JP2005354088A - リソグラフィ運動制御システム及び方法 - Google Patents

リソグラフィ運動制御システム及び方法 Download PDF

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Publication number
JP2005354088A
JP2005354088A JP2005179853A JP2005179853A JP2005354088A JP 2005354088 A JP2005354088 A JP 2005354088A JP 2005179853 A JP2005179853 A JP 2005179853A JP 2005179853 A JP2005179853 A JP 2005179853A JP 2005354088 A JP2005354088 A JP 2005354088A
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target value
feedforward
transfer function
actuator
delay
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JP2005354088A5 (https=
Inventor
Donkelaar Edwin T Van
トイニス ファン ドンケラール エドウィン
Den Biggelaar Petrus Marinus Christianus Maria Van
マリヌス クリスティアヌス マリア ファン デン ビッゲラール ペトルス
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ASML Netherlands BV
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ASML Netherlands BV
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Publication of JP2005354088A publication Critical patent/JP2005354088A/ja
Publication of JP2005354088A5 publication Critical patent/JP2005354088A5/ja
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    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
    • G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
    • G05B13/04—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators
    • G05B13/042—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators in which a parameter or coefficient is automatically adjusted to optimise the performance
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B21/00—Systems involving sampling of the variable controlled
    • G05B21/02—Systems involving sampling of the variable controlled electric

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Health & Medical Sciences (AREA)
  • Artificial Intelligence (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Evolutionary Computation (AREA)
  • Medical Informatics (AREA)
  • Software Systems (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2005179853A 2004-05-25 2005-05-24 リソグラフィ運動制御システム及び方法 Pending JP2005354088A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/852,688 US7289858B2 (en) 2004-05-25 2004-05-25 Lithographic motion control system and method

Publications (2)

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JP2005354088A true JP2005354088A (ja) 2005-12-22
JP2005354088A5 JP2005354088A5 (https=) 2009-03-05

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JP2005179853A Pending JP2005354088A (ja) 2004-05-25 2005-05-24 リソグラフィ運動制御システム及び方法

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US (1) US7289858B2 (https=)
JP (1) JP2005354088A (https=)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007251162A (ja) * 2006-03-14 2007-09-27 Asml Netherlands Bv 設定値プロファイルを介した構成要素を移動するシステムおよび方法、リソグラフィ装置およびデバイス製造方法
JP2008028392A (ja) * 2006-07-24 2008-02-07 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2008060563A (ja) * 2006-08-29 2008-03-13 Asml Netherlands Bv 可動物体の位置を制御するための方法、位置決めシステム、および、リソグラフィ装置
JP2008199020A (ja) * 2007-02-15 2008-08-28 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2009152604A (ja) * 2007-12-19 2009-07-09 Asml Netherlands Bv 位置決めデバイスのためのコントローラ、位置決めデバイスを制御する方法、位置決めデバイスおよび位置決めデバイスを備えるリソグラフィ装置
WO2010055673A1 (ja) * 2008-11-13 2010-05-20 株式会社ニコン 移動体の駆動制御方法、露光方法、ロボット制御方法、駆動制御装置、露光装置、及び、ロボット装置
JP2011086892A (ja) * 2009-10-19 2011-04-28 Canon Inc 位置制御装置、露光装置およびデバイス製造方法
JP2012028784A (ja) * 2010-07-26 2012-02-09 Asml Netherlands Bv 位置制御システム、リソグラフィ装置、及び可動オブジェクトの位置制御方法
JP2015115990A (ja) * 2013-12-09 2015-06-22 山洋電気株式会社 モータ制御装置
KR20210142740A (ko) * 2019-04-17 2021-11-25 에이에스엠엘 네델란즈 비.브이. 디바이스 제조 프로세스를 위한 방법

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EP1883914B1 (en) * 2005-05-06 2011-07-06 Omnilink Systems, Inc. System and method of tracking the movement of individuals and assets
US7657334B2 (en) * 2005-09-16 2010-02-02 Asml Netherlands B.V. Lithographic apparatus and control method
US8045134B2 (en) * 2006-03-13 2011-10-25 Asml Netherlands B.V. Lithographic apparatus, control system and device manufacturing method
US7576832B2 (en) * 2006-05-04 2009-08-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2290808B1 (de) * 2009-08-28 2013-01-23 Baumüller Anlagen-Systemtechnik GmbH & Co. KG Verfahren zur Bestimmung eines Skalierungsfaktors eines elektrischen Antriebssystems sowie zugehörige Einrichtung und zugehöriges elektrisches Antriebssystem
US20110257768A1 (en) * 2010-03-26 2011-10-20 International Business Machines Corporation Control of a dynamic system cross reference to related application
JP5968017B2 (ja) * 2012-04-06 2016-08-10 キヤノン株式会社 制御装置、リソグラフィー装置、物品の製造方法、及びフィードフォワード操作量データ列を生成する方法
JP6308852B2 (ja) * 2014-04-15 2018-04-11 キヤノン株式会社 駆動装置、リソグラフィ装置、および物品の製造方法
US10078272B2 (en) 2014-12-02 2018-09-18 Asml Netherlands B.V. Lithographic method and apparatus
WO2016087388A1 (en) 2014-12-02 2016-06-09 Asml Netherlands B.V. Lithographic method and apparatus
WO2017050523A1 (en) 2015-09-24 2017-03-30 Asml Netherlands B.V. Method of reducing effects of reticle heating and/or cooling in a lithographic process
EP3379356A1 (en) 2017-03-23 2018-09-26 ASML Netherlands B.V. Method of modelling lithographic systems for performing predictive maintenance
JP6897545B2 (ja) * 2017-12-18 2021-06-30 オムロン株式会社 同期制御装置
US11048281B2 (en) * 2018-06-12 2021-06-29 Robert Bosch Gmbh Real-time capable control strategy for hydraulic systems while systematically taking into consideration control (rate) and state variable constraints
WO2023050226A1 (zh) * 2021-09-29 2023-04-06 西门子股份公司 运动控制方法及装置

Family Cites Families (12)

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US5523193A (en) * 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
EP0527166B1 (de) * 1990-05-02 1995-06-14 Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. Belichtungsvorrichtung
US5229872A (en) * 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
JP3217522B2 (ja) * 1992-03-02 2001-10-09 キヤノン株式会社 精密位置決め装置
WO1997033205A1 (en) * 1996-03-06 1997-09-12 Philips Electronics N.V. Differential interferometer system and lithographic step-and-scan apparatus provided with such a system
WO1998028665A1 (en) * 1996-12-24 1998-07-02 Koninklijke Philips Electronics N.V. Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
US6961628B2 (en) * 1999-04-16 2005-11-01 Siemens Energy & Automation, Inc. Method and apparatus for tuning compensation parameters
US6470225B1 (en) * 1999-04-16 2002-10-22 Siemens Energy & Automation, Inc. Method and apparatus for automatically tuning feedforward parameters
AU5881700A (en) * 1999-06-22 2001-01-09 Brooks Automation, Inc. Run-to-run controller for use in microelectronic fabrication
US6577908B1 (en) * 2000-06-20 2003-06-10 Fisher Rosemount Systems, Inc Adaptive feedback/feedforward PID controller
US7006900B2 (en) * 2002-11-14 2006-02-28 Asm International N.V. Hybrid cascade model-based predictive control system
US7209219B2 (en) * 2003-03-06 2007-04-24 Asml Netherlands B.V. System for controlling a position of a mass

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007251162A (ja) * 2006-03-14 2007-09-27 Asml Netherlands Bv 設定値プロファイルを介した構成要素を移動するシステムおよび方法、リソグラフィ装置およびデバイス製造方法
JP2008028392A (ja) * 2006-07-24 2008-02-07 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2008060563A (ja) * 2006-08-29 2008-03-13 Asml Netherlands Bv 可動物体の位置を制御するための方法、位置決めシステム、および、リソグラフィ装置
US8014881B2 (en) 2007-02-15 2011-09-06 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2008199020A (ja) * 2007-02-15 2008-08-28 Asml Netherlands Bv リソグラフィ装置およびデバイス製造方法
JP2012074718A (ja) * 2007-12-19 2012-04-12 Asml Netherlands Bv 位置決めデバイスのためのコントローラ、位置決めデバイスを制御する方法、位置決めデバイスおよび位置決めデバイスを備えるリソグラフィ装置
JP2009152604A (ja) * 2007-12-19 2009-07-09 Asml Netherlands Bv 位置決めデバイスのためのコントローラ、位置決めデバイスを制御する方法、位置決めデバイスおよび位置決めデバイスを備えるリソグラフィ装置
WO2010055673A1 (ja) * 2008-11-13 2010-05-20 株式会社ニコン 移動体の駆動制御方法、露光方法、ロボット制御方法、駆動制御装置、露光装置、及び、ロボット装置
JP2011086892A (ja) * 2009-10-19 2011-04-28 Canon Inc 位置制御装置、露光装置およびデバイス製造方法
JP2012028784A (ja) * 2010-07-26 2012-02-09 Asml Netherlands Bv 位置制御システム、リソグラフィ装置、及び可動オブジェクトの位置制御方法
US8825182B2 (en) 2010-07-26 2014-09-02 Asml Netherlands B.V. Position control system, lithographic apparatus, and method to control a position of a movable object
JP2015115990A (ja) * 2013-12-09 2015-06-22 山洋電気株式会社 モータ制御装置
KR20210142740A (ko) * 2019-04-17 2021-11-25 에이에스엠엘 네델란즈 비.브이. 디바이스 제조 프로세스를 위한 방법
KR102698693B1 (ko) * 2019-04-17 2024-08-23 에이에스엠엘 네델란즈 비.브이. 디바이스 제조 프로세스를 위한 방법
US12085913B2 (en) 2019-04-17 2024-09-10 Asml Netherlands B.V. Method for generating a control scheme and device manufacturing method

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US7289858B2 (en) 2007-10-30
US20050267609A1 (en) 2005-12-01

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