JP2004080025A5 - - Google Patents

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Publication number
JP2004080025A5
JP2004080025A5 JP2003284379A JP2003284379A JP2004080025A5 JP 2004080025 A5 JP2004080025 A5 JP 2004080025A5 JP 2003284379 A JP2003284379 A JP 2003284379A JP 2003284379 A JP2003284379 A JP 2003284379A JP 2004080025 A5 JP2004080025 A5 JP 2004080025A5
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JP
Japan
Prior art keywords
cooling
radiation
optical member
temperature
refrigerant
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003284379A
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English (en)
Japanese (ja)
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JP2004080025A (ja
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Publication date
Application filed filed Critical
Priority to JP2003284379A priority Critical patent/JP2004080025A/ja
Priority claimed from JP2003284379A external-priority patent/JP2004080025A/ja
Publication of JP2004080025A publication Critical patent/JP2004080025A/ja
Publication of JP2004080025A5 publication Critical patent/JP2004080025A5/ja
Pending legal-status Critical Current

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JP2003284379A 2002-07-31 2003-07-31 冷却装置及び方法、当該冷却装置を有する露光装置 Pending JP2004080025A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003284379A JP2004080025A (ja) 2002-07-31 2003-07-31 冷却装置及び方法、当該冷却装置を有する露光装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002222911 2002-07-31
JP2003284379A JP2004080025A (ja) 2002-07-31 2003-07-31 冷却装置及び方法、当該冷却装置を有する露光装置

Publications (2)

Publication Number Publication Date
JP2004080025A JP2004080025A (ja) 2004-03-11
JP2004080025A5 true JP2004080025A5 (enExample) 2006-09-07

Family

ID=32032785

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003284379A Pending JP2004080025A (ja) 2002-07-31 2003-07-31 冷却装置及び方法、当該冷却装置を有する露光装置

Country Status (1)

Country Link
JP (1) JP2004080025A (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1477850A1 (en) 2003-05-13 2004-11-17 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4666908B2 (ja) 2003-12-12 2011-04-06 キヤノン株式会社 露光装置、計測方法及びデバイス製造方法
US7295284B2 (en) 2004-02-27 2007-11-13 Canon Kk Optical system, exposure apparatus using the same and device manufacturing method
JP2006073895A (ja) 2004-09-03 2006-03-16 Canon Inc 冷却装置、露光装置及びデバイス製造方法
JP5022914B2 (ja) * 2005-01-26 2012-09-12 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学アセンブリ
JPWO2007122856A1 (ja) * 2006-04-24 2009-09-03 株式会社ニコン 光学素子冷却装置および露光装置
WO2009046955A2 (en) * 2007-10-09 2009-04-16 Carl Zeiss Smt Ag Device for controlling temperature of an optical element
DE102009054869B4 (de) 2009-04-09 2022-02-17 Carl Zeiss Smt Gmbh Spiegel zur Führung eines Strahlungsbündels, Vorrichtungen mit einem derartigen Spiegel sowie Verfahren zur Herstellung mikro- oder nanostrukturierter Bauelemente
DE102009045193A1 (de) 2009-09-30 2011-04-14 Carl Zeiss Smt Gmbh Optische Anordnung in einem optischen System, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
CN107003621B (zh) * 2014-12-12 2019-01-11 Asml荷兰有限公司 反射器
WO2019170422A1 (en) * 2018-03-06 2019-09-12 Asml Netherlands B.V. Radiation shielding device and apparatus comprising such shielding device

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