JP2005314802A - 成膜方法、基板および液体吐出ヘッド - Google Patents

成膜方法、基板および液体吐出ヘッド Download PDF

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Publication number
JP2005314802A
JP2005314802A JP2005074231A JP2005074231A JP2005314802A JP 2005314802 A JP2005314802 A JP 2005314802A JP 2005074231 A JP2005074231 A JP 2005074231A JP 2005074231 A JP2005074231 A JP 2005074231A JP 2005314802 A JP2005314802 A JP 2005314802A
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Japan
Prior art keywords
film
substrate
sacrificial layer
layer
metal film
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Pending
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JP2005074231A
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Japanese (ja)
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JP2005314802A5 (enExample
Inventor
Koji Kitani
耕治 木谷
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Canon Inc
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Canon Inc
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Priority to JP2005074231A priority Critical patent/JP2005314802A/ja
Publication of JP2005314802A publication Critical patent/JP2005314802A/ja
Publication of JP2005314802A5 publication Critical patent/JP2005314802A5/ja
Pending legal-status Critical Current

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  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Physical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP2005074231A 2004-03-31 2005-03-16 成膜方法、基板および液体吐出ヘッド Pending JP2005314802A (ja)

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JP2005074231A JP2005314802A (ja) 2004-03-31 2005-03-16 成膜方法、基板および液体吐出ヘッド

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JP2004101842 2004-03-31
JP2005074231A JP2005314802A (ja) 2004-03-31 2005-03-16 成膜方法、基板および液体吐出ヘッド

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JP2005314802A true JP2005314802A (ja) 2005-11-10
JP2005314802A5 JP2005314802A5 (enExample) 2006-02-02

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Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008105364A (ja) * 2005-12-09 2008-05-08 Canon Inc インクジェットヘッド用基板、該基板を有するインクジェットヘッド、該ヘッドのクリーニング方法および前記ヘッドを用いるインクジェット記録装置
JP2010032298A (ja) * 2008-07-28 2010-02-12 Toshiba Corp シンチレータパネル
US7795144B2 (en) 2007-06-06 2010-09-14 Sony Corporation Method for forming electrode structure for use in light emitting device and method for forming stacked structure
JP2010208237A (ja) * 2009-03-11 2010-09-24 Seiko Epson Corp 液体噴射ヘッド及び液体噴射装置並びにアクチュエーター
JP2012101557A (ja) * 2005-12-09 2012-05-31 Canon Inc インクジェットヘッドおよびインクジェット記録装置
JP2012121262A (ja) * 2010-12-09 2012-06-28 Ricoh Co Ltd インクジェット装置
JP2012201025A (ja) * 2011-03-25 2012-10-22 Ngk Insulators Ltd 流路部品
JP2013021187A (ja) * 2011-07-12 2013-01-31 Mitsubishi Electric Corp Ｍｉｍキャパシタとその製造方法、並びに半導体装置
DE102014221915A1 (de) 2013-10-28 2015-04-30 Hamamatsu Photonics K.K. Quantenkaskadenlaser
JP2016038280A (ja) * 2014-08-07 2016-03-22 コニカミノルタ株式会社 シンチレータパネルおよびこれを備えた放射線検出器
JP2017002338A (ja) * 2015-06-05 2017-01-05 旭硝子株式会社 光学部材および光学部材の製造方法
CN110699671A (zh) * 2019-10-21 2020-01-17 江苏菲沃泰纳米科技有限公司 镀膜夹具及其应用
US12180582B2 (en) 2019-10-21 2024-12-31 Jiangsu Favored Nanotechnology Co., Ltd. Coating method and film layer thereof, and coating fixture and application thereof

Cited By (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8491087B2 (en) 2005-12-09 2013-07-23 Canon Kabushiki Kaisha Circuit board for ink jet head, ink jet head having the same, method for cleaning the head and ink jet printing apparatus using the head
US8123330B2 (en) 2005-12-09 2012-02-28 Canon Kabushiki Kaisha Circuit board for ink jet head, ink jet head having the same, method for cleaning the head and ink jet printing apparatus using the head
JP2012101557A (ja) * 2005-12-09 2012-05-31 Canon Inc インクジェットヘッドおよびインクジェット記録装置
JP2008105364A (ja) * 2005-12-09 2008-05-08 Canon Inc インクジェットヘッド用基板、該基板を有するインクジェットヘッド、該ヘッドのクリーニング方法および前記ヘッドを用いるインクジェット記録装置
US7795144B2 (en) 2007-06-06 2010-09-14 Sony Corporation Method for forming electrode structure for use in light emitting device and method for forming stacked structure
JP2010032298A (ja) * 2008-07-28 2010-02-12 Toshiba Corp シンチレータパネル
JP2010208237A (ja) * 2009-03-11 2010-09-24 Seiko Epson Corp 液体噴射ヘッド及び液体噴射装置並びにアクチュエーター
JP2012121262A (ja) * 2010-12-09 2012-06-28 Ricoh Co Ltd インクジェット装置
JP2012201025A (ja) * 2011-03-25 2012-10-22 Ngk Insulators Ltd 流路部品
JP2013021187A (ja) * 2011-07-12 2013-01-31 Mitsubishi Electric Corp Ｍｉｍキャパシタとその製造方法、並びに半導体装置
DE102014221915A1 (de) 2013-10-28 2015-04-30 Hamamatsu Photonics K.K. Quantenkaskadenlaser
US9276381B2 (en) 2013-10-28 2016-03-01 Hamamatsu Photonics K.K. Quantum cascade laser
DE102014221915B4 (de) 2013-10-28 2023-12-28 Hamamatsu Photonics K.K. Quantenkaskadenlaser
JP2016038280A (ja) * 2014-08-07 2016-03-22 コニカミノルタ株式会社 シンチレータパネルおよびこれを備えた放射線検出器
JP2017002338A (ja) * 2015-06-05 2017-01-05 旭硝子株式会社 光学部材および光学部材の製造方法
CN110699671A (zh) * 2019-10-21 2020-01-17 江苏菲沃泰纳米科技有限公司 镀膜夹具及其应用
US12180582B2 (en) 2019-10-21 2024-12-31 Jiangsu Favored Nanotechnology Co., Ltd. Coating method and film layer thereof, and coating fixture and application thereof

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