EP1390309A4 - Method for producing titania-doped fused silica extreme ultraviolet lithography substrates glass - Google Patents

Method for producing titania-doped fused silica extreme ultraviolet lithography substrates glass

Info

Publication number
EP1390309A4
EP1390309A4 EP02723639A EP02723639A EP1390309A4 EP 1390309 A4 EP1390309 A4 EP 1390309A4 EP 02723639 A EP02723639 A EP 02723639A EP 02723639 A EP02723639 A EP 02723639A EP 1390309 A4 EP1390309 A4 EP 1390309A4
Authority
EP
European Patent Office
Prior art keywords
fused silica
extreme ultraviolet
ultraviolet lithography
doped fused
producing titania
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP02723639A
Other languages
German (de)
French (fr)
Other versions
EP1390309A1 (en
EP1390309B1 (en
Inventor
Bradford G Ackerman
Kenneth E Hrdina
Lisa A Moore
Nikki J Russo
Chunzhe C Yu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of EP1390309A1 publication Critical patent/EP1390309A1/en
Publication of EP1390309A4 publication Critical patent/EP1390309A4/en
Application granted granted Critical
Publication of EP1390309B1 publication Critical patent/EP1390309B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1484—Means for supporting, rotating or translating the article being formed
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/60—Relationship between burner and deposit, e.g. position
    • C03B2207/62—Distance
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/70—Control measures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/08—Doped silica-based glasses containing boron or halide
    • C03C2201/12—Doped silica-based glasses containing boron or halide containing fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
EP02723639.7A 2001-04-27 2002-03-25 Method for producing titania-doped fused silica extreme ultraviolet lithography substrates glass Expired - Lifetime EP1390309B1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/844,947 US8047023B2 (en) 2001-04-27 2001-04-27 Method for producing titania-doped fused silica glass
US844947 2001-04-27
PCT/US2002/009461 WO2002088036A1 (en) 2001-04-27 2002-03-25 Method for producing titania-doped fused silica extreme ultraviolet lithography substrates glass

Publications (3)

Publication Number Publication Date
EP1390309A1 EP1390309A1 (en) 2004-02-25
EP1390309A4 true EP1390309A4 (en) 2004-12-08
EP1390309B1 EP1390309B1 (en) 2016-12-21

Family

ID=25294029

Family Applications (1)

Application Number Title Priority Date Filing Date
EP02723639.7A Expired - Lifetime EP1390309B1 (en) 2001-04-27 2002-03-25 Method for producing titania-doped fused silica extreme ultraviolet lithography substrates glass

Country Status (5)

Country Link
US (1) US8047023B2 (en)
EP (1) EP1390309B1 (en)
JP (1) JP2005507353A (en)
TW (1) TW568889B (en)
WO (1) WO2002088036A1 (en)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030226377A1 (en) * 2002-03-05 2003-12-11 Barrett W. Tim Method of making silica-titania extreme ultraviolet elements
KR100556141B1 (en) * 2003-03-27 2006-03-03 호야 가부시키가이샤 Method of producing a glass substrate for a mask blank and method of producing a mask blank
JP4219718B2 (en) * 2003-03-28 2009-02-04 Ｈｏｙａ株式会社 Manufacturing method of glass substrate for EUV mask blanks and manufacturing method of EUV mask blanks
JP2010275189A (en) * 2003-04-03 2010-12-09 Asahi Glass Co Ltd SILICA GLASS CONTAINING TiO2 AND OPTICAL MEMBER FOR EUV LITHOGRAPHY
JP2011168485A (en) * 2003-04-03 2011-09-01 Asahi Glass Co Ltd SILICA GLASS CONTAINING TiO2 AND METHOD OF PRODUCING THE SAME
JP5402975B2 (en) * 2003-04-03 2014-01-29 旭硝子株式会社 Silica glass containing TiO2 and method for producing the same
JP5367204B2 (en) * 2003-04-03 2013-12-11 旭硝子株式会社 Silica glass containing TiO2 and optical member for EUV lithography
JP4792705B2 (en) * 2003-04-03 2011-10-12 旭硝子株式会社 Silica glass containing TiO2 and method for producing the same
JP4792706B2 (en) * 2003-04-03 2011-10-12 旭硝子株式会社 Silica glass containing TiO2 and method for producing the same
DE202004021665U1 (en) * 2003-04-26 2009-11-26 Schott Ag Glass body of doped quartz glass
DE10359102A1 (en) * 2003-12-17 2005-07-21 Carl Zeiss Smt Ag Optical component comprises a material with a longitudinal expansion coefficient which is spatially dependent
JP4492123B2 (en) * 2004-01-05 2010-06-30 旭硝子株式会社 Silica glass
DE102004015766B4 (en) * 2004-03-23 2016-05-12 Asahi Glass Co., Ltd. Use of a SiO 2 -tiO 2 glass as a radiation-resistant substrate
DE102004024808B4 (en) * 2004-05-17 2006-11-09 Heraeus Quarzglas Gmbh & Co. Kg Quartz glass blank for an optical component for transmitting extremely short-wave ultraviolet radiation
WO2006004169A1 (en) * 2004-07-01 2006-01-12 Asahi Glass Company, Limited Silica glass containing tio2 and process for its production
JP4487783B2 (en) * 2005-01-25 2010-06-23 旭硝子株式会社 Method for producing silica glass containing TiO2 and optical member for EUV lithography using silica glass containing TiO2
KR100651453B1 (en) * 2005-10-21 2006-11-29 삼성전자주식회사 Apparatus for fabricating soot preform
TW200940472A (en) * 2007-12-27 2009-10-01 Asahi Glass Co Ltd TiO2-containing silica glass
JP5365247B2 (en) 2008-02-25 2013-12-11 旭硝子株式会社 Silica glass containing TiO2 and optical member for lithography using the same
EP2247546B1 (en) * 2008-02-26 2016-02-24 Asahi Glass Company, Limited Tio2-containing silica glass and optical member for euv lithography using high energy densities as well as special temperature controlled process for its manufacture
JP5417884B2 (en) * 2008-02-27 2014-02-19 旭硝子株式会社 Silica glass containing TiO2 and optical member for lithography using the same
EP2250133A1 (en) * 2008-02-29 2010-11-17 Asahi Glass Company, Limited Tio2-containing silica glass and optical member for lithography using the same
JP5644058B2 (en) * 2008-03-21 2014-12-24 旭硝子株式会社 Silica glass containing TiO2
JP2009274947A (en) 2008-04-16 2009-11-26 Asahi Glass Co Ltd Silica glass for euv lithography optical component containing tio2
JP2010135732A (en) 2008-08-01 2010-06-17 Asahi Glass Co Ltd Substrate for euv mask blanks
US20100124709A1 (en) * 2008-11-20 2010-05-20 Daniel Warren Hawtof Image mask assembly for photolithography
US8735308B2 (en) * 2009-01-13 2014-05-27 Asahi Glass Company, Limited Optical member comprising TiO2-containing silica glass
KR101740067B1 (en) † 2009-01-13 2017-05-25 아사히 가라스 가부시키가이샤 OPTICAL MEMBER COMPRISING SILICA GLASS CONTAINING TiO
JP5578167B2 (en) * 2009-02-24 2014-08-27 旭硝子株式会社 Method for producing porous quartz glass body and optical member for EUV lithography
JPWO2011021609A1 (en) 2009-08-19 2013-01-24 旭硝子株式会社 Silica glass containing TiO2 and optical member for EUV lithography
DE102010039779A1 (en) * 2009-08-28 2011-03-24 Corning Inc. GLASS WITH LOW HEAT EXTENSION FOR EUVL APPLICATIONS
DE102010028488A1 (en) * 2010-05-03 2011-11-03 Carl Zeiss Smt Gmbh Substrates for mirrors for EUV lithography and their preparation
JP2012031052A (en) * 2010-06-28 2012-02-16 Asahi Glass Co Ltd Method for producing glass body and method for producing optical member for euv lithography
EP2671848A1 (en) 2011-01-31 2013-12-11 Asahi Glass Company, Limited Method for producing silica glass body containing titania, and silica glass body containing titania
JP5640920B2 (en) * 2011-08-18 2014-12-17 信越化学工業株式会社 Titania-doped quartz glass and method for producing the same
DE102012013134B4 (en) * 2012-07-03 2014-04-03 Heraeus Quarzglas Gmbh & Co. Kg Process for the production of cylinders made of quartz glass
US8987155B2 (en) 2012-08-30 2015-03-24 Corning Incorporated Niobium doped silica titania glass and method of preparation
US9382151B2 (en) 2014-01-31 2016-07-05 Corning Incorporated Low expansion silica-titania articles with a Tzc gradient by compositional variation
US9382150B2 (en) * 2014-03-14 2016-07-05 Corning Incorporated Boron-doped titania-silica glass having very low CTE slope
EP3209615A4 (en) 2014-10-20 2018-07-04 Navus Automation, Inc. Fused silica furnace system&method for continuous production of fused silica
PL3218317T3 (en) 2014-11-13 2019-03-29 Gerresheimer Glas Gmbh Glass forming machine particle filter, a plunger unit, a blow head, a blow head support and a glass forming machine adapted to or comprising said filter
US9580350B2 (en) 2014-11-19 2017-02-28 Corning Incorporated High hydroxyl TiO2-SiO2 glass
US10017413B2 (en) 2014-11-26 2018-07-10 Corning Incorporated Doped silica-titania glass having low expansivity and methods of making the same

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2326059A (en) * 1939-04-22 1943-08-03 Corning Glass Works Glass having an expansion lower than that of silica
US5067975A (en) * 1989-12-22 1991-11-26 Corning Incorporated Method of manufacturing optical waveguide fiber with titania-silica outer cladding
EP0471139A2 (en) * 1990-08-16 1992-02-19 Corning Incorporated Method of making high purity, non-porous fused silica bodies
WO1998039496A1 (en) * 1997-03-07 1998-09-11 Corning Incorporated Method of making titania-doped fused silica
WO1999054259A1 (en) * 1998-04-22 1999-10-28 Corning Incorporated Methods for making ultra-low expansion silica-titania glasses
WO2000055689A1 (en) * 1999-03-15 2000-09-21 Corning Incorporated Projection lithography photomask blanks, preforms and method of making
WO2001008163A1 (en) * 1999-07-22 2001-02-01 Corning Incorporated Extreme ultraviolet soft x-ray projection lithographic method system and lithography elements

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3806570A (en) * 1972-03-30 1974-04-23 Corning Glass Works Method for producing high quality fused silica
JPS57100930A (en) * 1980-12-12 1982-06-23 Nippon Telegr & Teleph Corp <Ntt> Preparation of base material for optical fiber
US4440558A (en) 1982-06-14 1984-04-03 International Telephone And Telegraph Corporation Fabrication of optical preforms by axial chemical vapor deposition
US5152819A (en) * 1990-08-16 1992-10-06 Corning Incorporated Method of making fused silica
JP2818349B2 (en) * 1993-03-18 1998-10-30 信越化学工業株式会社 Manufacturing method of quartz glass base material
JP2818350B2 (en) * 1993-03-18 1998-10-30 信越化学工業株式会社 Manufacturing method of quartz glass base material
EP1030822B1 (en) 1997-09-24 2010-06-23 Corning Incorporated FUSED SiO2-TiO2 GLASS METHOD
EP1010672A1 (en) * 1998-12-17 2000-06-21 PIRELLI CAVI E SISTEMI S.p.A. Method and apparatus for forming an optical fiber preform by combustionless hydrolysis
US6242136B1 (en) 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
AU5932500A (en) 1999-07-22 2001-02-13 Corning Incorporated Extreme ultraviolet soft x-ray projection lithographic method and mask devices
US6606883B2 (en) 2001-04-27 2003-08-19 Corning Incorporated Method for producing fused silica and doped fused silica glass

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2326059A (en) * 1939-04-22 1943-08-03 Corning Glass Works Glass having an expansion lower than that of silica
US5067975A (en) * 1989-12-22 1991-11-26 Corning Incorporated Method of manufacturing optical waveguide fiber with titania-silica outer cladding
EP0471139A2 (en) * 1990-08-16 1992-02-19 Corning Incorporated Method of making high purity, non-porous fused silica bodies
WO1998039496A1 (en) * 1997-03-07 1998-09-11 Corning Incorporated Method of making titania-doped fused silica
WO1999054259A1 (en) * 1998-04-22 1999-10-28 Corning Incorporated Methods for making ultra-low expansion silica-titania glasses
WO2000055689A1 (en) * 1999-03-15 2000-09-21 Corning Incorporated Projection lithography photomask blanks, preforms and method of making
WO2001008163A1 (en) * 1999-07-22 2001-02-01 Corning Incorporated Extreme ultraviolet soft x-ray projection lithographic method system and lithography elements

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 0134, no. 61 (C - 645) 18 October 1989 (1989-10-18) *
See also references of WO02088036A1 *

Also Published As

Publication number Publication date
EP1390309A1 (en) 2004-02-25
WO2002088036A1 (en) 2002-11-07
EP1390309B1 (en) 2016-12-21
TW568889B (en) 2004-01-01
JP2005507353A (en) 2005-03-17
US20020157421A1 (en) 2002-10-31
US8047023B2 (en) 2011-11-01

Similar Documents

Publication Publication Date Title
EP1390309A4 (en) Method for producing titania-doped fused silica extreme ultraviolet lithography substrates glass
WO2003077038A3 (en) Reduced striae extreme ultraviolegt lithographic elements, a method of manufacturing the same and a method of measuring striae
WO2001083388A8 (en) Glass preform and methods and apparatus for manufacture thereof
AU2002308572A8 (en) Method for separating silica waveguides
IL159728A0 (en) Method for producing micro-electromechanical components
EP1475355A4 (en) Method for producing float glass
EP1440950A4 (en) Optical glass suitable for mold forming
AU2002231350A1 (en) Attenuating extreme ultraviolet (euv) phase-shifting mask fabrication method
TWI350276B (en) Deuteroxyl-doped silica glass, optical member and lithographic system comprising same and method of making same
TWI318198B (en) Highly durable silica glass, process for producing same, member comprised thereof, and apparatus provided therewith
NO20033920D0 (en) Process for making a quartz glass crucible
EP1256547A4 (en) Method for producing silica particles, synthetic quartz powder and synthetic quartz glass
GB2334254B (en) Method of fabricating silica glass by sol-gel process
SG102709A1 (en) Method for producing float glass
AU2002307174A8 (en) Method for making doped silica glass by vapour deposition
EP1460691A4 (en) Method for producing cemented wafer
EP1623963A4 (en) Process for producing high silicate glass and high silicate glass
DK1437328T3 (en) Process for making a film of silica
EP1457794A4 (en) Method for forming optical waveguide
HK1048800A1 (en) An optical glass for molding
AU2002254407A1 (en) Method for producing titania-doped fused silica extreme ultraviolet lithography substrates glass
AU2002353351A1 (en) Lithography process for transparent substrates
EP1140715A4 (en) Burners for producing boules of fused silica glass
DK1403225T3 (en) Process for making a glass pane
AU2001245816A1 (en) Method of making a titania-doped fused silica preform

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20031022

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR

AX Request for extension of the european patent

Extension state: AL LT LV MK RO SI

A4 Supplementary search report drawn up and despatched

Effective date: 20041025

RIC1 Information provided on ipc code assigned before grant

Ipc: 7C 03B 19/14 B

Ipc: 7C 03C 3/06 B

Ipc: 7C 03B 8/04 A

Ipc: 7C 03B 37/014 B

Ipc: 7C 03C 3/076 B

REG Reference to a national code

Ref country code: DE

Ref legal event code: R079

Ref document number: 60248570

Country of ref document: DE

Free format text: PREVIOUS MAIN CLASS: C03B0008040000

Ipc: C03C0004000000

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

RIC1 Information provided on ipc code assigned before grant

Ipc: C03C 4/00 20060101AFI20160715BHEP

Ipc: C03B 19/14 20060101ALI20160715BHEP

Ipc: C03C 3/076 20060101ALI20160715BHEP

Ipc: C03C 3/06 20060101ALI20160715BHEP

INTG Intention to grant announced

Effective date: 20160803

RBV Designated contracting states (corrected)

Designated state(s): DE FR GB NL

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: GRANT OF PATENT IS INTENDED

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE PATENT HAS BEEN GRANTED

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): DE FR GB NL

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 60248570

Country of ref document: DE

REG Reference to a national code

Ref country code: NL

Ref legal event code: FP

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 60248570

Country of ref document: DE

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed

Effective date: 20170922

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

Effective date: 20171130

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170331

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 20200227

Year of fee payment: 19

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20210210

Year of fee payment: 20

Ref country code: GB

Payment date: 20210311

Year of fee payment: 20

REG Reference to a national code

Ref country code: NL

Ref legal event code: MM

Effective date: 20210401

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20210401

REG Reference to a national code

Ref country code: DE

Ref legal event code: R071

Ref document number: 60248570

Country of ref document: DE

REG Reference to a national code

Ref country code: GB

Ref legal event code: PE20

Expiry date: 20220324

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF EXPIRATION OF PROTECTION

Effective date: 20220324