JP2005109158A5 - - Google Patents

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Publication number
JP2005109158A5
JP2005109158A5 JP2003340790A JP2003340790A JP2005109158A5 JP 2005109158 A5 JP2005109158 A5 JP 2005109158A5 JP 2003340790 A JP2003340790 A JP 2003340790A JP 2003340790 A JP2003340790 A JP 2003340790A JP 2005109158 A5 JP2005109158 A5 JP 2005109158A5
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JP
Japan
Prior art keywords
temperature
cooling
deriving
cooled
light incident
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003340790A
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English (en)
Japanese (ja)
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JP2005109158A (ja
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Publication date
Application filed filed Critical
Priority to JP2003340790A priority Critical patent/JP2005109158A/ja
Priority claimed from JP2003340790A external-priority patent/JP2005109158A/ja
Priority to EP08163860A priority patent/EP2028578A3/en
Priority to US10/953,205 priority patent/US7212274B2/en
Priority to EP04255973A priority patent/EP1521155A3/en
Publication of JP2005109158A publication Critical patent/JP2005109158A/ja
Publication of JP2005109158A5 publication Critical patent/JP2005109158A5/ja
Pending legal-status Critical Current

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JP2003340790A 2003-09-30 2003-09-30 冷却装置及び方法、それを有する露光装置、デバイスの製造方法 Pending JP2005109158A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2003340790A JP2005109158A (ja) 2003-09-30 2003-09-30 冷却装置及び方法、それを有する露光装置、デバイスの製造方法
EP08163860A EP2028578A3 (en) 2003-09-30 2004-09-29 Cooling system, exposure apparatus having the same, and device manufacturing method
US10/953,205 US7212274B2 (en) 2003-09-30 2004-09-29 Cooling system, exposure apparatus having the same, and device manufacturing method
EP04255973A EP1521155A3 (en) 2003-09-30 2004-09-29 Cooling system, exposure apparatus having the same, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003340790A JP2005109158A (ja) 2003-09-30 2003-09-30 冷却装置及び方法、それを有する露光装置、デバイスの製造方法

Publications (2)

Publication Number Publication Date
JP2005109158A JP2005109158A (ja) 2005-04-21
JP2005109158A5 true JP2005109158A5 (enExample) 2006-11-02

Family

ID=34309057

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003340790A Pending JP2005109158A (ja) 2003-09-30 2003-09-30 冷却装置及び方法、それを有する露光装置、デバイスの製造方法

Country Status (3)

Country Link
US (1) US7212274B2 (enExample)
EP (2) EP2028578A3 (enExample)
JP (1) JP2005109158A (enExample)

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JP2005109158A (ja) 2003-09-30 2005-04-21 Canon Inc 冷却装置及び方法、それを有する露光装置、デバイスの製造方法
US7295284B2 (en) * 2004-02-27 2007-11-13 Canon Kk Optical system, exposure apparatus using the same and device manufacturing method
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JP2008124079A (ja) * 2006-11-08 2008-05-29 Nikon Corp 露光装置とそれを用いた半導体装置または液晶装置の製造方法
JP5098306B2 (ja) * 2006-11-22 2012-12-12 株式会社ニコン 露光装置、デバイス製造方法、及び露光方法
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US20100186942A1 (en) * 2009-01-23 2010-07-29 Phillips Alton H Reticle error reduction by cooling
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DE102009030230A1 (de) * 2009-06-23 2010-12-30 Carl Zeiss Smt Ag Reflektives optisches Element mit einer Messeinrichtung
DE102009045193A1 (de) 2009-09-30 2011-04-14 Carl Zeiss Smt Gmbh Optische Anordnung in einem optischen System, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
DE102010006326A1 (de) * 2010-01-29 2011-08-04 Asml Netherlands B.V. Anordnung zur Verwendung in einer Projektionsbelichtungsanlage für die Mikrolithographie mit einem reflektiven optischen Element
DE102011081259A1 (de) 2010-09-28 2012-03-29 Carl Zeiss Smt Gmbh Anordnung zur Spiegeltemperaturmessung und/oder zur thermischen Aktuierung eines Spiegels in einer mikrolithographischen Projektionsbelichtungsanlage
US8746975B2 (en) 2011-02-17 2014-06-10 Media Lario S.R.L. Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography
US8731139B2 (en) 2011-05-04 2014-05-20 Media Lario S.R.L. Evaporative thermal management of grazing incidence collectors for EUV lithography
WO2013041134A1 (en) 2011-09-21 2013-03-28 Carl Zeiss Smt Gmbh Arrangement for thermal actuation of a mirror in a microlithographic projection exposure apparatus
DE102011084117A1 (de) 2011-10-07 2013-04-11 Carl Zeiss Smt Gmbh Reflektives optisches Element für den EUV-Wellenlängenbereich, Verfahren zur Erzeugung und zur Korrektur eines solchen Elements, Projektionsobjektiv für die Mikrolithographie mit einem solchen Element und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv
DE102011086457A1 (de) * 2011-11-16 2012-12-20 Carl Zeiss Smt Gmbh Euv-abbildungsvorrichtung
DE102012201075A1 (de) * 2012-01-25 2013-07-25 Carl Zeiss Smt Gmbh Optische Anordnung, EUV-Lithographieanlage und Verfahren zum Konfigurieren einer optischen Anordnung
DE102012201410B4 (de) * 2012-02-01 2013-08-14 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage mit einer Messvorrichtung zum Vermessen eines optischen Elements
US9164388B2 (en) * 2012-04-10 2015-10-20 Kla-Tencor Corporation Temperature control in EUV reticle inspection tool
WO2014095266A2 (en) * 2012-12-17 2014-06-26 Asml Netherlands B.V. Substrate support for a lithographic apparatus and lithographic apparatus
US20140356985A1 (en) 2013-06-03 2014-12-04 Lam Research Corporation Temperature controlled substrate support assembly
DE102018211596A1 (de) 2018-07-12 2020-01-16 Carl Zeiss Smt Gmbh Verfahren zur Herstellung eines reflektierenden optischen Elementes einer Projektionsbelichtungsanlage und reflektierendes optisches Element für eine Projektionsbelichtungsanlage, Projektionsobjektiv und Projektionsbelichtungsanlage
KR102678312B1 (ko) * 2018-10-18 2024-06-25 삼성전자주식회사 Euv 노광 장치와 노광 방법, 및 그 노광 방법을 포함한 반도체 소자 제조 방법
CN109582059B (zh) * 2018-11-30 2020-11-06 中国航空工业集团公司洛阳电光设备研究所 一种光学件温度控制方法及光学系统
DE102020203753A1 (de) 2020-03-24 2021-09-30 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie
DE102020203750A1 (de) 2020-03-24 2021-09-30 Carl Zeiss Smt Gmbh Vorrichtung zur Erfassung einer Temperatur, Anlage zur Herstellung eines optischen Elementes und Verfahren zur Herstellung eines optischen Elementes
DE102021205908A1 (de) 2021-06-10 2022-12-15 Carl Zeiss Smt Gmbh Optische Anordnung und Lithographiesystem mit Strahlungskühlung
DE102022200976A1 (de) 2022-01-31 2023-01-05 Carl Zeiss Smt Gmbh Kalibrierkörper und Verfahren zur Kalibrierung
DE102022210037A1 (de) 2022-09-23 2024-03-28 Carl Zeiss Smt Gmbh Anordnung zum Tempern mindestens eines Teilbereichs eines optischen Elementes
DE102023208563A1 (de) 2023-09-06 2025-03-06 Carl Zeiss Smt Gmbh Bearbeitung eines optischen Elements für eine Projektionsbelichtungsanlage

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EP1318431A1 (en) 2001-12-04 2003-06-11 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and method of manufacturing an optical element
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JP4311711B2 (ja) * 2003-02-24 2009-08-12 キヤノン株式会社 露光装置及びデバイス製造方法
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JP4307130B2 (ja) * 2003-04-08 2009-08-05 キヤノン株式会社 露光装置
JP2005109158A (ja) 2003-09-30 2005-04-21 Canon Inc 冷却装置及び方法、それを有する露光装置、デバイスの製造方法

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