JP2005197602A - 半導体装置およびその製造方法 - Google Patents

半導体装置およびその製造方法 Download PDF

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Publication number
JP2005197602A
JP2005197602A JP2004004509A JP2004004509A JP2005197602A JP 2005197602 A JP2005197602 A JP 2005197602A JP 2004004509 A JP2004004509 A JP 2004004509A JP 2004004509 A JP2004004509 A JP 2004004509A JP 2005197602 A JP2005197602 A JP 2005197602A
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JP
Japan
Prior art keywords
insulating film
wiring
film
oxide film
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2004004509A
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English (en)
Japanese (ja)
Other versions
JP2005197602A5 (enExample
Inventor
Naohiro Hosoda
直宏 細田
Kenji Kanemitsu
賢司 金光
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Renesas Technology Corp
Original Assignee
Renesas Technology Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Renesas Technology Corp filed Critical Renesas Technology Corp
Priority to JP2004004509A priority Critical patent/JP2005197602A/ja
Priority to TW093140326A priority patent/TW200527533A/zh
Priority to US11/028,296 priority patent/US20050151259A1/en
Priority to CN200510000505.9A priority patent/CN1638112A/zh
Publication of JP2005197602A publication Critical patent/JP2005197602A/ja
Publication of JP2005197602A5 publication Critical patent/JP2005197602A5/ja
Priority to US12/183,919 priority patent/US20080293230A1/en
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/49—Adaptable interconnections, e.g. fuses or antifuses
    • H10W20/493—Fuses, i.e. interconnections changeable from conductive to non-conductive
    • H10W20/494—Fuses, i.e. interconnections changeable from conductive to non-conductive changeable by the use of an external beam, e.g. laser beam or ion beam
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H10W20/45—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their insulating parts
    • H10W20/47—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes characterised by their insulating parts comprising two or more dielectric layers having different properties, e.g. different dielectric constants

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  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
JP2004004509A 2004-01-09 2004-01-09 半導体装置およびその製造方法 Pending JP2005197602A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2004004509A JP2005197602A (ja) 2004-01-09 2004-01-09 半導体装置およびその製造方法
TW093140326A TW200527533A (en) 2004-01-09 2004-12-23 Semiconductor device and manufacturing method thereof
US11/028,296 US20050151259A1 (en) 2004-01-09 2005-01-04 Semiconductor device and manufacturing method thereof
CN200510000505.9A CN1638112A (zh) 2004-01-09 2005-01-07 半导体器件及其制造方法
US12/183,919 US20080293230A1 (en) 2004-01-09 2008-07-31 Method of manufacturing a semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004004509A JP2005197602A (ja) 2004-01-09 2004-01-09 半導体装置およびその製造方法

Publications (2)

Publication Number Publication Date
JP2005197602A true JP2005197602A (ja) 2005-07-21
JP2005197602A5 JP2005197602A5 (enExample) 2007-02-15

Family

ID=34737195

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004004509A Pending JP2005197602A (ja) 2004-01-09 2004-01-09 半導体装置およびその製造方法

Country Status (4)

Country Link
US (2) US20050151259A1 (enExample)
JP (1) JP2005197602A (enExample)
CN (1) CN1638112A (enExample)
TW (1) TW200527533A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7833844B2 (en) 2006-09-15 2010-11-16 Ricoh Company, Ltd. Semiconductor device and production method of the same
JP2017069436A (ja) * 2015-09-30 2017-04-06 エスアイアイ・セミコンダクタ株式会社 半導体装置の製造方法

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060237802A1 (en) * 2005-04-21 2006-10-26 Macronix International Co., Ltd. Method for improving SOG process
US20060292774A1 (en) * 2005-06-27 2006-12-28 Macronix International Co., Ltd. Method for preventing metal line bridging in a semiconductor device
KR101100428B1 (ko) * 2005-09-23 2011-12-30 삼성전자주식회사 ＳＲＯ(Ｓｉｌｉｃｏｎ Ｒｉｃｈ Ｏｘｉｄｅ) 및 이를적용한 반도체 소자의 제조방법
US20070293034A1 (en) * 2006-06-15 2007-12-20 Macronix International Co., Ltd. Unlanded via process without plasma damage
CN102054839B (zh) * 2009-10-28 2014-12-31 无锡华润上华半导体有限公司 一种mos场效应晶体管结构及其制备方法
US20170287834A1 (en) * 2016-03-29 2017-10-05 Microchip Technology Incorporated Contact Expose Etch Stop
JP6985791B2 (ja) * 2016-09-27 2021-12-22 株式会社村田製作所 データ転送デバイス及び無線通信回路
TWI677056B (zh) 2018-04-16 2019-11-11 華邦電子股份有限公司 半導體裝置及其製造方法
CN110416182B (zh) * 2018-04-28 2021-01-29 华邦电子股份有限公司 半导体装置及其制造方法
KR102482697B1 (ko) * 2018-11-30 2022-12-28 양쯔 메모리 테크놀로지스 씨오., 엘티디. 본딩된 메모리 장치 및 그 제조 방법
CN109830459B (zh) * 2019-01-28 2021-01-22 上海华虹宏力半导体制造有限公司 一种熔丝结构的形成方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05218205A (ja) * 1992-02-05 1993-08-27 Fujitsu Ltd 半導体装置の製造方法
JPH09115888A (ja) * 1995-10-13 1997-05-02 Nec Corp 半導体装置の製造方法
JPH118299A (ja) * 1997-04-22 1999-01-12 Sanyo Electric Co Ltd 半導体装置の製造方法
JP2000031271A (ja) * 1998-07-09 2000-01-28 Toshiba Corp 多層配線の半導体装置の製造方法

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59214239A (ja) * 1983-05-16 1984-12-04 Fujitsu Ltd 半導体装置の製造方法
US4833094A (en) * 1986-10-17 1989-05-23 International Business Machines Corporation Method of making a dynamic ram cell having shared trench storage capacitor with sidewall-defined bridge contacts and gate electrodes
US5382545A (en) * 1993-11-29 1995-01-17 United Microelectronics Corporation Interconnection process with self-aligned via plug
US5879966A (en) * 1994-09-06 1999-03-09 Taiwan Semiconductor Manufacturing Company Ltd. Method of making an integrated circuit having an opening for a fuse
US5747868A (en) * 1995-06-26 1998-05-05 Alliance Semiconductor Corporation Laser fusible link structure for semiconductor devices
US6117345A (en) * 1997-04-02 2000-09-12 United Microelectronics Corp. High density plasma chemical vapor deposition process
KR100483226B1 (ko) * 1997-10-13 2005-04-15 후지쯔 가부시끼가이샤 퓨즈를 갖는 반도체 장치 및 그 제조 방법
JP3450221B2 (ja) * 1999-04-21 2003-09-22 Ｎｅｃエレクトロニクス株式会社 半導体装置の製造方法
US6180503B1 (en) * 1999-07-29 2001-01-30 Vanguard International Semiconductor Corporation Passivation layer etching process for memory arrays with fusible links
US6313025B1 (en) * 1999-08-30 2001-11-06 Agere Systems Guardian Corp. Process for manufacturing an integrated circuit including a dual-damascene structure and an integrated circuit
JP2003060031A (ja) * 2001-08-14 2003-02-28 Oki Electric Ind Co Ltd 半導体装置及びその製造方法。
US6750129B2 (en) * 2002-11-12 2004-06-15 Infineon Technologies Ag Process for forming fusible links
JP4489345B2 (ja) * 2002-12-13 2010-06-23 株式会社ルネサステクノロジ 半導体装置の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05218205A (ja) * 1992-02-05 1993-08-27 Fujitsu Ltd 半導体装置の製造方法
JPH09115888A (ja) * 1995-10-13 1997-05-02 Nec Corp 半導体装置の製造方法
JPH118299A (ja) * 1997-04-22 1999-01-12 Sanyo Electric Co Ltd 半導体装置の製造方法
JP2000031271A (ja) * 1998-07-09 2000-01-28 Toshiba Corp 多層配線の半導体装置の製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7833844B2 (en) 2006-09-15 2010-11-16 Ricoh Company, Ltd. Semiconductor device and production method of the same
JP2017069436A (ja) * 2015-09-30 2017-04-06 エスアイアイ・セミコンダクタ株式会社 半導体装置の製造方法

Also Published As

Publication number Publication date
US20050151259A1 (en) 2005-07-14
CN1638112A (zh) 2005-07-13
US20080293230A1 (en) 2008-11-27
TW200527533A (en) 2005-08-16

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