載の多波長半導体レーザー素子。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040087199A KR100568322B1 (ko) | 2004-10-29 | 2004-10-29 | 다파장 반도체 레이저 소자 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006128614A true JP2006128614A (ja) | 2006-05-18 |
JP4372052B2 JP4372052B2 (ja) | 2009-11-25 |
Family
ID=36261819
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005174742A Expired - Fee Related JP4372052B2 (ja) | 2004-10-29 | 2005-06-15 | 多波長半導体レーザー素子 |
Country Status (4)
Country | Link |
---|---|
US (1) | US7460579B2 (ja) |
JP (1) | JP4372052B2 (ja) |
KR (1) | KR100568322B1 (ja) |
CN (1) | CN100380755C (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008134870A1 (en) * | 2007-05-04 | 2008-11-13 | The Governors Of The University Of Alberta | A p-order metric uwb receiver structure with improved performance in multiple access interference-plus-noise multipath channels |
DE102008061152B4 (de) * | 2008-12-09 | 2017-03-02 | Osram Opto Semiconductors Gmbh | Optoelektronischer Halbleiterchip |
TWI530720B (zh) | 2012-06-01 | 2016-04-21 | 鴻海精密工業股份有限公司 | 光波導及光波導的製作方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62144378A (ja) | 1985-12-18 | 1987-06-27 | Sony Corp | 分布帰還覆半導体レ−ザ− |
JP2645871B2 (ja) * | 1988-10-20 | 1997-08-25 | キヤノン株式会社 | 多波長半導体レーザ装置 |
US5033053A (en) * | 1989-03-30 | 1991-07-16 | Canon Kabushiki Kaisha | Semiconductor laser device having plurality of layers for emitting lights of different wavelengths and method of driving the same |
JPH05102613A (ja) * | 1991-10-09 | 1993-04-23 | Fuji Xerox Co Ltd | 多波長半導体レーザ装置 |
US5465263A (en) * | 1992-12-12 | 1995-11-07 | Xerox Corporation | Monolithic, multiple wavelength, dual polarization laser diode arrays |
JPH10117040A (ja) | 1996-10-08 | 1998-05-06 | Nec Corp | 半導体レーザ素子及びその製造方法 |
JP3862894B2 (ja) * | 1999-08-18 | 2006-12-27 | 株式会社東芝 | 半導体レーザ装置 |
JP2001077457A (ja) * | 1999-09-08 | 2001-03-23 | Sony Corp | 半導体レーザおよびその製造方法 |
JP2001244570A (ja) | 2000-02-29 | 2001-09-07 | Sony Corp | 半導体レーザ、レーザカプラおよびデータ再生装置、データ記録装置ならびに半導体レーザの製造方法 |
JP2001257413A (ja) * | 2000-03-14 | 2001-09-21 | Toshiba Electronic Engineering Corp | 半導体レーザ装置及びその製造方法 |
US6456429B1 (en) * | 2000-11-15 | 2002-09-24 | Onetta, Inc. | Double-pass optical amplifier |
US20050105577A1 (en) * | 2003-11-13 | 2005-05-19 | Matsushita Electric Industrial Co., Ltd. | Semiconductor laser device and manufacturing method for the same |
-
2004
- 2004-10-29 KR KR1020040087199A patent/KR100568322B1/ko not_active IP Right Cessation
-
2005
- 2005-06-15 JP JP2005174742A patent/JP4372052B2/ja not_active Expired - Fee Related
- 2005-06-23 US US11/159,350 patent/US7460579B2/en not_active Expired - Fee Related
- 2005-06-24 CN CNB2005100800120A patent/CN100380755C/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US7460579B2 (en) | 2008-12-02 |
CN1767285A (zh) | 2006-05-03 |
JP4372052B2 (ja) | 2009-11-25 |
US20060093007A1 (en) | 2006-05-04 |
KR100568322B1 (ko) | 2006-04-05 |
CN100380755C (zh) | 2008-04-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5261857B2 (ja) | 端面発光型半導体レーザおよび半導体レーザ・モジュール | |
JP4952376B2 (ja) | 光導波路と半導体光集積素子の製造方法 | |
US20070195847A1 (en) | Semiconductor laser diode and integrated semiconductor optical waveguide device | |
JP5026905B2 (ja) | 半導体発光素子及びその製造方法 | |
US20060193353A1 (en) | High power single mode semiconductor laser device and fabrication method thereof | |
JP2010027935A (ja) | 半導体レーザ、光ディスク装置および光ピックアップ | |
JP2006128617A (ja) | 半導体レーザー素子及びその製造方法 | |
JP4372052B2 (ja) | 多波長半導体レーザー素子 | |
JP4077348B2 (ja) | 半導体レーザ装置およびそれを用いた光ピックアップ装置 | |
JP2006294984A (ja) | 半導体レーザ素子とその製造方法およびそれを用いた光ピックアップ装置 | |
JP2723045B2 (ja) | フレア構造半導体レーザ | |
JP2013165201A (ja) | 半導体光素子、半導体光モジュール、およびその製造方法 | |
US7095769B2 (en) | Semiconductor laser diode with higher-order mode absorption layers | |
CN113906640A (zh) | 半导体光集成元件及半导体光集成元件的制造方法 | |
JP2012038931A (ja) | 半導体レーザ素子 | |
WO2020255183A1 (ja) | 半導体光源素子および光半導体導波路窓構造の製造方法 | |
JP2007103403A (ja) | 半導体レーザ素子 | |
JP2006303052A (ja) | 半導体レーザ装置及び半導体レーザ装置の製造方法 | |
JP2007142227A (ja) | 半導体レーザ装置 | |
JP4274393B2 (ja) | 半導体発光装置 | |
KR100248431B1 (ko) | 방열구조를 갖는 고출력 반도체 레이저 | |
JP2004253543A (ja) | 半導体光増幅器 | |
JP2000232252A (ja) | 半導体光集積装置及びその作製方法 | |
JP2005158953A (ja) | 半導体レーザ素子およびその製造方法 | |
JP2006032778A (ja) | 半導体レーザ素子 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090106 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20090406 |
|
A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20090409 |
|
A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20090422 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20090804 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20090901 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120911 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120911 Year of fee payment: 3 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120911 Year of fee payment: 3 |
|
R360 | Written notification for declining of transfer of rights |
Free format text: JAPANESE INTERMEDIATE CODE: R360 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120911 Year of fee payment: 3 |
|
R370 | Written measure of declining of transfer procedure |
Free format text: JAPANESE INTERMEDIATE CODE: R370 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120911 Year of fee payment: 3 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120911 Year of fee payment: 3 |
|
R360 | Written notification for declining of transfer of rights |
Free format text: JAPANESE INTERMEDIATE CODE: R360 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20120911 Year of fee payment: 3 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
S631 | Written request for registration of reclamation of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313631 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130911 Year of fee payment: 4 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
S631 | Written request for registration of reclamation of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313631 |
|
S633 | Written request for registration of reclamation of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313633 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130911 Year of fee payment: 4 |
|
R371 | Transfer withdrawn |
Free format text: JAPANESE INTERMEDIATE CODE: R371 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130911 Year of fee payment: 4 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313111 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R371 | Transfer withdrawn |
Free format text: JAPANESE INTERMEDIATE CODE: R371 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20130911 Year of fee payment: 4 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |