AU2002365522A1 - Evaluating method and method for manufacturing exposure apparatus - Google Patents

Evaluating method and method for manufacturing exposure apparatus

Info

Publication number
AU2002365522A1
AU2002365522A1 AU2002365522A AU2002365522A AU2002365522A1 AU 2002365522 A1 AU2002365522 A1 AU 2002365522A1 AU 2002365522 A AU2002365522 A AU 2002365522A AU 2002365522 A AU2002365522 A AU 2002365522A AU 2002365522 A1 AU2002365522 A1 AU 2002365522A1
Authority
AU
Australia
Prior art keywords
exposure apparatus
evaluating
manufacturing exposure
manufacturing
evaluating method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002365522A
Inventor
Tsunehito Hayashi
Kaname Takeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of AU2002365522A1 publication Critical patent/AU2002365522A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Filters (AREA)
AU2002365522A 2001-11-26 2002-11-25 Evaluating method and method for manufacturing exposure apparatus Abandoned AU2002365522A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2001-359534 2001-11-26
JP2001359534 2001-11-26
JP2002-238044 2002-08-19
JP2002238044 2002-08-19
PCT/JP2002/012271 WO2003046962A1 (en) 2001-11-26 2002-11-25 Evaluating method and method for manufacturing exposure apparatus

Publications (1)

Publication Number Publication Date
AU2002365522A1 true AU2002365522A1 (en) 2003-06-10

Family

ID=26624690

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002365522A Abandoned AU2002365522A1 (en) 2001-11-26 2002-11-25 Evaluating method and method for manufacturing exposure apparatus

Country Status (4)

Country Link
JP (1) JPWO2003046962A1 (en)
AU (1) AU2002365522A1 (en)
TW (1) TW200303039A (en)
WO (1) WO2003046962A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4786224B2 (en) * 2005-03-30 2011-10-05 富士フイルム株式会社 Projection head focus position measuring method and exposure method
JP6433264B2 (en) * 2014-11-27 2018-12-05 株式会社ディスコ Detection method of transmitted laser beam
EP3807654B1 (en) * 2018-06-12 2023-08-16 King Abdullah University of Science and Technology Single-camera particle tracking system and method

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2690381B2 (en) * 1990-04-24 1997-12-10 キヤノン株式会社 Dummy wafer and method of manufacturing the same
JP2690383B2 (en) * 1990-05-02 1997-12-10 キヤノン株式会社 Dummy wafer
US6151122A (en) * 1995-02-21 2000-11-21 Nikon Corporation Inspection method and apparatus for projection optical systems
JPH08335548A (en) * 1995-06-08 1996-12-17 Canon Inc Exposing apparatus, exposing condition determining method and aberration measuring method
US5841520A (en) * 1995-08-09 1998-11-24 Nikon Corporatioin Exposure apparatus and method that use mark patterns to determine image formation characteristics of the apparatus prior to exposure
JPH11162841A (en) * 1997-12-01 1999-06-18 Canon Inc Method apparatus for measuring exposure conditions and aberration, and device manufacture
JP2001308001A (en) * 1999-10-05 2001-11-02 Nikon Corp Latent image forming method, latent image detecting method, exposure method, device aligner, resist and substrate

Also Published As

Publication number Publication date
JPWO2003046962A1 (en) 2005-04-14
TW200303039A (en) 2003-08-16
WO2003046962A1 (en) 2003-06-05

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase