JP2005507353A - チタニアドープ溶融シリカ極紫外線リソグラフィー用ガラス基板 - Google Patents

チタニアドープ溶融シリカ極紫外線リソグラフィー用ガラス基板 Download PDF

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Publication number
JP2005507353A
JP2005507353A JP2002585343A JP2002585343A JP2005507353A JP 2005507353 A JP2005507353 A JP 2005507353A JP 2002585343 A JP2002585343 A JP 2002585343A JP 2002585343 A JP2002585343 A JP 2002585343A JP 2005507353 A JP2005507353 A JP 2005507353A
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JP
Japan
Prior art keywords
porous preform
glass
titania
burner
dense
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002585343A
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English (en)
Japanese (ja)
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JP2005507353A5 (enExample
Inventor
ジー アッカーマン，ブラッドフォード
イー アーディナ，ケネス
エイ ムーア，リサ
ジェイ ルッソ，ニッキ
シー ユー，チュンツェ
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Corning Inc
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Corning Inc
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Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of JP2005507353A publication Critical patent/JP2005507353A/ja
Publication of JP2005507353A5 publication Critical patent/JP2005507353A5/ja
Pending legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1484—Means for supporting, rotating or translating the article being formed
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/60—Relationship between burner and deposit, e.g. position
    • C03B2207/62—Distance
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/70—Control measures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Glass Compositions (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Glass Melting And Manufacturing (AREA)
JP2002585343A 2001-04-27 2002-03-25 チタニアドープ溶融シリカ極紫外線リソグラフィー用ガラス基板 Pending JP2005507353A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/844,947 US8047023B2 (en) 2001-04-27 2001-04-27 Method for producing titania-doped fused silica glass
PCT/US2002/009461 WO2002088036A1 (en) 2001-04-27 2002-03-25 Method for producing titania-doped fused silica extreme ultraviolet lithography substrates glass

Publications (2)

Publication Number Publication Date
JP2005507353A true JP2005507353A (ja) 2005-03-17
JP2005507353A5 JP2005507353A5 (enExample) 2005-12-22

Family

ID=25294029

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002585343A Pending JP2005507353A (ja) 2001-04-27 2002-03-25 チタニアドープ溶融シリカ極紫外線リソグラフィー用ガラス基板

Country Status (5)

Country Link
US (1) US8047023B2 (enExample)
EP (1) EP1390309B1 (enExample)
JP (1) JP2005507353A (enExample)
TW (1) TW568889B (enExample)
WO (1) WO2002088036A1 (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005194118A (ja) * 2004-01-05 2005-07-21 Asahi Glass Co Ltd シリカガラス
JP2008505827A (ja) * 2004-05-17 2008-02-28 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 石英ガラスブランクおよびその製造方法
WO2011021609A1 (ja) * 2009-08-19 2011-02-24 旭硝子株式会社 ＴｉＯ2を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材
JP2013530517A (ja) * 2010-05-03 2013-07-25 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｅｕｖリソグラフィ用ミラーの基板およびその製造方法
JP2013224261A (ja) * 2003-04-03 2013-10-31 Asahi Glass Co Ltd ＴｉＯ２を含有するシリカガラスおよびその製造法

Families Citing this family (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030226377A1 (en) * 2002-03-05 2003-12-11 Barrett W. Tim Method of making silica-titania extreme ultraviolet elements
KR100556141B1 (ko) * 2003-03-27 2006-03-03 호야 가부시키가이샤 마스크 블랭크용 유리 기판 제조 방법 및 마스크 블랭크제조 방법
JP4219718B2 (ja) * 2003-03-28 2009-02-04 Ｈｏｙａ株式会社 Ｅｕｖマスクブランクス用ガラス基板の製造方法及びｅｕｖマスクブランクスの製造方法
JP4792705B2 (ja) † 2003-04-03 2011-10-12 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびその製造法
JP5367204B2 (ja) 2003-04-03 2013-12-11 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材
JP2010275189A (ja) * 2003-04-03 2010-12-09 Asahi Glass Co Ltd ＴｉＯ２を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材
JP4792706B2 (ja) 2003-04-03 2011-10-12 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびその製造方法
JP5402975B2 (ja) * 2003-04-03 2014-01-29 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびその製造法
EP1471038A3 (de) * 2003-04-26 2005-11-23 Schott Ag Verfahren zur Herstellung von Glaskörpern aus dotiertem Quarzglas
DE10359102A1 (de) * 2003-12-17 2005-07-21 Carl Zeiss Smt Ag Optische Komponente umfassend ein Material mit einer vorbestimmten Homogenität der thermischen Längsausdehnung
DE102004015766B4 (de) * 2004-03-23 2016-05-12 Asahi Glass Co., Ltd. Verwendung eines SiO2-TiO2-Glases als strahlungsresistentes Substrat
JP4957249B2 (ja) * 2004-07-01 2012-06-20 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびその製造方法
JP4487783B2 (ja) * 2005-01-25 2010-06-23 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスの製造方法およびＴｉＯ２を含有するシリカガラスを用いたＥＵＶリソグラフィ用光学部材
KR100651453B1 (ko) * 2005-10-21 2006-11-29 삼성전자주식회사 수트 모재의 제조 장치
TW200940472A (en) 2007-12-27 2009-10-01 Asahi Glass Co Ltd TiO2-containing silica glass
JP5365247B2 (ja) 2008-02-25 2013-12-11 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材
WO2009107858A1 (en) * 2008-02-26 2009-09-03 Asahi Glass Co., Ltd. Tio2-containing silica glass and optical member for euv lithography using high energy densities as well as special temperature controlled process for its manufacture
JP5417884B2 (ja) * 2008-02-27 2014-02-19 旭硝子株式会社 ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材
EP2250133A1 (en) * 2008-02-29 2010-11-17 Asahi Glass Company, Limited Tio2-containing silica glass and optical member for lithography using the same
JP5644058B2 (ja) * 2008-03-21 2014-12-24 旭硝子株式会社 ＴｉＯ２を含有するシリカガラス
JP2009274947A (ja) 2008-04-16 2009-11-26 Asahi Glass Co Ltd ＴｉＯ２を含有するＥＵＶリソグラフィ光学部材用シリカガラス
JP2010135732A (ja) 2008-08-01 2010-06-17 Asahi Glass Co Ltd Ｅｕｖマスクブランクス用基板
US20100124709A1 (en) * 2008-11-20 2010-05-20 Daniel Warren Hawtof Image mask assembly for photolithography
EP2377826B2 (en) † 2009-01-13 2020-05-27 AGC Inc. OPTICAL MEMBER COMPRISING SILICA GLASS CONTAINING TiO2
US8735308B2 (en) * 2009-01-13 2014-05-27 Asahi Glass Company, Limited Optical member comprising TiO2-containing silica glass
WO2010098352A1 (ja) * 2009-02-24 2010-09-02 旭硝子株式会社 多孔質石英ガラス体の製造方法およびｅｕｖリソグラフィ用光学部材
DE102010039779A1 (de) * 2009-08-28 2011-03-24 Corning Inc. Glas mit geringer wärmeausdehnung für euvl-anwendungen
US8567214B2 (en) * 2010-06-28 2013-10-29 Asahi Glass Company, Limited Method for producing glass body and method for producing optical member for EUV lithography
JPWO2012105513A1 (ja) 2011-01-31 2014-07-03 旭硝子株式会社 チタニアを含有するシリカガラス体の製造方法およびチタニアを含有するシリカガラス体
JP5640920B2 (ja) * 2011-08-18 2014-12-17 信越化学工業株式会社 チタニアドープ石英ガラス及びその製造方法
DE102012013134B4 (de) * 2012-07-03 2014-04-03 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von Zylindern aus Quarzglas
US8987155B2 (en) 2012-08-30 2015-03-24 Corning Incorporated Niobium doped silica titania glass and method of preparation
US9382151B2 (en) 2014-01-31 2016-07-05 Corning Incorporated Low expansion silica-titania articles with a Tzc gradient by compositional variation
US9382150B2 (en) 2014-03-14 2016-07-05 Corning Incorporated Boron-doped titania-silica glass having very low CTE slope
EP3209615A4 (en) 2014-10-20 2018-07-04 Navus Automation, Inc. Fused silica furnace system&method for continuous production of fused silica
PL3218317T3 (pl) 2014-11-13 2019-03-29 Gerresheimer Glas Gmbh Filtr cząstek urządzenia do wytwarzania szkła, jednostka tłoka, głowica dmuchu, wspornik głowicy dmuchu i urządzenie do wytwarzania szkła, przystosowane lub zawierające filtr
US9580350B2 (en) 2014-11-19 2017-02-28 Corning Incorporated High hydroxyl TiO2-SiO2 glass
WO2016085915A1 (en) 2014-11-26 2016-06-02 Corning Incorporated Doped silica-titania glass having low expansivity and methods of making the same

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JPS57100930A (en) * 1980-12-12 1982-06-23 Nippon Telegr & Teleph Corp <Ntt> Preparation of base material for optical fiber
US4440558A (en) * 1982-06-14 1984-04-03 International Telephone And Telegraph Corporation Fabrication of optical preforms by axial chemical vapor deposition
US5067975A (en) * 1989-12-22 1991-11-26 Corning Incorporated Method of manufacturing optical waveguide fiber with titania-silica outer cladding
US5152819A (en) * 1990-08-16 1992-10-06 Corning Incorporated Method of making fused silica
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JP2818349B2 (ja) * 1993-03-18 1998-10-30 信越化学工業株式会社 石英ガラス母材の製造方法
JP4350168B2 (ja) 1997-03-07 2009-10-21 コーニング インコーポレイテッド チタニアドープ溶融シリカの製造方法
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US6242136B1 (en) * 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6265115B1 (en) * 1999-03-15 2001-07-24 Corning Incorporated Projection lithography photomask blanks, preforms and methods of making
USRE41220E1 (en) 1999-07-22 2010-04-13 Corning Incorporated Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements
KR100647968B1 (ko) 1999-07-22 2006-11-17 코닝 인코포레이티드 극 자외선 소프트 ｘ-선 투사 리소그라피 방법 및 마스크디바이스
US6606883B2 (en) * 2001-04-27 2003-08-19 Corning Incorporated Method for producing fused silica and doped fused silica glass

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013224261A (ja) * 2003-04-03 2013-10-31 Asahi Glass Co Ltd ＴｉＯ２を含有するシリカガラスおよびその製造法
JP2005194118A (ja) * 2004-01-05 2005-07-21 Asahi Glass Co Ltd シリカガラス
JP2008505827A (ja) * 2004-05-17 2008-02-28 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 石英ガラスブランクおよびその製造方法
WO2011021609A1 (ja) * 2009-08-19 2011-02-24 旭硝子株式会社 ＴｉＯ2を含有するシリカガラスおよびＥＵＶリソグラフィ用光学部材
JP2013530517A (ja) * 2010-05-03 2013-07-25 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｅｕｖリソグラフィ用ミラーの基板およびその製造方法

Also Published As

Publication number Publication date
US20020157421A1 (en) 2002-10-31
US8047023B2 (en) 2011-11-01
WO2002088036A1 (en) 2002-11-07
EP1390309A4 (en) 2004-12-08
TW568889B (en) 2004-01-01
EP1390309A1 (en) 2004-02-25
EP1390309B1 (en) 2016-12-21

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