WO2003077038A3 - Reduced striae extreme ultraviolegt lithographic elements, a method of manufacturing the same and a method of measuring striae - Google Patents

Reduced striae extreme ultraviolegt lithographic elements, a method of manufacturing the same and a method of measuring striae Download PDF

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Publication number
WO2003077038A3
WO2003077038A3 PCT/US2003/006825 US0306825W WO03077038A3 WO 2003077038 A3 WO2003077038 A3 WO 2003077038A3 US 0306825 W US0306825 W US 0306825W WO 03077038 A3 WO03077038 A3 WO 03077038A3
Authority
WO
WIPO (PCT)
Prior art keywords
striae
manufacturing
extreme
ultraviolegt
measuring
Prior art date
Application number
PCT/US2003/006825
Other languages
French (fr)
Other versions
WO2003077038A2 (en
Inventor
Kenneth E Hrdina
John E Maxon
Brent R Mclean
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27805120&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=WO2003077038(A3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Corning Inc filed Critical Corning Inc
Priority to AU2003220982A priority Critical patent/AU2003220982A1/en
Priority to DE60332429T priority patent/DE60332429D1/en
Priority to JP2003575191A priority patent/JP2005519349A/en
Priority to EP03744207A priority patent/EP1481288B1/en
Priority to KR1020047013806A priority patent/KR101190914B1/en
Publication of WO2003077038A2 publication Critical patent/WO2003077038A2/en
Publication of WO2003077038A3 publication Critical patent/WO2003077038A3/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1446—Means for after-treatment or catching of worked reactant gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1484—Means for supporting, rotating or translating the article being formed
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C4/00—Compositions for glass with special properties
    • C03C4/0085—Compositions for glass with special properties for UV-transmitting glass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/52—Reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/60—Relationship between burner and deposit, e.g. position
    • C03B2207/62—Distance
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/60—Relationship between burner and deposit, e.g. position
    • C03B2207/66—Relative motion
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2201/00—Glass compositions
    • C03C2201/06—Doped silica-based glasses
    • C03C2201/30—Doped silica-based glasses containing metals
    • C03C2201/40—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03C2201/42—Doped silica-based glasses containing metals containing transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn containing titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2203/00—Production processes
    • C03C2203/40—Gas-phase processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Nanotechnology (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • General Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Glass Compositions (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

Titania-containing silica glass bodies and extreme ultraviolet elements having low levels of striae are disclosed. Methods and apparatus for manufacturing and measuring striae in glass elements and extreme ultraviolet elements are also disclosed.
PCT/US2003/006825 2002-03-05 2003-03-04 Reduced striae extreme ultraviolegt lithographic elements, a method of manufacturing the same and a method of measuring striae WO2003077038A2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
AU2003220982A AU2003220982A1 (en) 2002-03-05 2003-03-04 Reduced striae extreme ultraviolegt lithographic elements, a method of manufacturing the same and a method of measuring striae
DE60332429T DE60332429D1 (en) 2002-03-05 2003-03-04 EXTREMELY ULTRAVIOLET LITHOGRAPHIC ELEMENTS WITH REDUCED SLICES AND METHOD FOR THE PRODUCTION THEREOF
JP2003575191A JP2005519349A (en) 2002-03-05 2003-03-04 Low striation extreme ultraviolet optical element
EP03744207A EP1481288B1 (en) 2002-03-05 2003-03-04 Reduced striae extreme ultraviolet lithographic elements and a method of manufacturing the same
KR1020047013806A KR101190914B1 (en) 2002-03-05 2003-03-04 Reduced striae extreme ultraviolet elements

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US36205202P 2002-03-05 2002-03-05
US60/362,052 2002-03-05

Publications (2)

Publication Number Publication Date
WO2003077038A2 WO2003077038A2 (en) 2003-09-18
WO2003077038A3 true WO2003077038A3 (en) 2004-03-18

Family

ID=27805120

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2003/006825 WO2003077038A2 (en) 2002-03-05 2003-03-04 Reduced striae extreme ultraviolegt lithographic elements, a method of manufacturing the same and a method of measuring striae

Country Status (8)

Country Link
US (3) US7053017B2 (en)
EP (2) EP2211232B1 (en)
JP (3) JP2005519349A (en)
KR (1) KR101190914B1 (en)
AU (1) AU2003220982A1 (en)
DE (1) DE60332429D1 (en)
TW (1) TWI247196B (en)
WO (1) WO2003077038A2 (en)

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US7053017B2 (en) * 2002-03-05 2006-05-30 Corning Incorporated Reduced striae extreme ultraviolet elements
JP4792706B2 (en) * 2003-04-03 2011-10-12 旭硝子株式会社 Silica glass containing TiO2 and method for producing the same
JP5367204B2 (en) * 2003-04-03 2013-12-11 旭硝子株式会社 Silica glass containing TiO2 and optical member for EUV lithography
EP1471038A3 (en) * 2003-04-26 2005-11-23 Schott Ag Process for producing glass articles of doped silica glass
US7155936B2 (en) * 2003-08-08 2007-01-02 Corning Incorporated Doped silica glass articles and methods of forming doped silica glass boules and articles
DE10359102A1 (en) 2003-12-17 2005-07-21 Carl Zeiss Smt Ag Optical component comprises a material with a longitudinal expansion coefficient which is spatially dependent
JP4492123B2 (en) * 2004-01-05 2010-06-30 旭硝子株式会社 Silica glass
JP4537087B2 (en) * 2004-02-12 2010-09-01 キヤノン株式会社 Exposure apparatus and device manufacturing method
DE102004015766B4 (en) * 2004-03-23 2016-05-12 Asahi Glass Co., Ltd. Use of a SiO 2 -tiO 2 glass as a radiation-resistant substrate
DE102004024808B4 (en) * 2004-05-17 2006-11-09 Heraeus Quarzglas Gmbh & Co. Kg Quartz glass blank for an optical component for transmitting extremely short-wave ultraviolet radiation
JP4487783B2 (en) * 2005-01-25 2010-06-23 旭硝子株式会社 Method for producing silica glass containing TiO2 and optical member for EUV lithography using silica glass containing TiO2
JP4781003B2 (en) * 2005-04-28 2011-09-28 信越石英株式会社 Silica-titania glass for nanoimprint stamper
JP5035516B2 (en) * 2005-12-08 2012-09-26 信越化学工業株式会社 Method for producing titania-doped quartz glass for photomask
US20070263281A1 (en) * 2005-12-21 2007-11-15 Maxon John E Reduced striae low expansion glass and elements, and a method for making same
US20070137252A1 (en) * 2005-12-21 2007-06-21 Maxon John E Reduced striae low expansion glass and elements, and a method for making same
US20070137253A1 (en) * 2005-12-21 2007-06-21 Beall Lorrie F Reduced striae low expansion glass and elements, and a method for making same
US20100154474A1 (en) * 2005-12-21 2010-06-24 Lorrie Foley Beall Reduced striae low expansion glass and elements, and a method for making same
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JP5042714B2 (en) * 2007-06-06 2012-10-03 信越化学工業株式会社 Titania-doped quartz glass for nanoimprint molds
CN101959820A (en) 2008-02-26 2011-01-26 旭硝子株式会社 TiO2-containing silica glass and optical member for EUV lithography using high energy densities as well as special temperature controlled process for its manufacture
EP2250133A1 (en) * 2008-02-29 2010-11-17 Asahi Glass Company, Limited Tio2-containing silica glass and optical member for lithography using the same
CN101978468B (en) 2008-03-18 2013-03-20 旭硝子株式会社 Reflective mask blank for EUV lithography and manufacture method thereof
JP2010135732A (en) * 2008-08-01 2010-06-17 Asahi Glass Co Ltd Substrate for euv mask blanks
CN102421713A (en) 2009-05-13 2012-04-18 旭硝子株式会社 Method for producing tio2-sio2 glass body, method for heat-treating tio2-sio2 glass body, tio2-sio2 glass body, and optical base for euvl
WO2010134449A1 (en) 2009-05-18 2010-11-25 旭硝子株式会社 Method for producing tio2-sio2 glass body, method for heat-treating tio2-sio2 glass body, tio2-sio2 glass body, and optical base for euvl
US8328417B2 (en) 2009-08-20 2012-12-11 Corning Incorporated Photoelastic method for absolute determination of zero CTE crossover in low expansion silica-titania glass samples
US8713969B2 (en) * 2009-08-31 2014-05-06 Corning Incorporated Tuning Tzc by the annealing of ultra low expansion glass
DE102009043680A1 (en) 2009-09-30 2011-03-31 Heraeus Quarzglas Gmbh & Co. Kg Blank made of titanium-doped, high-silica glass for a mirror substrate for use in EUV lithography and method for its production
WO2011068064A1 (en) * 2009-12-01 2011-06-09 旭硝子株式会社 Silica glass containing tio2
CN103003054B (en) * 2010-07-12 2014-11-19 旭硝子株式会社 TIO2-containing quartz-glass substrate for an imprint mold and manufacturing method therefor
US20120026473A1 (en) 2010-07-29 2012-02-02 Michael Lucien Genier Highly reflective, hardened silica titania article and method of making
JP5737070B2 (en) 2010-09-02 2015-06-17 信越化学工業株式会社 Titania-doped quartz glass and method for producing the same
EP2671848A1 (en) 2011-01-31 2013-12-11 Asahi Glass Company, Limited Method for producing silica glass body containing titania, and silica glass body containing titania
US8857214B2 (en) * 2011-11-18 2014-10-14 Sunedison Semiconductor Limited Methods for producing crucibles with a reduced amount of bubbles
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US9505649B2 (en) 2013-09-13 2016-11-29 Corning Incorporated Ultralow expansion glass
US9382151B2 (en) 2014-01-31 2016-07-05 Corning Incorporated Low expansion silica-titania articles with a Tzc gradient by compositional variation
US20150239767A1 (en) 2014-02-26 2015-08-27 Corning Incorporated HEAT TREATING SILICA-TITANIA GLASS TO INDUCE A Tzc GRADIENT
EP3224213B1 (en) 2014-11-26 2022-03-23 Corning Incorporated Doped silica-titania glass having low expansivity and methods of making the same
EP3274311B1 (en) 2015-03-26 2020-06-17 Corning Incorporated Glass composite for use in extreme ultra-violet lithography
US10948814B2 (en) * 2016-03-23 2021-03-16 AGC Inc. Substrate for use as mask blank, and mask blank
DE102016224236A1 (en) 2016-12-06 2017-01-26 Carl Zeiss Smt Gmbh Blank made of TiO2-doped quartz glass, optical element for EUV lithography and EUV lithography system with it
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WO2001008163A1 (en) * 1999-07-22 2001-02-01 Corning Incorporated Extreme ultraviolet soft x-ray projection lithographic method system and lithography elements

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US4668086A (en) * 1985-05-20 1987-05-26 Salomon Redner Stress and strain measuring apparatus and method
WO1997010487A1 (en) * 1995-09-12 1997-03-20 Corning Incorporated Methods for detecting striae
EP0901989A1 (en) * 1997-09-11 1999-03-17 Nikon Corporation Silica glass and its manufacturing method
EP1033350A1 (en) * 1999-03-04 2000-09-06 Heraeus Quarzglas GmbH & Co. KG Synthetic quartz glass member for use in ArF excimer laser lithography
WO2001008163A1 (en) * 1999-07-22 2001-02-01 Corning Incorporated Extreme ultraviolet soft x-ray projection lithographic method system and lithography elements

Also Published As

Publication number Publication date
EP2211232B1 (en) 2015-09-02
KR101190914B1 (en) 2012-10-12
JP2005519349A (en) 2005-06-30
US20040027555A1 (en) 2004-02-12
TW200417822A (en) 2004-09-16
EP1481288B1 (en) 2010-05-05
JP2008182220A (en) 2008-08-07
WO2003077038A2 (en) 2003-09-18
TWI247196B (en) 2006-01-11
JP4887271B2 (en) 2012-02-29
AU2003220982A8 (en) 2003-09-22
US20050241338A1 (en) 2005-11-03
US7053017B2 (en) 2006-05-30
EP2211232A1 (en) 2010-07-28
JP2012042966A (en) 2012-03-01
USRE40586E1 (en) 2008-11-25
KR20040089703A (en) 2004-10-21
EP1481288A2 (en) 2004-12-01
DE60332429D1 (en) 2010-06-17
AU2003220982A1 (en) 2003-09-22

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