AU2001245816A1 - Method of making a titania-doped fused silica preform - Google Patents
Method of making a titania-doped fused silica preformInfo
- Publication number
- AU2001245816A1 AU2001245816A1 AU2001245816A AU4581601A AU2001245816A1 AU 2001245816 A1 AU2001245816 A1 AU 2001245816A1 AU 2001245816 A AU2001245816 A AU 2001245816A AU 4581601 A AU4581601 A AU 4581601A AU 2001245816 A1 AU2001245816 A1 AU 2001245816A1
- Authority
- AU
- Australia
- Prior art keywords
- titania
- making
- fused silica
- doped fused
- silica preform
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
- C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
- C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/80—Feeding the burner or the burner-heated deposition site
- C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
- C03B2207/87—Controlling the temperature
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US58034800A | 2000-05-25 | 2000-05-25 | |
US09580348 | 2000-05-25 | ||
PCT/US2001/008521 WO2001092172A1 (en) | 2000-05-25 | 2001-03-16 | Method of making a titania-doped fused silica preform |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001245816A1 true AU2001245816A1 (en) | 2001-12-11 |
Family
ID=24320714
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001245816A Abandoned AU2001245816A1 (en) | 2000-05-25 | 2001-03-16 | Method of making a titania-doped fused silica preform |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1283819A1 (en) |
JP (1) | JP2004509041A (en) |
KR (1) | KR20030005387A (en) |
AU (1) | AU2001245816A1 (en) |
WO (1) | WO2001092172A1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2005113857A1 (en) * | 2004-05-20 | 2005-12-01 | Akzo Nobel N.V. | Bubbler for constant vapor delivery of a solid chemical |
US7470974B2 (en) | 2006-07-14 | 2008-12-30 | Cabot Corporation | Substantially transparent material for use with light-emitting device |
JP5640920B2 (en) | 2011-08-18 | 2014-12-17 | 信越化学工業株式会社 | Titania-doped quartz glass and method for producing the same |
DE102011121356A1 (en) | 2011-12-19 | 2013-06-20 | Heraeus Quarzglas Gmbh & Co. Kg | Process for the production of synthetic quartz glass |
DE102013202256B3 (en) * | 2013-02-12 | 2014-07-17 | Heraeus Quarzglas Gmbh & Co. Kg | Process for the production of titanium-doped synthetic quartz glass and its use |
US20220033294A1 (en) * | 2018-09-14 | 2022-02-03 | Sumitomo Electric Industries, Ltd. | Method for manufacturing glass fine particle deposit and method for manufacturing glass base material |
JP7449842B2 (en) * | 2020-11-02 | 2024-03-14 | 信越化学工業株式会社 | Manufacturing method and manufacturing device for porous glass base material |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE438752A (en) * | 1939-04-22 | |||
US5154744A (en) * | 1991-08-26 | 1992-10-13 | Corning Incorporated | Method of making titania-doped fused silica |
US5558687A (en) * | 1994-12-30 | 1996-09-24 | Corning Incorporated | Vertical, packed-bed, film evaporator for halide-free, silicon-containing compounds |
JP4108926B2 (en) * | 1997-09-24 | 2008-06-25 | コーニング インコーポレイテッド | Method for producing molten SiO2-TiO2 glass |
EP1094990A1 (en) * | 1998-04-22 | 2001-05-02 | Corning Incorporated | Methods for making ultra-low expansion silica-titania glasses |
-
2001
- 2001-03-16 EP EP01918777A patent/EP1283819A1/en not_active Withdrawn
- 2001-03-16 KR KR1020027015845A patent/KR20030005387A/en not_active Application Discontinuation
- 2001-03-16 AU AU2001245816A patent/AU2001245816A1/en not_active Abandoned
- 2001-03-16 JP JP2001588149A patent/JP2004509041A/en not_active Withdrawn
- 2001-03-16 WO PCT/US2001/008521 patent/WO2001092172A1/en active Search and Examination
Also Published As
Publication number | Publication date |
---|---|
KR20030005387A (en) | 2003-01-17 |
EP1283819A1 (en) | 2003-02-19 |
WO2001092172A1 (en) | 2001-12-06 |
JP2004509041A (en) | 2004-03-25 |
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